Abstract:
PURPOSE: An apparatus and method for forming graphene pattern are provided to maintain the conductive property and visibility of a graphene by forming a graphene pattern and using an adhesive strength. CONSTITUTION: In an apparatus and method for forming graphene pattern, a bonding layer is formed in a stamp part in which a pattern is formed. The bonding layer of the stamp part is contacted with the graphene layer. A contact part to the adhesive layer is separated from the other part of the graphene layer.
Abstract:
The present invention relates to a graphene coated metal conductor and a flexible flat cable containing the same. More particularly, the present invention relates to a graphene coated metal conductor, a flexible flat cable containing the same, and a manufacturing method thereof. According to the embodiment of the present invention, the graphene coated metal conductor includes a metal conductor; and a graphene layer formed on the metal conductor.
Abstract:
본원은, 플렉서블 비휘발성 메모리 소자용 강유전체 캐패시터, 트랜지스터형 플렉서블 비휘발성 강유전체 메모리 소자, 1T-1R(1Transistor-1Resistor) 플렉서블 강유전체 메모리 소자 및 이들의 제조 방법에 관한 것으로서, 강유전체층과 반도체층 사이의 계면에 고분자 접착층을 형성함으로써 계면에서의 전기적 특성 및 물리화학적 특성을 향상시킬 수 있다.
Abstract:
PURPOSE: A ferroelectric capacitor for a flexible nonvolatile memory device, a flexible nonvolatile ferroelectric memory device, and a manufacturing method thereof are provided to improve electric, physical, and chemical properties in an interface between a ferroelectric layer and a semiconductor layer. CONSTITUTION: A contact layer(110) is formed on a flexible substrate(100). A first electrode(120) is formed on the contact layer. A ferroelectric layer(130) is formed on the first electrode. A second electrode(140) is formed on the ferroelectric layer. An insulation layer(150) is formed on the second electrode layer. A polymer protection layer(160) is formed on the second electrode.
Abstract:
PURPOSE: A method for forming the pattern of a graphene is provided to maintain the conductive property and visibility property of a graphene by forming the screen area of a touch panel or an electrode region. CONSTITUTION: In a method for forming the pattern of a graphene, a graphene layer(602) is formed in a base substrate. A mask(603) is arranged on the top side of the graphene layer. The substrate having the mask is exposed to outside under oxidization atmosphere. The graphene pattern is formed. The mask is eliminated.
Abstract:
PURPOSE: A method for forming an electrode of a touch panel is provided to offer an electrode forming method including a graphene. CONSTITUTION: Carbon is absorbed into a metal catalytic layer by using a chemistry deposition method. A praphene is grown by cooling the metal catalytic layer. A conduction layer is formed by arranging the graphene on one of substrates(10,130). Electrodes are formed on the surface of the conductive layer by processing the metal catalytic layer.
Abstract:
PURPOSE: A method for manufacturing a graphene sheet, the graphene sheet, and an element using the same are provided to maintain the performance of the graphene sheet regardless of the shape deformation of the element. CONSTITUTION: A graphene growing support includes carbonating catalyst. Carbon source and heat are applied to the support to grow a graphene sheet on the support. Either of the support and the graphene sheet is cooled to form corrugation on the graphene sheet. Either of the height or the width of the graphene sheet is controlled by varying the thickness of the graphene sheet during the graphene sheet growing process.
Abstract:
PURPOSE: A transferred thin film transistor and a manufacturing method thereof are provided to separate an active layer from a silicon wafer by a dry etching method and transfer the active layer to a flexible substrate, thereby maximizing productivity. CONSTITUTION: A source area(12), a drain area(14), and a channel area(15) are expanded on a first substrate(10) in a first direction. A trench(18) is expanded on the first substrate in the second direction crossing the first direction. A photoresist pattern(20) is formed on an active layer(16) between the trenches. The first substrate in the trench is etched by an anisotropic etching process so that the active layer is separated from the first substrate. The active layer is bonded with a second substrate.