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公开(公告)号：JP2001240799A
公开(公告)日：2001-09-04
申请号：JP2000052018
申请日：2000-02-28
Applicant: JSR CORP
Inventor： SHINODA TOMOTAKA , TAMAKI KENTARO , NISHIKAWA MICHINORI , YAMADA KINJI
IPC: C09D183/02 , C09D5/25 , C09D183/04
Abstract: PROBLEM TO BE SOLVED: To provide a coating composition yielding a coated film which has a uniform thickness and has an excellent hardness, crack resistance and CMP resistance and a low dielectric constant. SOLUTION: A film-forming composition contains, based on 100 pts.wt. silicon compounds (A) of formulae (1): R1aSi(OR2)4-a and (2): R3b(R4O)3-bSi-(R7)d-Si(OR5)3-cR6c, from 0.0005 to 0.05 pts.wt. metal chelated compound (B) of formula (3): R8eM(OR9)f-e wherein R1 is hydrogen, fluorine or a monovalent organic group; R2, R3, R4, R5 and R6 are each a monovalent organic group; a, b and c are each an integer of 0-2; R7 is an oxygen atom or a -(CH2)m- group; m is 1-6; d is 0 or 1; R8 is a chelating agent; M is a metal atom; R9 is a 2-5C alkyl group or a 6-20C aryl group; e is a valence number of the metal M; and f is integer of from 1 to e.
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公开(公告)号：JP2001172565A
公开(公告)日：2001-06-26
申请号：JP36029199
申请日：1999-12-20
Applicant: JSR CORP
Inventor： SUGIURA MAKOTO , SHINODA TOMOTAKA , KAWAI JUNJI , NISHIKAWA MICHINORI , YAMADA KINJI
IPC: H01L21/312 , C09D171/02 , C09D183/00
Abstract: PROBLEM TO BE SOLVED: To obtain a film-forming composition which yields a coated from showing an excellent mechanical strength and crack resistance, shows an excellent long-term shelf stability of the solution and exerts a low dielectric constant and is therefore suitable as a material for interlayer insulating films for semiconductor elements, etc. SOLUTION: The film-forming composition contains (A) a hydrolytic condensate obtained by hydrolyzing and condensing at least one compound selected from the group consisting of (A-1) a compound of the formula: R1aSi(OR2)4-a, wherein R1 is a hydrogen atom, a fluorine atom or a monovalent organic group; R2 is a monovalent organic group; and a is an integer of 0-2 and (A-2) a compound of the formula: R3b(R4 O)3-bSi-(R7)d-Si(OR5)3-cR6c, wherein R3, R4, R5 and R6 are identical to or different from each other and are each a monovalent organic group; b and c are identical to or different from each other and are each 0-2; R7 is an oxygen atom or a group of the formula: -(CH2)n-; n is 1-6; and d is 0 or 1 in the presence of from 0.00001 to 0.001 mol organic acid against 1 mol alkoxyl group in the components (A-1) and (A-2) and from 0.8 to 2.5 mol water against 1 mol alkoxyl group in the components (A-1) and (A-2), and (B) an organic solvent.
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公开(公告)号：JP2001019903A
公开(公告)日：2001-01-23
申请号：JP19730199
申请日：1999-07-12
Applicant: JSR CORP
Inventor： NISHIKAWA MICHINORI , TSUNODA MAYUMI , SHINODA TOMOTAKA , HAKAMAZUKA SATOKO , EBISAWA MASAHIKO , YAMADA KINJI
IPC: H01L21/312 , C09D183/04 , H01L21/316
Abstract: PROBLEM TO BE SOLVED: To provide a membrane-forming composition excellent in coating uniformity, lowness in dielectric constant and leakage current, CPM resistance, preservation stability, etc., as interlayer insulating material e.g. in semiconductor elements. SOLUTION: This membrane-forming composition is produced by hydrolyzing at least one selected from a compound expressed by the formula R1aSi(OR2)4-a, wherein R1 is H, fluorine atom or a monovalent organic group; R2 is a monovalent organic group; and (a) is an integer of 0 to 2, and a compound expressed by the formula R3b(R4O)3-bSi-(R7)d-(OR5)3-cR6c, wherein R3 to R6 are each a monovalent organic group; (b) and (c) are each 0 to 2; R7 is oxygen atom or (CH2)n; (n) is 1 to 6; and (d) is 0 or 1 in the presence of a solvent expressed by the formula HOCHCH3CH2OR8, wherein R8 is a 1-4C alkyl group.
