公开(公告)号：KR1020080089240A

公开(公告)日：2008-10-06

申请号：KR1020080028806

申请日：2008-03-28

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 마쯔오까노부아끼 ,  하시모또다까히로 ,  쯔찌야가쯔히로 ,  하야시신이찌 ,  하야시다야스시

IPC: H01L21/68 ,  H01L21/677

CPC classification number: H01L21/67178 ,  H01L21/67745 ,  G05B19/4189 ,  G05B2219/31002 ,  H01L21/67196 ,  H01L21/67742

Abstract: A coating and developing system, a coating and developing method, and a storage medium are provided to compose easily a carrying program by using the same carrying path. A first processing block(S2) is installed to be connected to a carrier block(S1) and is formed by stacking up a plurality of unit blocks including a film forming block, in order to receive a substrate from the carrier block or transmit the substrate to the carrier block by using a transfer unit installed in the carrier block. A second processing block(S4) is installed to be connected to an interface block(S5) and is formed by stacking up a plurality of unit blocks including a film forming unit block, in order to receive the substrate from the interface block or transmit the substrate to the interface block by using an interface arm(F). A transfer block(S3) is installed between the first and the second processing blocks and includes a plurality of common transfer units of a stacked structure to receive and transmit the substrate from and to a substrate carrying unit included in the unit blocks of the first and the second processing block. The transfer block includes a transfer arm(E) for transferring the substrate between the common transfer units. A developing unit block is installed at least in either of the first and the second processing blocks and is stacked on the film forming unit block. A first direct carrying unit is installed in the first processing block to transfer the substrate between the carrier block and the common transfer units of the transfer block. A second direct carrying unit is installed in the second processing block to transfer the substrate between the common transfer units of the transfer block and the interface block. A control unit controls the transfer unit, the direct carrying unit, the transfer arm, the substrate carrying unit, and the interface arm.

Abstract translation: 提供一种涂覆和显影系统，涂层和显影方法以及存储介质，以通过使用相同的传送路径容易地构成携带程序。 安装第一处理块（S2）以连接到载体块（S1），并且通过堆叠多个包括成膜块的单元块而形成，以便从载体块接收基板或传输基板 通过使用安装在承载块中的传送单元到载波块。 安装第二处理块（S4）以连接到接口块（S5），并且通过堆叠包括成膜单元块的多个单元块而形成，以便从接口块接收基板或者将 通过使用接口臂（F）到接口块的衬底。 传送块（S3）安装在第一处理块和第二处理块之间，并且包括堆叠结构的多个公共传送单元，用于从包括在第一和第二处理块的单元块中的基板传送单元接收和发送基板， 第二处理块。 传送块包括用于在公共传送单元之间传送基板的传送臂（E）。 显影单元块至少安装在第一处理块和第二处理块中的任一个中，并且堆叠在成膜单元块上。 第一直接承载单元安装在第一处理块中，以在承载块和转移块的公共转移单元之间传送基板。 第二直接承载单元安装在第二处理块中，以在传送块的公共传送单元和接口块之间传送基板。 控制单元控制传送单元，直接传送单元，传送臂，基板传送单元和接口臂。

公开(公告)号：KR1020060110213A

公开(公告)日：2006-10-24

申请号：KR1020060034815

申请日：2006-04-18

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 하야시신이찌 ,  후꾸오까데쯔오 ,  오다데쯔야 ,  이나도미히로아끼

IPC: H01L21/324 ,  H01L21/30

CPC classification number: F27B5/04 ,  F27B17/0025 ,  F27D3/0084 ,  H01L21/67109

Abstract: A heating apparatus, a coater, a developing apparatus and a heating method are provided to improve the uniformity of a heat treatment by restraining the difference of temperature between a substrate and a lower surface of a ceiling plate using an air flow generating unit. A heating apparatus comprises a heating plate(53) for loading and heating a substrate, a rectifying ceiling plate(6) over the substrate, a vacuum region(65), and an air flow generating unit. The vacuum region is formed in the ceiling plate in order to be used as a heat insulation portion. The air flow generating unit is used for generating an air flow between the substrate and the ceiling plate.

Abstract translation: 提供加热装置，涂布机，显影装置和加热方法，以通过使用空气流产生单元来限制基板和顶板的下表面之间的温度差来提高热处理的均匀性。 加热装置包括用于加载和加热基板的加热板（53），在基板上方的整流顶板（6），真空区域（65）和空气流产生单元。 真空区域形成在顶板中以用作隔热部分。 气流发生单元用于在基板和顶板之间产生空气流。