-
公开(公告)号：KR1020140101489A
公开(公告)日：2014-08-20
申请号：KR1020130014369
申请日：2013-02-08
Applicant: 한국표준과학연구원
Abstract: Provided in the present invention are a spectrum domain interference apparatus and a spectrum domain interference method. The spectrum domain interference apparatus comprises: a laser source which emits light with a fixed longitudinal mode frequency width in a fixed frequency band; a fiber Bragg grating filter which receives the light from the laser source in order to penetrate longitudinal modes selected by a free spectral range (FSR) larger than the longitudinal mode frequency width; an interferometer which receives light from the fiber Bragg grating filter in order to provide interference light with an optical path difference due to different optical paths; a spectrum analyzer which receives the interference light from the interferometer in order to decompose and measure the interference light according to frequencies; and a signal processing unit which extracts a spectral cycle of an interference signal according to frequencies using the interference signal of the spectrum analyzer, and extracts an optical path difference provided by the interferometer using the spectral cycle.
Abstract translation: 本发明提供的是频域干扰装置和频域干扰方法。 频域干扰装置包括：以固定频带中的固定纵模频率发射光的激光源; 光纤布拉格光栅滤波器，其接收来自激光源的光，以穿透由大于纵向模式频率宽度的自由光谱范围（FSR）选择的纵向模式; 干涉仪，其从光纤布拉格光栅滤波器接收光，以便由于不同的光路而提供具有光程差的干涉光; 频谱分析仪，其接收来自干涉仪的干涉光，以便根据频率分解和测量干涉光; 以及信号处理单元，其使用频谱分析仪的干扰信号，根据频率提取干扰信号的频谱周期，并且使用频谱周期提取由干涉仪提供的光程差。
-
公开(公告)号：KR101361625B1
公开(公告)日：2014-02-12
申请号：KR1020120062074
申请日：2012-06-11
Applicant: 한국표준과학연구원
Abstract: 본 발명은 위치 측정 장치 및 위치 측정 방법을 제공한다. 이 위치 측정 방법은 증분형 스케일(incremental scale)에서 반사 또는 투과된 광을 상기 증분형 스케일의 한 주기 내에 60도의 위상차를 가지고 감지하여 측정신호를 생성하는 단계, 감지된 측정 신호를 기본 공간 주파수(fundamental spatial frequency)의 1차 정현파 및 3차 정현파의 합으로 표시하는 단계, 및 측정 신호를 이용하여 1차 정현파의 위상을 추출하는 단계를 포함한다.
-
公开(公告)号：KR1020130107108A
公开(公告)日：2013-10-01
申请号：KR1020120028938
申请日：2012-03-21
Applicant: 한국표준과학연구원
Abstract: PURPOSE: A thickness change measuring device and a thickness change measuring method are provided to precisely measure a change in the thickness of a target object and to measures a thickness change aspect of the whole surface of the target object. CONSTITUTION: A thickness change measuring device includes a light emitting unit (10), a double slit (30), a target object (20), a light position detecting unit (40), and a signal processing unit. The double slit includes a first opening (31) and a second opening (32) which are separated in a direction across a light progressing direction and transmits the lights. The target object is arranged between the light emitting unit and the double slit, thereby transmitting the lights. The light position detecting unit receives coherent lights formed by the lights transmitted through the first and second openings, thereby detecting a position change of coherent patterns. The signal processing unit receives signals from the light position detecting unit, thereby measuring a change in the thickness of the target object. [Reference numerals] (10) Light emitting unit; (80) Processing unit; (90) Transfer control unit; (91) Driving unit