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公开(公告)号：JP2000256621A
公开(公告)日：2000-09-19
申请号：JP15867399
申请日：1999-06-04
Applicant: JSR CORP
Inventor： SHINODA TOMOTAKA , YAMADA KINJI , TSUNODA MAYUMI , MATSUBARA MINORU , HAKAMAZUKA SATOKO
IPC: H05K1/03 , C08K5/06 , C08K5/07 , C08K5/56 , C08L83/04 , C09D5/25 , C09D7/12 , C09D183/04 , H01L21/312 , H01L21/316 , H05K3/46
Abstract: PROBLEM TO BE SOLVED: To obtain a composition which is excellent in uniformity of a coated film, dielectric characteristic, storage stability, O plasma ashing resistance, adhesion to an underlying layer and the like by including an alkoxysilane compound, a metal chelate compound, a propylene glycol monoalkyl ether and a β-diketone. SOLUTION: The composition comprises a hydrolyzate of a compound of the formula, R1nSi(OR2)4-n and/or its partial condensate, a metal chelate compound of the formula, R3tM(OR4)s-t, a propylene glycol monoalkyl ether and a β-diketone, in which it is preferred that the content of Na is 20 ppb or below, the content of β-diketone is not lower than 1 wt.%, and the content of an alcohol having a boiling point of 100 deg.C or below is not higher than 20 wt.%. In the formula, R1-2 represents 1-5C alkyl or 6-20C aryl; n is 0 to 2; R3 represents a chelating agent; M is a metal atom, preferably Ti, Zr or Al; R4 represents 2-5C alkyl or 6-20C aryl; s is a valence of M; and t is 1 to s. This composition is useful as a layer insulating film such as for semiconductor devices.
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公开(公告)号：JPH10204292A
公开(公告)日：1998-08-04
申请号：JP33657697
申请日：1997-11-21
Applicant: JSR CORP
Inventor： KUROSAWA TAKAHIKO , YAMADA KINJI , SHINODA TOMOTAKA , MATSUBARA MINORU , INOUE YASUTAKE , GOTO KOHEI
Abstract: PROBLEM TO BE SOLVED: To provide a thermosetting resin composition excellent in storage stability as a solution, free from cracks in curing process, and capable of forming a cured article excellent in adhesive properties to various substrates, heat resistance, resistance to moist heat, electrical insulating properties, etc. SOLUTION: This resin composition consists of (A) a hydrolysate of a hydrolyzable organosilane compound and/or its partial condensate, (B) a polyamic acid having a carboxylic acid anhydride group and/or a polyimide having a carboxylic acid anhydride group, and (C) a chelate compound of a metal selected from a group of zirconium, titanium and aluminum and/or an alkoxide compound.
