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    아크릴계 점착제 조성물
    4.
    发明公开
    아크릴계 점착제 조성물 有权
    丙烯酸胶粘剂组合物

    公开(公告)号：KR1020120078020A

    公开(公告)日：2012-07-10

    申请号：KR1020100140177

    申请日：2010-12-31

    Applicant: 제일모직주식회사

    Inventor： 하경진 ,  정은환 ,  이길성 ,  정우진 ,  김이준 ,  남이리나

    IPC: C09J133/04 ,  C09J4/00 ,  C09J11/00 ,  G02B5/30

    CPC classification number: C09J133/14 ,  C09J9/00 ,  C09J11/06 ,  C09J133/066 ,  G02B1/00 ,  G02B5/30

    Abstract: PURPOSE: An acrylic adhesive composition is provided to improve light leakage phenomenon, and to have excellent thermal resistance, and to have high release strength, thereby capable of restraining excitation phenomenon. CONSTITUTION: An acrylic adhesive composition comprises an acrylic copolymer comprising a monomer having a pyrrolidonyl group, and a hardener. The comprised amount of the monomer having pyrrolidonyl group is 11-40 parts by weight in 100.0 parts by weight of the acrylic copolymer. The acrylic copolymer is polymerized of 60-83 parts by weight of (meth)acrylic acid alkyl ester having an alkyl group, 1-10 parts by weight of (meth)acrylic ester having a hydroxy group, and 11-40 parts by weight of a monomer having a pyrrolidonyl group. The acrylic copolymer additionally comprises a silane group. The weight average molecular weight of the acrylic copolymer is 800,000-1,500,000 g/mol.

    Abstract translation: 目的：提供丙烯酸类粘合剂组合物以改善漏光现象，并具有优异的耐热性，并且具有高剥离强度，从而能够抑制激发现象。 构成：丙烯酸类粘合剂组合物包括含有具有吡咯烷酮基的单体的丙烯酸共聚物和硬化剂。 丙烯酸共聚物100.0重量份中，含有吡咯烷酮基的单体的含量为11〜40重量份。 丙烯酸共聚物由60-83重量份的具有烷基的（甲基）丙烯酸烷基酯，1-10重量份的具有羟基的（甲基）丙烯酸酯和11-40重量份的具有羟基的（甲基） 具有吡咯烷酮基的单体。 丙烯酸共聚物另外包含硅烷基。 丙烯酸共聚物的重均分子量为800,000-1,500,000g / mol。

    디스플레이용 광학 점착제 조성물
    5.
    发明公开
    디스플레이용 광학 점착제 조성물 有权
    粘合剂用于显示

    公开(公告)号：KR1020120077916A

    公开(公告)日：2012-07-10

    申请号：KR1020100140047

    申请日：2010-12-31

    Applicant: 제일모직주식회사

    Inventor： 하경진 ,  권지혜 ,  이길성 ,  남이리나 ,  김이준

    IPC: C09J4/00 ,  C09J9/00 ,  C09J133/04 ,  C09J7/02

    CPC classification number: C09J4/00 ,  C09J7/22 ,  C09J7/38 ,  C09J7/385 ,  C09J9/00 ,  C09J133/04 ,  C09J2201/606 ,  C09J2203/318

    Abstract: PURPOSE: An optical adhesive composition for display is provided to have excellent outdoor visibility and impact strength, and to have little overflowing phenomenon. CONSTITUTION: An optical adhesive composition has the glass transition temperature of (-100) - 0 °C, and comprises a binder containing isoprene monomers. The binder is polyisoprene (meth)acrylate oligomer. The polyisoprene (meth)acrylate oligomer comprises a vinyl group. The binder has a structure in chemical formula 1. In chemical formula 1, m is 1-300, n is 0-60, and p is 1-10. The comprised amount of the binder in the optical adhesive composition is 50-80 weight%. The optical adhesive composition comprises the binder, a photo-curable monomer, a photo-initiator, a UV blocking agent, and thermal stabilizer.

    Abstract translation: 目的：提供用于显示的光学粘合剂组合物以具有优异的室外可见度和冲击强度，并且具有很少的溢出现象。 构成：光学粘合剂组合物的玻璃化转变温度为（-100）-0℃，并且包含含有异戊二烯单体的粘合剂。 粘合剂是聚异戊二烯（甲基）丙烯酸酯低聚物。 聚异戊二烯（甲基）丙烯酸酯低聚物包含乙烯基。 粘合剂具有化学式1的结构。在化学式1中，m为1-300，n为0-60，p为1-10。 光学粘合剂组合物中粘合剂的含量为50-80重量％。 光学粘合剂组合物包含粘合剂，可光固化单体，光引发剂，UV阻断剂和热稳定剂。

    현상액에 용해 가능한 근자외선 바닥 반사방지막 조성물 및이를 이용한 패턴화된 재료 형성 방법
    6.
    发明公开
    현상액에 용해 가능한 근자외선 바닥 반사방지막 조성물 및이를 이용한 패턴화된 재료 형성 방법 失效
    用于DUV（深紫外）光刻的开发者可溶底部防反射涂料组合物及其使用生产图案材料的方法

    公开(公告)号：KR1020090067767A

    公开(公告)日：2009-06-25

    申请号：KR1020070135531

    申请日：2007-12-21

    Applicant: 제일모직주식회사

    Inventor： 김민수 ,  어동선 ,  오창일 ,  윤경호 ,  형경희 ,  남이리나 ,  이진국 ,  나탈리아토카레바

    IPC: G03F7/11

    CPC classification number: G03F7/091 ,  C08F220/18 ,  C08F220/28 ,  C08F220/36 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0757

