METHOD OF COATING MICROELECTRONIC SUBSTRATES
    21.
    发明申请
    METHOD OF COATING MICROELECTRONIC SUBSTRATES 审中-公开
    涂覆微电子基片的方法

    公开(公告)号:WO2004070071A3

    公开(公告)日:2004-11-11

    申请号:PCT/US0338324

    申请日:2003-12-02

    Abstract: A method of coating a substrate comprises the steps of: (a) providing a substrate in an enclosed vessel, the substrate having a surface portion; (b) at least partially filling the enclosed vessel with a first supercritical fluid so that said first supercritical fluid contacts the surface portion, with the first supercritical fluid carrying or containing a coating component; then (c) adding a separate compressed gas atmosphere to the reaction vessel so that a boundary is formed between the first supercritical fluid and the separate compressed gas atmosphere, said separate compressed gas atmosphere having a density less than said first supercritical fluid; and then (d) displacing said first supercritical fluid from said vessel by continuing adding said separate compressed gas atmosphere to said vessel so that said boundary moves across said surface portion and a thin film of coating component is deposited on said microelectronic substrate.

    Abstract translation: 一种涂布基材的方法包括以下步骤:(a)在封闭容器中提供基材,基材具有表面部分; (b)用第一超临界流体至少部分地填充封闭容器,使得所述第一超临界流体接触表面部分,第一超临界流体携带或含有涂层组分; 然后(c)将单独的压缩气体气氛添加到反应容器中,使得在第一超临界流体和单独的压缩气体气氛之间形成边界,所述单独的压缩气体气氛的密度小于所述第一超临界流体的密度; 然后(d)通过继续将所述分开的压缩气体气氛加入所述容器,使所述边界移过所述表面部分,并将涂层组分的薄膜沉积在所述微电子基底上,从所述容器中置换所述第一超临界流体。

    METHODS FOR CARBON DIOXIDE DRY CLEANING WITH INTEGRATED DISTRIBUTION
    22.
    发明申请
    METHODS FOR CARBON DIOXIDE DRY CLEANING WITH INTEGRATED DISTRIBUTION 审中-公开
    用于二氧化碳干燥清洗与一体化分布的方法

    公开(公告)号:WO0157303A9

    公开(公告)日:2002-10-31

    申请号:PCT/US0103545

    申请日:2001-02-01

    CPC classification number: D06L1/02

    Abstract: The present invention provides a dry cleaning process that facilitates distribution of detergent and solvent and (optionally) facilitates recovery of cleaning by-products in conjunction with the cleaning of articles at a dry cleaning facility. The proces comprises the steps of: (a) receiving from a source a dry cleaning solvent at the dry cleaning facility, the solvent consisting essentially of carbon dioxide; (b) receiving a concentrated detergent formulation (preferably a liquid formulation) at the cleaning facility; (c) accepting from customers soiled articles to be cleaned at the cleaning facility; (d) mixing the dry cleaning solvent and the concentrated detergent formulation to provide a dry cleaning formulation comprised of from 30 or 40 to 99 percent by weight of carbon dioxide solvent; (e) cleaning the articles in a cleaning apparatus to produce cleaned articles; (f) at least periodically distilling the dry cleaning formulation to produce a still residue comprising surfactant and soil; and then (g) returning the cleaned articles to the customers. Optionally but preferably, the process further comprises the step of: (h) returning the still residue to a waste collector or reprocessor for suitable disposal.

    Abstract translation: 本发明提供了一种便于洗涤剂和溶剂的分配的干洗方法,并且(任选地)便于在干洗设施处清洁物品的同时回收清洁副产物。 方法包括以下步骤:(a)在干洗设备处从干燥清洁设备处获得干洗溶剂,所述溶剂基本上由二氧化碳组成; (b)在清洁设施处接收浓缩洗涤剂配制剂(优选液体制剂); (c)客户接受在清洁设施上清洁的污物; (d)混合干洗溶剂和浓缩洗涤剂配方以提供由30或40至99重量%的二氧化碳溶剂组成的干洗制剂; (e)清洁清洁设备中的物品以产生清洁物品; (f)至少定期蒸馏干洗制剂以产生包含表面活性剂和土壤的残余物; 然后(g)将清洁的物品送回顾客。 可选地,但优选地,该方法还包括以下步骤:(h)将残余物返回到废物收集器或再处理器以进行适当处置。

