公开(公告)号：NL2008353A

公开(公告)日：2012-10-02

申请号：NL2008353

申请日：2012-02-27

Applicant: ASML NETHERLANDS BV

Inventor： VERMEULEN JOHANNES ,  AKKERMANS JOHANNES ,  WAL MARINUS ,  BEERENS RUUD ,  HUANG YANG-SHAN ,  AANGENENT WOUTER

IPC: G03F7/20

公开(公告)号：NL2006743A

公开(公告)日：2011-12-12

申请号：NL2006743

申请日：2011-05-09

Applicant: ASML NETHERLANDS BV

Inventor： BEERENS RUUD ,  GROOT ANTONIUS ,  VERMEULEN JOHANNES

IPC: G03F7/20 ,  G03F9/00

Abstract: A position sensor is configured to measure a position data of a target. The position sensor includes a radiation source configured to irradiate a radiation beam, a first grating configured to diffract the radiation beam in a first diffraction direction into at least a first order diffraction beam, and a second grating, arranged in an optical path of the first order diffraction beam, the second grating being configured to diffract the first order diffraction beam diffracted at the first grating in a second diffraction direction substantially perpendicular to the first diffraction direction. The second grating is connected to the target. A first detector is configured to detect at least a part of the beam diffracted by the first grating, and at least one second detector is configured to detect at least part of the beam diffracted by the first grating and the second grating.

公开(公告)号：NL2010193A

公开(公告)日：2013-08-06

申请号：NL2010193

申请日：2013-01-28

Applicant: ASML NETHERLANDS BV ,  KONINKL PHILIPS ELECTRONICS NV

Inventor： VEN BASTIAAN ,  GROOT ANTONIUS ,  VERMEULEN JOHANNES ,  CADEE THEODORUS PETRUS MARIA ,  RIJS ROBERTUS MATHIJS GERARDUS ,  LIESHOUT RICHARD HENRICUS ADRIANUS

IPC: G03F7/20 ,  H01L21/68

公开(公告)号：NL2009332A

公开(公告)日：2013-03-26

申请号：NL2009332

申请日：2012-08-17

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  DONDERS SJOERD ,  GROOT ANTONIUS ,  VERMEULEN JOHANNES ,  HUANG YANG-SHAN ,  VALENTIN CHRISTIAAN LOUIS ,  SEGERS HUBERT MARIE ,  BERG JOHAN ,  WESTERLAKEN JAN STEVEN CHRISTIAAN ,  VISSER RAIMOND

IPC: G03F7/20 ,  G03F9/00

Abstract: A lithographic apparatus comprises a substrate table constructed to hold a substrate and a gripper arranged to position the substrate on the substrate table. The gripper includes an electrostatic clamp arranged to clamp the substrate at a top side thereof. The electrostatic clamp is arranged to clamp at least part of a circumferential outer zone of a top surface of the substrate. The invention provides a substrate handling method including positioning the substrate by means of a gripper on a substrate table of a lithographic apparatus. The substrate is clamped at a top side thereof by using an electrostatic clamp of the gripper.

公开(公告)号：NL2008696A

公开(公告)日：2012-11-27

申请号：NL2008696

申请日：2012-04-24

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  VERMEULEN JOHANNES

IPC: G03F7/20 ,  H01L21/68

公开(公告)号：NL2007036A

公开(公告)日：2012-01-31

申请号：NL2007036

申请日：2011-07-04

Applicant: ASML NETHERLANDS BV ,  UNIV EINDHOVEN TECH ,  SORAMA

Inventor： AANGENENT WOUTER ,  VERMEULEN JOHANNES ,  BEERENS RUUD ,  SCHOLTE RICK ,  LOPEZ ARTEAGA INES

IPC: G03F7/20

公开(公告)号：NL2005013A

公开(公告)日：2011-02-02

申请号：NL2005013

申请日：2010-07-01

Applicant: ASML NETHERLANDS BV

Inventor： EIJK JAN ,  PASCH ENGELBERTUS ,  VERMEULEN JOHANNES

IPC: G03F7/20 ,  G03F9/00

Abstract: A positioning system to position a movable object having a body, the positioning system includes an object position measurement system, an object actuator, and an object controller, wherein the positioning system further includes a stiffener to increase the stiffness and/or to damp relative movements within the body of the object, the stiffener including; one or more sensors, wherein each sensor is arranged to determine a measurement signal representative of an internal strain or relative displacement in the body, one or more actuators, wherein each actuator is arranged to exert an actuation force on a part of the body, and at least one controller, configured to provide on the basis of the measurement signal of at least one of the sensors, an actuation signal to at least one of the actuators to increase the stiffness and/or to damp movements within the body.

公开(公告)号：NL2003380A

公开(公告)日：2010-04-20

申请号：NL2003380

申请日：2009-08-21

Applicant: ASML NETHERLANDS BV

Inventor： KRUIJT-STEGEMAN YVONNE ,  JEUNINK ANDRE ,  VERMEULEN JOHANNES

IPC: G03F7/20 ,  H01L21/30

公开(公告)号：NL2007501A

公开(公告)日：2013-04-02

申请号：NL2007501

申请日：2011-09-29

Applicant: ASML NETHERLANDS BV

Inventor： HOL SVEN ANTOIN JOHAN ,  AANGENENT WOUTER ,  CLIJSEN GEORGE ,  AKKERMANS JOHANNES ,  VEER JACOB KORNELIS ,  BOEIJ JEROEN ,  VERMEULEN JOHANNES

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/68

公开(公告)号：NL2009210A

公开(公告)日：2013-02-19

申请号：NL2009210

申请日：2012-07-20

Applicant: ASML NETHERLANDS BV

Inventor： JAGER PIETER ,  BANINE VADIM ,  BLEEKER ARNO ,  SCHOOT HARMEN ,  STEVENS LUCAS ,  VERMEULEN JOHANNES ,  WUISTER SANDER

IPC: G03F7/20