公开(公告)号：US20030119652A1

公开(公告)日：2003-06-26

申请号：US10310276

申请日：2002-12-05

Inventor： Bodo Kuhn ,  Bruno Uebbing

IPC: C03C003/06

CPC classification number: C03B19/1453 ,  C03B19/1415 ,  C03B2201/07 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/52

Abstract: The present invention concerns a quartz glass blank for an optical component for the transmission of ultraviolet radiation of a wave length of 250 nm and under, as well as its utilization in microlilthography in connection with ultraviolet radiation of a wavelength of 250 nm and under. Such quartz glass blank is to have low induced absorption, while being optimized in respect of compaction and de-compaction. The quartz glass blank according to the invention has the following properties: A glass structure essentially free of oxygen defect sites; a H2 content in the range of 3null1017 molecules/cm3 to 2.0null1018 molecules/cm3; an OH content in the range of 500 weight ppm to 1000 weight ppm; a SiH group content of less than 2null1017 molecules/cm3; a chlorine content in the range of 60 weight ppm to 120 weight ppm; a refractive index inhomogeneity, nulln, of less than 2 ppm; and a stress birefringence of less than 2 nm/cm. For utilization according to the invention, the quartz glass blanknullin respect of its minimum and maximum hydrogen content, CH2min and CH2max, as well as its OH content COHnullis in accordance with the scaling laws (2), (3) and (4), with P standing for the pulse number and null for the energy density: CH2min nullmolecules/cm3nullnull1.0null108null2Pnullnull(2), CH2max nullmolecules/cm3nullnull2null1019nullnullnull(3), COH nullweight ppmnullnull1700null nullmJ/cm2null0.4null50nullnull(4).

Abstract translation: 本发明涉及一种用于传输波长为250nm及以下的紫外线辐射的光学部件的石英玻璃坯料，以及其在与250nm及以下的波长的紫外线辐射相关的微立体图谱中的应用。 这种石英玻璃坯料具有低的诱导吸收，同时在压实和去压实方面被优化。 根据本发明的石英玻璃坯料具有以下特性：基本上不含氧缺陷部位的玻璃结构; 在3×10 17分子/ cm 3至2.0×10 18分子/ cm 3范围内的H 2含量; 在500重量ppm至1000重量ppm的范围内的OH含量; SiH基含量小于2×10 17分子/ cm3; 氯含量在60重量ppm至120重量ppm的范围内; 折射率不均匀性，DELTAn小于2ppm; 应力双折射小于2nm / cm。 对于根据本发明的利用，石英玻璃坯料在其最小和最大氢含量，CH 2 min和CH 2 max以及其OH含量COH-方面符合定标法（2），（3）和（ 4），其中P代表能量密度的脉冲数和εi：CH 2min [分子/ cm 3] = 1.0×10 8epsi 2 P（2），CH 2 max [分子/ cm 3] = 2×10 19秒（3），COH [重量ppm] = 1700秒[ mJ / cm 2] 0.4±50（4）。

公开(公告)号：US20030115904A1

公开(公告)日：2003-06-26

申请号：US10310279

申请日：2002-12-05

Inventor： Bodo Kuhn ,  Bruno Uebbing ,  Martin Trommer ,  Stefan Ochs ,  Gero Fischer ,  Ulla Holst

IPC: C03C021/00 ,  C03B019/06

CPC classification number: C03B19/1469 ,  C03B19/1415 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/52 ,  C03C2203/54 ,  Y02P40/57

