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    Nano-size imprinting stamp
    22.
    发明公开
    Nano-size imprinting stamp 有权
    DruckstempelfürNanostrukturen

    公开(公告)号：EP1333324A2

    公开(公告)日：2003-08-06

    申请号：EP03250633.9

    申请日：2003-01-31

    Applicant: Hewlett-Packard Company

    Inventor： Lee, Heon, Gyosu APT 6-602

    IPC: G03F7/00 ,  B29C67/00

    CPC classification number: B29C59/022 ,  B29C2059/023 ,  B81C99/009 ,  B81C2201/036 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10T428/24479 ,  Y10T428/2457 ,  Y10T428/24579 ,  Y10T428/24595

    Abstract: A wide-area nano-size imprinting stamp 10 is disclosed. The wide-area nano-size imprinting stamp 10 includes a substrate 11 having a base surface 13 upon which is formed a plurality of micro-features 21 . Each micro-feature 21 includes a plurality of spacers 23 disposed on opposed side surfaces ( 22a, 22b ) thereof. The spacers 23 extend laterally outward of the opposed side surfaces ( 22a, 22b ) and the micro-features 21 and the spacers 23 extend outward of the base surface 13. The micro-features 21 and the spacers 23 are selectively etched to differing heights ( h 1 , h 2 ) to define an imprint stamp 20 having an imprint profile 24. The imprint stamps 20 can be formed on substantially all of a useable area A U of the substrate 11 and can have complex shapes that vary among the imprint stamps 20 . The imprint stamps 20 can be used as a template for transferring the imprint profile 24 to a mask layer 65 in which the imprint profile 24 will be replicated.

    Abstract translation: 公开了一种广域纳米尺寸印记印模10。 广域纳米尺寸压印印模10包括具有基面13的基底11，多个微特征21形成在每个微特征21上。每个微特征21包括多个间隔物23，其设置在相对的侧表面（22a， 22b）。 间隔件23在相对的侧表面（22a，22b）的横向外侧延伸，并且微特征21和间隔件23延伸到基面13的外侧。微特征21和间隔物23被选择性地蚀刻到不同的高度 h1，h2）以限定具有压印轮廓24的压印印模20.压印标记20可以形成在基底11的基本上所有可用的区域AU上，并且可以具有在压印印记20之间变化的复杂形状。印记 邮票20可以用作将压印简档24传送到掩模层65的模板，在该掩模层65中将复印印痕轮廓24。

    APPARATUS FOR NANO STRUCTURE FABRICATION
    24.
    发明申请
    APPARATUS FOR NANO STRUCTURE FABRICATION 审中-公开
    纳米结构制造设备

    公开(公告)号：US20120298617A1

    公开(公告)日：2012-11-29

    申请号：US13559640

    申请日：2012-07-27

    Applicant: Kwangyeol LEE

    Inventor： Kwangyeol LEE

    IPC: B29C59/16 ,  C23F1/14 ,  B29C59/02 ,  C23F1/00 ,  B82Y40/00

    CPC classification number: B29C33/3857 ,  B81C1/00031 ,  B81C2201/036

    Abstract: One or more techniques for nano structure fabrication are provided. In an embodiment, an apparatus for manufacturing a nano structure is disclosed. The apparatus includes a stamp having a line pattern on a surface thereof that comprises a plurality of protrusions, a die configured to hold a substrate thereon, and a mechanical processing unit configured to press the plurality of protrusions of the stamp against the substrate with a predetermined pressure so as to form at least one channel pore therebetween.

    Abstract translation: 提供一种或多种用于纳米结构制造的技术。 在一个实施例中，公开了一种用于制造纳米结构的装置。 该装置包括在其表面上具有线图案的印模，该印模包括多个凸起，模具，其构造成在其上保持基板;以及机械处理单元，其构造成以预定的方式将印模的多个突起压靠在基板上 以在其间形成至少一个通道孔。

    Process and System for Fabrication of Patterns on a Surface
    25.
    发明申请
    Process and System for Fabrication of Patterns on a Surface 有权
    制作表面图案的工艺和系统

    公开(公告)号：US20110189446A1

    公开(公告)日：2011-08-04

    申请号：US13003484

    申请日：2009-07-03

    Applicant: Graham L. W. Cross ,  Warren McKenzie ,  John B. Pethica

    Inventor： Graham L. W. Cross ,  Warren McKenzie ,  John B. Pethica

    IPC: B32B3/00 ,  C23F1/00 ,  C23F1/08 ,  B82Y30/00 ,  B82Y40/00 ,  B82Y5/00

    CPC classification number: G03F7/11 ,  B81C1/00634 ,  B81C2201/0143 ,  B81C2201/0159 ,  B81C2201/036 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/0337

    Abstract: The invention provides a system and process of patterning structures on a carbon based surface comprising exposing part of the surface to an ion flux, such that material properties of the exposed surface are modified to provide a hard mask effect on the surface. A further step of etching unexposed parts of the surface forms the structures on the surface. The inventors have discovered that by controlling the ion exposure, alteration of the surface structure at the top surface provides a mask pattern, without substantially removing any material from the exposed surface. The mask allows for subsequent ion etching of unexposed areas of the surface leaving the exposed areas raised relative to the unexposed areas thus manufacturing patterns onto the surface. For example, a Ga+ focussed ion beam exposes a pattern onto a diamond surface which produces such a pattern after its exposure to a plasma etch. The invention is particularly suitable for patterning of clear well-defined structures down to nano-scale dimensions.

