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公开(公告)号：KR1020120074616A
公开(公告)日：2012-07-06
申请号：KR1020100136507
申请日：2010-12-28
Applicant: 롬엔드하스전자재료코리아유한회사
CPC classification number: C08G77/16 , C08G77/14 , C08K5/5435 , G03F7/0007 , G03F7/027 , G03F7/038 , G03F7/0757
Abstract: PURPOSE: A photosensitive resin composition, an overcoat layer formed by curing the composition, and electronic devices including the overcoat layer are provided to improve load resistance characteristic regardless of heating and to prevent the generation of cracks at high temperatures. CONSTITUTION: A photosensitive resin composition includes an organic siloxane polymer, an acrylate-based compound with an ethylenically unsaturated double bond, a photo-polymerization initiator, and an organic solvent. The organic siloxane polymer includes one or more selected from an epoxy group, a glycidyl group, and an alcohol group. The organic siloxane polymer includes a chain structure which is formed by the polymerization of components with bifunctional monomer represented by chemical formula 1, trifunctional monomer represented by chemical formula 2, bifunctional monomer represented by chemical formula 3, and trifunctional monomer represented by chemical formula 4. In chemical formulas, R1s are respectively hydrogen elements, C1 to C9 alkyl groups, C5 to C14 cyclic alkyl groups, C6 to C14 aryl groups, C6 to C14 arcaryl groups, or C6 to C14 aralkyl groups; R2s are respectively C1 to C9 alkylene groups, C5 to C14 cyclicalkylene groups, C6 to C14 arcarylene groups, or C6 to C14 aralkylene groups; and Xs are respectively hydroxyl groups, fluorine elements, chlorine elements, bromine elements, iodine elements, or C1 to C6 alkoxy groups.
Abstract translation: 目的：提供一种光敏树脂组合物，通过固化该组合物形成的外涂层和包括该外涂层的电子器件，以改善负载电阻特性而不管加热，并且防止在高温下产生裂纹。 构成：感光性树脂组合物包含有机硅氧烷聚合物，具有烯键式不饱和双键的丙烯酸酯类化合物，光聚合引发剂和有机溶剂。 有机硅氧烷聚合物包括选自环氧基，缩水甘油基和醇基中的一种或多种。 有机硅氧烷聚合物包括由化学式1表示的双官能单体，由化学式2表示的三官能单体，由化学式3表示的双官能单体和由化学式4表示的三官能单体的组分聚合形成的链结构。 在化学式中，R 1分别是氢元素，C 1至C 9烷基，C 5至C 14环烷基，C 6至C 14芳基，C 6至C 14芳酰基或C 6至C 14芳烷基; R2分别为C1至C9亚烷基，C5至C14环亚烷基，C6至C14亚芳基或C6至C14亚芳基; Xs分别是羟基，氟元素，氯元素，溴元素，碘元素或C1-C6烷氧基。
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公开(公告)号：KR101320243B1
公开(公告)日：2013-10-23
申请号：KR1020100136507
申请日：2010-12-28
Applicant: 롬엔드하스전자재료코리아유한회사
CPC classification number: C08G77/16 , C08G77/14 , C08K5/5435 , G03F7/0007 , G03F7/027 , G03F7/038 , G03F7/0757
Abstract: 본 발명은 에폭시기, 글리시딜기 및 알코올기 중에서 선택된 1종 이상을 포함하는 유기 실록산 중합체; 에틸렌성 불포화 아크릴 화합물; 광중합 개시제; 및 유기용매;를 포함하는 감광성 수지 조성물에 관한 것으로서, 컬러기판 상에 회전 도포시 균일하고 안정한 코팅막을 형성하면서 수지 얼룩, 뭉게 얼룩 등의 얼룩 발생을 방지하도록 함과 동시에 단일 광량으로 투과막을 경화하여 현상액을 이용하여 패턴 형성이 용이하며 200∼400℃ 범위의 고온에서 크랙 발생이 없이 가열 하에서도 내하중성이 우수하고, 소성시의 승화물이 적어 열적 안정성이 우수하며, 경화 후에 얻어지는 보호막이 400∼800nm 파장범위에서 95% 이상의 투과율을 갖고, 기판과의 접착력이 5B 이상인 감광성 수지 조성물을 제공할 수 있다.