Abstract: The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction. The quartz glass blank according to the invention is characterized by the following properties:a glass structure essentially free of oxygen defect sites, an H2-content in the range of 0.1null1016 molecules/cm3 to 4.0null1016 molecules/cm3, an OH-content in the range of 125 wt-ppm to 450 wt-ppm, an SiH group-content of less than 5null1016 molecules/cm3, a refractive index inhomogeneity, nulln, of less than 2 ppm, and a stress birefringence of less than 2 nm/cm.In the use according to the invention, the quartz glass blank complies with dimensioning rules (2), (3), and (4) in terms of its OH-content, minimal and maximal hydrogen contents, COH, CH2min, and CH2max, respectively, with P being the pulse number and null being the energy density:COH nullwt-ppmnullnull1,700nullnullnullmJ/cm2null0.4null50nullnull(2),CH2min nullmolecules/cm3nullnull1null106null2 Pnullnull(3),CH2max nullmolecules/cm3nullnull2null1018nullnullnull(4).The procedure according to the invention is characterized in that a mixed quartz glass is generated from a first and a second quartz glass by mixing the two quartz glasses.

Abstract translation: 本发明涉及用于传输波长为250nm或更短波长的紫外线辐射的光学部件的石英玻璃坯料，以及微波平版印刷中使用石英玻璃毛坯与波长为250nm的紫外线辐射或 较短 此外，本发明涉及石英玻璃坯料的制造工序。 所述类型的石英玻璃坯料应显示出很少的诱导吸收，并且在压实和分解时优化。 根据本发明的石英玻璃坯料的特征在于以下性质：基本上不含氧缺陷部位的玻璃结构，H 2含量在0.1×10 16分/ cm 3至4.0×10 16分子/ cm 3范围内，OH-含量 125重量ppm至450重量ppm的范围，小于5×10 16分/厘米3的SiH基含量，小于2ppm的折射率不均匀性，DELTAn，应力双折射小于2nm / cm 在根据本发明的使用中，石英玻璃空白符合尺寸规则（2），（3）和（4）的OH含量，最小和最大氢含量，COH，CH2min和CH2max， 分别为P为脉冲数，εi为能量密度：COH [wt-ppm] = 1,700xepsi [mJ / cm 2] 0.4±50（2），CH 2min [分子/ cm 3] = 1×10 6秒2 P（3） [分子/厘米3] = 2×10 18秒（4）。根据本发明的方法的特征在于，从第一和第二石英玻璃b产生混合石英玻璃 y混合两个石英眼镜。

公开(公告)号：US06574991B1

公开(公告)日：2003-06-10

申请号：US09658200

申请日：2000-09-08

Applicant: Robert S. Pavlik, Jr. ,  Lawrence H. Kotacska

Inventor： Robert S. Pavlik, Jr. ,  Lawrence H. Kotacska

IPC: C03B514

CPC classification number: C03B19/1407 ,  C03B2201/02 ,  C03B2201/03 ,  C03B2201/07 ,  C03B2201/42 ,  C03B2207/32 ,  C03B2207/50 ,  C04B35/10 ,  F27B9/26 ,  F27B17/00 ,  F27D1/0006 ,  F27D1/0043 ,  F27D3/0033

Abstract: An article of relatively pure silica, and a furnace and method of producing the article. The article is produced by collecting molten silica particles in a refractory furnace in which at least a portion of the refractory has been exposed to a halogen-containing gas to react with contaminating metal ions in the refractory.

Abstract translation: 相对纯二氧化硅的制品，以及制造该制品的炉子和方法。 该制品通过在难熔炉中收集熔融二氧化硅颗粒而制备，其中耐火材料的至少一部分暴露于含卤素的气体中以与耐火材料中的污染金属离子反应。

公开(公告)号：US20030096693A1

公开(公告)日：2003-05-22

申请号：US10298924

申请日：2002-11-19

Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.

Inventor： Yuichi Ohga ,  Tadashi Enomoto

IPC: C03C003/06 ,  C03C003/112

CPC classification number: C03C23/0025 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/70 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/54

Abstract: Fluorine-containing glass which comprises silica and contains, in said silica, not more than 10 ppm of OH group, not more than 10 ppm of Cl and not less than 1000 ppm of F, said fluorine-containing glass having a concentration ratio of F/Cl of 100 or more. Also disclosed is fluorine-containing glass which contains not more than 10 ppm of OH group, not more than 10 ppm of Cl and not less than 1000 ppm of F, and has a concentration ratio of F/Cl of 1000 or more.

