公开(公告)号：EP1503957B1

公开(公告)日：2008-11-19

申请号：EP03708186.6

申请日：2003-03-06

Applicant: Wacker Chemie AG

Inventor： SZILLAT, Holger ,  SCHWERTFEGER, Fritz ,  HAACK, Bernd ,  SCHÄFER, Marcus

IPC: C01B33/18 ,  C03C3/04 ,  C03C3/06 ,  C03B37/014 ,  C03B37/018 ,  B01J19/26 ,  B01J19/08

CPC classification number: B82Y30/00 ,  C01B33/183 ,  C01P2002/84 ,  C01P2004/32 ,  C01P2004/51 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/12 ,  C01P2006/80 ,  C03B19/1025 ,  C03B2201/03 ,  C03B2207/06 ,  C03B2207/08 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/42 ,  C03B2207/46 ,  C03C3/06 ,  C03C12/00 ,  C03C2201/02 ,  C03C2203/44

Abstract: The invention relates to silica-powder having a sum of impurities less than 500 ppb.

公开(公告)号：EP1695375A2

公开(公告)日：2006-08-30

申请号：EP04807799.4

申请日：2004-12-17

Applicant: ASAHI GLASS COMPANY LTD.

Inventor： IKUTA, Yoshiaki Asahi Glass Company, Limited ,  AGATA, Noriyuki

IPC: H01L21/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/36 ,  Y02P40/57

Abstract: A synthetic quartz glass for an optical member which is free from compaction and rarefaction is obtained. A synthetic quartz glass for an optical member to be used for an optical device employing a light having a wavelength of at most 400 nm and at least 170 nm as a light source, which contains substantially no oxygen excess defects, dissolved oxygen molecules nor reduction type defects, which has a chlorine concentration of at most 50 ppm and a OH group concentration of at most 100 ppm, and which contains oxygen deficient defects within a concentration range of at most 5x10(14) defects/cm(3) and at least 1x10(13) defects/cm(3). The fluorine concentration is preferably at most 100 ppm. A process for producing the synthetic quartz glass is also claimed.

公开(公告)号：EP1663888A2

公开(公告)日：2006-06-07

申请号：EP04786950.8

申请日：2004-09-16

Applicant: Degussa AG

Inventor： JACOBSEN, Hauke ,  OSWALD, Monika ,  SCHUMACHER, Kai ,  MÖRTERS, Martin

IPC: C03C1/00

CPC classification number: C01B33/183 ,  C03B19/12 ,  C03B2201/03 ,  C03C1/02 ,  Y02P40/57

Abstract: High-purity pyrogenically prepared silicon dioxide having metal contents of less than 0.2 μg/g is prepared by reacting a silicon tetrachloride having a metal content of less than 30 ppb by means of flame hydrolysis. The silicon dioxide can be utilised for the manufacture of high-purity glasses by means of the sol-gel process, which show a high-homogenity. It can be used for the production of shaped articles, which can be used as preforms for the optical fiber spinning.

公开(公告)号：EP1655270A1

公开(公告)日：2006-05-10

申请号：EP04734356.1

申请日：2004-05-21

Applicant: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.

Inventor： OHAMA, Yasuo, c/o Takefu Plant Shin-Etsu Quartz ,  TOGAWA, Takayuki, Takefu Plant Shin-Etsu Quartz ,  MIZUNO, Shigeo, c/o Takefu Plant Shin-Etsu Quartz

IPC: C03B29/06 ,  C30B15/10 ,  C03B20/00

CPC classification number: C03B19/095 ,  C03B2201/03 ,  C30B15/10 ,  Y02P40/57 ,  Y10S65/08 ,  Y10S117/90 ,  Y10T117/10

Abstract: A quartz glass crucible for use in pulling up a silicon single crystal, wherein it has, at least in the curved portion thereof, a three-layer structure comprising a transparent inner layer being composed of a synthetic quartz glass and having a low Al concentration, a transparent or nontransparent intermediate layer being composed of a natural quartz glass or a mixture of natural and synthetic quartz glasses and having a high A1 concentration, and a nontransparent outer layer being composed of a natural quartz glass and having an Al concentration higher than that of the intermediate layer. The quartz glass crucible is reduced in the deformation of the transparent inner layer, and allows the suppression of the change in the amount of dissolution of the quartz glass crucible associated with the pull-up of a single crystal and the achievement of the uniform oxygen concentration in the longitudinal direction of a single crystal.

Abstract translation: 一种用于拉起单晶硅的石英玻璃坩埚，其中至少在其弯曲部分具有由合成石英玻璃构成的具有低Al浓度的透明内层的三层结构， 透明或不透明的中间层由天然石英玻璃或天然和合成石英玻璃的混合物组成，具有高的A1浓度，不透明的外层由天然石英玻璃组成，其Al浓度高于 中间层。 石英玻璃坩埚在透明内层的变形中减小，并且能够抑制与单晶上拉相关联的石英玻璃坩埚的溶解量的变化和实现均匀的氧浓度 在单晶的纵向上。

公开(公告)号：EP1580170A1

公开(公告)日：2005-09-28

申请号：EP03775963.6

申请日：2003-11-28

Applicant: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.

