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公开(公告)号：KR1020110072947A
公开(公告)日：2011-06-29
申请号：KR1020090130068
申请日：2009-12-23
Applicant: 제일모직주식회사
IPC: C08L33/12 , C09B29/033 , G02B5/30
Abstract: PURPOSE: A pigment dispersion composition for a color filter is provided to ensure excellent dispersibility and stability while satisfying high brightness and high contrast and to prevent the degradation of color reproductivity. CONSTITUTION: A pigment dispersion composition for a color filter includes: pigment including diazo-based yellow pigment kneaded with an acrylic resin, ester-based resin or combination thereof; a binder resin; and a dispersing agent. The average molecular weight of pigment within the pigment dispersion composition is 50-150 nm. The binder resin has the average molecular weight of 5,000-40,000.
Abstract translation: 目的：提供用于滤色器的颜料分散组合物，以确保优异的分散性和稳定性，同时满足高亮度和高对比度并防止颜色再现性的降低。 构成：用于滤色器的颜料分散组合物包括：颜料，包括与丙烯酸树脂捏合的重氮基黄色颜料，酯基树脂或其组合; 粘合剂树脂; 和分散剂。 颜料分散组合物中颜料的平均分子量为50-150nm。 粘合剂树脂的平均分子量为5,000-40,000。
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32.发明公开
公开(公告)号：KR1020100080142A
公开(公告)日：2010-07-08
申请号：KR1020080138780
申请日：2008-12-31
Applicant: 제일모직주식회사
Abstract: PURPOSE: A photosensitive resin composition for dye, coloring composition, and color filter is provided to ensure dispersion stability, chemical resistance and brightness. CONSTITUTION: A dye is represented by chemical formula 1. A coloring composition contains the dye of chemical formula 1, binder resin, and solvent. The composition further contains pigment and/or dispersing agent. The pigment is selected from a group consisting of yellow pigment of C.I.Yellow138, C.I.Yellow139, C.I.Yellow150, and C.I.Yellow183; red pigment selected from C.I.Red254, and mixture thereof.
Abstract translation: 目的：提供用于染料，着色组合物和滤色器的感光性树脂组合物，以确保分散稳定性，耐化学性和亮度。 构成：染料由化学式1表示。着色组合物含有化学式1的染料，粘合剂树脂和溶剂。 组合物还含有颜料和/或分散剂。 颜料选自C.I.Yellow138的黄色颜料，C.I.Yellow139，C.I.Yellow150和C.I.Yellow183; 选自C.I.Red254的红色颜料及其混合物。
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公开(公告)号：KR1020100072934A
公开(公告)日：2010-07-01
申请号：KR1020080131487
申请日：2008-12-22
Applicant: 제일모직주식회사
CPC classification number: G03F7/027 , G02B1/04 , G02B5/201 , G02B5/223 , G02B5/23 , G03F7/0007 , G03F7/028 , G03F7/031 , G03F7/033
Abstract: PURPOSE: A photoresist resin composition for a color filter, and the color filter using thereof are provided to manufacture the high definition color filter with the uniform thickness of a film, and to secure the excellent dispersion stability of a pigment, and the mobility. CONSTITUTION: A photoresist resin composition for a color filter contains the following: a dispersion resin selected from an unsaturated ethylene oligomer marked with chemical formula 1 or its homopolymer, or the unsaturated ethylene oligomer and an unsaturated ethylene monomer copolymer; an acrylic binder resin containing a carboxy group; a photo-polymerizable monomer; a photopolymerization initiator; and a pigment and a solvent. In the chemical formula 1, R1 and R1` are aliphatic hydrocarbon groups of C1~C4, respectively. R2 and R2` are hydrogen atoms or methyl groups, respectively.
Abstract translation: 目的：提供一种用于滤色器的光致抗蚀剂树脂组合物及其使用的滤色器，以制造具有均匀膜厚度的高分辨率滤色器，并确保颜料的优异分散稳定性和迁移率。 构成：用于滤色器的光致抗蚀剂树脂组合物包含：选自标记有化学式1的不饱和乙烯低聚物或其均聚物或不饱和乙烯低聚物和不饱和乙烯单体共聚物的分散树脂; 含有羧基的丙烯酸类粘合剂树脂; 光聚合性单体; 光聚合引发剂; 和颜料和溶剂。 在化学式1中，R1和R1分别是C1〜C4的脂族烃基。 R2和R2分别是氢原子或甲基。
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公开(公告)号：KR1020100072660A
公开(公告)日：2010-07-01
申请号：KR1020080131135
申请日：2008-12-22
Applicant: 제일모직주식회사
CPC classification number: C08G61/02 , C08G61/00 , C08L65/00 , G03F7/004 , G03F7/0045 , G03F7/0047
Abstract: PURPOSE: A composition for forming a hard-mask layer and a manufacturing method of a patterned material using thereof are provided to improve the anti-reflection property applied to a short wavelength area and to apply a coating spin-on method. CONSTITUTION: A composition for forming a hard-mask layer contains a copolymer marked with chemical formula 1. In chemical formula 1, R1 is a substituted or non-substituted alkylene of C1~C4. R2, R3, R7, and R8 are hydrogen, a hydroxyl group, a straight, branched, or cyclic alkyl group of C1~C10, an alkoxy group, or an aryl group of C6~C20. R4, R5, and R6 are the hydrogen, the hydroxyl group, an alkyl ether group of C1~C4, a phenyl dialkylene ether group, or their combination.