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Patent Agency Ranking
公开(公告)号：JP2014229542A
公开(公告)日：2014-12-08
申请号：JP2013109730
申请日：2013-05-24
Inventor： ITO KAZUTOSHI , SHINODA TOMOTAKA
IPC: H01M10/0567 , H01M10/30
CPC classification number: Y02E60/124
Abstract: 【課題】電極またはセパレーターの端面と外装容器の内表面とのブロッキングを効果的に抑制することができる電解液、および該電解液を備えることで良好な充放電特性を示す蓄電デバイスを提供する。【解決手段】本発明に係る電解液は、ブロッキング防止剤を含有することを特徴とする。【選択図】なし
Abstract translation: 要解决的问题：提供：能够有效地抑制电极或隔板的端面与外容器的内表面之间的阻塞的电解质; 以及通过包含电解质显示出良好的充电/放电特性的蓄电装置。解决方案：根据本发明的电解质含有防粘连剂。
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公开(公告)号：JP2014212030A
公开(公告)日：2014-11-13
申请号：JP2013087746
申请日：2013-04-18
Inventor： ITO KAZUTOSHI , SHINODA TOMOTAKA
CPC classification number: Y02P70/54
Abstract: 【課題】集電体の腐食を効果的に抑制できると共に、電池容量が高くかつ電池特性に優れた蓄電デバイスが作製可能な蓄電デバイス用電極およびその製造方法を提供する。【解決手段】本発明に係る蓄電デバイス用電極の製造方法は、ステンレス集電体と、前記ステンレス集電体の表面に形成された活物質層と、を備える蓄電デバイス用電極の製造方法であって、導電助剤粒子と、活物質粒子と、を含有し、かつpHが9〜12の蓄電デバイス電極用スラリーを準備する第1の工程と、前記ステンレス集電体の表面に前記蓄電デバイス電極用スラリーを塗布、乾燥させて前記活物質層を形成する第2の工程と、を含むことを特徴とする。【選択図】図3
Abstract translation: 要解决的问题：提供一种能够有效地抑制集电体的腐蚀并制造具有高电池容量和优异的电池特性的蓄电装置的蓄电装置用电极，以及用于蓄电装置的电极的制造方法 。解决方案：在根据本发明的用于蓄电装置的电极的制造方法中，制造了在不锈钢集电体的表面上形成有不锈钢集电体和活性物质层的蓄电装置用电极。 该方法包括：制备用于蓄电装置电极的浆料的第一步骤，含有导电助剂颗粒和活性物质颗粒并且pH为9-12的浆料; 以及在要干燥的不锈钢收集器的表面上涂覆用于蓄电装置电极的浆料的第二步骤，从而形成活性物质层。
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公开(公告)号：JP2014032909A
公开(公告)日：2014-02-20
申请号：JP2012173943
申请日：2012-08-06
Inventor： KOSE OSAMU , MATSUKI YASUO , KITAGUCHI HIRONORI , SHINODA TOMOTAKA
CPC classification number: Y02E60/122
Abstract: PROBLEM TO BE SOLVED: To provide a binder composition for a negative electrode, capable of providing a power storage device high in charge/discharge capacity and less in the degree of capacity deterioration due to the repetition of charge/discharge cycles.SOLUTION: The binder composition for a negative electrode is a binder composition for a negative electrode of a power storage device, containing at least a polymer (A), water (B) and a liquid medium (C). The polymer (A) is at least one selected from the group consisting of a polyamic acid and an imidized polymer thereof, the polyamic acid being obtained by the reaction between (a) mol of tetracarboxylic dianhydride and b mol of diamine while a ratio a/b is more than 0.95 and 0.99 or less.
Abstract translation: 要解决的问题：提供一种负极用粘结剂组合物，其能够提供充电/放电容量高的蓄电装置，并且由于充放电循环的重复而导致的容量劣化程度较小。解决方案：粘合剂 用于负极的组合物是至少含有聚合物（A），水（B）和液体介质（C）的蓄电装置的负极的粘合剂组合物。 聚合物（A）为选自聚酰胺酸及其酰亚胺化聚合物中的至少一种，所述聚酰胺酸通过（a）摩尔四羧酸二酐与b摩尔二胺反应获得，而比率a / b大于0.95且小于等于0.99。
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39.发明专利Carbon nanotube dispersion, film using the same and method of producing the same 审中-公开碳纳米管分散体，使用其的膜及其制造方法
公开(公告)号：JP2010173884A
公开(公告)日：2010-08-12
申请号：JP2009016774
申请日：2009-01-28
Inventor： AOKI OSAMU , MIYAZAKI TOMOKAZU , SHINODA TOMOTAKA
IPC: C01B31/02
Abstract: PROBLEM TO BE SOLVED: To provide a carbon nanotube dispersion having excellent dispersibility and coating characteristics, and also to provide its production method.
