公开(公告)号：FR2286418A1

公开(公告)日：1976-04-23

申请号：FR7525148

申请日：1975-08-07

Applicant: IBM

Inventor： GIPSTEIN EDWARD ,  MOREAU WAYNE M ,  NEED OMAR U III

IPC: G03F7/20 ,  G03F7/039 ,  G03F7/30 ,  H01L21/027 ,  G03F7/00

Abstract: Electron beam positive resists which are sensitive to electron beam radiation and simultaneously thermally stable are prepared using polycarbonates.

公开(公告)号：DE2528288A1

公开(公告)日：1976-01-08

申请号：DE2528288

申请日：1975-06-25

Applicant: IBM

Inventor： GIPSTEIN EDWARD ,  HEWETT WILLIAM AINSLIE

IPC: H01L21/027 ,  C08G75/00 ,  C08G75/22 ,  G03F7/039 ,  G03F7/10

Abstract: Electron beam positive resists are formed from terpolymers of (a) an alpha olefin, (b) sulfur dioxide, and (c) a compound selected from the group consisting of cyclopentene, bicycloheptene and methyl methacrylate. The terpolymers have the particular unexpected advantage of being resistant to cracking of the films.

公开(公告)号：DE2512745A1

公开(公告)日：1975-10-09

申请号：DE2512745

申请日：1975-03-22

Applicant: IBM

Inventor： CORTELLINO CHARLES ANTHONY ,  GIPSTEIN EDWARD ,  HEWETT WILLIAM AINSLIE ,  JOHNSON DUANE EDWARD ,  MOREAU WAYNE MARTIN

IPC: G03F7/039 ,  H01L21/027 ,  G03F7/10

Abstract: It has been discovered that the sensitivity of positive acting polymeric electron beam resists is increased by well over an order of magnitude by using polymers having a molecular weight of at least one million, thereby making it possible to reduce the required radiation to below 3 x 10 6 coulombs/cm2.

公开(公告)号：DE2355701A1

公开(公告)日：1974-05-16

申请号：DE2355701

申请日：1973-11-07

Applicant: IBM

Inventor： MOREAU WAYNE M ,  GIPSTEIN EDWARD

IPC: H05K3/06 ,  G03F7/039 ,  G03F1/00

公开(公告)号：CA904853A

公开(公告)日：1972-07-11

申请号：CA904853D

Applicant: IBM

Inventor： HEWETT WILLIAM A ,  GIPSTEIN EDWARD

公开(公告)号：DE1906831A1

公开(公告)日：1969-11-06

申请号：DE1906831

申请日：1969-02-12

Applicant: IBM

Inventor： GIPSTEIN EDWARD ,  AINSLIE HEWETT WILLIAM

IPC: C08F24/00 ,  C08F26/06 ,  C08F28/06 ,  G03G5/07 ,  G03G

Abstract: 1,269,385. Electrophotographic element. INTERNATIONAL BUSINESS MACHINES CORP. 8 April, 1969 [8 April, 1968], No. 17992/69. Heading H1K. [Also in Divisions C2 and C3] An electrophotographic element includes a polymeric material of the formula wherein n >40 or wherein one of R 1 and R 2 is hydrogen, the other is C 1-4 alkyl and n>10. The polymers may be applied to a substrate of aluminium glass, paper, or plastics as an organic solvent solution or by melting the polymers and applying in the liquid state. Activators or electron acceptors, which increase the photoconductivity of the polymers, may be incorporated into the polymers.