도파로 구조체 및 배열 도파로 격자 구조체
    32.
    发明公开
    도파로 구조체 및 배열 도파로 격자 구조체 失效
    波导结构和阵列波导光栅结构

    公开(公告)号:KR1020090106262A

    公开(公告)日:2009-10-08

    申请号:KR1020080031847

    申请日:2008-04-04

    CPC classification number: G02B6/12011 G02B2006/12119

    Abstract: PURPOSE: A waveguide structure and an arrayed waveguide grating structure are provided to improve a crosstalk characteristic by reducing a phase error of an arrayed waveguide and the coupling loss between the arrayed waveguide and a star coupler. CONSTITUTION: A plurality of arrayed waveguides(103) connect an input start coupler(102) and an outer star coupler(104) optically. The arrayed waveguides includes a first section with a high confinement factor and a second section with a low confinement factor. The first section of the arrayed waveguide has the same structure.

    Abstract translation: 目的:提供波导结构和阵列波导光栅结构,以通过减少阵列波导的相位误差和阵列波导与星形耦合器之间的耦合损耗来改善串扰特性。 构成:多个阵列波导(103)以光学方式连接输入起始耦合器(102)和外部星形耦合器(104)。 阵列波导包括具有高限制因子的第一部分和具有低约束因子的第二部分。 阵列波导的第一部分具有相同的结构。

    광 도파로 구조체 및 그 제조 방법
    33.
    发明公开
    광 도파로 구조체 및 그 제조 방법 失效
    光波导结构及其制作方法

    公开(公告)号:KR1020090061293A

    公开(公告)日:2009-06-16

    申请号:KR1020070128259

    申请日:2007-12-11

    Abstract: An optical guide structure and a manufacturing method thereof are provided, which forms a wave guide having the end of very small radius of curvature while having the tapered shape. An optical guide structure comprises the substrate(110), the high refractivity core(135), and the low-refractive-index pattern(140). The substrate comprises the first waveguide domain, and the second waveguide domain, and transition areas. The high refractivity core is extended to the transition domain from the first waveguide domain. The high refractivity core is covered by the low refractivity core pattern. The other side wall of the high refractivity core forms acute angle with one side wall of the low refractivity core pattern.

    Abstract translation: 提供了一种导光结构及其制造方法,其形成具有非常小的曲率半径的端部的波导,同时具有锥形形状。 光导结构包括基板(110),高折射率芯(135)和低折射率图案(140)。 衬底包括第一波导域和第二波导域,以及过渡区域。 高折射率核心从第一波导域延伸到过渡域。 高折射率芯由低折射率芯图案覆盖。 高折射率芯的另一侧壁与低折射率芯图案的一个侧壁形成锐角。

    양방향성 광모듈
    34.
    发明公开
    양방향성 광모듈 失效
    双向光学模块

    公开(公告)号:KR1020070013985A

    公开(公告)日:2007-01-31

    申请号:KR1020050124043

    申请日:2005-12-15

    Abstract: A bi-directional optical module is provided to reduce the number of parts and to allow an alignment error in a wide range, by amplifying an optical signal with a wavelength of 1.5um by using a semiconductor optical amplifier. A bi-directional optical module includes a transmitting optical element(100) aligned on an optical axis of an LD(Laser Diode,102) formed on a substrate(108) and integrated with a semiconductor optical amplifier(106); and a receiving optical element(200) having a PD(Photo Diode,204) of which a light receiving surface is placed vertically to the optical axis of the LD of the transmitting optical element. Therefore, the bi-directional optical module transmits and receives the optical signals with different wavelengths at the same time. A monitor PD(104) is integrally aligned on the optical axis of the LD formed on the substrate.

    Abstract translation: 通过使用半导体光放大器,通过放大波长为1.5um的光信号,提供双向光模块以减少部件数量并允许在宽范围内的对准误差。 双向光学模块包括在形成在衬底(108)上并与半导体光放大器(106)集成的LD(激光二极管102)的光轴上对准的透射光学元件(100)。 以及具有PD(光电二极管204)的接收光学元件(200),其中光接收表面垂直于发射光学元件的LD的光轴放置。 因此,双向光模块同时发送和接收具有不同波长的光信号。 监视器PD(104)在形成在基板上的LD的光轴上一体地对准。

    단일 집적 반도체 광소자의 제조방법
    35.
    发明公开
    단일 집적 반도체 광소자의 제조방법 无效
    单片集成半导体光学器件的制造方法

