Abstract:
PURPOSE: Photopolymerizable unsaturated resin is provided to provide a block-shielding spacer with excellent resolution and elastic restitution while having a low dielectric constant. CONSTITUTION: Photopolymerizable unsaturated resin is a product which is obtained by reacting an epoxy adduct, which is obtained by reacting epoxy resin indicated in chemical formula 1 with an unsaturated basic acid, with a polybasic acid anhydride. A photosensitive resin composition comprises the photopolymerizable unsaturated resin, a functional monomer which has one or more ethylenically unsaturated bonds, a polymerization initiator, a black organic pigment, and a solvent. The black organic pigment includes one or more selected from a group consisting of aniline black, lactam black, and perylene black.
Abstract:
본 발명은 액정 디스플레이 장치의 차광에 사용되는 블랙매트릭스 제조용 초소수성 감광성 수지 조성물에 관한 것으로, 더욱 상세하게는 하기 화학식 1로 표시되는 제 1 중합체와 하기 화학식 2로 표시되는 제 2 중합체를 포함하는 것을 특징으로 하는 내열성, 내화학성, 현상 마진 및 밀착성이 우수한 블랙매트릭스 제조용 초소수성 감광성 수지 조성물 및 그로부터 제조되는 블랙매트릭스에 관한 것이다. [화학식 1]
Abstract:
PURPOSE: A super-hydrophobic photosensitive resin composition and a black matrix manufacture therefrom are provided to ensure enough solubility to developing solution and to prevent smearing between pixels. CONSTITUTION: A super-hydrophobic photosensitive resin composition contains: 1-10 weight% of first polymer of chemical formula 1; 1-40 weight% of second polymer of chemical formula 2; 1-20 weight% of multifunctional (meth)acrylate monomers; 1-20 weight% of photopolymerization initiator; 1-40 weight% of black pigment; and 20-80 weight% of solvent.