公开(公告)号：BR9201428A

公开(公告)日：1992-12-01

申请号：BR9201428

申请日：1992-04-16

Applicant: HOECHST AG

Inventor： PAWLOWSKI GEOR ,  ROESCHERT HORST ,  SPIESS WALTER ,  DAMMEL RALPH

IPC: C09K11/00 ,  C07C235/00 ,  C07C235/08 ,  C07C271/12 ,  C07C271/14 ,  C07C271/16 ,  C07C275/04 ,  C07C275/06 ,  C07C275/24 ,  C07C275/28 ,  C07C323/10 ,  C07D317/54 ,  C08G69/00 ,  C08G71/00 ,  G01D15/14 ,  G03F7/004 ,  G03F7/039 ,  C07C271/24 ,  C07C271/28 ,  C07D317/48 ,  C07D333/16

Abstract: Compounds having repeating units of the formula I (* CHEMICAL STRUCTURE *) (I) in which R1 is an alkylene, cycloalkylene, alkenylene, alkynylene, or arylenebisalkyl group, in which one or more aliphatic CH2 groups may be replaced by oxygen or sulfur atoms, R2 is an alkyl, alkenyl, alkynyl, cycloalkyl, alkoxyalkyl, aryl, aralkyl or aryloxyalkyl radical, R3 is an alkyl or aryl radical, X is -CO-, -O-CO- or -NH-CO-, and n is an integer greater than 1, especially from 3 to 50. are cleavable by acid and, in combination with photolytic acid donors and alkali-soluble binders, are constituents of positive-working mixtures which are used especially in recording materials for UV radiation and high-energy radiation. The materials are distinguished by a high resolution in conjunction with high image contrast.

公开(公告)号：ZA921456B

公开(公告)日：1992-11-25

申请号：ZA921456

申请日：1992-02-27

Applicant: HOECHST AG

Inventor： ROESCHERT HORST ,  HORST ROESCHERT ,  PAWLOWSKI GEORG ,  GEORG PAWLOWSKI ,  DAMMEL RALPH ,  RALPH DAMMEL ,  MERREM HANS-JOACHIM ,  HANS-JOACHIM MERREM ,  FUCHS JUERGEN ,  JUERGEN FUCHS

IPC: C08F8/30 ,  C08F12/00 ,  C08F12/14 ,  C08F212/14 ,  C08F220/20 ,  G03F7/039 ,  C08F ,  C08L ,  G03F ,  H01L

Abstract: The invention relates to radiation-sensitive polymers, to a mixture essentially containing these radiation-sensitive polymers as binders and to a process for preparing the radiation-sensitive polymeric binder and also to a positive-working radiation-sensitive recording material which is produced using the radiation-sensitive mixture.

公开(公告)号：BR9200680A

公开(公告)日：1992-11-10

申请号：BR9200680

申请日：1992-02-27

Applicant: HOECHST AG

Inventor： ROESCHERT HORST ,  MERREM HANS-JOACHIM ,  PAWLOWSKI GEORG ,  FUCHS JUERGEN ,  DAMMEL RALPH

IPC: B41M5/26 ,  C08F12/00 ,  C08F212/14 ,  G03F7/023 ,  H01L21/027 ,  C08F8/24 ,  C08F8/34

Abstract: The invention relates to radiation-sensitive polymers, to a mixture essentially containing these radiation-sensitive polymers as binders and, furthermore, to a process for preparing the radiation-sensitive polymeric binder and also to a positive-working radiation-sensitive recording material which is produced using the radiation-sensitive mixture.

公开(公告)号：CA2066147A1

公开(公告)日：1992-10-21

申请号：CA2066147

申请日：1992-04-15

Applicant: HOECHST AG

Inventor： ROESCHERT HORST ,  FUCHS JUERGEN ,  SPIESS WALTER ,  ECKES CHARLOTTE ,  PAWLOWSKI GEORG ,  DAMMEL RALPH

IPC: G03F7/00 ,  C07C303/28 ,  C07C309/65 ,  C07C309/66 ,  C07C309/73 ,  G03F7/004 ,  G03F7/028 ,  G03F7/038 ,  H01L21/027 ,  G03C1/73 ,  G03F7/16

Abstract: A negative-working radiation-sensitive mixture containing a) a compound which generates a strong acid under the action of actinic radiation, b) a compound having at least two groups crosslinkable by means of acid and c) a polymeric binder which is insoluble in water and soluble or at least swellable in aqueous alkaline solutions, wherein the compound (a) comprises a di-, tri- or tetrahydroxybenzene which may be further substituted, or a polymer containing a di-, tri-, or tetra- hydroxy phenyl radical, is esterified with respectively 2, 3 or 4 sulfonic acids of the formula R-SO3H, and is distinguished by high resolution and high sensitivity over a wide spectral range. It also shows high thermal stability and does not form any corrosive photolysis products on exposure. A radiation-sensitive recording material produced with this mixture is suitable for the production of photoresists, electronic components, printing plates or for chemical milling.

