公开(公告)号：NL2003347A

公开(公告)日：2010-03-16

申请号：NL2003347

申请日：2009-08-12

Applicant: ASML NETHERLANDS BV

Inventor： BOEF ARIE ,  JEUNINK ANDRE ,  VERMEULEN JOHANNES ,  SMITS PASCAL ,  WUISTER SANDER ,  KRUIJT-STEGEMAN YVONNE ,  SCHIFFART CATHARINUS

IPC: G03F7/00

Abstract: A method of determining a position of a substrate relative to an imprint template is described, wherein the imprint template has at least three gratings and the substrate has at least three gratings positioned such that each imprint template grating forms a composite grating with an associated substrate grating, the at least three imprint template gratings and associated substrate gratings having offsets relative to one another. The method includes detecting an intensity of radiation which is reflected by the three composite gratings, and using the detected intensities to determine displacement of the substrate or imprint template from a position.

公开(公告)号：NL2003254A

公开(公告)日：2010-03-10

申请号：NL2003254

申请日：2009-07-21

Applicant: ASML NETHERLANDS BV

Inventor： BOEF ARIE ,  KUIPER JOHANNES

IPC: G01B11/00 ,  G03F7/20 ,  H01L21/66

Abstract: A metrology device for inspecting a substrate is provided. In an embodiment, the metrology device includes a remote radiation source device, an optical system for creating a radiation beam, and an optical fibre for transferring radiation from the optical system to the location where the metrology operations are performed. The optical system includes a control system that includes a deformable mirror, a detector that detects the position of a radiation beam, and a controller that produces a control signal for input into the deformable mirror, the control signal being based on the detected position of the radiation. In this way, the shape of the deformable mirror can be used to control the position of the radiation beam output by the optical system into the optical fibre.