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公开(公告)号：KR101267674B1
公开(公告)日：2013-05-24
申请号：KR1020100112604
申请日：2010-11-12
Applicant: 롬엔드하스전자재료코리아유한회사
CPC classification number: C08F2/50 , C08L2312/06 , C09D135/00 , G03F7/031 , G03F7/033 , G03F7/0751 , G03F7/0755
Abstract: 본발명은해상도및 잔막률등의감광성특성, 낮은노광영역에서기판과의밀착성, UV 영역에대한내광성및 가시광영역에서의광투과율이양호한감광성수지조성물에관한것으로, 식각공정마진과노광마진그리고내광성이요구되는 TFT-LCD용층간유기절연막용감광성수지조성물에관한것이다.
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公开(公告)号：KR100961560B1
公开(公告)日：2010-06-07
申请号：KR1020090033161
申请日：2009-04-16
Applicant: 롬엔드하스전자재료코리아유한회사
IPC: C08L33/00 , C08F220/00 , C08K5/00 , H01L21/31
Abstract: PURPOSE: A photo-crosslinking resin composition, a dielectric insulating film using thereof, and an electronic device using thereof are provided to improve resolution, light-proof and photosensitivity properties of the dielectric insulating film. CONSTITUTION: A dielectric insulating film is formed by curing a photo-crosslinking resin composition. The photo-crosslinking resin composition contains the following: 100 parts of copolymer by weight polymerized with 5~40mol% of unsaturated carboxylic acid, unsaturated carboxylic acid anhydride or their mixture, 5~70mol% of aromatic unsaturated monomer, 1~10mol % of unsaturated compound including an epoxy group or an oxetane group, and 5~50mol% of methyl methacrylate; 1~150 parts of photo-polymerizable ethylenic unsaturated monomeric compound by weight; 0.5~10 parts of photo initiator by weight; and 0.5~30 parts of functionalized silane compound by weight.
Abstract translation: 目的：提供光交联树脂组合物，其使用的介电绝缘膜及其使用的电子器件，以提高介电绝缘膜的分辨率，耐光性和光敏性。 构成：通过固化光交联树脂组合物形成介电绝缘膜。 光交联树脂组合物含有以下重量份：100重量份的共聚物与5〜40摩尔％的不饱和羧酸，不饱和羧酸酐或它们的混合物聚合，5〜70摩尔％的芳族不饱和单体，1〜10摩尔％的不饱和羧酸 包括环氧基或氧杂环丁烷基的化合物和5〜50mol％的甲基丙烯酸甲酯; 1〜150份可光聚合烯键式不饱和单体化合物; 0.5〜10份重量的光引发剂; 和0.5〜30份官能化硅烷化合物。
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公开(公告)号：KR1020120056938A
公开(公告)日：2012-06-05
申请号：KR1020100112604
申请日：2010-11-12
Applicant: 롬엔드하스전자재료코리아유한회사
CPC classification number: C08F2/50 , C08L2312/06 , C09D135/00 , G03F7/031 , G03F7/033 , G03F7/0751 , G03F7/0755
Abstract: PURPOSE: A photo-sensitive resin composition, an insulating film using the same, and electronic parts thereof are provided to improve permeability and contrast while the thickness of a thermosetting film is kept. CONSTITUTION: A photo-sensitive resin composition includes 100 parts by weight of a copolymer, 0.1-10 parts by weight of a photo-polymerization initiator containing the compound represented by chemical formula 1, 1-150 parts by weight of polymerizable ethylenically unsaturated monomer compounds, 0.5-30 parts by weight of functional silane compounds, and 1-20 parts by weight of one or more compounds selected from the compound represented by chemical formula 2, the compound represented by chemical formula 3, or a mixture of the compounds. The copolymer includes unsaturated carbonic acid, unsaturated carboxylic acid anhydride, or a mixture of the same, an aromatic unsaturated monomer, unsaturated compounds with epoxy groups or oxetane groups or a mixture of the same, and methyl methacrylate. The epoxy groups or oxetane groups are selected from glycidyl methacrylate, 4-hydroxybutyl acrylate triglycidyl ether, and 3-ethyl-3-methylmethacrylate oxetane.
