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公开(公告)号:KR1020030061916A
公开(公告)日:2003-07-23
申请号:KR1020020001928
申请日:2002-01-12
Applicant: 삼성전자주식회사
Inventor: 강성철
IPC: F25D17/08
Abstract: PURPOSE: A refrigerator is provided to prevent formation of frost on a front plate of a recovery duct member. CONSTITUTION: A recovery duct member(30) is placed on a lower part a chilled air discharge duct(20) to form a fixed space on a rear wall of a cooling compartment so as to guide chilled air guided by the chilled air discharge duct to the cooling compartment and circulating in the cooling compartment to an evaporator, and includes at least one main air inlet(33); a main air guiding part forming a main air channel(35) guiding air in the cooling compartment introduced through the main air inlet to the evaporator; an auxiliary air inlet(37) separated from the main air inlet; and an auxiliary air guiding part(40) guiding air introduced through the auxiliary air inlet to at least some section of the main air channel. The main air guiding part is a pair of air guiding ribs(34) protruding from a rear side of the recovery duct member toward the rear wall of the cooling compartment in vertical direction to be separated from each other, and having protrusive ends contacting with the rear wall of the cooling compartment to form the main air channel.
Abstract translation: 目的:提供冰箱以防止在回收管道构件的前板上形成霜。 构成:回收管道构件(30)被放置在冷却空气排放管道(20)的下部上,以在冷却室的后壁上形成固定空间,以将由冷却空气排放管道引导的冷却空气引导到 所述冷却室在所述冷却室中循环到蒸发器,并且包括至少一个主空气入口(33); 主空气引导部分,形成主空气通道(35),引导通过主空气入口引入蒸发器的冷却室中的空气; 与主空气入口分离的辅助空气入口(37); 以及辅助空气引导部(40),其将通过辅助空气入口引入的空气引导到主空气通道的至少一部分。 主空气引导部分是从回收管道部件的后侧向垂直方向的冷却室的后壁突出的一对空气引导肋(34),彼此分离,并且具有与 冷却室的后壁形成主空气通道。
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公开(公告)号:KR1020030048327A
公开(公告)日:2003-06-19
申请号:KR1020010078397
申请日:2001-12-12
Applicant: 삼성전자주식회사
IPC: H01L29/786
Abstract: PURPOSE: A method for manufacturing a TFT(Thin Film Transistor) substrate is provided to be capable of preventing the generation of residuals by additionally carrying out a wet cleaning process using a cleaning solution containing nitric acid. CONSTITUTION: A gate line(22) and a gate wiring including a gate electrode(26) are formed on an insulating substrate(10). A gate insulating layer(30) is formed on the resultant structure. A semiconductor layer(40) is formed on the gate insulating layer of the gate electrode. A resistive contact layer is formed on the upper portion of the semiconductor layer. The first conductive layer(601) made of chrome and an upper layer(602) are sequentially formed on the resultant structure. A data line, a source electrode(65) and a data wiring including a drain electrode(66) are formed by etching the first conductive layer and the upper layer using an etchant mixed with Ce(NH4)2(NO3)6 of 8-12 %, NH3 of 4-12 %, and deionized water. Preferably, an additional wet cleaning process is carried out using an etchant containing nitric acid of 4-8 % and deionized water after forming the data wiring.