Inventor： SATO, Tatsuhiro Shin-Etsu Quartz Products Co., Ltd ,  KAITOU, Takahiro ,  FUJINOKI, Akira Shin-Etsu Quartz Products Co.,Ltd. ,  KATO, Toshiyuki Shin-Etsu Quartz Products Co.,Ltd. ,  SEGAWA, Tohru; Shin-Etsu Quartz Products Co., Ltd. ,  YOSHIDA,Nobumasa Shin-Etsu Quartz Products Co.Ltd.

IPC: C03B20/00 ,  C03B8/04 ,  C03C3/06

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03B2201/24 ,  C03C2201/02 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/26

Abstract: First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm -1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.

公开(公告)号：EP1413559A4

公开(公告)日：2005-06-29

申请号：EP02741357

申请日：2002-06-27

Applicant: WATANABE & CO LTD M ,  ASAHI DENKA KOGYO KK

Inventor： KUSUHARA MASAKIO ,  WATANABE HIROYUKI ,  UEHARA HIROFUMI ,  SANPEI KEIKO ,  KURITA NAOYASU ,  TADA SHUICHI ,  OMI JINICHI ,  TAKAHASHI MAKIO ,  MORITA HIROSHI

IPC: C03B8/02 ,  C03B19/10 ,  C03B20/00 ,  C03C1/00 ,  C03C1/02 ,  C03C3/06 ,  C03C12/00 ,  C01B33/158

CPC classification number: C03B19/1065 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/23 ,  C03C1/026 ,  C03C3/06 ,  C03C2201/02

Abstract: High purity synthetic vitreous silica particles, characterized in that it is derived from an alkali metal silicate and has a total metal impurity content of 1 μg/g or less, and in particular has an oxygen deficient defect. The melt of the high purity synthetic vitreous silica particles exhibits a high viscosity similar to that of the melt of natural quartz, and the above synthetic vitreous silica has a high purity similar to that of a conventional synthetic quartz and can be produced at a reduced cost.

公开(公告)号：EP1530552A2

公开(公告)日：2005-05-18

申请号：EP03791644.2

申请日：2003-08-05

Applicant: CORNING INCORPORATED

Inventor： MOORE, Lisa, A. ,  BOOKBINDER, Dana, C. ,  HOUSE, Keith, L. ,  SCHIEFELBEIN, Susan, L. ,  BALL, Laura, J. ,  BANEY, Bruno, Paul, Marc ,  KHRAPKO, Rostislav, R.

IPC: C03C25/60 ,  C03C25/68 ,  C03C13/04 ,  C03C15/00 ,  C03C21/00 ,  G02B6/00 ,  C03C17/28 ,  C03C17/30 ,  C03C17/245

CPC classification number: C03C3/06 ,  C03B37/01211 ,  C03B37/01228 ,  C03B37/01426 ,  C03B37/01807 ,  C03B37/01861 ,  C03B37/01892 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/28 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/50 ,  C03B2201/54 ,  C03B2203/26 ,  C03B2207/30 ,  C03B2207/90 ,  C03C25/602 ,  C03C25/607 ,  C03C25/68 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/50 ,  C03C2203/50 ,  G02B6/02

Abstract: A method of forming an alkali metal oxide-doped optical fiber by diffusing an alkali metal into a surface of a glass article is disclosed. The silica glass article may be in the form of a tube or a rod, or a collection of tubes or rods. The silica glass article containing the alkali metal, and impurities that may have been unintentionally diffused into the glass article, is etched to a depth sufficient to remove the impurities. The silica glass article may be further processed to form a complete optical fiber preform. The preform, when drawn into an optical fiber, exhibits a low attenuation.

公开(公告)号：EP1529759A1

公开(公告)日：2005-05-11

申请号：EP03788064.8

申请日：2003-08-08

Applicant: SUMITOMO ELECTRIC INDUSTRIES, Ltd

Inventor： KATO, Shuichiro, Sumitomo Electrics Industries Ltd ,  MORIYA, Tomomi, Sumitomo Electrics Industries Ltd ,  OGA, Yuichi, Sumitomo Electrics Industries Ltd

IPC: C03B32/00 ,  C03B23/045 ,  G02B6/00

CPC classification number: C03B32/00 ,  C03B23/043 ,  C03B23/045 ,  C03B23/0496 ,  C03B37/01228 ,  C03B37/01254 ,  C03B2201/03

Abstract: An object of the present invention is to provide a method of highly purifying a glass body, which enables high purification of the glass body while decreasing deformation of the glass body at a high degree, to provide a highly purified glass body, and to provide a method and an apparatus for manufacturing a glass tube, which can obtain a highly purified glass tube.
A method of highly purifying a glass body according to the present invention is to apply a voltage between electrodes 1 and 2, which make contact with the glass pipe 11, in a nearly radial direction of the glass pipe 11 while heating the glass pipe 11 to a temperature within a range less than 1300°C. Further, a method of manufacturing a glass tube according to the invention is to generate a voltage gradient in a radial direction of a glass tube 106 by applying voltages to the inner circumferential side and the outer circumferential side of the glass tube 106 when a glass rod 103 is gradually formed into the glass tube 106 by heating the glass rod 103 to soften the glass rod 103 and by bringing a boring jig 130 into contact with a softened portion of the glass rod 103.