Abstract translation: 目的：提供光敏树脂组合物，使用该树脂组合物的绝缘膜及其电子部件，以在保持热固性膜的厚度的同时提高渗透性和对比度。 构成：光敏树脂组合物包含100重量份共聚物，0.1-10重量份含有由化学式1表示的化合物的光聚合引发剂，1-150重量份可聚合的烯属不饱和单体化合物 ，0.5-30重量份的官能硅烷化合物和1-20重量份的选自化学式2表示的化合物，化学式3表示的化合物或化合物的混合物的一种或多种化合物。 共聚物包括不饱和碳酸，不饱和羧酸酐或其混合物，芳族不饱和单体，不饱和化合物与环氧基或氧杂环丁烷基团或其混合物，和甲基丙烯酸甲酯。 环氧基或氧杂环丁烷基选自甲基丙烯酸缩水甘油酯，丙烯酸4-羟基丁酯三缩水甘油醚和3-乙基-3-甲基甲基丙烯酸酯氧杂环丁烷。
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Patent Agency Ranking
公开(公告)号：KR1020100033603A
公开(公告)日：2010-03-31
申请号：KR1020080092556
申请日：2008-09-22
Applicant: 롬엔드하스전자재료코리아유한회사
CPC classification number: G03F7/033 , G03F7/0007
Abstract: PURPOSE: An alkaline developable super-hydrophobic photosensitive material is provided to be suitable for a partition forming pixels inside LCD cell in an LCD manufacturing process using an ink jet process. CONSTITUTION: An alkaline developable super-hydrophobic photosensitive material for a pixel diaphragm of LCD comprises: (A) a first polymer consisting of (a1) 10~70 weight% radical responsiveness monomer having C4~C30 cyclic or acyclic saturated or unsaturated alkyl group, aryl group, alkylaryl group or alkylaryl group substituents, (a2) ~40 weight% at least one monomer selected from (meth)acrylate, vinyl alcohol, and vinyl thiol, (a3) 5~40 weight% (meth)acrylate with (meth)acryl group or 3-acryloyloxy-2-hydroxypropyl group as a terminated group, and (a4) 5~30 weight% radical responsive monomer with fluorine-substituted C4~C30 cyclic or acyclic saturated or unsaturated alkyl group, aryl group, alkylaryl group or alkylaryl group substituents; (B) 50 ~ 120 parts by weight of multifunctional (meth)acrylate monomer; and (C) 1 ~ 20 parts by weight of a photoinitiator. 50 ~ 1000 parts by weight of solvent is included.
Abstract translation: 目的：提供一种碱性可显影超疏水感光材料，适用于在使用喷墨工艺的LCD制造工艺中形成LCD单元内部的像素的分隔。 构成：用于LCD的像素隔膜的碱显影性超疏水感光材料包括：（A）由（a1）10〜70重量％的具有C 4〜C 30环状或非环状饱和或不饱和烷基的自由基反应性单体组成的第一聚合物， 芳基，烷基芳基或烷基芳基取代基，（a2）〜40重量％的至少一种选自（甲基）丙烯酸酯，乙烯醇和乙烯基硫醇的单体，（a3）5〜40重量％（甲基） ）丙烯酰基或3-丙烯酰氧基-2-羟丙基作为端基，和（a4）5〜30重量％的具有氟取代的C4〜C30环状或非环状饱和或不饱和烷基的自由基反应性单体，芳基，烷基芳基 或烷芳基取代基; （B）50〜120重量份多官能（甲基）丙烯酸酯单体; 和（C）1〜20重量份的光引发剂。 包括50〜1000重量份的溶剂。
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公开(公告)号：KR1020110040640A
公开(公告)日：2011-04-20
申请号：KR1020100042835
申请日：2010-05-07
Applicant: 롬엔드하스전자재료코리아유한회사
IPC: G03F7/027 , G03F7/033 , G03F7/075 , H01L21/312
CPC classification number: G03F7/027 , C07D213/643 , C08F2/50 , G02B5/223 , G03F7/0007 , G03F7/0233 , G03F7/028 , G03F7/031
Abstract: PURPOSE: A photosensitive resin composition, an insulating film and an electronic component using the same are provided to reduce the deviation of a thickness generated in multi-stepped composition layer forming processes. CONSTITUTION: A photosensitive resin composition includes 100.0 parts by weight of a copolymer, 1 to 150 parts by weight of photo-polymerizable ethylenically unsaturated monomer, 0.5 to 30 parts by weight of a functional silane compound, and 1 to 20 parts by weight of one or more compound selected from a compound with chemical formula 1, a compound with chemical formula 2, and the mixture of the same. The copolymer is based on 5 to 40 mol% of unsaturated carboxylic acid and/or unsaturated carboxylic acid anhydride, 5 to 70 mol% of aromatic unsaturated monomer, 1 to 10 mol% of an unsaturated compound with epoxy group, oxetane group, or the mixture of the same, and 5 to 50 mol% of methyl methacrylate.
