31.
    发明专利
    未知

    公开(公告)号:DE58904478D1

    公开(公告)日:1993-07-01

    申请号:DE58904478

    申请日:1989-09-23

    Applicant: BASF AG

    Abstract: The invention relates to radiation-sensitive mixtures of certain precursors and carbonyl compounds which contain aromatic radicals and, in the UV-excited state, are capable of hydrogen abstraction, which mixtures experience a solubility differentiation on irradiation with actinic light and are suitable for the preparation of polyimides, polyisoindoloquinazolinediones, polyoxazinediones, polyquinazolinediones or polyquinazolones. They are suitable for the production of insulating layers and printed circuit boards.

    33.
    发明专利
    未知

    公开(公告)号:DE3833437A1

    公开(公告)日:1990-04-05

    申请号:DE3833437

    申请日:1988-10-01

    Applicant: BASF AG

    Abstract: The invention relates to radiation-sensitive mixtures of certain precursors and carbonyl compounds which contain aromatic radicals and, in the UV-excited state, are capable of hydrogen abstraction, which mixtures experience a solubility differentiation on irradiation with actinic light and are suitable for the preparation of polyimides, polyisoindoloquinazolinediones, polyoxazinediones, polyquinazolinediones or polyquinazolones. They are suitable for the production of insulating layers and printed circuit boards.

    35.
    发明专利
    未知

    公开(公告)号:DE3712015A1

    公开(公告)日:1988-10-27

    申请号:DE3712015

    申请日:1987-04-09

    Applicant: BASF AG

    Abstract: Nonaqueous polymer dispersions are obtainable by polymerization of esters (A) of acrylic acid and/or methacrylic acid and/or ethylacrylic acid with C1-C20-alcohols in an organic solvent or a mixture of organic solvents in which the polymers formed are insoluble, and in the presence of copolymers (B) having a molecular weight of from 500 to 20,000 and obtainable by bulk or solution polymerization of monoolefinically unsaturated monomers at from 180 DEG to 400 DEG C. and from 1 to 200 bar, and the said dispersions are used for the production of finishes, coating materials and adhesives.

    Continuous production of homogeneous fluid mixtures in widely applicable reactor-mixer

    公开(公告)号:DE19751762A1

    公开(公告)日:1999-05-27

    申请号:DE19751762

    申请日:1997-11-21

    Applicant: BASF AG

    Abstract: A tubular reactor (5) has one or more throttling restrictions, which automatically offer increased reaction cross section, as the volumetric flow rate increases. An Independent claim is included for the reactor/mixer carrying out the procedure. It includes a series of coincident openings rotated relatively and automatically, to achieve flow-dependent throttling action. Preferred Features: Volumetric flow rate of a first mixture component varies by a factor of \! 10, especially by \! 5. The viscosity difference between at least two mixture components prior to mixing exceeds 100 mPas, especially exceeding 1000 mPas. Volumetric flow rate ratio between first and further components is 1000 : 1, preferably 100 : 1; it especially lies in the range 5 : 1 to 1:1. The first liquid is a homogeneous or non-homogeneous liquid. It is especially a dispersion, preferably of a polymer. Further component(s) are homogeneous or non-homogenous fluids and/or solids and/or gases. The components react chemically.

    38.
    发明专利
    未知

    公开(公告)号:DE59108388D1

    公开(公告)日:1997-01-16

    申请号:DE59108388

    申请日:1991-05-14

    Applicant: BASF AG

    Abstract: Synthetic resins are obtainable by chemically bonding one or more compounds of the general formula I (* CHEMICAL STRUCTURE *) (I) where R1 is -OH, -NH2, (* CHEMICAL STRUCTURE *) -NHR3 or (* CHEMICAL STRUCTURE *) R2 is -H, -CH3 or -C2H5, R3 is -CmH2m+1, where m is from 1 to 6, R4 is -H or -CH3 and n is from 1 to 12, via the oxygen or nitrogen atom of R1 to one or more polymers A which consist of a) from 50 to 100% by weight of one or more esters of acrylic or methacrylic acid with monohydric alcohols of 1 to 18 carbon atoms or a mixture of these esters (monomers a) and b) from 0 to 50% by weight of other copolymerizable monomers (monomers b) in polymerized form, in amounts such that the synthetic resin contains from 0.01 to 1 mole of double bonds per kg of polymer A. After exposure to ultraviolet light or to electrons, these synthetic resins are suitable as contact adhesives.

    39.
    发明专利
    未知

    公开(公告)号:DE59104198D1

    公开(公告)日:1995-02-23

    申请号:DE59104198

    申请日:1991-05-10

    Applicant: BASF AG

    Abstract: Aqueous synthetic resin formulations containing A) from 3 to 75% by weight of one or more synthetic resins, B) one or more organic compounds having two or more hydrazide groups, C) from 0 to 10% by weight, based on the synthetic resin A, of benzophenone or acetophenone or of one or more acetophenone or benzophenone derivatives which are not monoethylenically unsaturated or of a mixture of these active ingredients, D) effective amounts of emulsifiers or protective colloids or of a mixture of these active ingredients, E) not less than 5% by weight of water and F) from 0 to 85% by weight of finely divided fillers, with the proviso that the total amount of the monomers d polymerized in the one or more synthetic resins A and of component C is from 0.05 to 10% by weight, based on the one or more synthetic resins A, and the ratio of the number of moles of hydrazide groups of component B and the number of moles of the aldehyde and keto groups of the monomers c polymerized in the one or more synthetic resins A is from 0.01 to 2. These synthetic resin formulations are suitable for coating, adhesive bonding, sealing or impregnating.

    40.
    发明专利
    未知

    公开(公告)号:DE59102431D1

    公开(公告)日:1994-09-08

    申请号:DE59102431

    申请日:1991-11-08

    Applicant: BASF AG

    Abstract: Unsaturated phenone derivatives of the general formula I I where R1 is C1-C4-alkyl, cyclopropyl, cyclopentyl, cyclohexyl, indanonyl, tetralonyl, phenyl or phenyl in which some or all of the hydrogen atoms have been replaced by a C1-C4-alkyl, C1-C4-alkoxy or C1-C4-thioalkyl group, or together with R2 or R6 forms an ethylene or propylene bridge, R2 to R6 are each hydrogen, C1-C4-alkyl, C1-C4-alkoxy or C1-C4-thioalkyl, and R3, R4 and R5 may each additionally be hydroxyl, R2 or R6 may additionally together with R1 form an ethylene or propylene bridge and one or more, but not more than three, of the radicals R2 to R6 are a group of the general formula II II or III III where K is C1-C10-alkylene which may contain 1 or 2 oxygen or sulfur atoms, Y is straight-chain or branched C1-C10-alkylene or is C1-C10-alkylene which is substituted by carboxyl, a carboxylate anion, an alkyl C1-C4-carboxylate group or hydroxyl, X is -NH- or -(N-Alkyl)- of 1 to 4 carbon atoms and Z is hydrogen or C1-C4-alkyl.

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