公开(公告)号：US20030037568A1

公开(公告)日：2003-02-27

申请号：US10139358

申请日：2002-05-07

Applicant: NIKON CORPORATION

Inventor： Seishi Fujiwara ,  Hiroyuki Hiraiwa ,  Kazuhiro Nakagawa ,  Shouji Yajima ,  Norio Komine ,  Hiroki Jinbo

IPC: C03B020/00 ,  C03B008/04

CPC classification number: C03B19/14 ,  C03B37/014 ,  C03B37/0142 ,  C03B2201/07 ,  C03B2207/66 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/42 ,  C03C2203/46 ,  G03F7/2004 ,  Y02P40/57 ,  Y10S501/905

Abstract: The invention relates to fluorine-containing silica glasses, and methods of their production. The silica glass may be used for an ultraviolet light optical system in which light in a wavelength region of 200 mn or less, such as an ArF (193 nm) excimer laser, is used The invention also relates to a projection exposure apparatus containing fluorine-containing glass of the invention.

Abstract translation: 本发明涉及含氟二氧化硅玻璃及其制造方法。 石英玻璃可以用于其中使用200nm以下的波长区域的光，例如ArF（193nm）准分子激光器的紫外光学系统。本发明还涉及一种投影曝光装置， 含有玻璃的本发明。

公开(公告)号：US20030027054A1

公开(公告)日：2003-02-06

申请号：US09920227

申请日：2001-08-01

Inventor： Laura J. Ball ,  Sylvain Rakotoarison

IPC: G03F009/00 ,  G21H001/00 ,  G21H005/00 ,  B01J019/08 ,  H01F041/00

CPC classification number: C03B19/1423 ,  C03B19/01 ,  C03B19/1415 ,  C03B2201/07 ,  C03B2201/08 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/30 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/42 ,  C03B2201/50 ,  C03B2201/54 ,  C23C16/401 ,  C23C16/513

Abstract: A method of making fused silica includes generating a plasma, delivering reactants comprising a silica precursor into the plasma to produce silica particles, and depositing the silica particles on a deposition surface to form glass.

Abstract translation: 制造熔融二氧化硅的方法包括产生等离子体，将包含二氧化硅前体的反应物输送到等离子体中以产生二氧化硅颗粒，并将二氧化硅颗粒沉积在沉积表面上以形成玻璃。

公开(公告)号：US06480518B1

公开(公告)日：2002-11-12

申请号：US09517888

申请日：2000-03-03

Applicant: Akira Fujinoki ,  Takayuki Oshima ,  Hiroyuki Nishimura ,  Yasuyuki Yaginuma

Inventor： Akira Fujinoki ,  Takayuki Oshima ,  Hiroyuki Nishimura ,  Yasuyuki Yaginuma

IPC: H01S322

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/21 ,  C03C4/0085 ,  C03C23/002 ,  C03C2201/21 ,  C03C2201/50 ,  C03C2203/42 ,  C03C2203/50

Abstract: A synthetic glass member for use in excimer laser lithography, having superior homogeneity, high transmittance for ArF excimer laser beams and an excellent resistance against lasers is made from high purity synthetic quartz glass, and it is characterized in that layered structures, striae in three directions and internal strains are thermally and mechanically removed, the distribution of refractive index (&Dgr;n) in a plane orthogonal to the optical axis is up to about 1×10−6, the distribution of refractive index (&Dgr;n) in a plane parallel to the optical axis is up to about 5×10−6, the birefringence is up to about 2 nm/cm, the hydrogen molecule concentration is at least about 2×1017 molecules/cm3, and the internal transmittance is at least about 99.8% at a wavelength of 193.4 nm.

