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    IMPRINT LITHOGRAPHY
    2.
    发明申请
    IMPRINT LITHOGRAPHY 审中-公开
    印刷光刻

    公开(公告)号：WO2011107302A3

    公开(公告)日：2011-12-15

    申请号：PCT/EP2011050246

    申请日：2011-01-11

    Applicant: ASML NETHERLANDS BV ,  KRUIJT-STEGEMAN YVONNE ,  DEN BOEF ARIE ,  JEUNINK ANDRE ,  WUISTER SANDER

    Inventor： KRUIJT-STEGEMAN YVONNE ,  DEN BOEF ARIE ,  JEUNINK ANDRE ,  WUISTER SANDER

    IPC: G03F7/00

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7042

    Abstract: A method of determining a position of an imprint template in an imprint lithography apparatus is disclosed. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.

    Abstract translation: 公开了一种确定压印光刻设备中的压印模板的位置的方法。 在一个实施例中，该方法包括通过在该区域上扫描对准辐射束来照射其中预期将找到对准标记的压印模板的区域，检测从该区域反射或透射的辐射的强度，以及识别对准标记 通过分析检测到的强度来标记。

    IMPRINT LITHOGRAPHY APPARATUS AND METHOD
    3.
    发明申请
    IMPRINT LITHOGRAPHY APPARATUS AND METHOD 审中-公开
    印刷光刻设备和方法

    公开(公告)号：WO2010063504A2

    公开(公告)日：2010-06-10

    申请号：PCT/EP2009062963

    申请日：2009-10-06

    Applicant: ASML NETHERLANDS BV ,  KONINK PHILIPS ELECTRONICS B V ,  VAN DER TEMPEL LEENDERT ,  DIJKSMAN JOHAN ,  WUISTER SANDER ,  KRUIJT-STEGEMAN YVONNE ,  LAMMERS JEROEN ,  MUTSAERS CORNELIS

    Inventor： VAN DER TEMPEL LEENDERT ,  DIJKSMAN JOHAN ,  WUISTER SANDER ,  KRUIJT-STEGEMAN YVONNE ,  LAMMERS JEROEN ,  MUTSAERS CORNELIS

    IPC: G03F7/00

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    Abstract: A method of imprint lithography involves the use of a void space in the substrate or imprint template. A gas pocket trapped between an imprint template and an imprintable, flowable medium on the substrate may lead to an irregularity once the imprintable medium has set. A void space allows the gas pocket to dissipate by flow or diffusion of gas into the void space, typically prior to setting the imprintable medium. A layer of solid porous medium as part of the imprint template, for instance as a layer forming or neighbouring the patterning surface of the template, may provide the void space. The void space of the porous layer acts as a void space into which the trapped gas can flow or diffuse. The substrate to be patterned may include a porous layer for the same purpose. A suitable solid porous medium includes a nanoporous silica.

    Abstract translation: 压印光刻的方法涉及在基板或压印模板中使用空隙空间。 一旦可压印介质凝固，被俘获在压印模板和衬底上的可压印的可流动介质之间的气袋可能导致不规则。 通常在设置可压印介质之前，空隙空间允许气穴通过气流或空气扩散进入空隙空间而消散。 作为压印模板的一部分的一层固体多孔介质，例如作为形成或邻近模板的图案化表面的层，可以提供空隙空间。 多孔层的空隙空间充当被捕获的气体可以流入或扩散到其中的空隙空间。 出于相同的目的，待图案化的衬底可以包括多孔层。 合适的固体多孔介质包括纳米多孔二氧化硅。

    IMPRINT LITHOGRAPHY APPARATUS.
    9.
    发明专利
    IMPRINT LITHOGRAPHY APPARATUS. 未知

    公开(公告)号：NL2004680A

    公开(公告)日：2011-01-10

    申请号：NL2004680

    申请日：2010-05-06

    Applicant: ASML NETHERLANDS BV

    Inventor： VERMEULEN JOHANNES ,  JEUNINK ANDRE ,  KRUIJT-STEGEMAN YVONNE

    IPC: G03F7/00

    Abstract: An imprint lithography apparatus is disclosed. The apparatus includes an electromagnetic Lorentz actuator arrangement configured to move an imprint template arrangement, the electromagnetic Lorentz actuator arrangement comprising: an array of magnets; and an array of conductors, each conductor configured to carry an electric current, one of the array of magnets or the array of conductors being moveable and connected to the imprint template arrangement, and the other of the array of magnets or the array of conductors extending at least partially around or forming a part of a substrate holder; the array of magnets and the array of conductors together being in a configuration which facilitates moving of the moveable one of the array of magnets or the array of conductors in six degrees of freedom, such that the imprint template arrangement is also movable in six degrees of freedom.

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