    24.
    发明专利
    未知

    公开(公告)号:AT290114T

    公开(公告)日:2005-03-15

    申请号:AT00930673

    申请日:2000-05-12

    Abstract: A system for the controlled addition of detergent formulations and the like to a carbon dioxide cleaning apparatus comprises: (a) a high pressure wash vessel; (b) an auxiliary vessel; (c) a drain line connecting the auxiliary vessel to the wash vessel; (d) optionally but preferably, a separate vent line connecting the auxiliary vessel to the wash vessel; (e) a detergent reservoir; and (f) a detergent supply line connecting the detergent reservoir to the auxiliary vessel. An advantage of this apparatus is that, because the detergent formulation can be pumped into the auxiliary vessel in a predetermined aliquot or amount, which predetermined aliquot or amount can then be transferred into the wash vessel where it combines with the liquid carbon dioxide cleaning solution, the detergent formulation can be added to the cleaning solution in a more controlled or accurate manner. An alternate embodiment adapted for the addition of aqueous detergent formulations and the like to a carbon dioxide dry cleaning system under turbulent conditions comprises: (a) a high pressure wash vessel; (b) a filter; (c) a carbon dioxide cleaning solution drain line interconnecting the wash vessel to the filter; (d) a carbon dioxide cleaning solution supply line connecting the filter to the wash vessel; (e) a first high pressure pump (i.e., a pump that is capable of pumping liquid solutions comprising liquid carbon dioxide) operably connected to the drain line; (f) a detergent formulation reservoir; (g) a detergent formulation supply line connecting the reservoir to the carbon dioxide cleaning solution supply line; and (h) a second high pressure pump operably connected to the detergent formulation supply line for transferring detergent formulation from the detergent formulation reservoir into the carbon dioxide cleaning solution under turbulent conditions.

    Method of coating microelectronic substrates

    公开(公告)号:AU2003294557A8

    公开(公告)日:2004-08-30

    申请号:AU2003294557

    申请日:2003-12-02

    Abstract: A method of coating a substrate comprises the steps of: (a) providing a substrate in an enclosed vessel, the substrate having a surface portion; (b) at least partially filling the enclosed vessel with a first supercritical fluid so that said first supercritical fluid contacts the surface portion, with the first supercritical fluid carrying or containing a coating component; then (c) adding a separate compressed gas atmosphere to the reaction vessel so that a boundary is formed between the first supercritical fluid and the separate compressed gas atmosphere, said separate compressed gas atmosphere having a density less than said first supercritical fluid; and then (d) displacing said first supercritical fluid from said vessel by continuing adding said separate compressed gas atmosphere to said vessel so that said boundary moves across said surface portion and a thin film of coating component is deposited on said microelectronic substrate.

    PRE-TREATMENT METHODS AND COMPOSITIONS FOR CARBON DIOXIDE DRY CLEANING

    公开(公告)号:CA2380004A1

    公开(公告)日:2001-01-25

    申请号:CA2380004

    申请日:2000-07-20

    Abstract: A method for dry-cleaning articles such as fabrics and clothing in carbon dioxide. The article includes a stained portion or region, which is pretreat ed with a pretreatment composition prior to initiating the cleaning cycle. The pretreatment step is followed by contacting the pretreated article to be cleaned with a liquid dry cleaning composition for a time sufficient to clea n the article. The liquid dry-cleaning composition comprises a mixture of carb on dioxide, a surfactant, and an organic co-solvent. After the contacting step, the article is separated from the liquid dry cleaning composition. The pretreatment composition, in a preferred embodiment, comprises at least one of (a) a surfactant; (b) d-limonene, and (c) a C12-C15 alkane co-solvent. Preferably the pretreatment composition comprises at least two, and in some particularly preferred embodiments, the pretreatment composition comprises a ll three, of the aforesaid ingredients.

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