Abstract translation: 目的：提供一种用于形成硬掩模层的组合物及其使用的图案化材料的制造方法，以提高施加于短波长区域的抗反射性，并施加涂布旋涂法。 构成：用于形成硬掩模层的组合物包含标记有化学式1的共聚物。在化学式1中，R 1是C 1 -C 4的取代或未取代的亚烷基。 R 2，R 3，R 7和R 8是C 1〜C 10，烷氧基或C 6〜C 20的芳基的氢，羟基，直链，支链或环状烷基。 R4，R5和R6是氢，羟基，C1〜C4的烷基醚基，苯基二亚烷基醚基或它们的组合。
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35.发明授权
公开(公告)号：KR100959190B1
公开(公告)日：2010-05-24
申请号：KR1020070135531
申请日：2007-12-21
Applicant: 제일모직주식회사
IPC: G03F7/11
Abstract: 본 발명은 열로서 가교되고 광에 의해 발생하는 산에 의해 탈 가교가 이루어지는 화합물을 포함하는 것을 특징으로 하는 바닥반사방지막 조성물에 관한 것이다.
상기 바닥반사방지막 조성물은 짧은 파장 영역(예를 들어, 157, 193, 248nm)에서 강한 흡수를 갖는 단위구조를 포함하는 방향족 고리 함유 중합체를 포함하고, 상기 열로서 가교되고 광에 의해 발생하는 산에 의해 탈 가교가 이루어지는 화합물은 방향족 고리 함유 중합체와 가교반응을 일으키며, 노광에 의해 탈 가교됨으로써 포토리쏘그라픽 공정상의 현상액에 의해 용해가 가능한 성질을 지닌다.
따라서 본 발명은 포토리쏘그라픽 공정에서 포토레지스트의 현상 공정에서 포토레지스트와 함께 용해가 이루어짐으로써 공정이 단순화되고 포토레지스트막의 형성두께를 감소시킬 뿐만 아니라 포토리쏘그래픽 공정 마진을 높일 수 있는 바닥반사방지막을 형성할 수 있는 것이다.
포토리쏘그래픽, 바닥 반사방지막(BARC), 가교제, 방향족 고리-
Patent Agency Ranking
公开(公告)号：KR1020090070142A
公开(公告)日：2009-07-01
申请号：KR1020070138040
申请日：2007-12-26
Applicant: 제일모직주식회사
Abstract: A gap-fill composition is provided to be charged without voids even when filling a via hole or a trench hole having big aspect ratio, and to ensure dry etch rate identical a low-K dielectric interlayer insulating film or high wet etch selectivity. A gap-fill composition comprises a compound selected from the group consisting of an aromatic ring-containing compound represented by chemical formula 1 or chemical formula 2, which has average molecular weight(Mw) of 1,000-20,000; and an organic solvent. In chemical formula 1, n is
Abstract translation: 即使在填充具有大纵横比的通孔或沟槽孔时也提供填充空隙的组合物，以便确保干蚀刻速率与低K电介质层间绝缘膜相同或高湿蚀刻选择性。 间隙填充组合物包含选自化学式1或化学式2表示的含芳环的化合物的化合物，其平均分子量（Mw）为1,000-20,000; 和有机溶剂。 在化学式1中，n为<= n <= 190; R1和R2独立地为选自化学式3-5的任何一种; R3由化学式6表示; 并且R 4和R 5独立地是氢或烷基。 在化学式2中，n为<= n <= 190; R6为选自化学式3-5的任何一种; R7由化学式6表示; 而R8-R11独立地是氢或烷基。
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公开(公告)号：KR1020090047801A
公开(公告)日：2009-05-13
申请号：KR1020070113840
申请日：2007-11-08
Applicant: 제일모직주식회사
IPC: C09D11/037 , C09D11/10 , G02B5/20
CPC classification number: C09B67/0041 , C08K5/0041 , C08K5/23 , C09B33/04 , C09B33/056 , C09D7/47 , C09D11/322 , G02B5/201 , G02B5/223 , G03F7/0007
Abstract: The present invention relates to a color filter ink composition including an acryl-based resin, a polymerizable monomer, a pigment, a leveling agent, and a solvent. The pigment is represented by the following Chemical Formula 1, and the leveling agent is a polymer including a repeating unit including at least one of the following Chemical Formula 2, Chemical Formula 3, or combinations thereof. In the above Formulae 1 to 3, each substituent is the same as in the detailed description.
