公开(公告)号：FI920735A0

公开(公告)日：1992-02-20

申请号：FI920735

申请日：1992-02-20

Applicant: BASF AG

Inventor： SCHWARTZ MANFRED ,  BAECHER REINHARD ,  DOTZAUER BERNHARD ,  WISTUBA ECKEHARDT ,  BOETTCHER ANDREAS

IPC: C08K5/13 ,  C04B41/46 ,  C04B41/48 ,  C04B41/62 ,  C04B41/63 ,  C08K5/00 ,  C08K5/10 ,  C08K5/109 ,  C08L25/00 ,  C08L25/14 ,  C08L33/04 ,  C08L33/06 ,  C09D7/12 ,  C09D133/04 ,  C09D133/06 ,  C08L

Abstract: The invention relates to an aqueous polymer dispersion which may optionally contain mineral additives and/or pigments and which essentially consists of a mixture of A) a 20% to 65% w/w aqueous dispersion of a copolymer of (a) an olefinically unsaturated compound containing one or more carboxyl groups and/or amide groups, and (b) at least two monomers selected from the group consisting of acrylates and methacrylates and vinylaromatic compounds, and B) from 0.1 to 5% w/w, based on the weight of the copolymer contained in component (A), of at least one aromatic ketone of the general formula (I) aryl radical and R1 stands for an aryl radical containing from 1 to 3 radicals of the formula -O-C(O)-O- attached to one or more oxaalkylene groups. Such polymer dispersions are suitable for the manufacture of paints and coating systems.

公开(公告)号：CA2007765A1

公开(公告)日：1990-07-25

申请号：CA2007765

申请日：1990-01-15

Applicant: SCHWALM REINHOLD ,  BASF AG

Inventor： SCHWALM REINHOLD ,  BOETTCHER ANDREAS

IPC: C08F8/00 ,  C08F20/10 ,  C08F20/38 ,  C08F20/52 ,  C08F28/00 ,  C08F30/08 ,  C08F212/14 ,  C08F220/10 ,  C08F220/38 ,  C08F220/58 ,  C08F228/02 ,  C08F230/08 ,  C08F246/00 ,  C08G59/00 ,  C08L63/00 ,  G03F7/038 ,  G03F7/039 ,  G03F7/075 ,  C08F214/16 ,  G03F7/029

Abstract: Disclosed are radiation-sensitive polymers which contain acid-labile groups and onium salt groups with nonnucleophilic counterions in one and the same molecule. These radiations sensitive polymers are highly suitable for use as photoresists and produce the desired resist profiles without additional measures or process steps. They are therefore very advantageously suitable for fabricating semiconductor components.

公开(公告)号：CA2005283A1

公开(公告)日：1990-06-30

申请号：CA2005283

申请日：1989-12-12

Applicant: BASF AG

Inventor： BOETTCHER ANDREAS ,  REHMER GERD

IPC: C07D335/16 ,  C07C68/00 ,  C07C68/02 ,  C07C68/06 ,  C07C69/96 ,  C07C225/22 ,  C07C231/12 ,  C07C233/09 ,  C07C255/56 ,  C07C323/22 ,  C07D295/10 ,  C07D295/104 ,  C08F2/46 ,  C08F2/48 ,  C08F2/50 ,  C08F20/10 ,  C08F20/26 ,  C08F20/34 ,  C08F20/36 ,  C08F20/38 ,  C08F20/52 ,  C08F20/54 ,  C08F20/58 ,  C08F20/60 ,  C08G65/331 ,  G03F7/027

Abstract: -42- Radiation-sensitive, ethylenically unsaturated compounds and a process for their preparation. The ethylenically unsaturated organic compounds axe of the general formula (see formula I) where R is alkyl, aryl or a radical R1 and R1 is a radical (see formula II) where R2 to R6 are each H, alkyl, OH, OAlkyl, SH, SAlkyl, halogen, N(Alkyl)2 or N(Alkyl)(Aryl) and at least one but not more than three of the radicals R2 to R6 is or are a radical (see formula III) (see formula IV) where X is alkylene, cycloalkylene, oxaalkylene or arylene, Y is H or CH3- and Z is O or NY. The novel radiation-sensitive ethylenically unsaturated compounds are suitable for the preparation of polymeric radiation-sensitive compounds.

公开(公告)号：FI895843A0

公开(公告)日：1989-12-07

申请号：FI895843

申请日：1989-12-07

Applicant: BASF AG

Inventor： REHMER GERD ,  BOETTCHER ANDREAS ,  AUCHTER GERHARD

IPC: C08F212/08 ,  C08F2/46 ,  C08F20/10 ,  C08F20/26 ,  C08F20/52 ,  C08F212/00 ,  C08F220/18 ,  C08F220/30 ,  C08F220/58 ,  C08F290/00 ,  C08F290/06 ,  C08F299/00 ,  C09D4/00 ,  C09D133/04 ,  C09J4/00 ,  C09J133/04 ,  C08L

