Abstract:
The invention relates to a method for electrically contacting a component (10) (for example a power component and/or a (semiconductor) component having at least one transistor, preferably an IGBT (insulated-gate bipolar transistor)) having at least one contact (40, 50), at least one open-pored contact piece (60, 70) is galvanically (electrochemically or free of external current) connected to at least one contact (40, 50). In this way, a component module is achieved. The contact (40, 50) is preferably a flat part or has a contact surface, the largest planar extent thereof being greater than an extension of the contact (40, 50) perpendicular to said contact surface. The temperature of the galvanic connection is at most 100 °C, preferably at most 60 °C, advantageously at most 20 °C and ideally at most 5 °C and/or deviates from the operating temperature of the component by at most 50 °C, preferably by at most 20 °C, in particular by at most 10 °C and ideally by at most 5 °C, preferably by at most 2 °C. The component (10) can be contacted by means of the contact piece (60, 70) with a further component, a current conductor and/or a substrate (90). Preferably, a component (10) having two contacts (40, 50) on opposite sides of the component (10) is used, wherein at least one open-pored contact piece (60, 70) is galvanically connected to each contact (40, 50).
Abstract:
Microelectronic assemblies and methods for making the same are disclosed herein. In one embodiment, a method of forming a microelectronic assembly comprises: assembling first and second components (102, 128) to have first major surfaces (104, 130) of the first and second components (102, 128) facing one another and spaced apart from one another by a predetermined spacing, the first component (102) having first and second oppositely-facing major surfaces (104, 106), a first thickness extending in a first direction between the first and second major surfaces (104, 106), and a plurality of first metal connection elements (112) at the first major surface (104), the second component (128) having a plurality of second metal connection elements (132) at the first major surface (130) of the second component (128); and then plating (electroplating or electroless plating) a plurality of metal connector regions (146) each connecting and extending continuously between a respective first connection element (112) and a corresponding second connection element (132) opposite the respective first connection element (112) in the first direction. The first and second metal connection elements (112, 132) may comprise metal vias (116, 134) in the components (102, 128) or metal pads (118) at the surface of the components (102, 128), the metal vias (116, 134) or the metal pads (118) being covered by plated metal regions (114). A first seed layer (126) may be formed overlying the major surface of the first component (102) before the plating process, wherein uncovered portions of the first seed layer (126) are removed after plating the metal connector regions (146). Similarly, a second seed layer (144) may be formed overlying the major surface of the second component (128). A plurality of barrier regions (152) may overlie the sidewalls of at least one of the metal connector regions (146), the first plated metal regions (114) or the second plated metal regions. At least some corresponding first and second metal connection elements (112, 132) may optionally not share a common axis. At least some first and second surfaces (113, 131) of the first metal connection elements (112) and the respective second metal connection elements (132) connected thereto may optionally not be parallel to a common plane.
Abstract:
In accordance with one or more aspects, a method of reducing void formation in a solder joint may comprise applying a solder paste deposit to a substrate, placing a solder preform in the solder paste deposit, disposing a device on the solder preform and the solder paste deposit, and processing the solder paste deposit and the solder preform to form the solder joint between the device and the substrate. In some aspects, the substrate is a printed circuit board and the device is an integrated circuit package.
Abstract:
Die vorliegende Erfindung betrifft ein Verfahren zum Herstellen einer halbleiterbasierten Schaltung mit dreidimensionaler Schaltungstopologie, bei dem mindestens ein Loch (11) in einem ersten Halbleitersubstrat (1) hergestellt wird, während mindestens eine metallische Erhebung (4) auf einer Oberfläche eines zweiten Halbleitersubstrats (2) hergestellt wird, wobei eine Klebstoffschicht (6) auf einer Wand (5) des mindestens einen Lochs (11) im ersten Halbleitersubstrat (1) aufgetragen wird, wonach die Halbleitersubstrate (1, 2) so zusammengefügt werden, dass die mindestens eine metallische Erhebung (4) zur Bildung einer Durchkontaktierung an der Klebstoffschicht (6) anliegend in dem mindestens einen Loch (11) im ersten Halbleitersubstrat (1) zu liegen kommt. Die Erfindung betrifft ferner eine entsprechende halbleiterbasierte Schaltung mit dreidimensionaler Schaltungstopologie.
Abstract:
A semiconductor device includes a semiconductor element (2) and an electronic element (3). The semiconductor element has a first protruding electrode (2a), and the electronic element has a second protruding electrode (3a). A substrate (4) is disposed between the semiconductor element (2) and the electronic element (3). The substrate has a through-hole (4a) in which the first and second protruding electrodes (2a, 3a) are fitted. The first and second protruding electrodes are connected together inside the through-hole (4a) of the substrate.