    Abstract translation: 本发明提供了一种在碳基表面上构图结构的系统和工艺，包括将表面的一部分暴露于离子通量，使得暴露表面的材料特性被修饰以在表面上提供硬掩模效应。 蚀刻表面的未曝光部分的另一步骤形成表面上的结构。 发明人已经发现，通过控制离子暴露，顶表面上的表面结构的改变提供掩模图案，而基本上不从暴露表面移除任何材料。 该掩模允许对表面的未曝光区域的后续离子蚀刻，离开暴露区域相对于未曝光区域升高，从而将图案制造到表面上。 例如，Ga +聚焦离子束将图案暴露在金刚石表面上，其在暴露于等离子体蚀刻之后产生这种图案。 本发明特别适用于直到纳米级尺寸的清晰明确定义的结构的图案化。

    METHODS FOR FORMING COMPOSITIONS CONTAINING GLASS
    26.
    发明申请
    METHODS FOR FORMING COMPOSITIONS CONTAINING GLASS 审中-公开
    用于形成包含玻璃的组合物的方法

    公开(公告)号：US20100071418A1

    公开(公告)日：2010-03-25

    申请号：US12526900

    申请日：2008-02-27

    Applicant: Thierry Luc Alain Dannoux ,  Paulo Gaspar Jorge Marques ,  Robert Michael Morena ,  Cameron Wayne Tanner

    Inventor： Thierry Luc Alain Dannoux ,  Paulo Gaspar Jorge Marques ,  Robert Michael Morena ,  Cameron Wayne Tanner

    IPC: C03B17/00

    CPC classification number: C03B11/084 ,  B81B2201/051 ,  B81C99/0085 ,  B81C2201/019 ,  B81C2201/036 ,  C03B2215/07

    Abstract: Methods for molding glass and glass composites, including providing a first structure having a first surface, providing a second structure having a second surface, the second surface being patterned and porous, and disposing between the first and second surfaces an amount of a composition comprising a glass, then heating together the first and second structures and the first amount of the composition sufficiently to soften the first amount of the composition such that the first and second structures, under gravity or an otherwise applied force, move toward each other, such that the pattern of the second surface is formed into the first amount of the composition, then cooling the composition sufficiently to stabilize it, the second structure comprising porous carbon having an open porosity of at least 5% and wherein the amount of the composition is removable from the second surface, without damage to the amount of the composition or to the second surface, such that the second surface is in condition for re-use.

    Abstract translation: 用于模制玻璃和玻璃复合材料的方法，包括提供具有第一表面的第一结构，提供具有第二表面的第二结构，第二表面被图案化和多孔化，并且在第一表面和第二表面之间设置一定量的组合物， 玻璃，然后将第一和第二结构和第一量的组合物充分加热以软化第一量的组合物，使得第一和第二结构在重力或以其他方式施加的力下朝向彼此移动，使得 将第二表面的图案形成为第一量的组合物，然后充分冷却组合物以使其稳定，第二结构包括具有至少5％的开放孔隙率的多孔碳，并且其中组合物的量可从 第二表面，而不损害组合物的量或第二表面，使得第二表面是 在重新使用的条件下。

    Method for manufacturing microstructures having multiple microelements with through-holes
    27.
    发明授权
    Method for manufacturing microstructures having multiple microelements with through-holes 有权
    具有多个具有通孔的微量元素的微结构的制造方法

    公开(公告)号：US07578954B2

    公开(公告)日：2009-08-25

    申请号：US10373251

    申请日：2003-02-24

    Applicant: Vladimir Gartstein ,  Faiz Feisal Sherman

    Inventor： Vladimir Gartstein ,  Faiz Feisal Sherman

    IPC: B29C43/02 ,  B29C1/48

    CPC classification number: B81C1/00111 ,  A61M37/0015 ,  A61M2037/003 ,  A61M2037/0053 ,  B26F1/24 ,  B26F1/26 ,  B81B2201/055 ,  B81C2201/034 ,  B81C2201/036

    Abstract: A method is provided for manufacturing microstructures of the type which contain a substrate and an array of protruding microelements with through-holes, which are used in penetrating layers of skin. The microelements are embossed or pressed into an initial substrate structure, which in some embodiments is formed from extruded polymeric material, and in some cases from two layers of polymer that are co-extruded. The through-holes are formed from filled through-cylinders of a second material that is removed after the embossing or pressing step; in other instances, the through-holes are left hollow during the embossing or pressing step.