Abstract translation: 目的：提供一种感光性树脂组合物，绝缘膜和使用其的电子部件，以减少在多阶段组成层形成工序中产生的厚度的偏差。 构成：感光性树脂组合物含有共聚物100.0重量份，光聚合性烯键式不饱和单体1〜150重量份，功能性硅烷化合物0.5〜30重量份，1重量份 或更多选自具有化学式1的化合物，化学式2的化合物及其混合物的化合物。 该共聚物为5〜40摩尔％的不饱和羧酸和/或不饱和羧酸酐，5〜70摩尔％的芳族不饱和单体，1〜10摩尔％的具有环氧基的不饱和化合物，氧杂环丁烷基或 的混合物和5〜50摩尔％的甲基丙烯酸甲酯。
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公开(公告)号：KR101208893B1
公开(公告)日：2012-12-07
申请号：KR1020090071637
申请日：2009-08-04
Applicant: 롬엔드하스전자재료코리아유한회사
CPC classification number: G03F7/0007 , G03F7/033 , G03F7/0388 , G03F7/40
Abstract: 본 발명은 액정 디스플레이 장치의 차광에 사용되는 블랙매트릭스 제조용 초소수성 감광성 수지 조성물에 관한 것으로, 더욱 상세하게는 하기 화학식 1로 표시되는 제 1 중합체와 하기 화학식 2로 표시되는 제 2 중합체를 포함하는 것을 특징으로 하는 내열성, 내화학성, 현상 마진 및 밀착성이 우수한 블랙매트릭스 제조용 초소수성 감광성 수지 조성물 및 그로부터 제조되는 블랙매트릭스에 관한 것이다.
[화학식 1]
[화학식 2]
초소수성, 감광성, 블랙매트릭스, 칼라필터, 액정 디스플레이 장치, 잉크젯-
公开(公告)号：KR1020110013930A
公开(公告)日：2011-02-10
申请号：KR1020090071637
申请日：2009-08-04
Applicant: 롬엔드하스전자재료코리아유한회사
CPC classification number: G03F7/0007 , G03F7/033 , G03F7/0388 , G03F7/40 , G03F7/027 , G03F7/004 , G03F7/0045 , G03F7/0046 , G03F7/028
Abstract: PURPOSE: A super-hydrophobic photosensitive resin composition and a black matrix manufacture therefrom are provided to ensure enough solubility to developing solution and to prevent smearing between pixels. CONSTITUTION: A super-hydrophobic photosensitive resin composition contains: 1-10 weight% of first polymer of chemical formula 1; 1-40 weight% of second polymer of chemical formula 2; 1-20 weight% of multifunctional (meth)acrylate monomers; 1-20 weight% of photopolymerization initiator; 1-40 weight% of black pigment; and 20-80 weight% of solvent.
Abstract translation: 目的：提供超疏水性感光性树脂组合物和由其制造的黑色矩阵，以确保对显影液的足够的溶解性并防止像素间的污染。 构成：超疏水性感光性树脂组合物含有：1-10重量％的化学式1的第一聚合物; 1-40重量％的化学式2的第二聚合物; 1-20重量％的多官能（甲基）丙烯酸酯单体; 1-20重量％的光聚合引发剂; 1-40重量％的黑色颜料; 和20-80重量％的溶剂。
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公开(公告)号：KR101000360B1
公开(公告)日：2010-12-13
申请号：KR1020080092556
申请日：2008-09-22
Applicant: 롬엔드하스전자재료코리아유한회사
CPC classification number: G03F7/033 , G03F7/0007
Abstract: 본 발명은 잉크젯공정을 이용한 LCD제조공정에서 LCD 셀내의 픽셀을 형성하는 격벽으로 적합한 초소수성(super-hydrophobic) 감광성수지 조성물을 제공하는 것이다.
본 발명은 극한의 소수성으로서 증류수에 대한 접촉각이 >90°이고, 에틸셀로솔브에 대한 접촉각이 > 35° 이며, 노광 전후의 현상액에 대하여 충분한 용해도를 가져 10㎛급 이하 까지의 마이크로패턴의 구현이 가능한 투명한 잉크젯용 네가티브 감광성 현상가능한 초소수성재료(Negative photo sensitive developable super hydrophobic materials)를 제공하는 것이다.
초소수성을 제공하기 위해 C4~C30의 포화 혹은 불포화 불소치환 탄소수소기와 포화 혹은 불포화 탄화수소기를 도입한 계의 공중합체에 반응성 사이트로 열 또는 빛에 의해 반응을 하는 부분으로 에폭시기 또는 메타아크릴레이트기 또는 아크릴레이트기 등의 반응성기를 가지는 유닛과 노광후 현상 가능 하도록 카르본산기를 가지는 유닛을 채택한 수지성분과 다관능성 (메타)아크릴레이트를 포함하는 수지조성물을 광개시제에 의한 UV 경화와 열경화 반응을 이용하여 LCD 픽셀 격벽을 제조하는 것이다.
LCD, 초소수성, 픽셀, 격벽, 잉크젯
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