Abstract translation: 目的：提供厚度变化测量装置和厚度变化测量方法，以精确地测量目标物体的厚度变化并测量目标物体的整个表面的厚度变化方面。 构成：厚度变化测量装置包括发光单元（10），双缝（30），目标物体（20），光位置检测单元（40）和信号处理单元。 双缝包括沿着光进行方向分离的第一开口（31）和第二开口（32），并且透光。 目标物体被布置在发光单元和双缝之间，从而传输光。 光位置检测单元接收由透过第一和第二开口的光形成的相干光，从而检测相干图案的位置变化。 信号处理单元从光位置检测单元接收信号，从而测量目标物体的厚度变化。 （附图标记）（10）发光单元; （80）处理单元; （90）转移控制单元; （91）驾驶单位
-
公开(公告)号：KR1020120043519A
公开(公告)日：2012-05-04
申请号：KR1020100104855
申请日：2010-10-26
Applicant: 한국표준과학연구원
Abstract: PURPOSE: A visibility enhanced interferometer is provided to improve the visibility because a reflected light signal is amplified to an auxiliary light source applied an injection locking method without a phase information change and becomes similar to a reference light signal. CONSTITUTION: A visibility enhanced interferometer comprises a main optical source unit(20), a light splitting unit(30), a reference surface reflection unit(40), a measuring surface reflection unit(50), and an optical detecting unit(60). The main optical source unit projects short wavelength light. The light splitting unit divides a light signal into two. The reference and measuring surface reflection units respectively reflect the light signals divided by the light splitting unit to each measuring surface of measuring objects. The light detecting unit observes the interference by gathering the reflected lights from the reference and measuring surface reflection units. The auxiliary light source unit amplifies weak reflected light so that the visibility is uniformly maintained.
Abstract translation: 目的：提供可见度增强型干涉仪以提高可见度，因为反射光信号被放大到辅助光源，而辅助光源则采用注入锁定方法而不会产生相位信息变化，并变得类似于参考光信号。 构成：可见度增强型干涉仪包括主光源单元（20），分光单元（30），参考表面反射单元（40），测量表面反射单元（50）和光学检测单元（60） 。 主光源单元投射短波长光。 光分离单元将光信号分为两个。 参考和测量表面反射单元分别将由光分离单元划分的光信号反映到测量对象的每个测量表面。 光检测单元通过从参考和测量表面反射单元收集反射光来观察干扰。 辅助光源单元放大弱反射光，使得能见度被均匀地保持。
-
公开(公告)号：KR101135142B1
公开(公告)日：2012-04-16
申请号：KR1020100107832
申请日：2010-11-01
Applicant: 한국표준과학연구원
Abstract: PURPOSE: An apparatus of measuring surface vibration using an injection locked laser is provided to accurately measure a surface oscillation of a measurement sample by amplifying a weak optical signal scattered from a measurement sample by using an injection locked laser. CONSTITUTION: An optical signal generator(10) irradiates a measurement sample(40) with an optical signal. The optical signal generator comprises a first laser unit(11), a beam splitter(12), a first detector(13), and a first light chopper(14). An optical signal amplification unit(20) amplifies a weak optical signal scattered from the measurement sample having an uneven surface. The optical signal amplification unit amplifies the optical signal scattered from the measurement sample through an injection locked laser. An optical signal analysis unit(30) analyzes an optical signal amplified in the optical signal amplification unit and measures the surface oscillation of the measurement sample.
Abstract translation: 目的：提供一种使用注射锁定激光测量表面振动的装置，通过使用注射锁定激光器放大从测量样本散射的弱光信号来精确测量测量样品的表面振荡。 构成：光信号发生器（10）用光信号照射测量样品（40）。 光信号发生器包括第一激光单元（11），分束器（12），第一检测器（13）和第一光斩波器（14）。 光信号放大单元（20）放大从具有不平坦表面的测量样品散射的弱光信号。 光信号放大单元通过注入锁定的激光放大从测量样本散射的光信号。 光信号分析单元（30）分析在光信号放大单元中放大的光信号，并测量测量样品的表面振荡。
-
Patent Agency Ranking
公开(公告)号：KR101105449B1
公开(公告)日：2012-01-17
申请号：KR1020090096356
申请日：2009-10-09
Applicant: 한국표준과학연구원
Abstract: 본 발명은 물질의 두께 및 굴절률을 측정하는 시스템에 관한 것으로, 좀 더 자세히는, 펄스 레이저 광원을 이용함으로써, 연속 발진 레이저 광원이나, 적외선 광원을 이용하는 산출 시스템 보다 간단한 작업으로 정확도가 높은 물질의 두께 및 굴절률을 동시에 산출할 수 있는 기술에 관한 것이다.
