公开(公告)号：US20050185307A1

公开(公告)日：2005-08-25

申请号：US11016059

申请日：2004-12-17

Applicant: Timo Laufer ,  Johannes Zellner

Inventor： Timo Laufer ,  Johannes Zellner

IPC: G02B1/00 ,  G03F1/24 ,  G03F7/20 ,  G21K1/06 ,  G02B5/08 ,  A61N5/00 ,  G02B7/192 ,  G21G5/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G02B1/00 ,  G03F1/24 ,  G03F7/70858 ,  G03F7/70958 ,  G21K1/06 ,  G21K2201/065

Abstract: The invention relates to an optical component comprising a material which has a coefficient of thermal expansion α. The invention is characterized in that the coefficient of thermal expansion is dependent on location and the following applies to the location-dependent coefficient of thermal expansion: α={overscore (α)}+Δα, with Δα being the maximum deviation of the coefficient of thermal expansion from the mean value of the coefficient of thermal expansion {overscore (α)} of the substrate material, represented by alternatingly arranged inhomogeneity zones with a maximum coefficient of thermal expansion {overscore (α)}+Δα and minimum coefficient of thermal expansion {overscore (α)}−Δα of width w or the period 2w=x, and the deviation Δα of the coefficient of thermal expansion meets the following homogeneity condition depending on the thermal output {dot over (Q)} as absorbed by the optical component, the resulting emissivity {overscore (ε)} and the permitted aberrations of the optical surface:  Δ ⁢   ⁢ α  ≤ ( 0 ⁢ . ⁢ 14 + 0.1 · x mm + 390 ⁢   ⁢ mm x ) ⁢ ppb · W K · ɛ _ Q .

公开(公告)号：US20030043455A1

公开(公告)日：2003-03-06

申请号：US10055608

申请日：2002-01-23

Inventor： Wolfgang Singer ,  Johannes Wangler

IPC: G02B005/08

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G02B5/09 ,  G02B17/006 ,  G02B19/0014 ,  G02B19/0019 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G03F7/70108 ,  G03F7/70158 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70825 ,  G21K2201/065 ,  G21K2201/067

Abstract: There is provided a collector for guiding light with a wavelength of null193 nm onto a plane. The collector includes a first mirror shell for receiving a first ring aperture section of the light and irradiating a first planar ring section of the plane with a first irradiance, and a second mirror shell for receiving a second ring aperture section of the light and irradiating a second planar ring section of the plane with a second irradiance. The first and second mirror shells are rotationally symmetrical and concentrically arranged around a common axis of rotation, the first and second ring aperture sections do not overlap with one another, the first planar ring section substantially abuts the second planar ring section, and the first irradiance is approximately equal to the second irradiance.

Abstract translation: 提供了用于将波长<= 193nm的光引导到平面上的收集器。 收集器包括第一反射镜壳体，用于接收光的第一环孔部分并以第一辐照度照射平面的第一平面环部分，以及用于接收光的第二环孔部分并照射光 具有第二辐照度的平面的第二平面环部分。 第一和第二镜壳围绕公共旋转轴线旋转对称并且同心地布置，第一和第二环孔部分彼此不重叠，第一平面环部分基本上邻接第二平面环部分，并且第一辐照度 大约等于第二辐照度。

公开(公告)号：US5785754A

公开(公告)日：1998-07-28

申请号：US565593

申请日：1995-11-30

Applicant: Yoshiyuki Yamamoto ,  Keiichiro Tanabe ,  Katsuko Harano ,  Nobuhiro Ota ,  Naoji Fujimori

Inventor： Yoshiyuki Yamamoto ,  Keiichiro Tanabe ,  Katsuko Harano ,  Nobuhiro Ota ,  Naoji Fujimori

IPC: G21K1/10 ,  H01J35/18 ,  H01L23/373 ,  H01L23/473 ,  H01S5/02 ,  H01S5/024 ,  H05H7/00 ,  C30B29/05

CPC classification number: H01J35/18 ,  G21K1/10 ,  H01L23/3732 ,  H01L23/473 ,  H05H7/00 ,  G21K2201/065 ,  H01J2235/122 ,  H01J2235/1262 ,  H01L2924/0002 ,  H01S5/02423 ,  H01S5/02492

Abstract: A substrate, which has a high thermal conductivity material layer having a thermal conductivity of at least 10 W/cm.multidot.K and which has a cooling medium flow path on or in the high thermal conductivity material layer, has a high heat-dissipating property.

