NEGATIVE PROCESS FOR OBTAINING RELIEF OR RESIST PATTERNS

    公开(公告)号:DE3369403D1

    公开(公告)日:1987-02-26

    申请号:DE3369403

    申请日:1983-08-04

    Applicant: BASF AG

    Abstract: Relief images or resist images are produced by a negative-working process, using a photosensitive resist layer which is applied on a base and contains a compound possessing two or more aromatic and/or heteroaromatic o-nitrocarbinol ester groups as well as a crosslinking compound possessing two or more reactive groups which are capable, under the action of heat, of reacting with carboxyl groups to form a covalent chemical bond. To produce the relief images or resist images, the photosensitive resist layer is first exposed imagewise to actinic light, the exposed areas of this layer are subjected to selective thermal hardening and crosslinking and the resist layer is then post-exposed uniformly to actinic light and finally washed out with an aqueous developer.

    33.
    发明专利
    未知

    公开(公告)号:DE3231144A1

    公开(公告)日:1984-02-23

    申请号:DE3231144

    申请日:1982-08-21

    Applicant: BASF AG

    Abstract: Gravure printing plates comprising a plastic printing layer applied on a printing plate base are produced by a method wherein a solid photosensitive layer (L) firmly bonded on the printing plate base is exposed imagewise to actinic light, and the exposed layer is washed out with a developer and then subjected to thermal hardening to form the plastic printing layer. In this process, the photosensitive layer (L) employed contains, as the photosensitive component, a compound possessing two or more aromatic and/or heteroaromatic o-nitrocarbinol ester groups, and a compound which effects crosslinking and possesses two or more reactive groups which are capable of reacting with -COOH groups under the action of heat to form a covalent chemical bond. After imagewise exposure, the layer is either washed out with an aqueous developer, post-exposed uniformly to actinic light and then subjected to thermal hardening and crosslinking, or subjected to selective thermal hardening and crosslinking in the exposed areas and then washed out with a developer.

    Impact-resistant polymer moulding compositions, process for their preparation and their use

    公开(公告)号:DE3802753A1

    公开(公告)日:1989-08-10

    申请号:DE3802753

    申请日:1988-01-30

    Applicant: BASF AG

    Abstract: The invention relates to impact-resistant polymer moulding compositions based on (A) polyoxymethylenes, (B) thermoplastic polyurethanes and (C) polyalkylene terephthalates and optionally (D) additives, which expediently comprise from 95 to 40 parts by weight of at least one polyoxymethylene homopolymer and/or copolymer (A), from 5 to 60 parts by weight of a mixture of from 60 to 98% by weight of at least one thermoplastic polyurethane (B) and from 2 to 40% by weight of at least one polyalkylene terephthalate (C), where the percentages by weight are based on the total weight of (B) and (C) and the parts by weight of (A) + (B) + (C) add up to 100 parts by weight and from 0 to 60 parts by weight of an additive (D), to a process for their preparation and to their use. In order to prepare the polymer moulding compositions, by the preferred method, components (A) to (C) and, if used, (D) are introduced individually or as mixtures, into an extruder and melted together at temperatures in the range from 150 to 260@C. The polymer moulding compositions are suitable for the production of films, sheeting or mouldings which are used, for example, in the vehicle, electrical appliance and electrical industries.

    PROCESS FOR THE MANUFACTURE OF PLATES FOR INTAGLIO PRINTING USING PLASTIC PRINTING FOILS

    公开(公告)号:DE3367685D1

    公开(公告)日:1987-01-02

    申请号:DE3367685

    申请日:1983-08-04

    Applicant: BASF AG

    Abstract: Gravure printing plates comprising a plastic printing layer applied on a printing plate base are produced by a method wherein a solid photosensitive layer (L) firmly bonded on the printing plate base is exposed imagewise to actinic light, and the exposed layer is washed out with a developer and then subjected to thermal hardening to form the plastic printing layer. In this process, the photosensitive layer (L) employed contains, as the photosensitive component, a compound possessing two or more aromatic and/or heteroaromatic o-nitrocarbinol ester groups, and a compound which effects crosslinking and possesses two or more reactive groups which are capable of reacting with -COOH groups under the action of heat to form a covalent chemical bond. After imagewise exposure, the layer is either washed out with an aqueous developer, post-exposed uniformly to actinic light and then subjected to thermal hardening and crosslinking, or subjected to selective thermal hardening and crosslinking in the exposed areas and then washed out with a developer.

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