公开(公告)号：AU1125492A

公开(公告)日：1992-09-03

申请号：AU1125492

申请日：1992-02-27

Applicant: HOECHST AG

Inventor： ROESCHERT HORST ,  MERREM HANS-JOACHIM ,  PAWLOWSKI GEORGE ,  FUCHS JUERGEN ,  DAMMEL RALPH

IPC: C08F8/30 ,  C08F12/00 ,  C08F12/14 ,  C08F212/14 ,  C08F220/20 ,  G03F7/039 ,  G03F7/004

Abstract: The invention relates to radiation-sensitive polymers, to a mixture essentially containing these radiation-sensitive polymers as binders and to a process for preparing the radiation-sensitive polymeric binder and also to a positive-working radiation-sensitive recording material which is produced using the radiation-sensitive mixture.

公开(公告)号：CA2061991A1

公开(公告)日：1992-08-29

申请号：CA2061991

申请日：1992-02-27

Applicant: HOECHST AG

Inventor： ROESCHERT HORST ,  MERREM HANS-JOACHIM ,  PAWLOWSKI GEORG ,  FUCHS JUERGEN ,  DAMMEL RALPH

IPC: C08F8/30 ,  C08F12/00 ,  C08F12/14 ,  C08F212/14 ,  C08F220/20 ,  G03F7/039 ,  C08F212/08 ,  G03F7/016 ,  C08F216/10 ,  C08F216/12

Abstract: Radiation-sensitive polymers, a mixture containing these radiation-sensitive polymers as binder, and a process for the preparation of the radiation-sensitive polymer binders are disclosed. A positive radiationsensitive recording material containing the radiationsensitive polymer is also disclosed.

公开(公告)号：ZA9000168B

公开(公告)日：1991-04-24

申请号：ZA9000168

申请日：1990-01-10

Applicant: HOECHST AG

Inventor： WILHARM PETER ,  PETER WILHARM ,  PAWLOWSKI GEORG ,  GEORG PAWLOWSKI ,  MERREM HANS-JOACHIM ,  HANS-JOACHIM MERREM ,  DAMMEL RALPH ,  RALPH DAMMEL

IPC: G03F7/039 ,  A61K8/00 ,  A61Q17/04 ,  C07C245/18 ,  C07C271/10 ,  C07C271/20 ,  C07C271/24 ,  C07C275/10 ,  C07C275/26 ,  C07C275/32 ,  C07C275/40 ,  C07C323/12 ,  C07D209/48 ,  C07D251/34 ,  C07D295/14 ,  C08F2/50 ,  C09K3/00 ,  G03C1/52 ,  G03F7/004 ,  G03F7/016 ,  H01L21/027 ,  H01L21/30 ,  G03F ,  G03C

CPC classification number: C07C245/18 ,  C07C2601/14 ,  G03F7/0163

公开(公告)号：ZA901796B

公开(公告)日：1990-11-28

申请号：ZA901796

申请日：1990-03-08

Applicant: HOECHST AG

Inventor： DAMMEL RALPH ,  RALPH DAMMEL ,  PAWLOSCKI GEORG ,  GEORG PAWLOSCKI ,  LINGNAU JUERGEN ,  JUERGEN LINGNAU ,  THEIS JUERGEN ,  JUERGEN THEIS

IPC: G03F7/039 ,  C07C271/28 ,  C07C275/50 ,  C08K5/00 ,  C08L61/00 ,  C08L61/04 ,  G03F7/004 ,  H01L21/027 ,  G03F

Abstract: A radiation-curable mixture is proposed which contains a compound which forms an acid when exposed to high-energy radiation and a compound which is acid-cleavable, and which is characterised in that the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pKa of less than 12 or is a derivative of a compound having such a pKa, which derivative can be converted into the free compound by acid catalysis. The composition claimed, and in particular the recording material prepared therefrom, has a higher sensitivity and an improved resolution, and in addition exhibits no image haze after development.

公开(公告)号：ZA9000795B

公开(公告)日：1990-10-31

申请号：ZA9000795

申请日：1990-02-02

Applicant: HOECHST AG

Inventor： KAEMPF GUENTHER ,  GUENTHER KAEMPF ,  SCHEUNEMANN UDE ,  UDE SCHEUNEMANN ,  FELDHUES MICHAEL ,  MICHAEL FELDHUES ,  LINGNAU JUERGEN ,  JUERGEN LINGNAU ,  DAMMEL RALPH ,  RALPH DAMMEL

IPC: G03F7/004 ,  C08G61/10 ,  C08G61/12 ,  G03F7/027 ,  G03F7/032 ,  G03F7/038 ,  H01L21/027 ,  G03F ,  C09D ,  C25B ,  H01L

CPC classification number: G03F7/027 ,  G03F7/032

公开(公告)号：CA2011728A1

公开(公告)日：1990-09-11

申请号：CA2011728

申请日：1990-03-08

Applicant: HOECHST AG

Inventor： DAMMEL RALPH ,  LINGNAU JUERGEN ,  PAWLOWSKI GEORG ,  THEIS JUERGEN

IPC: G03F7/039 ,  G03F7/004 ,  H01L21/027

Abstract: A positive radiation-sensitive mixture is disclosed which contains a compound which forms an acid under the action of high-energy radiation, and an acid-cleavable compound, wherein the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pKa value of less than about 12 or is a derivative of a compound having such a pKa value which can be converted into the free compound by acid catalysis. A positive recording material and a process for recording highenergy radiation using the material are also disclosed. The mixture, and in particular the recording material produced therefrom, has relatively high sensitivity and improved resolution and, in addition, does not exhibit image fogging after development.