公开(公告)号：EP0831060B1

公开(公告)日：2003-12-03

申请号：EP96914406.2

申请日：1996-05-23

Applicant: MITSUBISHI CHEMICAL CORPORATION

Inventor： KATSURO, Yoshio, Mitsubishi Chem.Corp., Kurosaki D ,  KATSUKI, Yoshinobu, Mitsubishi Chem.Corp. ,  TAKAZAWA, Akihiro, Mitsubishi Chem.Corp. Kurosaki ,  KATO, Hanako, Mitsubishi Chem.Corp., Kurosaki Dev. ,  UTSUNOMIYA, Akira Mitsubishi Chem. Corp. Kurosaki

IPC: C01B33/18 ,  C07F7/04 ,  C03C1/00 ,  C03B20/00 ,  C07F7/02

CPC classification number: C03B19/095 ,  C01B33/18 ,  C01P2006/80 ,  C03B19/01 ,  C03B19/09 ,  C03B19/1065 ,  C03B2201/03 ,  C03C3/06 ,  C03C2201/02 ,  C03C2203/26 ,  Y10S65/08

公开(公告)号：EP1329539A2

公开(公告)日：2003-07-23

申请号：EP03000823.9

申请日：2003-01-15

Applicant: Heraeus Quarzglas GmbH & Co. KG ,  Shin-Etsu Quartz Products Co.,Ltd.

Inventor： Watanabe, Hiroyuki

IPC: C30B15/10 ,  C03B19/09

CPC classification number: C03B19/095 ,  C03B2201/03 ,  C03B2201/50 ,  C30B15/10 ,  Y02P40/57 ,  Y10S117/90 ,  Y10T117/1032 ,  Y10T117/1052

Abstract: An object of the invention is to provide a quartz glass crucible for pulling up silicon single crystal and a method for producing the same, suitable for improving the productivity of the crucible and the quality of the silicon single crystal, which, by forming a crystalline layer on the inner surface of the quartz glass crucible during pulling up silicon single crystal, prevents degradation from occurring on the inner surface of the crucible and increases the ratio of single crystal while preventing the dislocation from forming on the single crystals.
The objects above have been accomplished by a quartz glass crucible, having a double layered structure comprising a naturally occurring quartz glass outer layer (3) and a synthetic quartz glass inner layer (4), said synthetic quartz glass inner layer (4) contains at least one type of an alkali metal ion selected from the group consisting of Na ion, K ion, and Li ion, which is diffused or moved from said naturally occurring quartz glass outer layer (3) into said synthetic quartz glass inner layer (4).

Abstract translation: 本发明的目的是提供一种用于提升硅单晶的石英玻璃坩埚及其制造方法，其适用于提高坩埚的生产率和硅单晶的质量，通过形成晶体层 在提升硅单晶时在石英玻璃坩埚的内表面上，防止在坩埚内表面上发生劣化，并增加单晶的比例，同时防止单晶上的位错形成。 上述目的是通过石英玻璃坩埚实现的，其具有包括天然存在的石英玻璃外层（3）和合成石英玻璃内层（4）的双层结构，所述合成石英玻璃内层（4）包含在 选自Na离子，K离子和Li离子中的至少一种碱金属离子，其从所述天然存在的石英玻璃外层（3）扩散或移动到所述合成石英玻璃内层（4）中， 。

公开(公告)号：EP1289896A2

公开(公告)日：2003-03-12

申请号：EP01964953.2

申请日：2001-05-31

Applicant: Heraeus Quarzglas GmbH & Co. KG ,  Shin-Etsu Quartz Products Co.,Ltd.

Inventor： UEDA, Tetsuji ,  NISHIMURA, Hiroyuki ,  FUJINOKI, Akira

IPC: C03B19/14

CPC classification number: C03C23/007 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/03 ,  Y10S65/90

Abstract: An object of the present invention is to overcome the problems of the prior art technique, and to provide a heat treatment method as well as a heat treatment apparatus capable of heat treating, with higher efficiency, a synthetic quartz glass for optical use having higher homogeneity and higher purity. Another object of the present invention is to provide an a synthetic quartz glass for optical use. The problems above are solved by, in a method for heat treating a flat cylindrical synthetic quartz glass body provided as the object to be heat treated in a heating furnace, a method for heat treating a synthetic quartz glass for optical use comprising preparing a vessel made of quartz glass and having a flat cylindrical space for setting therein the object synthetic quartz glass body, placing two or more object synthetic quartz glass bodies into the vessel in parallel with each other, filling the space with SiO2 powder, setting the vessel inside the heating furnace with its lid closed, and applying the heat treatment to the vessel.

