Abstract:
An electron emission film having a pattern of diamond in X-ray diffraction and formed of a plurality of diamond fine grains having a grain diameter of 5nm to 10nm is formed on a substrate. The electron emission film can restrict the field intensity to a low level when it causes an emission current to flow, and has a uniform electron emission characteristic.
Abstract:
An amorphous multi-layered structure (100, 200) is formed by a method including the steps of: i) positioning a deposition substrate (101) in a physical vapor deposition apparatus (300, 400, 500) ii) ionizing a precursor of a multi-phase material within the physical vapor deposition apparatus (300, 400, 500) iv) modulating the total ion impinging energy of the ions to deposit layers having predetermined properties corresponding to the total ion impinging energy values.
Abstract:
A matrix-addressed diode flat panel display of field emission type is described, utilizing a diode (two terminal) pixel structure. The flat panel display comprises a cathode assembly having a plurality of cathodes, each cathode including a layer of cathode conductive material and a layer of a low effective work-function material deposited over the cathode conductive material and an anode assembly having a plurality of anodes, each anode including a layer of anode conductive material and a layer of cathodoluminescent material deposited over the anode conductive material, the anode assembly located proximate the cathode assembly to thereby receive charged particle emissions from the cathode assembly, the cathodoluminescent material emitting light in response to the charged particle emissions. The flat panel display further comprises means for selectively varying field emission between the plurality of corresponding light-emitting anodes and field-emission cathodes to thereby effect an addressable grey-scale operation of the flat panel display.
Abstract:
A cylinder array of diamond having a dent in its cylinder top face is manufactured by subjecting a cylinder array of diamond to a plasma etching.
Abstract:
본 발명은 마이크로전자공학 분야에서 저급 및 고급 다이아몬드형 함유 물질의 신규한 용도에 관한 것이다. 상기 용도의 구체적인 예는 집적회로 패키징 내의 열전도성 필름, 집적회로 다단계 연결선 내의 저 유전상수층, 열전도성 점착성 필름, 집적 회로 장치용 보호막 필름 및 전계 방출 음극을 포함하지만 이에 한정되는 것은 아니다. 본 발명에서 사용되는 다이아몬드형은 저급 다이아몬드형 뿐만 아니라 신규하게 제공되는 고급 다이아몬드형으로부터 선택될 수 있으며, 치환 및 비치환 다이아몬드형을 포함한다. 상기 고급 다이아몬드형은 테트라만탄, 펜타만탄, 헥사만탄, 헵타만탄, 옥타만탄, 노나만탄, 데카만탄 및 운데카만탄을 포함한다. 다이아몬드형 함유 물질은 다이아몬드형 함유 중합체, 다이아몬드형 함유 소결 세라믹, 다이아몬드형 세라믹 복합체, CVD 다이아몬드형 필름, 자가 집합 다이아몬드형 필름 및 다이아몬드형-풀러렌 복합체로 제조될 수 있다.
Abstract:
본발명은직경이나노크기인다이아몬드나노휘스커제조방법에관한것으로, 종래에는직경이나노크기인다이아몬드휘스커를제조할수 없었으며, 이에본 발명은기판의상부에다이아몬드막을형성하고, 이종물질간에박막을형성함에있어서초기핵형성단계에서나타나는다양한박막표면구조를이용하여상기다이아몬드막에이종물질의나노크기를갖는마스크패턴을형성하고, 상기나노크기의마스크패턴을식각마스크로사용하여반응성식각에의하여상기다이아몬드막을식각하는단계로이루어지는나노크기의다이아몬드휘스커제조방법을제공한다. 상기마스크패턴은핵이비연속적으로서로분리된상태의아이랜드(island) 성장에의한박막표면구조또는표면이울퉁불퉁한스트란스키-크라스타노프(Stranski-Krastanov) 성장에의한박막표면구조인것을특징으로한다. 본발명에의하면다이아몬드를사용한다양한복합소재를제조할수 있으며, 또한, 새로운형태의전계방출냉 음극으로응용을가능케하여우수한성능의전계방출소자의실용화를앞당길수 있다.
Abstract:
PURPOSE: A method for preparing diamond nano whisker is provided, which is prepared at the low temperature using mask production in real time and anisotropic etching character of diamond. CONSTITUTION: A method for preparing diamond nano whisker comprises the steps of: deposition process of diamond to form diamond film on the upper part of the board; formation process of mask to be formed as nano size on the upper part of the diamond film using nuclear formation reaction of shaping; formation process of diamond whisker of nano size by etching process using the mask pattern of the nano size as etching mask.
Abstract:
A method of transmitting a data block in a wireless communication system includes generating a data block having a variable size in an upper layer, transmitting a radio resource request message to a base station according to the size of the data block in a medium access control (MAC) layer and transmitting the data block by using a radio resource allocated by using the radio resource request message. For a packet service such as VoIP in which a delay time is important, QoS can be improved by decreasing the delay time of packet transmission and by decreasing a packet discard ratio.