公开(公告)号：CA2074791A1

公开(公告)日：1993-01-30

申请号：CA2074791

申请日：1992-07-28

Applicant: HOECHST AG

Inventor： PAWLOWSKI GEORG ,  DAMMEL RALPH ,  ROESCHERT HORST ,  MEIER WINFRIED ,  SPIESS WALTER ,  PRZYBILLA KLAUS-JUERGEN

IPC: G03F7/00 ,  C04B41/50 ,  G03F7/029 ,  G03F7/038 ,  H01L21/027

Abstract: A negative-working radiation-sensitive mixture containing a) a compound which contains at least one -CBr3 group bound to an atom not linked in turn to a hydrogen atom, b) an alkoxymethylated melamine and c) a water-insoluble polymeric binder which is soluble, or at least swellable, in aqueous alkaline solutions and contains phenolic OH groups, wherein (1) the mixture has an absorption of

公开(公告)号：ZA922813B

公开(公告)日：1992-11-25

申请号：ZA922813

申请日：1992-04-16

Applicant: HOECHST AG

Inventor： PAWLOWSKI GEORG ,  GEORG PAWLOWSKI ,  ROESCHERT HORST ,  HORST ROESCHERT ,  SPIESS WALTER ,  WALTER SPIESS ,  DAMMEL RALPH ,  RALPH DAMMEL

IPC: C09K11/00 ,  C07C235/00 ,  C07C235/08 ,  C07C271/12 ,  C07C271/14 ,  C07C271/16 ,  C07C275/04 ,  C07C275/06 ,  C07C275/24 ,  C07C275/28 ,  C07C323/10 ,  C07D317/54 ,  C08G69/00 ,  C08G71/00 ,  G01D15/14 ,  G03F7/004 ,  G03F7/039 ,  C07C ,  C07D ,  G03F

Abstract: Compounds having repeating units of the formula I (* CHEMICAL STRUCTURE *) (I) in which R1 is an alkylene, cycloalkylene, alkenylene, alkynylene, or arylenebisalkyl group, in which one or more aliphatic CH2 groups may be replaced by oxygen or sulfur atoms, R2 is an alkyl, alkenyl, alkynyl, cycloalkyl, alkoxyalkyl, aryl, aralkyl or aryloxyalkyl radical, R3 is an alkyl or aryl radical, X is -CO-, -O-CO- or -NH-CO-, and n is an integer greater than 1, especially from 3 to 50. are cleavable by acid and, in combination with photolytic acid donors and alkali-soluble binders, are constituents of positive-working mixtures which are used especially in recording materials for UV radiation and high-energy radiation. The materials are distinguished by a high resolution in conjunction with high image contrast.

公开(公告)号：AU630675B2

公开(公告)日：1992-11-05

申请号：AU5123090

申请日：1990-03-09

Applicant: HOECHST AG

Inventor： DAMMEL RALPH ,  LINGNAU JUERGEN ,  PAWLOWSKI GEORG ,  THEIS JUERGEN

IPC: G03F7/039 ,  C07C271/28 ,  C07C275/50 ,  C08K5/00 ,  C08L61/00 ,  C08L61/04 ,  G03F7/004 ,  H01L21/027 ,  G03F7/029 ,  G03F7/031 ,  G03F7/032 ,  G03F7/033 ,  G03F7/035 ,  G03F7/037

Abstract: A radiation-curable mixture is proposed which contains a compound which forms an acid when exposed to high-energy radiation and a compound which is acid-cleavable, and which is characterised in that the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pKa of less than 12 or is a derivative of a compound having such a pKa, which derivative can be converted into the free compound by acid catalysis. The composition claimed, and in particular the recording material prepared therefrom, has a higher sensitivity and an improved resolution, and in addition exhibits no image haze after development.

公开(公告)号：ZA921510B

公开(公告)日：1992-10-28

申请号：ZA921510

申请日：1992-02-28

Applicant: HOECHST AG

Inventor： PRZYBILLA KLAUS JUERGEN ,  KLAUS JUERGEN PRZYBILLA ,  DAMMEL RALPH ,  RALPH DAMMEL ,  PAWLOWSKI GEORG ,  GEORG PAWLOWSKI

IPC: C07C69/96 ,  C08F20/30 ,  G03F7/039 ,  C07C ,  C07D ,  G03F ,  H01L

公开(公告)号：BR9001122A

公开(公告)日：1991-03-05

申请号：BR9001122

申请日：1990-03-09

Applicant: HOECHST AG

Inventor： DAMMEL RALPH ,  LINGNAU JUERGEN ,  PAWLOWSKI GEORG ,  THEIS JUERGEN

IPC: G03F7/039 ,  G03F7/004 ,  H01L21/027 ,  G03F1/04

Abstract: A positive radiation-sensitive mixture is disclosed which contains a compound which forms an acid under the action of high-energy radiation, and an acid-cleavable compound, wherein the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pKa value of less than about 12 or is a derivative of a compound having such a pKa value which can be converted into the free compound by acid catalysis. A positive recording material and a process for recording high-energy radiation using the material are also disclosed. The mixture, and in particular the recording material produced therefrom, has relatively high sensitivity and improved resolution and, in addition, does not exhibit image fogging after development.