Abstract translation: 具有热传导率为至少10W / cm×KK并且在高导热性材料层上或其中具有冷却介质流动路径的高导热性材料层的基板具有高的散热性能。

公开(公告)号：NL2006032C

公开(公告)日：2012-12-17

申请号：NL2006032

申请日：2011-01-19

Applicant: MEDIA LARIO SRL

Inventor： HILL JOHN EARL ,  MUNNS ROBERT J

IPC: G02B7/18 ,  G02B7/182 ,  G02B17/06 ,  G02B19/00 ,  G03F7/20 ,  G21K5/04

CPC classification number: G21K1/067 ,  G02B7/1815 ,  G02B7/182 ,  G02B19/0019 ,  G02B19/0095 ,  G03F7/70166 ,  G03F7/70891 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

公开(公告)号：NL2005622C

公开(公告)日：2012-03-14

申请号：NL2005622

申请日：2010-11-04

Applicant: MEDIA LARIO SRL

Inventor： PEDRALI MARCO ,  GHISLANZONI RICCARDO

IPC: C25D1/02 ,  C25D5/14 ,  C25D7/08 ,  G02B7/18 ,  G21K1/06

CPC classification number: G21K1/06 ,  C25D1/02 ,  C25D1/22 ,  C25D5/02 ,  C25D5/14 ,  G02B7/1815 ,  G02B19/0019 ,  G02B19/0095 ,  G03F7/70175 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  Y10T29/4935

公开(公告)号：EP3049870A2

公开(公告)日：2016-08-03

申请号：EP14777038.2

申请日：2014-09-24

Applicant: ASML Netherlands B.V.

Inventor： BANINE, Vadim ,  BARTRAIJ, Petrus ,  VAN GORKOM, Ramon ,  AMENT, Lucas ,  DE JAGER, Pieter ,  DE VRIES, Gosse ,  DONKER, Rilpho ,  ENGELEN, Wouter ,  FRIJNS, Olav ,  GRIMMINCK, Leonardus ,  KATALENIC, Andelko ,  LOOPSTRA, Erik ,  NIENHUYS, Han-Kwang ,  NIKIPELOV, Andrey ,  RENKENS, Michael ,  JANSSEN, Franciscus ,  KRUIZINGA, Borgert

IPC: G03F7/20 ,  G03F1/84 ,  G02B27/00 ,  G02B5/18 ,  G02B27/10 ,  G02B27/12 ,  G02B27/14 ,  G02B27/42 ,  H01S3/09 ,  H05H7/04 ,  G01N21/956 ,  G02B27/09 ,  G21K1/06

CPC classification number: G21K1/067 ,  G01N2021/95676 ,  G02B5/1814 ,  G02B5/1823 ,  G02B5/1838 ,  G02B5/1861 ,  G02B27/0025 ,  G02B27/0938 ,  G02B27/10 ,  G02B27/1086 ,  G02B27/12 ,  G02B27/14 ,  G02B27/142 ,  G02B27/146 ,  G02B27/4272 ,  G03F1/84 ,  G03F7/70025 ,  G03F7/70208 ,  G03F7/70566 ,  G03F7/70891 ,  G03F7/70991 ,  G21K2201/065 ,  H01S3/0903 ,  H05H7/04

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

公开(公告)号：EP2686133A1

公开(公告)日：2014-01-22

申请号：EP12708143.8

申请日：2012-03-13

Applicant: Carl Zeiss Laser Optics GmbH ,  Carl Zeiss SMT GmbH

Inventor： KIEREY, Holger ,  SIEKMANN, Heiko ,  BRESAN, Andre

IPC: B24B13/00 ,  G02B5/18

CPC classification number: G02B5/208 ,  B24B13/00 ,  G02B1/10 ,  G02B5/0891 ,  G02B5/10 ,  G02B5/1838 ,  G02B5/1852 ,  G02B5/1857 ,  G03F7/70316 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

