Abstract:
PROBLEM TO BE SOLVED: To provide an electron source which can operate under room temperature while applying an exciton, without requiring high voltage, operating in low vacuum, with high efficiency and with continuously high output. SOLUTION: The electron source is an indirect transition semiconductor composed of semiconductor material in which exciton binding energy is great, wherein the electron source forms an active layer by the indirect transition semiconductor, with ≥10% generation efficiency for free exciton with an electrode carrying out active layer current injection and converts a free exciton to a free electron in a negative electron affinity force surface formed in an active layer or in an active region to carry out continuous discharging. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
A method of forming a cathodic device includes the steps of forming a p-type layer (18) and an n-type layer (20) below a surface (20) of a substrate. The material has a conduction band which is at an energy level no more than 0.5 electron-Volts (eV) below the lowest vacuum energy level. The layers are formed so that they are in contact, with the p-type layer located between the surface and the n-type layer, and so that they form a p-n junction. The thickness of the p-type layer is somewhat less than the average distance which an electron injected into the p-type layer travels by diffusion and the thickness of the negatively charged depletion layer in the p-type layer is such that the difference between the thickness of the p-type layer and the thickness of the negatively charged depletion layer in the p-type layer is substantially less than the said average distance.
Abstract:
Electron-optical device having an electron-emitting region, a longitudinal axis and an arrangement of apertured electron grids along the axis. The first grid has an aperture for passing electrons, which aperture is located further outwards with respect to the longitudinal axis than the emitting region. One of the further grids is provided with a shield so as to shield the edge wall of the aperture, if it is located within direct view of the electron-emitting region, from incidence of positive ions.
Abstract:
Cathode ray tube comprising an electron gun which is constructed in such a way that the gas pressure near the electron-emissive layer (30) of the cathode is lower than in the other parts of the tube. This can be achieved by reducing the aperture between the G1 (33) and G2 (36), by providing the G2 (36) with a skirt (43). The wall of the skirt, the G1 and the G2 may also be at least partly coated with a getter (41).
Abstract:
Device for generating X-rays, comprising: -a field emission cathode (10) configured to emit electrons when an electrical field is applied to the cathode (10); and -an anode (20), the anode being configured to generate X-rays as a result of receiving electrons from the field emission cathode (10); wherein the cathode (10) comprises an electron emission surface (S) extending opposite the anode (20), the cathode (10) being configured to emit electrons substantially from the electron emission surface (S) during use.
Abstract:
In an electron tube based on a cold cathode, a cesium source (17) containing Csx-Auy or Csx-Sby is provided near the cold cathode (7), preferably in contact with the first grid (9). Cesium is introduced into the source during activation of the tube. The vapor pressure of the cesium compounds is such that proper delivery of cesium is guaranteed throughout the life-time of the cathode.
Abstract:
A method of forming a cathodic device includes the steps of forming a p-type layer and an n-type layer below a surface of a substrate. The material has a conduction band which is at an energy level no more than 0.5 electron-Volts (eV) below the lowest vacuum energy level. The layers are formed so that they are in contact, with the p-type layer located between the surface and the n-type layer, and so that they form a p-n junction. The thickness of the p-type layer is somewhat less than the average distance which an electron injected into the p-type layer travels by diffusion and the thickness of the negatively charged depletion layer in the p-type layer is such that the difference between the thickness of the p-type layer and the thickness of the negatively charged depletion layer in the p-type layer is substantially less than the said average distance.
Abstract:
Electron-optical device having two elongate emitting regions arranged symmetrically with respect to a longitudinal axis for producing two electron beams having an elongate cross section. By means of electron grids, the two beams are focused at the same point of an electron target arranged transversely to the longitudinal axis and having a short central axis and a long central axis. The elongate emitting regions have their smallest cross section parallel to the scanning direction of a device, cooperating with the electron-optical device, for scanning a target arranged transversely to the longitudinal axis.