    公开(公告)号:KR1020060067111A

    公开(公告)日:2006-06-19

    申请号:KR1020050041287

    申请日:2005-05-17

    CPC classification number: H01L31/109 H01L31/02366 H01L31/18

    Abstract: 본 발명은 단일 집적 반도체 광소자의 제조방법에 관한 것으로, 능동 및 수동 도파로 영역이 분리된 기판 상에 완충층을 형성하고, 상기 능동 도파로 영역의 완충층 상에 제1 활성층 및 제1 클래드층과, 상기 수동 도파로 영역의 완충층 상에 제2 활성층 및 제2 클래드층을 선택적 결정 성장하여 수직 정렬하는 단계와, 상기 제1 및 제2 클래드층 상부의 소정영역에 제1 및 제2 마스크를 형성하는 단계와, 상기 제1 및 제2 마스크를 이용하여 메사 형태의 능동 및 수동 도파로가 각각 형성되도록 상기 완충층의 소정깊이까지 식각하는 단계와, 상기 제2 마스크를 제거한 후 전체 구조의 상부에 소정두께의 제3 클래드층을 형성하는 단계와, 상기 제1 마스크를 제거한 후 전체 구조의 상부에 제4 클래드층을 형성하는 단계를 포함함으로써, 도파 손실을 최대한 줄이 고 제작 공정도 단순화할 수 있는 효과가 있다.
    단일 집적 반도체, 광소자, 수동 도파로, 능동 도파로

    광소자 및 광소자의 제조 방법
    36.
    发明公开
    광소자 및 광소자의 제조 방법 有权
    光学器件及其制造方法,可被无源波导光损失

    公开(公告)号:KR1020040096376A

    公开(公告)日:2004-11-16

    申请号:KR1020030029440

    申请日:2003-05-09

    Abstract: PURPOSE: An optical device and a fabricating method thereof are provided to reduce the optical loss of a passive waveguide by forming an undoped cladding layer on a passive waveguide region. CONSTITUTION: An active mesa pattern(120) is formed on an active waveguide region of a substrate. A passive mesa pattern(122) is formed on a passive waveguide region of the substrate. A first undoped cladding layer(124), an N-type cladding layer(126), and a first P-type cladding layer(128) are sequentially formed on the entire structure. The first P-type cladding layer, the N-type cladding layer, and the first undoped cladding layer are removed from the active waveguide region by performing a pattering process. A second P-type cladding layer(130) is formed on the entire structure. An ohmic contact layer(132) is formed on the second P-type cladding layer.

    Abstract translation: 目的:提供一种光学器件及其制造方法,以通过在无源波导区域上形成未掺杂的包层来减少无源波导的光学损耗。 构成:在衬底的有源波导区域上形成活性台面图案(120)。 无源台面图案(122)形成在衬底的无源波导区域上。 在整个结构上依次形成第一未掺杂的包覆层(124),N型包覆层(126)和第一P型包覆层(128)。 通过进行图案化处理,从有源波导区域去除第一P型包覆层,N型包覆层和第一未掺杂包覆层。 在整个结构上形成第二P型包覆层(130)。 欧姆接触层(132)形成在第二P型覆层上。

    전기 신호에 의해 동작되는 광 편향기 및 이를 이용한파장 가변형 외부 공진기
    37.
    发明授权

    公开(公告)号:KR100444176B1

    公开(公告)日:2004-08-09

    申请号:KR1020010079683

    申请日:2001-12-15

    CPC classification number: H01S5/141 H01S3/0815 H01S3/1055 H01S3/107 H01S5/143

    Abstract: The present invention relates to an optical deflector driven by an electrical signal, and a wavelength tunable external resonator using the same. The optical deflector of a triangle shape, capable of controlling the refractive index of a beam depending on the electrical signal, is positioned between a reflection mirror and a diffraction grating in a Littman-Metcalf mode external resonator or between a lens and the diffraction grating in a Littrow mode external resonator. Thus, even with the reflection mirror and the diffracting grating fixed, the refractive index of the beam generated from a laser diode can be controlled by adjusting the electrical signal applied to the optical deflector, so that beam having a specific wavelength can be focused and the wavelength can be rapidly and consecutively tuned.

    Abstract translation: 本发明涉及由电信号驱动的光学偏转器和使用该光学偏转器的波长可调谐外部谐振器。 能够根据电信号控制光束的折射率的三角形光学偏转器位于Littman-Metcalf模式外部谐振器中的反射镜和衍射光栅之间,或者位于透镜和衍射光栅之间 一个Littrow模式外部谐振器。 因此,即使反射镜和衍射光栅被固定,从激光二极管产生的光束的折射率也可以通过调节施加到光偏转器的电信号来控制,使得具有特定波长的光束可以被聚焦,并且 波长可以被快速连续地调谐。

    확산 현상을 이용한 수직 테이퍼 형성방법
    38.
    发明公开
    확산 현상을 이용한 수직 테이퍼 형성방법 失效
    使用扩散菲涅尔形成垂直锥的方法

    公开(公告)号:KR1020040056555A

    公开(公告)日:2004-07-01

    申请号:KR1020020083056

    申请日:2002-12-24

    Abstract: PURPOSE: A method for forming a vertical taper using a diffusion phenomenon is provided to enhance a degree of integration of an optical device and simplify conditions of an etching process by using a diffusion-limited etching method to form the vertical taper. CONSTITUTION: A lower peripheral layer(2) of a waveguide, a center layer(3) of the waveguide, an upper peripheral layer(1) of the waveguide, and a selective etching layer(7) are sequentially formed on a substrate. A long ribbon-shaped etching mask(6) is formed on the selective etching layer. The selective etching layer is etched to the inside of the etching mask by using a selective etching solution. A capillary flat plate is formed by the etching process. The upper peripheral layer of the waveguide is partially etched by using the diffusion-limited etching solution.