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38.发明公开고 내에칭성 반사방지 하드마스크 조성물, 패턴화된 재료형상의 제조방법 및 그 제조방법으로 제조되는 반도체집적회로 디바이스 有权具有抗反射性的高耐蚀硬质合金组合物，通过该方法制造的图案材料的制造方法和半导体IC器件
公开(公告)号：KR1020080057927A
公开(公告)日：2008-06-25
申请号：KR1020060131851
申请日：2006-12-21
Applicant: 제일모직주식회사
CPC classification number: G03F7/091 , H01L21/0276
Abstract: An antireflective hard mask composition, a method for forming a pattern on a substrate by using the composition, and a semiconductor integrated circuit device formed by the method are provided to improve optical properties, mechanical properties and dry etching resistance and to form a pattern having a high aspect ratio. An antireflective hard mask composition comprises 1-20 wt% of a polymer containing an aromatic ring represented by the formula 1, 2 or 3; 0.001-5 wt% of an initiator; and 75-98.8 wt% of an organic solvent, wherein 1
Abstract translation: 提供了一种抗反射硬掩模组合物，通过使用该组合物在基板上形成图案的方法以及通过该方法形成的半导体集成电路器件，以改善光学性能，机械性能和耐干蚀刻性，并形成具有 高纵横比。 抗反射硬掩模组合物包含1-20重量％的由式1,2或3表示的芳环的聚合物; 0.001-5重量％的引发剂; 和75-98.8重量％的有机溶剂，其中1 <= n <750; R1是-CH2-，-CH2-Ph-CH2-，-CH2-Ph-Ph-CH2-，-CH（-OH-取代的Ph） - 或-CH（-Ph） - ; R2，R3和R4是H，羟基，C1-C10烷基，C6-C10芳基，烯丙基或卤素原子。
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公开(公告)号：KR100833212B1
公开(公告)日：2008-05-28
申请号：KR1020060120724
申请日：2006-12-01
Applicant: 제일모직주식회사
CPC classification number: G03F7/091 , G03F7/0045 , G03F7/0048
Abstract: An anti-reflective hard mask composition is provided to realize high etching selectivity and excellent resistance against multi-etching and to minimize reflection between a resist layer and a backside layer. An anti-reflective hard mask composition comprises: (a) an aromatic ring-containing polymer comprising a compound represented by the following formula 1; and (b) an organic solvent. In formula 1, each of m and n is equal to or greater than 1 and less than 190, wherein m+n is 190 or less; R1, R2 and R3 are the same or different, and represent any one substituent of H, OH, C1-C10 alkyl, C6-C10 aryl, allyl and halogen atoms; and R2 and R4 are the same or different, and represent -CH2- and the following formula.
Abstract translation: 提供了抗反射硬掩模组合物以实现高蚀刻选择性和优异的耐多蚀刻性，并且使抗蚀剂层和背面层之间的反射最小化。 抗反射硬掩模组合物包含：（a）含有芳族环的聚合物，其包含由下式1表示的化合物; 和（b）有机溶剂。 在式1中，m和n各自等于或大于1且小于190，其中m + n为190以下; R1，R2和R3相同或不同，表示H，OH，C1-C10烷基，C6-C10芳基，烯丙基和卤素原子的任何一个取代基; 并且R 2和R 4相同或不同，并且表示-CH 2 - 和下式。
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公开(公告)号：KR101690514B1
公开(公告)日：2016-12-28
申请号：KR1020120157574
申请日：2012-12-28
Applicant: 제일모직주식회사
CPC classification number: G03F7/0007 , G03F7/033 , G03F7/105 , Y10S430/106
Abstract: (A) 하기화학식 1로표시되는염료및 하기화학식 2로표시되는염료로부터선택되는적어도하나를포함하는착색제; (B) 아크릴계바인더수지; (C) 광중합성단량체; (D) 광중합개시제; 및 (E) 용매를포함하는컬러필터용감광성수지조성물, 그리고이를이용한컬러필터가제공된다. [화학식 1][화학식 2](상기화학식 1 및화학식 2에서, 각치환기는명세서에정의한바와같다.)
Abstract translation: 公开了一种用于滤色器的感光性树脂组合物，其包含（A）着色剂，其包含由以下化学式1表示的染料和/或由以下化学式2表示的染料，其中在以下化学式1和2中， 取代基与详细描述中描述的相同; （B）丙烯酸系粘合剂树脂; （C）可光聚合单体; （D）光聚合引发剂; 和（E）溶剂，以及使用其的滤色器。
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