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公开(公告)号:US20210111088A1
公开(公告)日:2021-04-15
申请号:US16464547
申请日:2016-12-29
Applicant: INTEL CORPORATION
Inventor: Rahul Jain , Kyu Oh Lee , Siddharth K. Alur , Wei-Lun K. Jen , Vipul V. Mehta , Ashish Dhall , Sri Chaitra J. Chavali , Rahul N. Manepalli , Amruthavalli P. Alur , Sai Vadlamani
IPC: H01L23/31 , H01L25/065 , H01L23/00 , H01L23/538 , H01L21/48 , H01L21/56
Abstract: An apparatus is provided which comprises: a substrate, a die site on the substrate to couple with a die, a die side component site on the substrate to couple with a die side component, and a raised barrier on the substrate between the die and die side component sites to contain underfill material disposed at the die site, wherein the raised barrier comprises electroplated metal. Other embodiments are also disclosed and claimed.
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32.
公开(公告)号:US10373951B1
公开(公告)日:2019-08-06
申请号:US16017247
申请日:2018-06-25
Applicant: Intel Corporation
Inventor: Cheng Xu , Rahul Jain , Seo Young Kim , Kyu Oh Lee , Ji Yong Park , Sai Vadlamani , Junnan Zhao
IPC: H01L27/07 , H01L23/64 , H01L23/522 , H01L23/00 , H01L49/02
Abstract: Disclosed embodiments include an embedded thin-film capacitor and a magnetic inductor that are assembled in two adjacent build-up layers of a semiconductor package substrate. The thin-film capacitor is seated on a surface of a first of the build-up layers and the magnetic inductor is partially disposed in a recess in the adjacent build up layer. The embedded thin-film capacitor and the integral magnetic inductor are configured within a die shadow that is on a die side of the semiconductor package substrate.
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33.
公开(公告)号:US20180286812A1
公开(公告)日:2018-10-04
申请号:US15475175
申请日:2017-03-31
Applicant: Intel Corporation
Inventor: Rahul Jain , Ji Yong Park , Kyu Oh Lee
IPC: H01L23/538 , H01L25/065 , H01L25/00 , H01L21/48 , H01L23/00
Abstract: Examples relate to a die interconnect substrate comprising a bridge die comprising at least one bridge interconnect connecting a first bridge die pad of the bridge die to a second bridge die pad of the bridge die. The die interconnect substrate further comprises a substrate structure comprising a substrate interconnect electrically insulated from the bridge die, wherein the bridge die is embedded in the substrate structure. The die interconnect substrate further comprises a first interface structure for attaching a semiconductor die to the substrate structure, wherein the first interface structure is connected to the first bridge die pad. The die interconnect substrate further comprises a second interface structure for attaching a semiconductor die to the substrate structure, wherein the second interface structure is connected to the substrate interconnect. A surface of the first interface structure and a surface of the second interface structure are at the same height.
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公开(公告)号:US11935805B2
公开(公告)日:2024-03-19
申请号:US18133868
申请日:2023-04-12
Applicant: Intel Corporation
Inventor: Rahul Jain , Kyu Oh Lee , Siddharth K. Alur , Wei-Lun K. Jen , Vipul V. Mehta , Ashish Dhall , Sri Chaitra J. Chavali , Rahul N. Manepalli , Amruthavalli P. Alur , Sai Vadlamani
IPC: H01L23/31 , H01L21/48 , H01L21/56 , H01L23/00 , H01L23/498 , H01L23/532 , H01L23/538 , H01L25/065
CPC classification number: H01L23/3185 , H01L21/4853 , H01L21/4857 , H01L21/563 , H01L23/3128 , H01L23/49816 , H01L23/53295 , H01L23/5381 , H01L23/5383 , H01L23/5386 , H01L24/06 , H01L24/13 , H01L24/16 , H01L24/81 , H01L25/0655 , H01L25/0657 , H01L2224/16227 , H01L2224/81 , H01L2224/83051 , H01L2924/18161
Abstract: An apparatus is provided which comprises: a substrate, a die site on the substrate to couple with a die, a die side component site on the substrate to couple with a die side component, and a raised barrier on the substrate between the die and die side component sites to contain underfill material disposed at the die site, wherein the raised barrier comprises electroplated metal. Other embodiments are also disclosed and claimed.
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公开(公告)号:US11335632B2
公开(公告)日:2022-05-17
申请号:US15857238
申请日:2017-12-28
Applicant: Intel Corporation
Inventor: Prithwish Chatterjee , Junnan Zhao , Sai Vadlamani , Ying Wang , Rahul Jain , Andrew J. Brown , Lauren A. Link , Cheng Xu , Sheng C. Li
Abstract: Methods/structures of forming in-package inductor structures are described. Embodiments include a substrate including a dielectric material, the substrate having a first side and a second side. A conductive trace is located within the dielectric material. A first layer is on a first side of the conductive trace, wherein the first layer comprises an electroplated magnetic material, and wherein a sidewall of the first layer is adjacent the dielectric material. A second layer is on a second side of the conductive trace, wherein the second layer comprises the electroplated magnetic material, and wherein a sidewall of the second layer is adjacent the dielectric material.
