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    22.
    发明专利
    未知

    公开(公告)号：ES2021586T5

    公开(公告)日：1995-08-16

    申请号：ES86117726

    申请日：1986-12-19

    Applicant: BASF AG

    Inventor： HOFFMANN GERHARD DR ,  KURTZ KARL-RUDOLF DR

    IPC: G03F7/00 ,  G03F7/30 ,  G03F7/32

    Abstract: Relief plates crosslinked by photopolymerization are produced by exposing layers which are crosslinkable by photopolymerization imagewise to actinic light and washing out the noncrosslinked parts of the layers with a developer, by a process in which the developer used contains, as an essential component, a branched or straight-chain, monoolefinically, diolefinically or triolefinically unsaturated acryclic or saturated or monoolefinically, diolefinically or triolefinically unsaturated cyclic aliphatic hydrocarbon, alcohol or ketone of 8 to 15 carbon atoms.

    24.
    发明专利
    未知

    公开(公告)号：DE4223888A1

    公开(公告)日：1994-01-27

    申请号：DE4223888

    申请日：1992-07-21

    Applicant: BASF AG

    Inventor： HOESSEL PETER DR ,  HOFFMANN GERHARD DR

    IPC: B01J19/00 ,  B29C35/08 ,  B29C59/16 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  H01L21/027 ,  G03F7/00

    Abstract: The invention relates to a process for making microstructures having structure depths ranging from several mu m up to the mm range by imagewise irradiation of polymers with X-rays and removal of the imagewise irradiated regions of the polymers. Before the imagewise irradiation, the polymers are applied in layer thicknesses ranging from several mu m up to the mm range by melting under pressure onto an electrically conductive substrate and firmly anchored. The process according to the invention is suitable, in particular, for making microstructures having structure depths of between 3 mu m and 2000 mu m and lateral dimensions of less than 10 mu m.

    25.
    发明专利
    未知

    公开(公告)号：DE3778395D1

    公开(公告)日：1992-05-27

    申请号：DE3778395

    申请日：1987-02-25

    Applicant: BASF AG

    Inventor： HOFFMANN GERHARD DR ,  HOFMANN REINER DR ,  LAUKE HARALD DR ,  WEBER WILHELM DR ,  LEYRER REINHOLD J DR

    IPC: G03C1/00 ,  C08F2/50 ,  G03C1/72 ,  G03F7/004 ,  G03F7/028 ,  G03F7/031

    Abstract: In a photo-polymerisable mixt. contg. at least one ethylenically unsatd., photo-polymerisable or photo-crosslinkable cpd. as well as a photopolymerisation initiator, the photo-polymerisation-initiator comprises a combination of (a) at least one benzophenone, anthraquinone, xanthone or thioxanthone type cpd. having formula (I); where A = H, opt. substd. alkyl, -NR1R2 or -OR3; R1, R2 each = H or opt. substd. aliphatic, aromatic or aliphatic-aromatic gp.; R3 = H or opt. substd. aliphatic, aromatic or aliphatic-aromatic gp.; B = a gp. having the significance of A, halogen or -CN; X = -O-, -S- or -NR4-; R4 = H or an aliphatic, aromatic or aliphatic-aromatic gp.; Y = a direct bond, -CH2-, -CH2-CH2-, -O-, -S-, -CO- or -NR5; R5 = H, an aliphatic or aromatic gp. and n = 0 or 1, and (b) at least one halogen-substd. Me gp.-contg. sym. triazine cpd. having formula (II); where R6, R7, R8 each = opt. substd. alkyl, opt. substd. aryl or opt. substd. aralkyl, provided that at least one of the gps. R6 and R8 is a mono-, di- or tri-halogen-substd. Me gp. and one of the R6, R7, R8 gps. can also be opt. substd. alkenyl, -NR2-, -OR-or -SR-; R = H, alkyl or aryl. A photo-sensitive recording material contains a dimensionally stable carrier and an applied photo-sensitive recording layer having thickness 0.1-50 micron, consisting of the photo-polymerisable mixt. claimed.

