31.
    发明专利
    未知

    公开(公告)号:DE19917906A1

    公开(公告)日:2000-10-26

    申请号:DE19917906

    申请日:1999-04-20

    Applicant: BASF AG

    Abstract: Amino-substituted hydroxybenzophenones (I) are used as photostable UV filters in cosmetic and pharmaceutical compositions for protecting human skin or hair against solar radiation, optionally in combination with other UV absorbers. Amino-substituted hydroxybenzophenones of formula (I) are used as photostable UV filters in cosmetic and pharmaceutical compositions for protecting human skin or hair against solar radiation, optionally in combination with other UV absorbers. [Image] R1>, R2>H, 1-20C alkyl, 2-10C alkenyl, 3-10C cycloalkyl or 3-10C cycloalkenyl, or NR1>R2> is a 5- or 6-membered ring; R3>, R4>1-20C alkyl, 2-10C alkenyl, 3-10C cycloalkyl, 3-10C cycloalkenyl, 1-12C alkoxy, 1-20C alkoxycarbonyl, 1-12C alkylamino, 1-12C dialkylamino, aryl, heteroaryl, nitrile, carboxylate, sulfonate or ammonium; X : H, COOR5> or CONR6>R7>; R5>-R7>H, 1-20C alkyl, 2-10C alkenyl, 3-10C cycloalkyl, 3-10C cycloalkenyl, (YO)oZ or aryl; Y : (CH2)x or CH(Me)CH2; x : 2-4; Z : Et, n-Pr, n-Bu or i-Pr; m : 0-3; n : 0-4; o : 1-20. Independent claims are also included for: (1) use of (I) as UV stabilizers in cosmetic and pharmaceutical compositions; (2) cosmetic and pharmaceutical compositions for protecting human skin or hair against UV light of wavelength 280-400 nm, comprising compounds (I) in a carrier, optionally in combination with other UV absorbers.

    33.
    发明专利
    未知

    公开(公告)号:DE19857127A1

    公开(公告)日:2000-06-15

    申请号:DE19857127

    申请日:1998-12-11

    Applicant: BASF AG

    Abstract: New oligomeric 4,4-diarylbutadiene carboxylic acid ester or amide sunscreen compounds. Oligomeric 4,4-diarylbutadiene carboxylic acid esters or amides of formula (I) are new. R1, R2 = H; aliphatic-, cycloaliphatic-, aromatic- or araliphatic- group; or carboxylate, sulfonate or ammonium; R3 = aliphatic, cycloaliphatic, aromatic, araliphatic or heterocyclic group; carbonyl, sulfonyl, phosphonyl, carboxylic acid ester or CN; Y = O or N(R4); R4 = H or aliphatic-, cycloaliphatic-, aromatic-,araliphatic or heterocyclic group; m = 2-10; n = 1-3 X = the residue of a polyol with 2-10 OH groups (corresponding to m). Am Independent claim is included for preparation of (I).

    Preparing alkyl ester of (meth)acrylic acid comprises supplying (meth)acrylic acid, alkanol and catalyst to reaction zone, adding discharged mixture to rectification unit, supplying a partial flow of sump stream and isolating streams