    Abstract: A bottom anti-reflective coating composition and a method for making a patterned material form on a substrate are provided to minimize the reflectivity between a resist and back layer in performing lithography technique. A bottom anti-reflective coating composition comprises a compound of the chemical formula 3. In the chemical formula 3, Q- is anion and contains one on the chemical formula 4. The composition also contains: a polymer containing an aromatic ring of the chemical formula 1; a compound of the chemical formula 3; and an organic solvent. In the chemical formula 1, 1

    Abstract translation: 提供底部抗反射涂料组合物和在基材上形成图案化材料形式的方法，以在进行光刻技术时使抗蚀剂和背层之间的反射率最小化。 底部抗反射涂料组合物包含化学式3的化合物。在化学式3中，Q-是阴离子，并含有化学式4的化合物。该组合物还包含：含有化学式芳族环的聚合物 1; 化学式3的化合物; 和有机溶剂。 在化学式1中，1 <= n <190; R1是化学式2的结构之一; R2，R4和R5是氢或甲基; R3是-H，-CH3和-C2H5或-C（CH3）3。

    반사방지성을 갖는 하드마스크 조성물 및 이를 이용한재료의 패턴화 방법
    7.
    发明授权
    반사방지성을 갖는 하드마스크 조성물 및 이를 이용한재료의 패턴화 방법 有权
    具有抗反射性的HARDMASK组合物和使用该材料的材料的方法

    公开(公告)号：KR100819162B1

    公开(公告)日：2008-04-03

    申请号：KR1020070040035

    申请日：2007-04-24

    Applicant: 제일모직주식회사

    Inventor： 이진국 ,  남이리나 ,  나탈리아토카레바 ,  오창일 ,  윤경호 ,  어동선 ,  형경희 ,  김민수

    IPC: G03F7/004

    CPC classification number: G03F7/091 ,  G03F7/09 ,  G03F7/11

    Abstract: A hard mask composition having anti-reflective property is provided to minimize reflection between a resist layer and a backside layer, to realize excellent optical and mechanical properties and high etching selectivity during a lithographic process. A hard mask composition having anti-reflective property comprises: (a) an aromatic ring-containing polymer including at least one compound represented by the following formula 1 or 2; and (b) an organic solvent. In formula 1, n ranges from 1 to 190; R1 is a specific fused aromatic ring radical; R2 is an ethylene radical containing an aromatic ring or not; and each of X and Y represents H or OH. In formula 2, each of m and n is equal to or greater than 1 and less than 190 and m+n is equal to or greater than 3 and equal to or less than 190; each of R1 and R2 represents a specific fused aromatic ring radical; each of R3 and R4 represents an ethylene radical containing an aromatic ring or not; and each of X, Y and Z represents H or OH.

    Abstract translation: 提供具有抗反射性能的硬掩模组合物以使抗蚀剂层和背面层之间的反射最小化，以在光刻工艺期间实现优异的光学和机械性能以及高蚀刻选择性。 具有抗反射性的硬掩模组合物包括：（a）含有至少一种由下式1或2表示的化合物的含芳环的聚合物; 和（b）有机溶剂。 在式1中，n的范围为1至190; R1是特定的稠合芳环基团; R2是含有芳环的亚乙基; 并且X和Y各自表示H或OH。 在式2中，m和n中的每一个等于或大于1且小于190，m + n等于或大于3并且等于或小于190; R1和R2各自表示特定的稠合芳环基团; R 3和R 4各自表示含有芳环的亚乙基; X，Y和Z各自表示H或OH。

    반사방지성을 갖는 하드마스크 조성물
    10.
    发明公开
    반사방지성을 갖는 하드마스크 조성물 有权
    具有抗逆性的HARDMASK组合物

    公开(公告)号：KR1020060116133A

    公开(公告)日：2006-11-14

    申请号：KR1020050068348

    申请日：2005-07-27

    Applicant: 제일모직주식회사

    Inventor： 어동선 ,  오창일 ,  김도현 ,  이진국 ,  남이리나

    IPC: G03F7/039 ,  G03F7/004

    CPC classification number: G03F7/091 ,  G03F7/38

    Abstract: Hard-mask composition having minimum residual acid content and anti-reflective property is provided to give extremely excellent optical and mechanical properties and etching selectivity by comprising aromatic-ring containing polymer with strong absorbance at short wavelength. The hard-mask composition comprises: (a) 1 to 20wt.% of at least one of aromatic ring containing polymer represented by any one of formulae(1) to (3) wherein for the formula(1), n ranges from 1 to 190, R1 and R2 are independently hydroxyl group(-OH), alkyl or aryl group having carbon atoms ranging from 1 to 10, allyl group or halogen atoms, and R3 and R4 are independently hydrogen or include active fraction reacting with cross-linkable component or chromophore fraction; (b) 0.1 to 5wt.% of the cross-linkable component; (c) 0.001 to 0.05wt.% of acid catalyst; and the balance of organic solvent. The aromatic ring containing polymer has weight average molecular weight ranging from 1,000 to 30,000.

    Abstract translation: 提供具有最小残留酸含量和抗反射性能的硬掩模组合物，以通过包含在短波长下具有强吸光度的含芳香环聚合物来提供非常优异的光学和机械性能和蚀刻选择性。 硬掩模组合物包含：（a）1至20重量％的由式（1）至（3）中任一个表示的含芳环的聚合物中的至少一种，其中对于式（1），n的范围为1至 190，R1和R2独立地是羟基（-OH），具有1-10个碳原子的烷基或芳基，烯丙基或卤素原子，R3和R4独立地是氢，或包括与可交联组分反应的活性组分 或发色团级分; （b）0.1〜5重量％的可交联组分; （c）0.001〜0.05重量％的酸催化剂; 和有机溶剂的平衡。 含芳环的聚合物的重均分子量为1,000〜30,000。

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