    28.
    发明专利
    未知

    公开(公告)号：DE3672305D1

    公开(公告)日：1990-08-02

    申请号：DE3672305

    申请日：1986-11-17

    Applicant: BASF AG

    Inventor： HOFFMANN GERHARD DR ,  KOCH HORST DR ,  SCHULZ GUENTHER DR

    IPC: G03F7/032 ,  C08G65/32 ,  G03F7/00 ,  G03F7/033

    Abstract: The invention relates to a novel photosensitive recording material which can be developed in aqueous solvents after its imagewise irradiation with actinic light and which consists essentially of a dimensionally stable base (A) and of a photosensitive recording layer (B). The said photosensitive recording layer (B) contains from about 48 to about 85% by weight, based on the photosensitive recording layer (B) of one or more elastomeric graft copolymers (B1) which are selected from the group consisting of polyalkylene oxide - vinyl ester - graft copolymers whose vinyl ester structural units have been hydrolyzed to a degree of not less 50 mol.-% from about 0.01 to about 10% by weight, based on the photosensitive recording layer (B), of one or more photoinitiators (B2), and from about 5 to about 30% by weight, based on the photosensitive recording layer (B), of one or more photopolymerizable monomers (B3). In addition to these components, the photosensitive recording layer (B) might contain further assistants or additives. The novel photosensitive recording material is especially well suited for the production of lithographic printing plates, resists and relief plates, in particular relief printing plates. The invention is furthermore related to a process for preparing the novel photosensitive recording material by polymerizing vinylesters in the presence of polyalkylene oxides to yield polyalkylene oxide - vinylester - graft copolymers, hydrolyzing or transesterifying said polyalkylene oxide - vinylester - graft copolymers to yield the said elastomeric graft copolymer (B1), mixing the said elastomeric graft copolymers (B1) with the other components of the photosensitive recording layer (B), and forming the said photosensitive recording layer (B) from the mixture consisting of its components on the dimensionally stable base (A).

    29.
    发明专利
    未知

    公开(公告)号：DE3837513A1

    公开(公告)日：1990-05-10

    申请号：DE3837513

    申请日：1988-11-04

    Applicant: BASF AG

    Inventor： NGUYEN KIM SON DR ,  HOFFMANN GERHARD DR ,  SCHWALM REINHOLD DR ,  BINDER HORST

    IPC: G03F7/039 ,  C08F4/00 ,  G03F7/004 ,  H01L21/027 ,  H01L21/30

    Abstract: The invention relates to a radiation-sensitive mixture essentially consisting of (a) a water-insoluble binder or binder mixture which is soluble in aqueous alkaline solutions, (b) a compound which upon irradiation forms a strong acid and (c) one or more organic compounds which inhibit the solubility of (a) in aqueous alkaline solutions, wherein the organic compound (c) is a beta -ketoacide ester. This radiation-sensitive mixture may be used to prepare photoresists.

    ELECTROPHOTOGRAPHIC RECORDING MATERIAL
    30.
    发明专利
    ELECTROPHOTOGRAPHIC RECORDING MATERIAL 未知

    公开(公告)号：DE3475970D1

    公开(公告)日：1989-02-09

    申请号：DE3475970

    申请日：1984-10-26

    Applicant: BASF AG

    Inventor： NEUMANN PETER DR ,  ETZBACH KARL-HEINZ DR ,  HOFFMANN GERHARD DR

    IPC: C09B5/62 ,  G03G5/043 ,  G03G5/06 ,  G03G5/09 ,  H01L51/42

    Abstract: An electrophotographic recording material consists of (A) an electrically conductive base and (B) a photoconductor layer containing (a) a polymeric binder, which either is itself capable of transporting charge carriers or contains charge carrier-transporting compounds, and (b) sensitizers, with or without (c) other additives conventionally used in photoconductor layers. Compounds (c), used according to the invention are compounds of the formula where R1 is H or C1-C8-alkyl, R2 is C1-C8-alkyl, Hal is Cl or Br and n is an integer from 2 to 6. The compounds (IV) are present as a molecular-disperse solution in the polymer matrix. The recording materials are highly photosensitive over the entire visible range of light, and are therefore very useful for reprographic purposes.

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