Abstract translation: 本发明的目的是提供高度纯化的玻璃体，其使玻璃体的高纯化，而在高度降低玻璃化体的变形的方法，提供一种高纯化的玻璃体，并提供一种 方法和装置用于制造玻璃管，它可以得到高度纯化的玻璃管中。 的高度纯化的玻璃体雅丁到本发明的一种方法是将电极1和2，其在玻璃管11的几乎径向方向使与玻璃管11接触而加热之间施加电压 玻璃管11的范围小于1300℃。另外内的温度，在制造玻璃管雅丁到本发明的方法是通过将电压施加到内周，以产生在一个玻璃管106的径向方向上的电压梯度 侧与玻璃管106的外周侧时，玻璃棒103通过加热玻璃杆103，以软化玻璃杆103和通过使镗孔夹具130接触到的软化部分正在逐渐形成到玻璃管106 玻璃棒103

公开(公告)号：EP1471039A1

公开(公告)日：2004-10-27

申请号：EP04009276.9

申请日：2004-04-20

Applicant: Heraeus Quarzglas GmbH & Co. KG ,  SHIN-ETSU QUARTZ PRODUCTS CO., LTD.

Inventor： Sato, Tatsuhiro

IPC: C03B20/00 ,  H01L21/68 ,  C03C23/00 ,  C03C15/00 ,  C03B32/00 ,  C03B25/04 ,  C03B19/14

CPC classification number: C03C23/008 ,  C03B32/00 ,  C03B2201/03 ,  C03C15/00 ,  C03C23/0075 ,  C30B35/00 ,  H01L21/673

Abstract: The invention provides a method for producing a quartz glass jig for use in semiconductor industries, which enables increasing the surface layer cleanliness simply and surely at low cost; it also provides a quartz glass jig improved in surface layer cleanliness. The inventive means for resolution are a method comprising processing a quartz glass raw material into a desired shape by a treatment inclusive of fire working, annealing for stress removal, and cleaning treatment to obtain the final product, the method is characterized by that it comprises performing gas phase etching step and gas phase purification step on the surface layer of the quartz glass jig after applying the annealing treatment for stress removal but before the cleaning treatment, wherein the gas phase purification step is carried out continuously after the gas phase etching step.

Abstract translation: 石英玻璃夹具的生产包括通过消防工程将石英玻璃原料加工成所需的形状，应力消除退火和清洁处理以获得最终产品。 在施加应力去除的退火之后但在清洁处理之前，在石英玻璃夹具的表面层上进行气相蚀刻步骤和气相纯化步骤。 气相纯化步骤在气相蚀刻步骤之后或与气相蚀刻步骤连续或同时进行。

公开(公告)号：EP1394125A1

公开(公告)日：2004-03-03

申请号：EP03019787.5

申请日：2003-08-29

Applicant: FITEL USA CORPORATION (a Delaware Corporation)

Inventor： Atkins, Robert M. ,  Liu, Alice W. ,  Kristensen, Poul ,  Pedersen, Morten Ostergaard ,  Knudsen, Stig Nissen ,  Chang, Kai H. ,  Bromage, Jake ,  Nielsen, Jan Levin

IPC: C03B37/014 ,  C03C13/04 ,  G02B6/16

CPC classification number: C03C13/045 ,  C03B37/014 ,  C03B2201/03 ,  C03B2201/07 ,  G02B6/02

Abstract: Applicants have discovered the existence of loss peaks in optical fiber transmission systems using wavelengths in the E-band and the L-band. Specifically, they have discovered the existence of narrow loss peaks at 1440 nm, 1583 nm and 1614 nm. Because the peaks are relatively narrow, they cannot be easily removed by conventional gain equalizers in long haul transmission systems, and although the peaks are relatively small, they can nonetheless cause transmission channels to drop out in amplified DWDM (Dense Wavelength Division Multiplexing) transmission systems. Applicants have further discovered that these loss peaks are due to carbon contamination of the transmission fiber. Thus optical fibers should be fabricated essentially free of carbon contamination. This means eliminating carbon-containing reagents in preform and tube-making processes. By the term carbon-free is preferably meant

Abstract translation: 申请人已经发现在使用在E波段和L波段的波长光纤传输系统损耗峰值的存在。 具体而言，全心全意在1440纳米，1583纳米和1614纳米的发现的窄损耗峰值的存在。由于该峰是相对窄的，它们不能容易地通过在长距离光纤传输系统的传统增益均衡器除去，虽然峰是相对小的 ，它们可以但要使传输信道在扩增DWDM（密集波分复用）​​传输系统中，以滴出。 申请人已经发现进一步确实论文损耗峰值是由于传输光纤的碳污染。 THUS光纤应来制造实质上无碳污染。 这意味着消除在预成型件和制管过程含碳试剂。 由术语无碳优选地表示<1000ppm的重量的碳，更优选<10ppm以下，最优选<1ppm的。