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31.A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING INORGANIC PARTICLES AND POLYMER PARTICLES 有权
Title translation: 无机刚性粒子和聚合物颗粒化学机械抛光组合公开(公告)号:EP2499210A4
公开(公告)日:2015-04-29
申请号:EP10829604
申请日:2010-11-10
Applicant: BASF SE
Inventor: LAUTER MICHAEL , RAMAN VIJAY IMMANUEL , LI YUZHUO , VENKATARAMAN SHYAM SUNDAR , SHEN DANIEL KWO-HUNG
CPC classification number: C09G1/02 , C09K3/1409 , C09K3/1463 , H01L21/31053
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32.A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A GLYCOSIDE 有权
Title translation: CMP组合苷公开(公告)号:EP2753670A4
公开(公告)日:2015-02-25
申请号:EP12830462
申请日:2012-09-04
Applicant: BASF SE
Inventor: LI YUZHUO , LAUTER MICHAEL , LANGE ROLAND , GAO NING
IPC: C09G1/02
CPC classification number: C09G1/02 , C09G1/00 , C09K13/00 , C23F1/00 , H01L21/30625 , H01L21/31053
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