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    22.
    发明专利
    未知

    公开(公告)号：DE3636951A1

    公开(公告)日：1987-06-25

    申请号：DE3636951

    申请日：1986-10-30

    Applicant: CANON KK

    Inventor： BABA TAKESHI ,  NIWA YUKICHI ,  YOSHII MINORU ,  WATANABE TAKAKO

    IPC: G02B7/36 ,  H04N5/232 ,  G02B7/11

    Abstract: In an automatic focusing apparatus, a focus detecting device having detecting means for detecting the width of the edge part of the image of an object to be photographed and discriminating means for discriminating a focused state on the basis of the size of the detected width is arranged to determine by the discriminating means the apparatus to be out of focus when the width of the edge part of the object image is wide and to be in focus when the width of the edge part is narrow, so that the focus detecting device can operate without being affected by difference in the kind and the contrast of the object to be photographed.

    23.
    发明专利
    未知

    公开(公告)号：DE3318293A1

    公开(公告)日：1983-12-01

    申请号：DE3318293

    申请日：1983-05-19

    Applicant: CANON KK

    Inventor： SUEDA TATSUO ,  YOSHII MINORU

    IPC: G01M11/02

    Abstract: In aberration measurement, a light beam from a light source provided at the image plane position of a lens to be examined is caused to enter the lens to be examined, the light beam passed through the lens to be examined, is separated into a plurality of light rays in a plane perpendicular to a principal ray or in a plane perpendicular to the optical axis of the lens to be examined, and the position of each light beam is detected at a position which is spaced apart from a position optically conjugate with said image plane position with respect to the lens to be examined and at which the plurality of light rays can be separated from one another.

    24.
    发明专利
    未知

    公开(公告)号：DE69940765D1

    公开(公告)日：2009-06-04

    申请号：DE69940765

    申请日：1999-11-30

    Applicant: CANON KK

    Inventor： INA HIDEKI ,  YOSHII MINORU ,  HASEGAWA MASANOBU ,  SATOH TAKASHI

    IPC: G03F9/00 ,  H01L21/027

    Abstract: An alignment method for aligning first and second objects, in an exposure apparatus for transferring a pattern of the first object onto the second object as being coated with a resist, includes a process of producing an alignment offset value related to an alignment mark forming region on the second object, after formation of the resist coating thereon, and a process of aligning the first object with the second object as being coated with the resist, in the exposure apparatus, on the basis of the offset value as produced.

    25.
    发明专利
    未知

    公开(公告)号：DE69937933D1

    公开(公告)日：2008-02-21

    申请号：DE69937933

    申请日：1999-10-29

    Applicant: CANON KK

    Inventor： INA HIDEKI ,  YOSHII MINORU ,  HASEGAWA MASANOBU ,  SATOH TAKASHI

    IPC: G03F9/00 ,  H01L21/027 ,  G03F7/20

    Abstract: A position detecting system includes a light source device for providing coherent light, an incoherence-transforming device for transforming the coherent light from the light source device, into incoherent light, an optical system for dividing the incoherent light from the incoherence-transforming device, wherein one of divided light beams is directed to illuminate a target upon a surface of an object while another of divided light beams is directed to be reflected by a surface which is optically conjugate with the surface of the object, and wherein light from the target and light reflected by the conjugate surface are re-combined, an image pickup device for producing an imagewise signal corresponding to the target on the basis of the light re-combined by the optical system, wherein positional information related to a position of the target with respect to a direction along the surface of the object can be produced on the basis of the imagewise signal, and an image contrast adjusting device for adjusting image contrast of an image of a portion close to the target, as picked up by the image pickup device.

    26.
    发明专利
    未知

    公开(公告)号：DE69225858T2

    公开(公告)日：1998-11-12

    申请号：DE69225858

    申请日：1992-09-24

    Applicant: CANON KK

    Inventor： NOSE NORIYUKI ,  YOSHII MINORU ,  SAITOH KENJI ,  OSAWA HIROSHI ,  SENTOKU KOICHI ,  TSUJI TOSHIHIKO ,  MATSUMOTO TAKAHIRO

    IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

    Abstract: A device and method for measuring the positional deviation between a plurality of diffraction gratings (2a,2b) formed on the same object (1) include an illumination optical system (3,6,20,21) for illuminating the plurality of diffraction gratings with a light beam, the illumination by the optical system generating a plurality of diffracted light beams from the plurality of diffraction gratings, an interference optical system (22,23,10) for forming at least one interference light beam from the plurality of diffracted light beams, a detector (12,14) for detecting the at least one interference light beam, the result of the detection serving as the basis for measuring the positional deviation between the plurality of diffraction gratings, and a measuring portion (31-33,41-44) for measuring the relative positional relation between the illumination optical system and the plurality of diffraction gratings.

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