公开(公告)号：EP0693461B1

公开(公告)日：2002-01-30

申请号：EP95111239.0

申请日：1995-07-18

Applicant: Heraeus Quarzglas GmbH & Co. KG ,  SHIN-ETSU QUARTZ PRODUCTS CO., LTD.

Inventor： Ikeda, Tooru ,  Asajima, Kazuo ,  Kimura, Hiroyuki ,  Watanabe, Hiroyuki

IPC: C03B20/00

CPC classification number: C30B35/002 ,  C03B19/095 ,  C03B2201/03 ,  C30B15/10 ,  Y02P40/57 ,  Y10S65/08

公开(公告)号：EP1152988A1

公开(公告)日：2001-11-14

申请号：EP00974527.4

申请日：2000-11-14

Applicant: Heraeus Tenevo AG

Inventor： DITTMER, Klaus ,  FABIAN, Heinz ,  ELSESSER, Susanne

IPC: C03B19/14

CPC classification number: C03B19/1484 ,  C03B2201/03

Abstract: In a prior art method for producing a quartz glass body, SiO2 particles are deposited on the cylindrical outer surface of a cylindrical mandrel (4), which rotates around the longitudinal axis thereof, while forming an essentially cylindrical porous blank (1), whereby a holding element (12) made of quartz glass is provided in the area of one of the ends of said blank (1). The aim of the invention is to improve, based on existing methods, the reproducibility of the properties of the products made of the quartz glass body. To this end, the invention provides that a holding element (2) is used which has a metastable OH content of less than 30 ppm by weight, and that the holding element (2) is subjected to a thermal pretreatment. A suitable holding element (2) for holding a blank made of quartz glass is characterized in that it is comprised of quartz glass that has a metastable OH content of less than 30 ppm by weight.

公开(公告)号：EP1067097A1

公开(公告)日：2001-01-10

申请号：EP99962506.4

申请日：1999-12-24

Applicant: ASAHI GLASS COMPANY LTD.

Inventor： IKUTA, Yoshiaki, Asahi Glass Company, Limited ,  KIKUGAWA, Shinya, Asahi Glass Company, Limited ,  MASUI, Akio ,  SHIMODAIRA, Noriaki, Asahi Glass Company, Limited ,  YOSHIZAWA, Shuhei, Asahi Glass Company, Limited

IPC: C03C3/06 ,  C03B8/04 ,  C03B20/00

CPC classification number: C03B19/1453 ,  C03B2201/03 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C23/002 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/54 ,  Y02P40/57

Abstract: A synthetic quartz glass to be used for light in a vacuum ultraviolet region with a wavelength of at most 175 nm, which is characterized in that the OH group content in the synthetic quartz glass is less than 10 ppm, and it contains substantially no reduction type defects.

公开(公告)号：EP0385753A3

公开(公告)日：1991-01-23

申请号：EP90302137.6

申请日：1990-02-28

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Shimizu Takaaki ,  Takita, Masatoshi

IPC: C03C3/06 ,  C03B8/02

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/066 ,  C03B19/1065 ,  C03B19/12 ,  C03B20/00 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/23 ,  C03C1/006 ,  C03C2201/23 ,  C03C2203/26 ,  Y10S65/90 ,  Y10T428/131 ,  Y10T428/1314

Abstract: A synthetic silica glass article made by hydrolyzing an alkoxysilane and thermally sintering the resulting silica; this synthetic silica glass article has a viscosity of not less than 10¹⁰ poise at 1400 °C, and contains, as metallic impurities, less than 1 ppm of Al, less than 0.2 ppm of Fe, less than 0.2 ppm of Na, less than 0.2 ppm of K, less than 0.01 ppm of Li, less than 0.2 ppm of Ca, less than 0.02 ppm of Ti, less than 0.01 ppm of B, less than 0.01 ppm of P, and less than 0.01 ppm of As.

公开(公告)号：EP0385753A2

公开(公告)日：1990-09-05

申请号：EP90302137.6

申请日：1990-02-28

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Shimizu Takaaki ,  Takita, Masatoshi

IPC: C03C3/06 ,  C03B8/02

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/066 ,  C03B19/1065 ,  C03B19/12 ,  C03B20/00 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/23 ,  C03C1/006 ,  C03C2201/23 ,  C03C2203/26 ,  Y10S65/90 ,  Y10T428/131 ,  Y10T428/1314

Abstract: A synthetic silica glass article made by hydrolyzing an alkoxysilane and thermally sintering the resulting silica; this synthetic silica glass article has a viscosity of not less than 10¹⁰ poise at 1400 °C, and contains, as metallic impurities, less than 1 ppm of Al, less than 0.2 ppm of Fe, less than 0.2 ppm of Na, less than 0.2 ppm of K, less than 0.01 ppm of Li, less than 0.2 ppm of Ca, less than 0.02 ppm of Ti, less than 0.01 ppm of B, less than 0.01 ppm of P, and less than 0.01 ppm of As.

