公开(公告)号：DE3584305D1

公开(公告)日：1991-11-14

申请号：DE3584305

申请日：1985-04-11

Applicant: IBM

Inventor： ITO HIROSHI ,  MACDONALD SCOTT ARTHUR ,  MILLER ROBERT DENNIS ,  WILLSON CARLTON GRANT

IPC: G03F7/30 ,  G03F7/038 ,  G03F7/039 ,  G03F7/26 ,  G03F7/36 ,  G03F7/38 ,  H01L21/027 ,  G03F7/09

Abstract: A negative tone resist image is produced by the successive steps of exposing a film to a pattern of radiation, the film having such a composition that after exposure to the radiation it contains a polymer which reacts with an organometallic reagent; treating the exposed film with the organometallic reagent; and developing a relief image by further treating the exposed film with an oxygen plasma.

公开(公告)号：DE3382401D1

公开(公告)日：1991-10-10

申请号：DE3382401

申请日：1983-05-02

Applicant: IBM

Inventor： ITO HIROSHI ,  WILLSON CARLTON GRANT ,  FRECHET JEAN M J

IPC: C08K5/00 ,  C08F8/00 ,  C08L33/00 ,  C08L33/02 ,  G03F7/004 ,  G03F7/021 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  H01L21/027 ,  G03F7/16 ,  G03F7/029

公开(公告)号：ES2019413B3

公开(公告)日：1991-06-16

申请号：ES88101849

申请日：1988-02-09

Applicant: IBM

Inventor： ALLEN ROBERT DAVID ,  FRECHET JEAN M J ,  TWIEG ROBERT JAMES ,  WILLSON CARLTON GRANT

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027