    Abstract translation: 提供了一种用于制造包含基底的微结构的方法和具有通孔的突出微元件阵列，其用于穿透皮肤层。 微元件被压花或压制成初始的基底结构，其在一些实施方案中由挤出的聚合物材料形成，并且在一些情况下由共挤出的两层聚合物形成。 通孔由在压花或压制步骤之后被去除的第二材料的填充的通孔形成; 在其他情况下，在压花或压制步骤期间，通孔留空。

    Selective and alignment-free molecular patterning of surfaces
    28.
    发明申请
    Selective and alignment-free molecular patterning of surfaces 审中-公开
    表面的选择性和无取向分子图案化

    公开(公告)号：US20040156988A1

    公开(公告)日：2004-08-12

    申请号：US10640413

    申请日：2003-08-12

    Inventor： Neville Z. Mehenti ,  Harvey A. Fishman ,  Stacey Francine Bent

    IPC: B05D005/00 ,  B05C001/00

    CPC classification number: G03F7/0002 ,  B05D1/185 ,  B05D1/283 ,  B41M3/006 ,  B81B2201/0214 ,  B81C1/00206 ,  B81C2201/036 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C12N11/06 ,  C12N11/08

    Abstract: The present invention is directed towards a method and means for molecularly patterning a surface to promote the patterned attachment of a target adherent. In some preferred embodiments the target adherent is a biological cell, but it can more generally be a biological or chemical species for which attachment at specific sites is desired. The method generally involves using a stamp to microcontact print a first type of molecule on the surface. With the stamp remaining in situ, the process then involves fluidic patterning of a second type of molecule through selected openings defined by selected recesses in the stamp and the surface itself. The second type of molecule should have an adhesion property relative to the target adherent that is complementary to that of the first type of molecule. The stamp is removed only after both the first and second types of molecules have been transferred to the surface.

    Abstract translation: 本发明涉及用于分子图案化表面以促进目标粘附剂的图案化附着的方法和装置。 在一些优选的实施方案中，靶粘附物是生物细胞，但它通常可以是需要在特定部位附着的生物或化学物质。 该方法通常涉及使用印模来微分印刷表面上的第一类型的分子。 当邮票保留在原位时，该方法然后涉及通过由印模和表面本身中的选定凹部限定的选定开口的第二类型分子的流体图案化。 第二类分子应该具有相对于与第一类型分子互补的靶粘附物的粘附性质。 只有在第一种和第二种类型的分子已经转移到表面之后，才能去除印模。

    Nano-size imprinting stamp using spacer technique
    30.
    发明申请
    Nano-size imprinting stamp using spacer technique 有权
    使用间隔技术的纳米尺寸印记邮票

    公开(公告)号：US20030141276A1

    公开(公告)日：2003-07-31

    申请号：US10062952

    申请日：2002-01-31

    Inventor： Heon Lee

    IPC: B32B001/08 ,  B44C001/22

    CPC classification number: B29C59/022 ,  B29C2059/023 ,  B81C99/009 ,  B81C2201/036 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10T428/24479 ,  Y10T428/2457 ,  Y10T428/24579 ,  Y10T428/24595

    Abstract: A wide-area nano-size imprinting stamp is disclosed. The wide-area nano-size imprinting stamp includes a substrate having a base surface upon which is formed a plurality of micro-features. Each micro-feature includes a plurality of spacers disposed on opposed side surfaces thereof. The spacers extend laterally outward of the opposed side surfaces and the micro-features and the spacers extend outward of the base surface. The micro-features and the spacers are selectively etched to differing heights to define an imprint stamp having an imprint profile. The imprint stamps can be formed on substantially all of a useable area of the substrate and can have complex shapes that vary among the imprint stamps. The imprint stamps can be used as a template for transferring the imprint profile to a mask layer in which the imprint profile will be replicated.

    Abstract translation: 公开了一种广域纳米尺寸印记。 广域纳米尺寸压印印模包括具有基面的基底，在其上形成多个微特征。 每个微特征包括设置在其相对侧表面上的多个间隔物。 间隔件在相对的侧表面的横向外侧延伸，并且微特征和间隔件从基部表面向外延伸。 微特征和间隔物被选择性地蚀刻到不同的高度以限定具有印记轮廓的压印印模。 压印戳可以形成在基板的基本上所有可用的区域上，并且可以具有在压印印记之间变化的复杂形状。 印记戳可用作模板，用于将压印轮廓传送到掩模层，在该掩模层中可以复制压印轮廓。

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