公开(公告)号：DE3271538D1

公开(公告)日：1986-07-10

申请号：DE3271538

申请日：1982-07-15

Applicant: BASF AG

Inventor： BARZYNSKI HELMUT DR ,  ECKELL ALBRECHT DR ,  ELZER ALBERT DR ,  KLINSMANN UWE DR ,  LEYRER REINHOLD J DR ,  SANNER AXEL DR

IPC: G03F7/032 ,  C08F8/32 ,  C08F220/34 ,  C08F220/60 ,  C08L33/14 ,  C08L33/24 ,  G03C1/76 ,  G03F7/033 ,  G03F7/26 ,  H05K3/00 ,  H05K3/06 ,  G03C1/68 ,  G03C1/70 ,  G03C1/90 ,  G03F7/10

Abstract: Photopolymerizable recording materials which are suitable for the production of photoresist layers, and contain one or more thermoplastic vinyl polymers as the binder, one or more low molecular weight, ethylenically unsaturated, photopolymerizable compounds and one or more photoinitiators, with or without other, conventional additives and/or assistants, have excellent adhesion to metallic substrate surfaces if the binder employed is a vinyl polymer which possesses amino and/or imino groups.

公开(公告)号：DE3369403D1

公开(公告)日：1987-02-26

申请号：DE3369403

申请日：1983-08-04

Applicant: BASF AG

Inventor： KLINSMANN UWE DR ,  LEYRER REINHOLD J DR ,  SAENGER DIETRICH DR

IPC: G03F7/038 ,  G03F7/004 ,  G03F7/039 ,  G03F7/20 ,  G03F7/26 ,  G03F7/38 ,  G03F7/10

Abstract: Relief images or resist images are produced by a negative-working process, using a photosensitive resist layer which is applied on a base and contains a compound possessing two or more aromatic and/or heteroaromatic o-nitrocarbinol ester groups as well as a crosslinking compound possessing two or more reactive groups which are capable, under the action of heat, of reacting with carboxyl groups to form a covalent chemical bond. To produce the relief images or resist images, the photosensitive resist layer is first exposed imagewise to actinic light, the exposed areas of this layer are subjected to selective thermal hardening and crosslinking and the resist layer is then post-exposed uniformly to actinic light and finally washed out with an aqueous developer.

公开(公告)号：AT20286T

公开(公告)日：1986-06-15

申请号：AT82106331

申请日：1982-07-15

Applicant: BASF AG

Inventor： BARZYNSKI HELMUT DR ,  ECKELL ALBRECHT DR ,  ELZER ALBERT DR ,  KLINSMANN UWE DR ,  LEYRER REINHOLD J DR ,  SANNER AXEL DR

IPC: G03F7/032 ,  C08F8/32 ,  C08F220/34 ,  C08F220/60 ,  C08L33/14 ,  C08L33/24 ,  G03C1/76 ,  G03F7/033 ,  G03F7/26 ,  H05K3/00 ,  H05K3/06 ,  G03C1/68 ,  G03C1/70 ,  G03C1/90 ,  G03F7/10

公开(公告)号：DE3712071A1

公开(公告)日：1988-10-20

申请号：DE3712071

申请日：1987-04-09

Applicant: BASF AG

Inventor： ECKLE ALBRECHT ,  KLINSMANN UWE DR

IPC: G03C1/76 ,  G03F1/00 ,  G03F1/54 ,  G03F7/09 ,  H01L21/027 ,  H05K3/00 ,  G03C1/78 ,  H05K3/46

公开(公告)号：DE3539690A1

公开(公告)日：1987-05-14

申请号：DE3539690

申请日：1985-11-08

Applicant: BASF AG

Inventor： ECKLE ALBRECHT ,  JAEKEL BERND ,  KLINSMANN UWE DR ,  BRITSCH HELMUT

IPC: G03F9/00 ,  G03B27/06 ,  G03F7/20 ,  H05K3/00 ,  G03B27/02 ,  G03B27/20 ,  H05K3/06

公开(公告)号：DE3231145A1

公开(公告)日：1984-02-23

申请号：DE3231145

申请日：1982-08-21

Applicant: BASF AG

Inventor： LEYRER REINHOLD J DR ,  SAENGER DIETRICH DR ,  KLINSMANN UWE DR

IPC: G03F7/038 ,  G03F7/004 ,  G03F7/039 ,  G03F7/20 ,  G03F7/26 ,  G03F7/38 ,  G03F7/10 ,  G03C1/71

Abstract: Relief images or resist images are produced by a negative-working process, using a photosensitive resist layer which is applied on a base and contains a compound possessing two or more aromatic and/or heteroaromatic o-nitrocarbinol ester groups as well as a crosslinking compound possessing two or more reactive groups which are capable, under the action of heat, of reacting with carboxyl groups to form a covalent chemical bond. To produce the relief images or resist images, the photosensitive resist layer is first exposed imagewise to actinic light, the exposed areas of this layer are subjected to selective thermal hardening and crosslinking and the resist layer is then post-exposed uniformly to actinic light and finally washed out with an aqueous developer.