公开(公告)号：JP2500260B2

公开(公告)日：1996-05-29

申请号：JP15850394

申请日：1994-07-11

Applicant: CANON KK

Inventor： YAMAMOTO SEKINORI ,  OOKAWA SHINKICHI ,  MATSUSHITA KOICHI ,  KAWAI YASUO ,  HIGOMURA MAKOTO ,  KARYA TAKUO

IPC: G01B21/00 ,  G03F7/20 ,  G03F9/00 ,  G12B5/00 ,  H01L21/027

公开(公告)号：JP2500258B2

公开(公告)日：1996-05-29

申请号：JP15850094

申请日：1994-07-11

Applicant: CANON KK

Inventor： YAMAMOTO SEKINORI ,  OOKAWA SHINKICHI ,  MATSUSHITA KOICHI ,  KAWAI YASUO ,  HIGOMURA MAKOTO ,  KARYA TAKUO

IPC: G01B21/00 ,  G03F7/20 ,  G03F9/00 ,  G12B5/00 ,  H01L21/027

公开(公告)号：JPS63312641A

公开(公告)日：1988-12-21

申请号：JP14861487

申请日：1987-06-15

Applicant: CANON KK

Inventor： SUZUKI MASAYUKI ,  MOCHIZUKI NORITAKA ,  WATANABE YUTAKA ,  OGURA SHIGETARO ,  KARIYA TAKUO ,  FUKUDA YOSHIAKI ,  KAWAI YASUO ,  MINAMI SETSUO

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To efficiently and accurately align by reversely moving a contraction optical system to enlarge an alignment mark on a stage, and detecting it at an original plate side. CONSTITUTION:A wafer stage made of constituents 50, 51, 52 is moved by drivers 70, 71, and alignment marks 6A, 6B, 6C on the constituent 50 are so positioned as to be sequentially observed by stage alignment scopes 10, 11, 12 through a projection optical system made of reflecting mirrors M1, M2, M3. That is, a semiconductor laser head LZ attached to the lower surface of a supporting plate SS is driven and fired. Then, the stage is so moved that the mark 6A on the stage is brought to a position facing a hole h2. Thereafter, a focusing is detected by the scope 12 by using an alignment mark 2A of the stage 1, the mark 6A of the stage. The wafer stage is moved up or down to focus by a piezoelectric element P1 at this time.

公开(公告)号：JPS63194332A

公开(公告)日：1988-08-11

申请号：JP2645987

申请日：1987-02-09

Applicant: CANON KK

Inventor： CHIBA KEIKO ,  FUJIOKA HIDEHIKO ,  SHIBATA HIROFUMI ,  KATO HIDEO ,  KAWAI YASUO

IPC: G03F1/00 ,  G03F1/22 ,  G03F1/68 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To improve the thermal stability of a lithography mask structure for realizing highly accurate lithography, by controlling and fixing the tempera ture of support substrates which is varied depending on applied energy so as to control the dimensions of a film carrying a masking material. CONSTITUTION:An X-ray absorbing material is deposited on an X-ray transmit ting film 2 in a pattern as desired. The X-ray transmitting film 2 is held by support substrates 3 to have tensile force. An electric resistor film 5 is formed on each of the support substrates 3 through an insulator 4 so that the resistor film 5 is principally used as a heater. A tube 6 is provided within the support substrate 3 for conducting fluid 7 which is used principally for cooling. The tube 6 is connected to a fluid supply 12 by means of a flexible pipe 11 or the like. A temperature of the support substrate 3 is detected by a temperature sensor 9 and the detected result is fed back to a control section, so that the control section actuates the heater or the cooling tube 6. In this manner, the temperature of the mask support substrates can be controlled to be a previously set value.

公开(公告)号：JPS63169244A

公开(公告)日：1988-07-13

申请号：JP22587

申请日：1987-01-06

Applicant: CANON KK

Inventor： MARUMO KOJI ,  KADOSAWA TSUNEAKI ,  KAWAI YASUO

IPC: B23Q3/15 ,  H01L21/67 ,  H01L21/68 ,  H01L21/683

Abstract: PURPOSE:To confirm a suction state of a sample to an electrostatic chuck easily and accurately even in a vacuum, by constituting it to detect a holding state of the sample on the basis of electrostatic capacity at the time of sample mounting. CONSTITUTION:Condensers 14 and 15 eliminate the DC high voltage generated by a power source 13, but it is ignorable alternatingly so that a circuit consisting of condensers 12, 14, 15 and a coil 16 is equivalent to an LC oscillation circuit. Therefore, a reactance oscillation circuit 17 is added to it whereby the resonance frequency (f) conformed to capacity inherent in an electrostatic chuck (condenser 12) is detectable. Accordingly, electrostatic capacity C of the condenser 12 and a mean distance (d) between a sample 1 and an electrostatic chuck surface are securable. Therefore, it detection value of this mean distance is set to d2, and another detection value at a time when the sample 1 is surely held is set to d2, respectively, both these detection values d1 and d2 are compared with each other, whereby whether a suction state of the sample at the time of detection is good or not is judgeable. And, when the sample is warped during the process and goes beyond a allowable mean distance d3, the sample is removed.