Abstract translation: 目的:提供一种制造TFT(薄膜晶体管)基板的方法,通过使用含有硝酸的清洗液进行湿式清洗处理,能够防止残留物的产生。 构成:在绝缘基板(10)上形成栅极线(22)和包括栅电极(26)的栅极布线。 在所得结构上形成栅极绝缘层(30)。 在栅电极的栅极绝缘层上形成半导体层(40)。 电阻接触层形成在半导体层的上部。 在所得结构上依次形成由铬构成的第一导电层(601)和上层(602)。 通过使用与8位的Ce(NH 4)2(NO 3)6混合的蚀刻剂蚀刻第一导电层和上层来形成数据线,源极(65)和包括漏极(66)的数据布线, 12%,NH3为4-12%,去离子水。 优选地,在形成数据布线之后,使用含有4-8%的硝酸的腐蚀剂和去离子水进行另外的湿式清洗工艺。
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公开(公告)号:KR1020030032638A
公开(公告)日:2003-04-26
申请号:KR1020010064571
申请日:2001-10-19
Applicant: 삼성전자주식회사
IPC: G03F7/004
CPC classification number: G03F7/0226
Abstract: PURPOSE: Provided is a highly heat-resistant photoresist composition excellent in high heat resistance, which is used for photo process in the production of LCD(liquid crystal device)-TFT(thin film transistor). CONSTITUTION: The photoresist composition comprises (a) 10-50 wt% of novolac resin, (b) 1-20 wt% of epoxy acrylate resin, (c) 3-15 wt% of photosensitizer, and (d) 50-80 wt% of solvent. The novolac resin is a mixture of novolac A resin having weight average molecular weight of 3000-15000 and novolac B resin having weight average molecular weight of 5000-15000, or a novolac B resin having weight average molecular weight of 5000-15000. The mixing ratio of the novolac A resin and novolac B resin is 1:1-9.
Abstract translation: 目的:提供高耐热性的高耐热性光致抗蚀剂组合物,其用于生产LCD(液晶装置)-TFT(薄膜晶体管)中的光刻工艺。 构成:光致抗蚀剂组合物包含(a)10-50重量%的酚醛清漆树脂,(b)1-20重量%的环氧丙烯酸酯树脂,(c)3-15重量%的光敏剂和(d)50-80重量% %的溶剂。 酚醛清漆树脂是重均分子量为3000-15000的酚醛清漆A树脂和重均分子量为5000-15000的酚醛清漆B树脂或重均分子量为5000-15000的酚醛清漆B树脂的混合物。 酚醛清漆A树脂和酚醛清漆B树脂的混合比为1:1-9。
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公开(公告)号:KR1020020057370A
公开(公告)日:2002-07-11
申请号:KR1020010000369
申请日:2001-01-04
Applicant: 삼성전자주식회사
IPC: H01J61/35
Abstract: PURPOSE: A vertical opposite discharge flat lamp is provided to improve discharge stability, luminescence, and uniformity of lamp light. CONSTITUTION: A vertical opposite discharge flat lamp comprises an upper plate(10), a lower plate(20), many outer walls(30), electrodes(40), dielectric layers(42) and a phosphor layer(41). The electrodes(40) are formed on at least two inner opposite surfaces of the outer walls(30). The dielectric layers(42) protect the electrodes(40). The phosphor layer(41) is coated over the upper plate(10) or the lower plate(20). A reflection layer is formed between the lower plate(20) and the phosphor layer(41) for preventing visible light from leaking through the lower plate(20) by reflecting toward the upper plate(10). The phosphor(41) is coated over the inner surface of the outer walls(30). At least one spacer(50) is arranged to avoid damage to the lamp and support space between the upper plate(10) and the lower plate(20).
Abstract translation: 目的:提供垂直的相对放电扁平灯,以提高灯光的放电稳定性,发光和均匀性。 构成:垂直相对放电扁平灯包括上板(10),下板(20),许多外壁(30),电极(40),电介质层(42)和磷光体层(41)。 电极(40)形成在外壁(30)的至少两个内相对表面上。 电介质层(42)保护电极(40)。 荧光体层(41)涂覆在上板(10)或下板(20)上。 在下板(20)和荧光体层(41)之间形成反射层,以防止可见光通过向上板(10)反射而通过下板(20)泄漏。 荧光体(41)涂覆在外壁(30)的内表面上。 设置至少一个间隔件(50)以避免损坏灯和上板(10)和下板(20)之间的支撑空间。
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公开(公告)号:KR1020020041866A
公开(公告)日:2002-06-05
申请号:KR1020000071489
申请日:2000-11-29
Applicant: 삼성전자주식회사
IPC: G03F7/004
CPC classification number: G03F7/039 , G03F7/0048 , G03F7/0395 , G03F7/0397 , G03F7/168 , G03F7/322 , G03F7/425
Abstract: PURPOSE: Provided is a photoresist composition for improving a pin stain, which contains a solvent containing 3-methoxy butyl acetate, n-butyl acetate, and gamma-butyrol lactone. CONSTITUTION: The photoresist composition contains the solvent containing 25-85wt% of 3-methoxy butyl acetate, 15-75wt% of n-butyl acetate, and 1-10wt% of gamma-butyrol lactone, a fluorine-based surfactant such as a fluorinated acrylic copolymer having a molecular weight of 3000-8000, and a polyester-based resin as an additive, such as poly vinyl methyl ether.