SOLUTION: The method for producing a composition containing the carbon nanotubes includes injecting a slurry composition containing carbon nanotubes and a dispersion medium from a nozzle under pressure and making injection flows colliding to each other or colliding to a wall. Also, the composition containing the carbon nanotubes is a carbon nanotube dispersion, which contains a dispersion medium and carbon nanotubes having the average length of 0.4-5,000 nm calculated from values measured by SEM image analysis and the coefficient of variation (CV value) of the average length of at most 40%. The composition can be used to solve the problem.
COPYRIGHT: (C)2010,JPO&INPITAbstract translation: 解决问题：提供具有优异的分散性和涂布特性的碳纳米管分散体，并提供其制造方法。 解决方案：制备含有碳纳米管的组合物的方法包括在压力下从喷嘴注入含有碳纳米管和分散介质的浆料组合物，并使注入流相互碰撞或碰撞到壁。 此外，含有碳纳米管的组合物是碳纳米管分散体，其含有分散介质和平均长度为0.4-5,000nm的碳纳米管，其通过SEM图像分析测量的值和所述碳纳米管的变异系数（CV值）计算， 平均长度最多为40％。 该组合可用于解决问题。 版权所有（C）2010，JPO＆INPIT
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40.发明专利
公开(公告)号：JP2010005704A
公开(公告)日：2010-01-14
申请号：JP2008164123
申请日：2008-06-24
Inventor： NISHIMOTO KAZUO , SHINODA TOMOTAKA
Abstract: PROBLEM TO BE SOLVED: To provide a chemical mechanical polishing water-based dispersing composition capable of keeping in-plane uniformity of polishing speed and inhibiting variation in in-plane flatness of a polished surface during a process of chemical-mechanical-polishing a barrier metal layer provided on a substrate for use of a display device, a manufacturing method of the chemical mechanical polishing water-based dispersing composition, and a chemical mechanical polishing method using the dispersing composition. SOLUTION: The inventors have found that the problem can be solved by means of the chemical mechanical polishing water-based dispersing composition for polishing the barrier metal layer provided on the substrate for use of the display device, which contains (A) abrasive grains, (B) an organic acid and (C) one or more atoms selected from a group consisting of Ta, Ti and Ru, wherein a ratio Rmax/Rmin of a longer diameter Rmax and a shorter diameter of the (A) abrasive grain ranges from 1.0 to 1.5 and (C) element ranges from 1.0×10 2 to 1.0×10 4 ppm. COPYRIGHT: (C)2010,JPO&INPIT
Abstract translation: 要解决的问题：提供一种化学机械抛光水性分散组合物，其能够在化学机械抛光的过程中保持研磨速度的面内均匀性和抑制抛光表面的面内平坦度的变化 用于显示装置的基板上设置的阻挡金属层，化学机械抛光水性分散组合物的制造方法以及使用该分散组合物的化学机械研磨方法。 解决方案：本发明人已经发现，通过用于抛光设置在用于显示装置的基板上的阻挡金属层的化学机械抛光水性分散组合物可以解决该问题，其包含（A）研磨剂 谷物，（B）有机酸和（C）选自Ta，Ti和Ru中的一种或多种原子，其中较长直径Rmax的比Rmax / Rmin和（A）磨粒的较短直径 范围为1.0至1.5，（C）元素的范围为1.0×10
2 至1.0×10 SP 3。 版权所有（C）2010，JPO＆INPIT
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