Abstract: A method for producing a reflective optical component (10) for an EUV projection exposure apparatus, said component having a substrate (12) having a base body (14), and a reflective layer (20) arranged on the substrate (12), wherein the substrate (12) has an optically operative microstructuring (16), comprises the following steps: working the microstructuring (16) into the substrate (12), polishing the substrate (12) after the micro-structuring (16) has been worked into the substrate (12), applying the reflective layer (20) to the substrate (12). A reflective optical component for an EUV projection exposure apparatus correspondingly has a polished surface between the microstructuring and the reflective layer.

公开(公告)号：EP1730763B1

公开(公告)日：2012-10-10

申请号：EP05714037.8

申请日：2005-02-24

Applicant: Cymer, Inc.

Inventor： PARTLO, William, N. ,  BOWERING, Norbert, R. ,  ERSHOV, Alexander, I. ,  FOMENKOV, Igor, V. ,  OLIVER, I., Roger ,  VIATELLA, John ,  JACQUES, Robert, N.

IPC: H05G2/00

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

公开(公告)号：EP1354325B1

公开(公告)日：2010-04-14

申请号：EP02722029.2

申请日：2002-01-23

Applicant: Carl Zeiss SMT AG

Inventor： SINGER, Wolfgang ,  EGLE, Wilhelm ,  WEISS, Markus ,  HAINZ, Joachim ,  WIETZORREK, Jochen ,  MELZER, Frank ,  WANGLER, Johannes

IPC: G21K1/06

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G02B5/09 ,  G02B17/006 ,  G02B19/0014 ,  G02B19/0019 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G03F7/70108 ,  G03F7/70158 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70825 ,  G21K2201/065 ,  G21K2201/067

Abstract: The invention relates to a collector for lighting systems having a wavelength ≤ 193 nm, preferably ≤ 126 nm, more preferably EUV wavelengths for receiving light from a light source via an aperture on the side of the object, and for illuminating a region on an image plane, comprising a plurality of rotationally symmetrical mirror shells respectively comprising at least one first mirror segment having one first optical surface,said mirror shells being arranged about a common axis of rotation and an annular aperture element of the aperture on the side of the object being associated with each mirror shell; a beginning and end point on a meridional plane are associated with the first optical surface, the meridional plane is a plane which includes the axis of rotation and the beginning point of the first optical surface on the meridional plane defines an outer edge beam and the endpoint of the first optical surface defines an inner edge beam, the inner and outer edge beams when rotated about the axis of rotation defining a brush discharge which is reflected on at least the first optical surface of the mirror shells and which runs through the collector from the aperture on the side of the object to the plane to be illuminated. The brush discharge defines a used area between at least two adjacent mirror shells. The invention is characterized in that the surface parameters and the position of the mirror shells are selected in such a way that at least one unused area is formed between at least two adjacent mirror shells.

公开(公告)号：EP1518262A4

公开(公告)日：2007-03-14

申请号：EP03761769

申请日：2003-06-19

Applicant: CANON KK

Inventor： MIYAJIMA YOSHIKAZU

IPC: G02B5/10 ,  G02B17/00 ,  G03F7/20 ,  G21K1/06 ,  H01L21/027

CPC classification number: G21K1/06 ,  G02B7/1815 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70891 ,  G21K2201/065 ,  G21K2201/067

Abstract: A reflection mirror apparatus, used in a reflection optical system of an exposure apparatus which performs exposure processing by guiding exposure light by reflection, has a mirror having a reflection surface to reflect the exposure light, and radiation plates for radiation-cooling provided in positions away from an outer surface of the mirror. The radiation plates are provided so as to ensure a passage area for the exposure light incident on and reflected from the reflection surface of the mirror. Further, the respective radiation plates are temperature-controlled by cooling liquid flowing through cooling pipes. Thus the temperature rise of the mirror used in the reflection optical system of the exposure apparatus can be suppressed, and the accuracy of surface form of the mirror reflection surface can be maintained.