公开(公告)号：JPS63166228A

公开(公告)日：1988-07-09

申请号：JP30920886

申请日：1986-12-27

Applicant: CANON KK

Inventor： KATO YUZO ,  KAWAI YASUO

IPC: H01L21/68 ,  H01J37/304 ,  H01L21/027

Abstract: PURPOSE:To detect signals under the respective optimum conditions of radiation for objects whose positions are to be detected, and detect signals under the best conditions also for a filament current, a spot diameter, etc., having an influence on the signals, by providing an electron beam optical equipment in which radiation conditions to irradiate a first and a second objects can be changed. CONSTITUTION:Electron beam optical equipments 13 and 14 measure electric signals 38-45 from a mask 10 and a wafer 11. Conditions of scanning and radiation of these equipments are controlled by an control equipment 15 of the electron beam optical system. The electron beam optical equipment is composed of a part 61 to generate an electron beam, a part 62 to set radiation conditions, a part 63 to control an scanning line, an electron beam transmitting part 64, and a part 65 which detects reflected electrons or the secondary electrons and converts it to an electric signal. As for radiation conditions, values of an acceleration high voltage, a filament current and a spot diameter are set, by changing the respective values of the acceleration high voltage, an alignment power source and a lens power source. Thereby, signals can be detected under the optimum condition. Further, signals can be detected under the optimum condition with respect to causes having an influence of the signals.

公开(公告)号：JPS63138731A

公开(公告)日：1988-06-10

申请号：JP28428586

申请日：1986-12-01

Applicant: CANON KK

Inventor： UDA KOJI ,  KAWAI YASUO

IPC: H01L21/30 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To enable a high-precision exposure with suppressed transfer deformation to be achieved by causing an exposure beam to be incident upon the negative or the substrate on an aligner vertically and in a predetermined relationship. CONSTITUTION:Means DT1-DT3 for detecting the position of an exposure beam BM relative to the main body of an aligner AL are provided, and by relatively positioning the aligner AL main body and the exposure beam BM based on the outputs of the detecting means DT1-DT3, the exposure beam BM is enabled to enter with a predetermined position and angle relative to the exposure AL main body. With this, a high-precision exposure with a minimum transfer deformation can be accomplished, and a high-precision exposure can also be accomplished by a beam from various light sources such as excimer laser light and charged particles beam.

公开(公告)号：JPS60178631A

公开(公告)日：1985-09-12

申请号：JP6133484

申请日：1984-03-28

Applicant: CANON KK

Inventor： KARIYA TAKUO ,  KAWAI YASUO ,  OKUNUKI MASAHIKO ,  GOTOU SUSUMU

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To eliminate a defect of which a gas generated in a target section for an X-ray generator has an adverse effect on other sections by connecting irradiating chambers to a main chamber so that the chambers keep the state of a vacuum severally independently. CONSTITUTION:Connecting sections of both irradiating chambers 5a, 5b and each of a main chamber 1 and a sub-chamber 6 are also kept under the state of a vacuum separately. Sluice valves 9 for mutually isolating each chamber are arranged, and the state of the vacuum in other chambers 1, 6 can be kept by closing the sluice valves and conducting operations when necessities for repair, etc. are generated. Pipes 10 for connecting a vacuum pump for evacuation and each chamber 1, 2, 3, 4, 5a, 5b, 6 are mounted to proper surfaces of several chamber. The irradiating chambers 5a, 5b have X-ray tube bulbs in insides, and a mask and a wafer are placed on bases and irradiated while being moved when they pass through the chambers.

公开(公告)号：JPS59119838A

公开(公告)日：1984-07-11

申请号：JP22845882

申请日：1982-12-27

Applicant: CANON KK

Inventor： KARIYA TAKUO ,  KAWAI YASUO

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To accomplish the X-ray irradiation suitable for mask exposure by a method wherein the X-ray generated from a target containing at least Si is spectral analyzed using InSb crystal. CONSTITUTION:X-ray is generated between the electron gun 2 under a high vacuum state and the target 3 containing Si by applying high voltage. When this X-ray is introduced to a spectral crystal 5 of InSb, a strong X-ray flux of excellent parallelism can be obtained by Bragg diffraction. The narrow-widthed region of a mask 6 extended in the vertical direction of the diagram by the X- ray flux extended in the vertical direction of the diagram can be exposed at the same time, but pertaining to the regions located on the left and the right, they are exposed by moving a holder 8 using a driving device, thereby enabling to perform an exposure on the whole surface of the mask 6. Besides, if a negative potential is given to the spectral crystal 5 of InSb for the filament of the electron gun, the damage generating by the recoiled electron on the spectral crystal can be prevented.

公开(公告)号：JPS56109777A

公开(公告)日：1981-08-31

申请号：JP1247180

申请日：1980-02-06

Applicant: CANON KK

Inventor： KAWAI YASUO

IPC: B41J2/01 ,  B41J25/20 ,  B41J29/00 ,  B41J29/26 ,  B41J29/36

Abstract: PURPOSE:To correct printing rapidly and securely by a method wherein a jetting nozzle for a correction ink which chemically decolors the ink of characters or the like is provided near a dot matrix printing head. CONSTITUTION:A printing command is transmitted from a controller 13 to a controlling means 11 for ink-jetting nozzle 8 through a control cable 12, whereby printing ink 19 is jetted from the tip end of the nozzle 8 to form a dot 19a on printing paper 20. