Abstract:
PROBLEM TO BE SOLVED: To provide a vaporizer for MOCVD, which can obtain a vaporized gas in which a material solution is uniformly dispersed, and to provide a method for vaporizing the material solution.SOLUTION: The vaporizer has: (1) a dispersion part 8 having a gas introducing port 4 for introducing a pressurized carrier gas 3 to a gas passage, means for supplying a material solution 5a to the gas passage, and a gas exit 7 for sending the carrier gas containing the material solution to a vaporization part 22; (2) a vaporization part 22 including a vaporization tube 20 of which one end is connected to a reaction tube of an MOCVD system and the other end is connected to the gas exit 7, and heating means for heating the vaporization tube 20, and for heating and vaporizing the carrier gas containing the material solution sent from the dispersion part 8; and (3) the dispersion part 8 having a main body 1 of the dispersion part having a cylindrical hollow part, a rod 10 having an outer diameter smaller than an inner diameter of the cylindrical hollow part, and a spiral groove 60 on the side of the vaporization part 22 in the outer periphery of the rod 10. The rod 10 is inserted into the cylindrical hollow part.
Abstract:
PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device in which a BCN film can be deposited using a non-corrosive organic aminoboron based gas in place of a conventional BClgas, for example, a BCN film having a stabilized low dielectric constant and a high hardness (Young's modulus) can be deposited using tris(dimethylamino)boron by plasma CVD.SOLUTION: In a method of producing an insulating film, a boron carbon nitride (BCN) based insulating film is deposited using an organic aminoboron based gas. The organic aminoboron based gas is tris(dimethylamino)boron. The BCN based insulating film has a dielectric constant of 2.5 or lower and an elastic modulus (Young's modulus) of 8 GPa or higher.
Abstract:
PROBLEM TO BE SOLVED: To provide a vaporization method which allows a long path of a reaction tube to be secured by centrifugal force generated when a carrier gas passing through the inside and is capable of uniformly accelerating vaporization with radiant heat from a heater by stirring the carrier gas having a material solution dispersed therein, in a direction crossing a pass direction of the carrier gas. SOLUTION: The carrier gas having the material solution dispersed therein, which comprises a liquid or powder, is supplied to a spiral reaction tube 103 from the upstream side, and the carrier gas having the material solution dispersed therein, which passes the inside of the reaction tube 103, is vaporized by radiant heat from a heater 104. COPYRIGHT: (C)2010,JPO&INPIT