    公开(公告)号:DE102005010587A1

    公开(公告)日:2006-06-08

    申请号:DE102005010587

    申请日:2005-03-08

    Applicant: BASF AG

    Abstract: Continuous preparation of alkyl ester of (meth)acrylic acid (A) comprises supplying (meth)acrylic acid, 1-5C alkanol and acid esterifying catalyst (a) to a reaction zone (5,6); adding the discharged reaction mixture to a rectification unit (I); isolating the alkyl ester of (meth)acrylic acid containing in main stream (23) and a sump stream (22); supplying a partial flow of the sump stream; and isolating the separated sump stream (40). Continuous preparation of alkyl ester of (meth)acrylic acid (A) comprises reacting (meth)acrylic acid and 1-5C alkanol in homogeneous, liquid, solvent-free phase with increased temperature and in presence of a acid esterifying catalyst, where (meth)acrylic acid, alkanol and acid esterified catalyst are supplied to a reaction zone (5,6) (that water formed during a retention time are separated rectificative as a component of a alkanol comprising mixture in one of the reaction zone mounted rectification unit (III), in which obtained distillate is isolated in a alkanol containing organic and a water containing aqueous phase, the organic phase is led back into (III) and the aqueous phase is removed, and a reaction mixture (21) is discharged from the reaction zone); initiating the mixture into a rectification unit (I) and the alkyl ester of (meth)acrylic acid containing in main stream (23) and a sump stream (22) are isolated under addition of water; supplying a partial flow of the sump stream (22) from (I) of a residue column unit (IV) comprising a column boiler (61) and recycling into a main stream (29) in (I) and isolating the separated sump stream (40); where (IV) comprises a rectification column (62) in addition to the column boiler, and the ascending vapors from the column boiler are initiated into the rectification column, and resulting liquid at the lowest stage of the rectifying column is led into the column boiler, where the rectification column is operated in a manner, such that the water content of the resulting liquid at the lowest stage is smaller than 0.1 wt.%.

    35.
    发明专利
    未知

    公开(公告)号:PT1046391E

    公开(公告)日:2005-01-31

    申请号:PT00105806

    申请日:2000-03-18

    Applicant: BASF AG

    Abstract: Amino-substituted hydroxybenzophenones (I) are used as photostable UV filters in cosmetic and pharmaceutical compositions for protecting human skin or hair against solar radiation, optionally in combination with other UV absorbers. Amino-substituted hydroxybenzophenones of formula (I) are used as photostable UV filters in cosmetic and pharmaceutical compositions for protecting human skin or hair against solar radiation, optionally in combination with other UV absorbers. [Image] R1>, R2>H, 1-20C alkyl, 2-10C alkenyl, 3-10C cycloalkyl or 3-10C cycloalkenyl, or NR1>R2> is a 5- or 6-membered ring; R3>, R4>1-20C alkyl, 2-10C alkenyl, 3-10C cycloalkyl, 3-10C cycloalkenyl, 1-12C alkoxy, 1-20C alkoxycarbonyl, 1-12C alkylamino, 1-12C dialkylamino, aryl, heteroaryl, nitrile, carboxylate, sulfonate or ammonium; X : H, COOR5> or CONR6>R7>; R5>-R7>H, 1-20C alkyl, 2-10C alkenyl, 3-10C cycloalkyl, 3-10C cycloalkenyl, (YO)oZ or aryl; Y : (CH2)x or CH(Me)CH2; x : 2-4; Z : Et, n-Pr, n-Bu or i-Pr; m : 0-3; n : 0-4; o : 1-20. Independent claims are also included for: (1) use of (I) as UV stabilizers in cosmetic and pharmaceutical compositions; (2) cosmetic and pharmaceutical compositions for protecting human skin or hair against UV light of wavelength 280-400 nm, comprising compounds (I) in a carrier, optionally in combination with other UV absorbers.

    Use of cyclic enamines as light protection agents

    公开(公告)号:AU778388B2

    公开(公告)日:2004-12-02

    申请号:AU4089900

    申请日:2000-06-16

    Applicant: BASF AG

    Abstract: Use of new and known bicyclic and tricyclic enamines as UV filters in cosmetic and pharmaceutical preparations is new. Also new is their use for the protection of plastics. Use of bicyclic and tricyclic enamines as UV filters in cosmetic and pharmaceutical preparations is new. R and R = CN; alkylcarbonyl; alkoxycarbonyl; aryloxycarbonyl; or optionally substituted aminocarbonyl; R = H; 1-20C alkyl; 3-20C cycloalkyl; or -CH2-CH2-SO3 M ; M = cation; X = -O-; -S-; or -N(R )-; Z' = group of formula (ii) or (iii): R = H; alkyl, cycloalkyl, alkoxy, cycloalkoxy, alkoxycarbonyl, alkyl-NH-CO-, (alkyl)2-NH-CO-, alkyl-NH- or (alkyl)2N- (each with up to 20C); CN; NH2; or SO3 M and more than 1 R can be present. Independent claims are also included for: (1) the use of compounds (I) as light screening agents for the protection of plastics; (2) (I; Z' = (iii); and (3) (I; Z' = (ii); R4 = R40; R1, R2 = R10, R20 respectively) R and R = CN or 2-10C alkoxycarbonyl optionally substituted with -(CH2)n-SO3 M ; R = H; CH3; or -(CH2)n-SO3 M ; R = H; 1-8C alkyl; 1-8C alkoxy; or -SO3 M ; n = 2 or 3; M = H or HN(R )(R )(R ) ; R -R = H lower alkyl optionally substituted with OH; or a metal cation; but at least one -(CH2)n-SO3 M or -SO3 M must be present.