    Abstract translation: 目的:提供使用扩散现象形成垂直锥形的方法,以通过使用扩散限制蚀刻方法来提高光学器件的集成度并简化蚀刻工艺的条件以形成垂直锥形。 构成:在衬底上依次形成波导的下周边(2),波导的中心层(3),波导的上周边(1)和选择性蚀刻层(7)。 在选择性蚀刻层上形成长的带状蚀刻掩模(6)。 通过使用选择性蚀刻溶液将选择性蚀刻层蚀刻到蚀刻掩模的内部。 通过蚀刻工艺形成毛细管平板。 通过使用扩散限制蚀刻溶液部分地蚀刻波导的上周边层。

    능동 광소자와 수동 광소자의 집적 방법 및 그 소자
    39.
    发明公开
    능동 광소자와 수동 광소자의 집적 방법 및 그 소자 失效
    集成有源光学器件和被动光学器件及其集成器件的方法

    公开(公告)号:KR1020040056554A

    公开(公告)日:2004-07-01

    申请号:KR1020020083055

    申请日:2002-12-24

    Abstract: PURPOSE: A method for integrating an active optical device and a passive optical device, and an integrated device thereby are provided to form the active optical device and the passive optical device on one substrate by changing a buried ridge waveguide into a strip loaded waveguide. CONSTITUTION: A taper is formed at an end of a passive waveguide connected to a buried ridge waveguide of an active device in order to change the taper into the strip loaded taper when a center of the buried ridge waveguide of the active device is etched. The taper is covered by a re-growth process. The taper is arranged to the taper formed at an end of the buried ridge waveguide. The strip-loaded waveguide is formed by performing an etching process. An etch-stop layer is inserted in the process for growing the passive waveguide layer in order to form constantly the etching depth.

    Abstract translation: 目的:提供一种用于集成有源光学器件和无源光学器件的方法,以及由此提供的集成器件,以通过将掩埋脊形波导变换为条带加载波导来在一个基板上形成有源光学器件和无源光学器件。 构成:当有源器件的埋地脊波导的中心被蚀刻时,锥形形成在连接到有源器件的埋地脊波导的无源波导的端部,以便将锥度改变为带状加载锥度。 锥度由再生长过程覆盖。 锥形布置成形成在埋脊形波导的端部处的锥形。 通过进行蚀刻工艺来形成带状波导管。 在用于生长无源波导层的过程中插入蚀刻停止层,以便不断地形成蚀刻深度。

    광집적 회로의 제작 방법
    40.
    发明公开
    광집적 회로의 제작 방법 失效
    制造光学集成电路的方法

    公开(公告)号:KR1020040042695A

    公开(公告)日:2004-05-20

    申请号:KR1020020071278

    申请日:2002-11-15

    Abstract: PURPOSE: A method for manufacturing an optical integrated circuit is provided to automatically align two optical devices with each other by defining a waveguide of a passive device and an active device by using only one mask. CONSTITUTION: A method for manufacturing an optical integrated circuit includes the steps of: forming a core layer(101) and a buffer layer(102) of a mode size converter on a substrate(100) provided with an active region(A) and a passive region(B); forming a first guide layer, the core layer(101), a second guide layer and a clad layer on the buffer layer(102) of the active region(A); forming the core layer(101) and the clad layer on the buffer layer(102) of the passive region(B); forming a first mask pattern so as to define the width of the upper waveguide of the mode size converter; etching the clad layer, the second guide layer, the core layer(101) of the active region(A), the first guide layer and the buffer layer(102) of the passive region(B) by using the first mask; after forming the second mask, removing the buffer layer(102), the core layer(101) and the portion of the substrate; forming a current blocking layer on the exposed substrate; and forming the clad layer on the entire top surface by removing the second mask pattern of the active region(A).

    Abstract translation: 目的:提供一种用于制造光学集成电路的方法,通过仅使用一个掩模来限定无源器件和有源器件的波导来自动对准两个光学器件。 构成:一种用于制造光学集成电路的方法包括以下步骤:在具有有源区(A)的基板(100)上形成模式尺寸转换器的芯层(101)和缓冲层(102) 被动区域(B); 在有源区(A)的缓冲层(102)上形成第一引导层,芯层(101),第二引导层和覆盖层; 在所述被动区域(B)的缓冲层(102)上形成所述芯层(101)和所述覆盖层; 形成第一掩模图案,以限定模式尺寸转换器的上波导的宽度; 通过使用第一掩模蚀刻包层,第二引导层,有源区(A)的芯层(101),第一引导层和无源区(B)的缓冲层(102); 在形成第二掩模之后,去除缓冲层(102),芯层(101)和基板的部分; 在暴露的衬底上形成电流阻挡层; 以及通过去除有源区域(A)的第二掩模图案,在整个顶表面上形成覆层。

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