Abstract translation: 目的:提供一种用于改善针染色剂的光致抗蚀剂组合物,其包含含有3-甲氧基丁酸乙酯,乙酸正丁酯和γ-丁内酯内酯的溶剂。 构成:光致抗蚀剂组合物含有含有25-85重量%的乙酸3-甲氧基丁酯,15-75重量%的乙酸正丁酯和1-10重量%γ-丁内酯的溶剂,氟基表面活性剂如氟化 分子量为3000〜8000的丙烯酸共聚物,聚乙烯基甲基醚等作为添加剂的聚酯系树脂。
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公开(公告)号:KR100299689B1
公开(公告)日:2001-09-13
申请号:KR1019990036321
申请日:1999-08-30
Applicant: 동우 화인켐 주식회사 , 삼성전자주식회사
IPC: G03F7/039
CPC classification number: G03F7/0048 , G03F7/0226
Abstract: 본발명은감광속도, 잔막율등이우수하고, 악취의발생량이적어작업환경을개선할수 있는포토레지스트조성물로서, 포토레지스트막을형성하기위한고분자수지, 노광에의하여포토레지스트막의용해도를변화시키는감광성화합물및 용매로서 3-메톡시부틸아세테이트및 4-부티로락톤을포함하는포지티브형포토레지스트조성물을제공한다.
Abstract translation: 本发明的光敏化合物和用于改变成膜速度快,残留涂膜等yiwoosu和,作为可写下来产生气味改善工作环境的量的光致抗蚀剂组合物,用于形成膜的光致抗蚀剂聚合物树脂,通过曝光光刻胶膜的溶解度 以及包含乙酸3-甲氧基丁酯和4-丁内酯作为溶剂的正型光刻胶组合物。
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公开(公告)号:KR100299688B1
公开(公告)日:2001-09-13
申请号:KR1019990036320
申请日:1999-08-30
Applicant: 동우 화인켐 주식회사 , 삼성전자주식회사
IPC: G03F7/039
CPC classification number: G03F7/0048 , G03F7/0226
Abstract: 본발명은감광속도, 잔막율등이우수하고, 악취의발생량이적어작업환경을개선할수 있는포토레지스트조성물로서, 포토레지스트막을형성하기위한고분자수지, 노광에의하여포토레지스트막의용해도를변화시키는감광성화합물및 용매로서 3-메톡시부틸아세테이트, 2-헵탄온과 4-부티로락톤을포함하는포지티브형포토레지스트조성물을제공한다.
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公开(公告)号:KR1020000052192A
公开(公告)日:2000-08-16
申请号:KR1019990003102
申请日:1999-01-30
Applicant: 삼성전자주식회사
IPC: F25D21/06
Abstract: PURPOSE: A refrigerator and a refrigerating control method thereof are provided for a freezing cycle to properly countermeasure according to a load condition for improving power saving efficiency, thereby achieving optimum cooling performance. CONSTITUTION: A method for controlling refrigerating of a refrigerator includes the steps of providing an intercooler channel having an intercooler tube divided between output parts of a condenser and a main capillary for heat exchange with a connection refrigerant tube of a freezing cycle and an intercooler capillary for providing refrigerant expanded from the intercooler tube, mounting a selection valve at the output part of the condenser for supply the refrigerant from the condenser to either the standard refrigerant channel or the intercooler channel, and switching the selection valve to supply the refrigerant to the standard channel if an increase of an inside temperature of a refrigerating chamber is higher than a predetermined temperature and switching the selection valve to supply the refrigerant to the intercooler channel if an inside temperature of a freezing chamber is higher than a predetermined temperature.
