Abstract:
Provided is an inexpensive low-loss optical fiber suitably used in an optical transmission network. An optical fiber includes a core, an optical cladding, and a jacket. The core has a relative refractive index difference between 0.2% and 0.32% and has a refractive index volume between 9%·μm2 and 18%·μm2. The jacket has a relative refractive index difference between 0.03% and 0.20%. Glass constituting the core has a fictive temperature between 1400° C. and 1560° C. Stress remaining in the core is compressive stress. A cutoff wavelength measured on a fiber having a length of 2 m is 1300 nm or more and a cutoff wavelength measured on a fiber having a length of 100 m is 1500 nm or less. An effective area at a wavelength of 1550 nm is 110 μm2 or more. A attenuation at a wavelength of 1550 nm is 0.19 dB/km or less.
Abstract:
The present invention relates to a TiO2-containing quartz glass substrate, having a TiO2 concentration of from 3 to 8% by mass, an OH concentration of 50 ppm by mass or less, and an internal transmittance T365 per 1 mm thickness at a wavelength of 365 nm of 95% or more.
Abstract:
Methods for producing an optical fiber by elongating a silica glass blank or a coaxial group of silica glass components, on the basis of which a fiber is obtained that comprises a core zone, an inner jacket zone enclosing the core zone and a ring zone surrounding the inner jacket zone, are known. In order to provide, proceeding from this, a method, a tubular semi-finished product and a group of coaxial components for the cost-effective production of an optical fiber, which is characterized by a high quality of the boundary between the core and jacket and by low bending sensitivity, according to the invention, the silica glass of the ring zone is provided in the form of a ring zone tube made of silica glass having a mean fluorine content of at least 6000 weight ppm and the tube has an inner tube surface and an outer tube surface, wherein via the wall of the ring zone tube, a radial fluorine concentration profile is adjusted which has an inner fluorine depletion layer with a layer thickness of at least 1 μm and no more than 10 μm, in which the fluorine content decreases toward the inner tube surface and is no more than 3000 weight ppm in a region close to the surface which has a thickness of 1 μm.
Abstract:
The specification describes an improved optical fiber produced by a hybrid VAD/MCVD process. The core of the fiber is produced using VAD and the inner cladding layer has a depressed index and is produced using MCVD. In preferred embodiments, the optical power envelope is essentially entirely contained in VAD produced core material and the MCVD produced depressed index cladding material. Optical loss is minimized by confining most of the optical power to the VAD core where OH presence is low, as well as by maximizing the optical power in the un-doped silica region. The MCVD substrate tube material is essentially devoid of optical power.
Abstract:
The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion in the range of the time of irradiation with EUV light is substantially zero when used as an optical member of an exposure tool for EUVL and which has extremely high surface smoothness. The present invention relates to a TiO2-containing silica glass having a TiO2 content of from 7.5 to 12% by mass, a temperature at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 40 to 110° C., and a standard deviation (σ) of a stress level of striae of 0.03 MPa or lower within an area of 30 mm×30 mm in at least one plane.
Abstract:
The invention starts from a known component of quartz glass for use in semiconductor manufacture, which component at least in a near-surface region shows a co-doping of a first dopant and of a second oxidic dopant, said second dopant containing one or more rare-earth metals in a concentration of 0.1-3% by wt. each (based on the total mass of SiO2 and dopant). Starting from this, to provide a quartz glass component for use in semiconductor manufacture in an environment with etching action, which component is distinguished by both high purity and high resistance to dry etching and avoids known drawbacks caused by co-doping with aluminum oxide, it is suggested according to the invention that the first dopant should be nitrogen and that the mean content of metastable hydroxyl groups of the quartz glass is less than 30 wtppm.
Abstract:
A fused silica glass and a fused silica article having a combined concentration of at least one of OH and OD of up to about 50 ppm. The fused silica glass is formed by drying a fused silica soot blank or preform in an inert atmosphere containing a drying agent, followed by removal of residual drying agent from the dried soot blank by heating the dried soot blank in an atmosphere comprising an inert gas and of oxygen.
Abstract:
A method of making a silica glass having a uniform fictive temperature. The glass article is heated at a target fictive temperature, or heated or cooled at a rate that is less than the rate of change of the fictive temperature, for a time that is sufficient to allow the fictive temperature of the glass to come within 3° C. of the target fictive temperature. The silica glass is then cooled from the target fictive temperature to a temperature below the strain point of the glass at a cooling rate that is greater than the relaxation rate of the glass at the target fictive temperature. The silica glass has a fictive temperature that varies by less than 3° C. after the annealing step. A silica glass made by the method is also described.
Abstract:
Disclosed are synthetic silica glass having a low polarization-induced birefringence, process for making the glass and lithography system comprising optical element made of the glass. The silica glass has a polarization-induced birefringence measured at 633 nm of less than about 0.1 nm/cm when subjected to excimer laser pulses at about 193 nm having a fluence of about 40 μJ·cm−2·pulse−1 and a pulse length of about 25 ns for 5×109 pulses.
Abstract translation:公开了具有低偏振诱发双折射的合成石英玻璃,用于制造玻璃的方法和包含由玻璃制成的光学元件的光刻系统。 当在大约193nm处的准分子激光脉冲具有约40μJ·cm-2·pulse-1的注量和脉冲长度时,石英玻璃具有在633nm处测量的偏振诱发双折射小于约0.1nm / cm 对于5×109脉冲,约25ns。
Abstract:
The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion in the range of the time of irradiation with EUV light is substantially zero when used as an optical member of an exposure tool for EUVL and which has extremely high surface smoothness. The present invention relates to a TiO2-containing silica glass having a TiO2 content of from 7.5 to 12% by mass, a temperature at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 40 to 110° C., and a standard deviation (σ) of a stress level of striae of 0.03 MPa or lower within an area of 30 mm×30 mm in at least one plane.