본 발명에 따른 펄스레이저를 이용한 물질 두께 및 굴절률 측정 시스템은 주기적인 간격으로 발진하는 펄스 형태의 레이저를 제공하는 광조사부 및 상기 광조사부에서 나오는 레이저 광을 이용하여, 측정 물질의 간섭 신호를 측정하고, 이를 분석하여, 측정 물질의 두께 및 굴절률을 동시에 산출하는 스펙트럼 분석 간섭부로 구성되는 것을 특징으로 한다.
펄스 레이저, 웨이퍼, 두께, 굴절률-
公开(公告)号：KR101079780B1
公开(公告)日：2011-11-03
申请号：KR1020100086011
申请日：2010-09-02
Applicant: 한국표준과학연구원
Abstract: PURPOSE: An apparatus for correcting micro particle image velocimetry is provided to improve the precision of correction by controlling the number of times that a rotational plate rotates and displaying an A-type uncertainty about the movement of the rotational plate and a B-type uncertainty about a distance between camera pixels. CONSTITUTION: A micro particle image velocimetry correcting apparatus(10) comprises a rotational plate(20), a frequency counter(40), a microscope(50), a micro-PIV(Particle Image Velocimetry)(60), and a PC(70). The rotational plate is rotated by a motor(30). A frequency counter measures the rotation speed of the motor. The microscope is arranged near the rotational plate. The Micro-PIV is arranged in the microscope. A PC receives a frequency counter signal and an image which is obtained in the micro-PIV and performs velocity correction.
Abstract translation: 目的：提供一种用于校正微粒图像测速的装置，通过控制旋转板旋转的次数和显示关于旋转板的运动的A型不确定度和B型不确定度来提高校正精度 相机像素之间的距离。 构成：微粒图像测速校正装置（10）包括旋转板（20），频率计数器（40），显微镜（50），微PIV（粒子图像测速仪）（60）和PC（ 70）。 旋转板由马达（30）旋转。 频率计数器测量电机的转速。 显微镜安置在旋转板附近。 Micro-PIV置于显微镜中。 PC接收频率计数器信号和在微PIV中获得的图像并执行速度校正。
-
公开(公告)号：KR1020110050979A
公开(公告)日：2011-05-17
申请号：KR1020090107607
申请日：2009-11-09
Applicant: 한국표준과학연구원
Abstract: PURPOSE: An apparatus for measuring three dimensional shape of a subject is provided to detect abnormality of a subject such as a semiconductor module by measuring the three dimensional shape of the subject without the movement of the subject and the camera. CONSTITUTION: An apparatus for measuring three dimensional shape of a subject comprises a camera(300). The camera photographs a subject(100) such as a semiconductor module. A defocus unit(1) is installed on the front side of the camera to defocus a subject image incident to the camera. The defocus unit changes the refractive index or focal distance of the light.
Abstract translation: 目的：提供一种用于测量被检体的三维形状的装置，以通过在被检体和照相机的移动的状态下测量被检体的三维形状来检测被检体（例如半导体模块）的异常。 构成：用于测量被检体的三维形状的装置包括照相机（300）。 相机拍摄诸如半导体模块的对象（100）。 散焦单元（1）安装在照相机的前侧以使入射到相机的被摄体图像散焦。 散焦单元改变光的折射率或焦距。
-
-
-
-
-
-
-
-
Search Results
67
records
(took 0.027 seconds)