Abstract translation: 用于准分子激光光刻的合成玻璃构件，具有优异的均匀性，对ArF准分子激光束的高透射率和优异的抗激光性能由高纯度合成石英玻璃制成，其特征在于层状结构，沿三个方向 并且内部应变被热和机械去除，在与光轴正交的平面中折射率（DELTAn）的分布高达约1×10 -6，平行于光轴的平面中的折射率分布（DELTAn）为 高达约5×10 -6，双折射高达约2nm / cm，氢分子浓度为至少约2×10 17分子/ cm 3，内部透射率在193.4nm波长处为至少约99.8％。

公开(公告)号：US20020144517A1

公开(公告)日：2002-10-10

申请号：US10107792

申请日：2002-03-28

Applicant: Nikon Corporation

Inventor： Seishi Fujiwara ,  Kazuhiro Nakagawa ,  Hiroki Jinbo ,  Norio Komine

IPC: C03B020/00 ,  C03B019/14

CPC classification number: C03C3/06 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/22 ,  C03B2207/24 ,  C03B2207/32 ,  C03B2207/36 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/26 ,  C03C2201/50 ,  C03C2203/52

Abstract: A method is provided for manufacturing a synthetic silica glass. The method includes the steps of emitting an oxygen containing gas and a hydrogen containing gas from a burner; emitting a mixture of an organic silicon compound and a halogen compound from the burner; and reacting the mixture with the oxygen containing gas and the hydrogen containing gas to synthesize the silica glass.

Abstract translation: 提供了一种制造合成石英玻璃的方法。 该方法包括从燃烧器发射含氧气体和含氢气体的步骤; 从燃烧器发射有机硅化合物和卤素化合物的混合物; 并使混合物与含氧气体和含氢气体反应以合成二氧化硅玻璃。

公开(公告)号：US06451719B1

公开(公告)日：2002-09-17

申请号：US09692014

申请日：2000-10-19

Applicant: Shigeru Yamagata

Inventor： Shigeru Yamagata

IPC: C03C306

CPC classification number: G03F7/70958 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/54 ,  Y10S501/905

Abstract: A silica glass optical material for transmitting light with a wavelength of from 155 to 195 nm emitted from an excimer laser or an excimer lamp, which comprises silica glass optical material of ultrahigh purity, containing from 1 to 100 wtppm of OH groups, from 5×1016 to 5×1019 molecules/cm3 of H2, and from 10 to 10,000 wtppm of F, but substantially free from halogens other than F, and having a fluctuation in refractive index, &Dgr;n, of from 3×10−6 to 3×10−7.

Abstract translation: 一种二氧化硅玻璃光学材料，用于从准分子激光或准分子灯发射波长为155至195nm的光，其包括含有1至100重量ppm的OH基团的超高纯度的石英玻璃光学材料，从5×10 16至 5×1019分子/ cm 3的H 2和10至10,000重量ppm的F，但基本上不含F以外的卤素，并且具有3×10 -6至3×10 -7的折射率DELTAn。

公开(公告)号：US20020094180A1

公开(公告)日：2002-07-18

申请号：US10044452

申请日：2002-01-11

Inventor： A. Joseph Antos ,  Dana C. Bookbinder ,  Richard M. Fiacco ,  Kevin B. Sparks

IPC: G02B006/16 ,  G02B006/22 ,  G02B006/26

CPC classification number: G02B6/03694 ,  C03B37/01446 ,  C03B37/01853 ,  C03B2201/07 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/22 ,  C03B2201/23 ,  C03B2201/31 ,  C03B2203/22 ,  C03C13/045 ,  C03C13/047 ,  C03C2201/22 ,  G02B6/02 ,  G02B6/03622 ,  G02B6/2835 ,  Y02P40/57

Abstract: An optical waveguide fiber or body having a doped outer region which can be utilized in an optical coupler, a preform which can serve as the precursor for the fiber, an optical coupler, and methods of making same. Water, for example in the form of H2O and/or D2O, may be added to the cladding of the optical waveguide fiber or body.

Abstract translation: 具有可用于光耦合器中的掺杂外部区域的光波导纤维或主体，可用作光纤的前体的预成型件，光耦合器及其制造方法。 可以将例如以H 2 O和/或D 2 O形式的水添加到光波导纤维或体的包层中。