Abstract:
An electron emission device includes a substrate, first electrodes formed on the substrate, electron emission regions electrically connected to the first electrodes, and second electrodes placed over the first electrodes such that the second electrodes are insulated from the first electrodes. The second electrodes have openings to expose the electron emission regions. A third electrode is placed over the second electrodes such that the third electrode is insulated from the second electrodes. The third electrode has openings communicating with the openings of the second electrodes. Each of the electron emission regions and the second electrodes simultaneously satisfy the following conditions: D 2 / D 1 ≤ 0.579 and D 2 ≥ 1 μm where D1 indicates the width of each of the openings of the second electrode, and D2 indicates the width of each of the electron emission regions.
Abstract:
The invention relates to a control grid (1 12) for an electron beam generating device, said control grid comprising apertures (122) arranged in rows (R) in a width direction and columns (C) in a height direction, wherein a majority of the apertures (122) in a row have the same size, and wherein the size of the apertures of at least one row differs from the size of the apertures of another row.
Abstract:
PROBLEM TO BE SOLVED: To provide an electron emission device and an electron emission display device using the same. SOLUTION: This electron emission device includes a substrate; first electrodes formed on the substrate; electron emission regions electrically connected to the first electrodes; second electrodes placed over the first electrodes such that the second electrodes are insulated from the first electrodes, the second electrodes having openings at the crossed areas with the first electrodes to expose the electron emission regions; and a third electrode placed over the second electrodes such that the third electrode is insulated from the second electrodes, the third electrode having openings communicating with the openings of the second electrodes. Each of the electron emission regions and the second electrodes simultaneously satisfy the following conditions (Condition 1: D2/D1≤0.579, Condition 2: D2≥1 μm). According to this, the color purity of a screen can be enhanced to attain an improved display quality. D1 indicates the width of the openings of the second electrodes, and D2 indicates the width of the electron emission regions. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
The invention relates to a control grid for an electron beam generating device, wherein the control grid comprises apertures arranged in rows in a width direction and columns in a height direction, wherein a majority of the apertures in a row have the same size, and wherein the size of the apertures of at least one row differs from the size of the apertures of another row.
Abstract:
PURPOSE: A cathode electrode emitting source and a manufacturing method thereof are provided to form a minute hole on a gate electrode layer by applying a polymer mask as an etching mask in an etching process. CONSTITUTION: A polymer solution is obtained by dissolving a first polymer and a second polymer. The polymer solution is coated on a second conductive layer(5) for forming a hole. A solvent is selected so that the first polymer has a larger solubility than the second polymer. The first polymer is deposited and fixed in the second polymer by evaporating the solvent as a micro particle. An etching hole is formed on the second polymer by removing the first polymer with the developer. The developer is selected so that the first polymer has larger solubility than the second polymer. A hole is formed on the second conductive layer by performing an etching operation through an etching hole(6).