Abstract: UV-crosslinkable materials based on (meth)acrylate copolymers contain copolymerized monomers of the general formula I (I) where R is a certain alkyl radical, an aryl radical or a radical R1 and R1 is a radical where R2 to R6 are each H, alkyl, a non-ortho OH group, OCH3, OC2H3, SH, SCH3, Cl, F, CN, COOH, COO(C1-C3-alkyl), CF3, N(CH3)2, N(C2H5)2, N(CH3)C6H5, +N(CH3)3X- or +N(CH3)XX-, where X- is an acid anion, and one or more of the radicals R2 to R6 are each a radical or or where Sp is one of the spacer groups of the following type and R', R'' and R''' are each H or a certain hydrocarbon, and where the radicals X may be identical or different and are each a divalent, alkylene radical, a cycloalkylene radical or phenylene radical, which are bonded directly to one another and/or are bonded to one another by identical or different groups Y, and Y is a divalent radical from the group consisting of and k and m are each from 1 to 10 and 1 and n are each from 0 to 25.

公开(公告)号：DK362488A

公开(公告)日：1989-02-20

申请号：DK362488

申请日：1988-06-30

Applicant: BASF AG

Inventor： SCHWALM REINHOLD ,  BOETTCHER ANDREAS ,  BINDER HORST

IPC: G03C1/72 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03C1/495

Abstract: A radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation. The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.

公开(公告)号：AU1861388A

公开(公告)日：1989-01-05

申请号：AU1861388

申请日：1988-07-01

Applicant: BASF AG

Inventor： SCHWALM REINHOLD ,  BOETTCHER ANDREAS

IPC: C07D333/46 ,  C07C67/00 ,  C07C69/96 ,  C07C325/00 ,  C07C381/12 ,  C07F7/08 ,  C07F7/18 ,  C08F2/50 ,  C08F4/00 ,  C09D7/12 ,  G03F7/004 ,  G03F7/029 ,  G03F7/031 ,  G03F7/26 ,  C07C149/46

Abstract: Sulphonium salts of the formula … … in which R , R and R are identical to or different from one another and represent aliphatic and/or aromatic radicals which may contain heteroatoms, or two of the radicals R to R are linked to one another to form a ring, with the proviso that at least one of the radicals R to R contains at least one grouping cleavable by acid or one of the radicals R to R is linked to one or more further sulphonium salt radicals, if desired via groupings cleavable by acid, and X denotes a non-nucleophilic counterion… are suitable as photoinitiators for cationic polymerisation.

公开(公告)号：PT1280788E

公开(公告)日：2005-02-28

申请号：PT01931684

申请日：2001-05-03

Applicant: BASF AG

Inventor： BURST WOLFRAM ,  BOETTCHER ANDREAS

IPC: A61K31/375 ,  A61P3/02 ,  C07B61/00 ,  C07D307/62

Abstract: The invention relates to a process for the preparation of L-ascorbic acid, in which free 2-keto-L-gulonic acid or C3-C10-alkyl 2-keto-L-gulonate is lactonized under acidic conditions in the presence of a water-miscible solvent and where this solvent in situ forms a solvent in which the ascorbic acid formed is poorly soluble.

公开(公告)号：DE50103770D1

公开(公告)日：2004-10-28

申请号：DE50103770

申请日：2001-05-03

Applicant: BASF AG

Inventor： BOETTCHER ANDREAS ,  BURST WOLFRAM

IPC: A61K31/375 ,  A61P3/02 ,  C07B61/00 ,  C07D307/62

Abstract: The invention relates to a process for the preparation of L-ascorbic acid, in which free 2-keto-L-gulonic acid or C3-C10-alkyl 2-keto-L-gulonate is lactonized under acidic conditions in the presence of a water-miscible solvent and where this solvent in situ forms a solvent in which the ascorbic acid formed is poorly soluble.

公开(公告)号：DK1280788T3

公开(公告)日：2004-10-18

申请号：DK01931684

申请日：2001-05-03

Applicant: BASF AG

Inventor： BOETTCHER ANDREAS ,  BURST WOLFRAM

IPC: A61K31/375 ,  A61P3/02 ,  C07B61/00 ,  C07D307/62

Abstract: The invention relates to a process for the preparation of L-ascorbic acid, in which free 2-keto-L-gulonic acid or C3-C10-alkyl 2-keto-L-gulonate is lactonized under acidic conditions in the presence of a water-miscible solvent and where this solvent in situ forms a solvent in which the ascorbic acid formed is poorly soluble.

公开(公告)号：DE19954511A1

公开(公告)日：2001-05-17

申请号：DE19954511

申请日：1999-11-12

Applicant: BASF AG

Inventor： BURST WOLFRAM ,  KAIBEL GERD ,  BOETTCHER ANDREAS ,  KESSLER VERONIQUE ,  KUNTZE THOMAS

IPC: B01D3/32 ,  C07B61/00 ,  C07D307/62

Abstract: Continuous production of alkali metal L-ascorbates (I) comprises: a ) esterifying 2-keto-L-gulonic acid or diacetone 2-keto-L-gulonic acid with a C1-C10 alcohol in the presence of an acid catalyst; and (b) rearranging the resulting ester in the presence of an alkali metal C1-C10 alkoxide.