Abstract translation: 目的:提供一种用于冷冻循环的冰箱及其制冷控制方法,以根据用于提高节能效率的负载条件进行适当的对策,从而实现最佳的冷却性能。 构成:一种用于控制冰箱制冷的方法,包括以下步骤:提供中间冷却器通道,该中间冷却器通道具有分配在冷凝器的输出部分和主毛细管之间的中间冷却器管,用于与冷冻循环的连接制冷剂管和中间冷却器毛细管进行热交换 提供从中间冷却器管膨胀的制冷剂,在冷凝器的输出部分安装选择阀,以将制冷剂从冷凝器供应到标准制冷剂通道或中间冷却器通道,并切换选择阀以将制冷剂供应到标准通道 如果冷藏室的内部温度升高高于预定温度,并且如果冷冻室的内部温度高于预定温度,则切换选择阀以将制冷剂供应到中间冷却器通道。
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公开(公告)号:KR1019980040780A
公开(公告)日:1998-08-17
申请号:KR1019960060017
申请日:1996-11-29
Applicant: 삼성전자주식회사
IPC: H01L21/20
Abstract: 본 발명은 웨이퍼 표면에 흡착된 가스를 용이하게 분석할 수 있는 반도체 웨이퍼 표면 흡착가스 분석장치에 관한 것이다.
본 발명은, 특정고온을 유지할 수 있는 가열로, 상기 가열로 일측에 연결된 대기압 이온화 질량 분석기, 상기 가열로 저면에 설치되고, 하부에 분석용 웨이퍼가 위치하는 석영셀, 일단이 상기 분석용 웨이퍼 중앙부에 위치하여 상기 웨이퍼를 지지하고, 그의 타단이 상기 가열로와 연결되는 배출라인을 구비하여 이루어진다.
따라서, 가열로방식을 채택함으로써 종래의 고진공상태에서 진행되는 분석공정에 비해서 비용이 절감되며, 전체 웨이퍼에 대해서 분석공정이 진행되고, ppb 단위까지 분석이 이루어지는 대기압 이온화 질량 분석기를 이용하여 분석공정이 진행되어 웨이퍼 분석결과에 신뢰성이 향상되는 효과가 있다.-
公开(公告)号:KR1019980039942A
公开(公告)日:1998-08-17
申请号:KR1019960059060
申请日:1996-11-28
Applicant: 삼성전자주식회사
IPC: H01L21/265
Abstract: 본 발명에 따른 이온 크로마토그래피 분석을 위한 농축설비는 시료를 공급하는 농축펌프, 상기 시료에서 특정 범위의 물질을 남기고 잔여물질을 배출할 수 있는 농축컬럼, 상기 농축펌프, 상기 농축컬럼, 가드컬럼 및 운반용매측 조절밸브를 서로 연결시킬 수 있는 시료측 조절밸브, 운반용매를 받아 상기 시료측 조절밸브, 상기 농축컬럼 및 방류라인으로 연결시킬 수 있는 상기 운반용매측 조절밸브를 구비하여 이루어지는 이온 크로마토그래피 분석을 위한 농축설비에 있어서, 상기 농축펌프와 상기 시료측 조절밸브 사이에 댐퍼(Damper)가 더 구비되는 것을 특징으로 한다.
따라서, 본 발명에 의하면 시료 입력시의 펄스 형태가 많이 완화되어 유속과 유량의 안정성이 크게 개선되므로 분석오차를 줄일 수 있다는 이점이 있다.
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