公开(公告)号：BR9000110A

公开(公告)日：1990-10-23

申请号：BR9000110

申请日：1990-01-12

Applicant: HOECHST AG

Inventor： WILHARM PETER ,  MERREM HANS-JOACHIM ,  PAWLOWSKI GEORG ,  DAMMEL RALPH

IPC: G03F7/039 ,  A61K8/00 ,  A61Q17/04 ,  C07C245/18 ,  C07C271/10 ,  C07C271/20 ,  C07C271/24 ,  C07C275/10 ,  C07C275/26 ,  C07C275/32 ,  C07C275/40 ,  C07C323/12 ,  C07D209/48 ,  C07D251/34 ,  C07D295/14 ,  C08F2/50 ,  C09K3/00 ,  G03C1/52 ,  G03F7/004 ,  G03F7/016 ,  H01L21/027 ,  H01L21/30

Abstract: Multifunctional alpha -diazo- beta -ketoesters of the general formula I are described … … in which… R denotes an aliphatic, cycloaliphatic or araliphatic or aromatic radical having 4 to 20 carbon atoms, where individual CH2 groups can be replaced by oxygen or sulphur atoms or by … … or NH groups and/or contain keto groups,… X denotes an aliphatic, cycloaliphatic, carbocyclic, heterocyclic or araliphatic radical having 2 to 22 carbon atoms, where individual CH2 groups can be replaced by oxygen or sulphur atoms or by the groups -NR -, -C(O)-O-, -C(O)-NR -, -C(O)- … … -NR -C(O)-NR -, -O-C(O)-NR -, -O-C(O)- … … -O-C(O)-O- or CH groups can be replaced by … … in which R and R independently of one another stand for hydrogen or an aliphatic, carbocyclic or araliphatic radical,… m denotes an integer from 2 to 10 and… n denotes an integer from 0 to 2,… with the proviso that… m-n is >/= 2. … The compounds mentioned are used as photoactive components in radiation-sensitive mixtures.

公开(公告)号：CA2011726A1

公开(公告)日：1990-09-11

申请号：CA2011726

申请日：1990-03-08

Applicant: HOECHST AG

Inventor： DAMMEL RALPH ,  LINGNAU JUERGEN ,  PAWLOWSKI GEORG ,  THEIS JUERGEN

IPC: G03F7/039 ,  C07C271/28 ,  C07C275/50 ,  C08K5/00 ,  C08L61/00 ,  C08L61/04 ,  G03F7/004 ,  H01L21/027

Abstract: A radiation-curable mixture is disclosed which contains a compound which forms an acid under the action of high-energy radiation, and contains an acid-curable compound, wherein the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pKa value of less than about 12. A radiation-curable recording material and a process for recording high-energy radiation using the material are also disclosed. The mixture, and in particular the recording material produced therefrom, has relatively high sensitivity and improved resolution and, in addition, does not exhibit image fogging after development.

公开(公告)号：FI893071A

公开(公告)日：1989-12-26

申请号：FI893071

申请日：1989-06-22

Applicant: HOECHST AG

Inventor： DAMMEL RALPH ,  DOESSEL KARL-FRIEDRICH ,  LINGNAU JUERGEN ,  THEIS JUERGEN

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  H01L21/027 ,  H01L21/30 ,  G03F

Abstract: A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pKa value below 12. The composition and the recording material prepared therefrom display increased sensitivity, improved resolution and a high etch resistance after development.

公开(公告)号：FI893071A0

公开(公告)日：1989-06-22

申请号：FI893071

申请日：1989-06-22

Applicant: HOECHST AG

Inventor： DAMMEL RALPH ,  DOESSEL KARL-FRIEDRICH ,  LINGNAU JUERGEN ,  THEIS JUERGEN

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  H01L21/027 ,  H01L21/30 ,  G03F

Abstract: A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pKa value below 12. The composition and the recording material prepared therefrom display increased sensitivity, improved resolution and a high etch resistance after development.

公开(公告)号：MX9204410A

公开(公告)日：1993-05-01

申请号：MX9204410

申请日：1992-07-28

Applicant: HOECHST AG

Inventor： PAWLOWSKI GEORG ,  DAMMEL RALPH ,  ROESCHERT HORST ,  MEIER WINFRIED ,  SPIESS WALTER ,  PRZYBILLA KLAUS-JUERGEN

IPC: C04B41/50 ,  G03F7/00 ,  G03F7/029 ,  G03F7/038 ,  H01L21/027 ,  C08G8/10

Abstract: The invention relates to a negative-working radiation-sensitive mixture containing a) a compound containing at least one -CBr3 group bonded to an atom which is not itself bonded to a hydrogen atom, b) an alkoxymethylated melamine and c) a polymeric binder containing phenolic OH groups which is insoluble in water, but soluble or at least swellable in aqueous-alkaline solutions, which is characterised in that (1) it has an absorption of at 248 nm, (2) the CBr3 group of compound a) is bonded to the sulphur atom of a sulphonyl group and compound a) is present in the mixture in an amount of from 0.2 to 10 % by weight, based on the total amount of components b) and c), (3) the ratio by weight between components b) and c) is between 50 : 50 and 5 : 95, and (4) component c) is a homopolymer or copolymer of hydroxystyrene or a derivative thereof, where the homopolymer or copolymer has a material removal rate of from 200 to 3,000 nm/min at 21 DEG C in an aqueous-alkaline developer containing 2.38 % by weight of tetramethylammonium hydroxide. n