    Use of sunscreen combinations comprising, as essential constituent, amino-substituted hydroxybenzophenones as photostable UV filters in cosmetic and pharmaceutical preparations

    公开(公告)号:AU2800301A

    公开(公告)日:2001-09-20

    申请号:AU2800301

    申请日:2001-03-14

    Applicant: BASF AG

    Abstract: A photostable ultraviolet (UV) filter for protecting human skin or hair against sunlight contains as UV-A absorbing components a combination of a hydroxybenzophenone (I), optionally together with a 4,4-diaryl-butadiene (II); and other UV protectant(s) i.e. dibenzoylmethane, triazine, benzotriazole, benzimidazole, tetrahydroxybenzophenone and/or organosiloxane-benzal malonate derivatives. Use of a light-protectant combination of a UV-A absorber and further UV-A and/or UV-B absorbers is claimed as a photostable UV-filter in cosmetic or pharmaceutical preparations for protecting human skin or hair against sunlight, optionally used together with other conventional light protectants. First UV light absorber is a hydroxybenzophenone of formula (I), optionally together with a 4,4-diaryl-butadiene of formula (II); and other UV protectants including 4-(R6)-4'-(R7)-dibenzoylmethane, 1,3,5-triazine derivatives of formula (III), 2,4,6-triphenyl-1,3,5-triazines, in which the phenyl rings are bonded with at least one o-hydroxy group and at least one p-(1-20C) alkoxy group, 2,2'-dihydroxy-3,3'-bis-(1,2,3-benzotriazol-2-yl)-5,5'-bis-(1,1,3,3-te tramethylbutyl)-diphenylmethane, 1,4-bis-(5,6-disulfo-benzimidazol-2-yl)-benzene or its salts, 2-(2-hydroxy-3-(2-methyl-4,4-bis-(trimethylsilyloxy)-4-silapentyl)-5-m ethyl)-1,2,3-benzotriazole, 2,2',4,4'-tetrahydroxybenzophenone and/or siloxanes of formula (IV). R1, R2 = H, 1-20C alkyl, 3-10C cycloalkyl or 3-10C cycloalkenyl; or NR1R2 = 5-6 membered ring; R3 = 1-20C alkyl; R4, R5 = H, 1-20C alkyl, 3-10C cycloalkyl or 3-10C cycloalkenyl; R6 = 1-12C alkyl; R7 = H, 1-12C alkyl or 1-12C alkoxy; R8-R10 = optionally substituted 1-20C alkyl, 5-10C aryl, 5-10C heteroaryl or -Sp-Sil; Sp = spacer; Sil = silane, oligosilane or polysiloxane residue; X = O or NR11; R11 = H or optionally substituted 1-20C alkyl, 5-10C aryl, 5-10C heteroaryl; V = 3-(4-(2,2-bis-(ethoxycarbonyl)-vinyl)-phenoxy)-prop-1-en-1-yl or 3-(4-(2,2-bis-(ethoxycarbonyl)-vinyl)-phenoxy)-prop-1-en-2-yl; V' = V or Me; t = up to 100; u = up to 20; provided that u = 0 if V' = V or u = 1-20 if V' = Me. An Independent claim is also included for cosmetic or pharmaceutical preparations for protecting human epidermis or hair against UV light in the 280-400 nm range, comprising the UV absorbing combination, a carrier and optionally other conventional light protectants.

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