Abstract translation: 通过水解烷氧基硅烷并热烧结所得二氧化硅制成的合成二氧化硅玻璃制品; 该合成石英玻璃制品在1400℃下的粘度不低于10 1泊，并且作为金属杂质含有小于1ppm的Al，小于0.2ppm的Fe，小于0.2ppm 的Na，小于0.2ppm的K，小于0.01ppm的Li，小于0.2ppm的Ca，小于0.02ppm的Ti，小于0.01ppm的B，小于0.01ppm的P和小于0.01ppm 的。

公开(公告)号：KR1020140146189A

公开(公告)日：2014-12-24

申请号：KR1020147031698

申请日：2014-03-25

Applicant: 신에쯔 세끼에이 가부시키가이샤

Inventor： 야마가타,시게루

IPC: C30B15/10 ,  C03B19/09 ,  C30B29/06 ,  C30B35/00 ,  H01L21/02

CPC classification number: C03B19/095 ,  C03B2201/03 ,  C03B2201/04 ,  C30B15/10 ,  C30B29/06 ,  C30B35/002 ,  Y10T117/1032 ,  C03B20/00 ,  H01L21/02002

Abstract: 본 발명은, 직동부, 만곡부, 및 저부를 갖는 단결정 실리콘 인상용 실리카 용기에 있어서, 용기 외측이 기포를 함유하는 불투명 실리카 유리로 이루어지고, 용기 내측이 투명 실리카 유리로 이루어지고, 적어도 상기 직동부의 내측 표층부분에 있어서, 결정질 실리카 분말이 용융된 상과 비정질 실리카 분말이 용융된 상이 입상으로 혼재하는 혼합 실리카층을 갖는 단결정 실리콘 인상용 실리카 용기이다. 이에 따라, 고온도 하에서의 실리카 용기 중의 실리콘 융액의 탕면진동을 억제할 수 있는 단결정 실리콘 인상용 실리카 용기가 제공된다.

公开(公告)号：KR1020130094283A

公开(公告)日：2013-08-23

申请号：KR1020137000457

申请日：2011-07-08

Applicant: 헤라우스 쿼츠 유케이 리미티드

Inventor： 코아페스,리차드벤자민 ,  먼디,알렌 ,  세이스,랜조지

IPC: C03B19/14 ,  C01B33/02 ,  C30B29/06

CPC classification number: C03B19/1492 ,  C03B19/1438 ,  C03B19/1453 ,  C03B19/1484 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/20 ,  C03B2201/24 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/36 ,  C03B2207/34 ,  C03B2207/52 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/23 ,  Y02P40/57 ,  Y10T428/131

Abstract: 이 발명은 외경 400 mm이고 내경이 300 mm인 투명 합성 유리질 실리카 글라스를 제공하기 위한 것이다. 잉고트는 기포와 100 ㎛ 이상의 협잡물이 거의 없고 불순물이 100 ppB를 넘지 않으며, 5 ppM 이하의 염소 농도를 갖고 있다. 또한 본 발명은 밀도가 0.4 g/cm
3
이상인 수트 바디가 산화 저항성 맨드렐에서 증착되도록 하는 방법을 제공한다. 수트 바디는 흑연, 실리콘 카바이드, 실리콘 카바이드 피복 실리콘 카바이드 또는 유리질 실리카로 구성된 맨드렐에서 진공 또는 환원 가스의 존재 하에 진공 또는 헬륨 분위기에서 투명 다공성 글라스로 소성된다.

Abstract translation: 公开了外径大于400mm，内径大于300mm的透明合成玻璃石英玻璃的中空铸锭。 锭基本上没有直径大于100um的气泡或夹杂物，具有不超过100ppB的任何单独的金属杂质，并且氯浓度小于5ppM。 还公开了生产这种锭的方法，其中密度大于0.4g / cm 3的多孔烟灰体沉积在抗氧化心轴上。 在真空下或在还原气体存在下，烟灰体在包括石墨，碳纤维增强碳，碳化硅，硅浸渍的碳化硅，碳化硅涂覆的石墨或玻璃状二氧化硅的心轴上脱水，然后烧结成透明 无孔玻璃在真空或氦气氛中。