WAVEGUIDE FORMING METHODS AND WAVEGUIDES FABRICATED THEREFROM

    公开(公告)号:CA2538699A1

    公开(公告)日:2005-05-06

    申请号:CA2538699

    申请日:2004-08-05

    Applicant: GEN ELECTRIC

    Abstract: A waveguide (116) fabrication method includes depositing a photodefinable copolymer material (14) comprising methyl methacrylate, tetrafluoropropyl methacrylate, and an epoxy monomer; fixing optical elements (10, 12) relativ e to the copolymer material; sending light through at least one of the optical elements and copolymer material towards the other; volatilizing uncured monomer. Another waveguide (116) fabrication method includes: fixing optical elements (110, 112) relative to each other, each having an optical surface (11, 13); providing a copolymer blob (114) over the optical surfaces with sufficient surface tension to result in the copolymer blob having a curved surface (15); sending light through each of the optical elements towards the curved surface and the other; volatilizing uncured monomer. An optical path fabrication method comprises: fixing optical elements (70, 76) relative to each other, each having an optical surface (71, 77); translating and rotatin g a minor (78) until aligned to optimally direct light from one of the optical elements to the other; securing the aligned minor in position.

    System zum Überwachen einer relativen Verschiebung von Komponenten

    公开(公告)号:DE102011001663B4

    公开(公告)日:2021-07-22

    申请号:DE102011001663

    申请日:2011-03-30

    Applicant: GEN ELECTRIC

    Abstract: System (100) zum Überwachen einer relativen Verschiebung (124) eines Paares von Wickelkopfkomponenten (102, 104), wobei das Verfahren (100) aufweist:eine an dem Paar der Wickelkopfkomponenten (102, 104) befestigte Struktur (110);ein Faser-Bragg-Gitter (116), das auf einer nicht-gekrümmten Oberfläche (126) der Struktur (110) befestigt ist, wobei das Faser-Bragg-Gitter (116) dafür konfiguriert ist, einfallende Strahlung zu reflektieren, wobei die reflektierte Strahlung eine Spitzenintensität bei einer entsprechenden Wellenlänge auf der Basis einer Dehnung (122) des Faser-Bragg-Gitters (116) hat, wobei sich die Dehnung (122) des Faser-Bragg-Gitters (116) aus einer Dehnung der Struktur (110) aufgrund der relativen Verschiebung (124) des Paares der Wickelkopfkomponenten (102) ergibt;wobei die Struktur (110) so konfiguriert ist, dass die von der Struktur (110) erzeugte Dehnung eine Größe der Dehnung (122) des Faser-Bragg-Gitters (116) in einem vorbestimmten Bereich über einer Spanne der relativen Verschiebung (124) des Paares der Wickelkopfkomponenten (102) begrenzt.

    Arc flash detection system
    34.
    发明专利

    公开(公告)号:GB2483198B

    公开(公告)日:2014-08-27

    申请号:GB201121267

    申请日:2010-06-10

    Applicant: GEN ELECTRIC

    Abstract: An apparatus to detect arc is presented. The apparatus includes a fiber sensor to detect characteristics of an arc flash and a processor to process at least two characteristics of the arc flash. The processor is further configured to generate an arc fault signal. A protective device is configured to mitigate the arc flash based on the arc fault signal.

    Waveguide forming methods and waveguides fabricated therefrom

    公开(公告)号:AU2004283172A1

    公开(公告)日:2005-05-06

    申请号:AU2004283172

    申请日:2004-08-05

    Applicant: GEN ELECTRIC

    Abstract: A waveguide (116) fabrication method includes depositing a photodefinable copolymer material (14) comprising methyl methacrylate, tetrafluoropropyl methacrylate, and an epoxy monomer; fixing optical elements (10, 12) relative to the copolymer material; sending light through at least one of the optical elements and copolymer material towards the other; volatilizing uncured monomer. Another waveguide (116) fabrication method includes: fixing optical elements (110, 112) relative to each other, each having an optical surface (11, 13); providing a copolymer blob (114) over the optical surfaces with sufficient surface tension to result in the copolymer blob having a curved surface (15); sending light through each of the optical elements towards the curved surface and the other; volatilizing uncured monomer. An optical path fabrication method comprises: fixing optical elements (70, 76) relative to each other, each having an optical surface (71, 77); translating and rotating a mirror (78) until aligned to optimally direct light from one of the optical elements to the other; securing the aligned mirror in position.

    38.
    发明专利
    未知

    公开(公告)号:DE69429047T2

    公开(公告)日:2002-08-22

    申请号:DE69429047

    申请日:1994-08-19

    Applicant: GEN ELECTRIC

    Abstract: A process for repairing an electronic array wafer assembly having a short circuit between two non-insulative layers (116,113a,113b) separated by a dielectric layer (114) includes the step of selectively ablating one of the non-insulative layers so as to electrically isolate the situs of the short circuit while maintaining the electrical integrity of the underlying non-insulative layer intact. A laser beam is directed onto the non-insulative layer and scanned in a selected pattern to isolate the situs of the short circuit; the laser is further controlled such that a selected energy density is delivered to the surface to be ablated such that the underlying non-insulative layer (113a,113b) is not damaged.

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