公开(公告)号：DE10224953A1

公开(公告)日：2004-01-08

申请号：DE10224953

申请日：2002-06-05

Applicant: INFINEON TECHNOLOGIES AG

Inventor： MOUKARA MOLELA ,  LUDWIG BURKHARD

IPC: G03F1/00 ,  G03F1/14

公开(公告)号：DE10206658A1

公开(公告)日：2003-09-04

申请号：DE10206658

申请日：2002-02-15

Applicant: INFINEON TECHNOLOGIES AG

Inventor： BADER PETER ,  LUDWIG BURKHARD

IPC: G06F9/45 ,  G06F17/50 ,  H01L21/66

Abstract: A layout of an integrated electrical circuit on a memory unit of a computer system includes one or more instantiations of at least one circuit network description as well as information about the instantiations. A raw data structure represents the logical configuration of the layout and associates each instantiation with one, and only one, polygon data structure. A modified data structure is produced to represent the layout, which associates a circuit network description with one, and only one, polygon data structure, wherein the geometrical differences between the instantiations of this circuit network description are taken into account by variants in the polygon data structure.

公开(公告)号：NL1019180A1

公开(公告)日：2002-04-18

申请号：NL1019180

申请日：2001-10-16

Applicant: INFINEON TECHNOLOGIES AG

Inventor： LUDWIG BURKHARD ,  MOUKARA MOLELA

IPC: G03F1/00 ,  H01L21/027 ,  G03F9/00

Abstract: A method for eliminating phase conflicts that occur in the layout of a phase mask in a localized and automated manner. The method includes a first step in which a set of phase conflicts is completely determined exclusively by using the technical requirements of the design. The first step is an optimum starting point for the following second step for automatically handling and eliminating such conflicts.

公开(公告)号：DE10057437A1

公开(公告)日：2002-02-14

申请号：DE10057437

申请日：2000-11-20

Applicant: INFINEON TECHNOLOGIES AG

Inventor： MOUKARA MOLELA ,  LUDWIG BURKHARD

IPC: G03F1/00

Abstract: The method involves determining critical regions, overlap regions between straight sections of critical regions and end regions of straight sections ending inboard of transparent regions, connected areas outside transparent and critical regions and major outer boundaries of these regions, overlapping regions and end regions and identifying a phase conflict if the number of contact sections with degenerate critical regions is odd. The method involves determining critical regions (2) in which any two adjacent transparent regions (1) provided for the phase mask exceed a defined minimum separation distance, determining overlap regions between straight sections of the critical regions and end regions of straight sections ending inboard of transparent regions, determining connected areas outside the transparent and critical regions and the major outer boundaries (4) of these regions, overlapping regions and end regions, and determining the number of contact sections with degenerate critical regions and identifying a phase conflict if the number is odd.

公开(公告)号：DE19957542C2

公开(公告)日：2002-01-10

申请号：DE19957542

申请日：1999-11-30

Applicant: INFINEON TECHNOLOGIES AG

Inventor： PFORR RAINER ,  FRIEDRICH CHRISTOPH ,  HEISSMEIER MICHAEL ,  MOUKARA MOLELA ,  GRIESINGER UWE ,  LUDWIG BURKHARD

IPC: G03F1/30 ,  G03F1/00 ,  H01L21/027 ,  G03F1/14

Abstract: An alternating phase mask having a branched structure containing two opaque segments is described. Two transparent surface segments are disposed on both sides of the segments or the components thereof, respectively. The surface segments are provided with phases that are displaced by 180°±Delta alpha, whereby Delta alpha a is not more than 25°. The surface segments are separated by at least one transparent surface boundary segment whose phase is situated between the phases of the adjacent surface segments.