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公开(公告)号:US11158558B2
公开(公告)日:2021-10-26
申请号:US16464547
申请日:2016-12-29
Applicant: INTEL CORPORATION
Inventor: Rahul Jain , Kyu Oh Lee , Siddharth K. Alur , Wei-Lun K. Jen , Vipul V. Mehta , Ashish Dhall , Sri Chaitra J. Chavali , Rahul N. Manepalli , Amruthavalli P. Alur , Sai Vadlamani
IPC: H01L23/48 , H01L21/00 , H01L21/44 , H05K7/00 , H01R9/00 , H01L23/31 , H01L21/48 , H01L21/56 , H01L23/538 , H01L23/00 , H01L25/065 , H01L23/532 , H01L23/498
Abstract: An apparatus is provided which comprises: a substrate, a die site on the substrate to couple with a die, a die side component site on the substrate to couple with a die side component, and a raised barrier on the substrate between the die and die side component sites to contain underfill material disposed at the die site, wherein the raised barrier comprises electroplated metal. Other embodiments are also disclosed and claimed.
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公开(公告)号:US20210151393A1
公开(公告)日:2021-05-20
申请号:US17158634
申请日:2021-01-26
Applicant: Intel Corporation
Inventor: Brandon C Marin , Shivasubramanian Balasubramanian , Rahul Jain , Praneeth Akkinepally , Jeremy D Ecton
IPC: H01L23/64 , H01L23/498 , H01L49/02 , H01L21/48
Abstract: A substrate for an electronic device may include a first layer, a second layer, and may include a third layer. The first layer may include a capacitive material, and the capacitive material may be segmented into a first section, and a second section. Each of the first section and the second section may include a first surface and a second surface. The second layer may include a first conductor. The third layer may include a second conductor. The first surface of the second section of capacitive material may be directly coupled to the first conductor. The second surface of the second section of the capacitive material may be directly coupled to the second conductor. A first filler region may include a dielectric material and the first filler region may be located in a first gap between the first section of capacitive material and the second section of capacitive material.
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38.
公开(公告)号:US10971492B2
公开(公告)日:2021-04-06
申请号:US16855376
申请日:2020-04-22
Applicant: Intel Corporation
Inventor: Cheng Xu , Rahul Jain , Seo Young Kim , Kyu Oh Lee , Ji Yong Park , Sai Vadlamani , Junnan Zhao
IPC: H01L27/07 , H01L23/64 , H01L23/522 , H01L23/00 , H01L49/02
Abstract: Disclosed embodiments include an embedded thin-film capacitor and a magnetic inductor that are assembled in two adjacent build-up layers of a semiconductor package substrate. The thin-film capacitor is seated on a surface of a first of the build-up layers and the magnetic inductor is partially disposed in a recess in the adjacent build up layer. The embedded thin-film capacitor and the integral magnetic inductor are configured within a die shadow that is on a die side of the semiconductor package substrate.
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公开(公告)号:US20200253037A1
公开(公告)日:2020-08-06
申请号:US16268813
申请日:2019-02-06
Applicant: Intel Corporation
Inventor: Brandon C. Marin , Andrew James Brown , Rahul Jain , Dilan Seneviratne , Praneeth Kumar Akkinepally , Frank Truong
IPC: H05K1/02 , H05K1/11 , H01L23/498
Abstract: Microelectronic assemblies, and related devices and methods, are disclosed herein. For example, in some embodiments, a microelectronic assembly may include a substrate layer having a surface, wherein the substrate layer includes a photo-imageable dielectric (PID) and an electroless catalyst; a first conductive trace having a first thickness on the surface of the substrate layer; and a second conductive trace having a second thickness on the surface of the substrate layer, wherein the first thickness is greater than the second thickness.
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公开(公告)号:US20200176355A1
公开(公告)日:2020-06-04
申请号:US16209861
申请日:2018-12-04
Applicant: Intel Corporation
Inventor: Robert A. May , Kristof Darmawikarta , Rahul Jain , Lilia May , Maroun Moussallem , Prithwish Chatterjee
IPC: H01L23/473 , H01L23/373 , H05K7/20
Abstract: A semiconductor device package structure is provided, which includes a substrate, one or more dies coupled to the substrate, and a heat pipe device. In an example, the heat pipe device may include a conduit that is at least partially embedded within the substrate. The heat pipe device may have a first region coupled to the one or more dies. In an example, the conduit may include a first path for flow of vapor from the first region to an opposing second region. The conduit may further include a second path for flow of liquid from the second region to the first region.
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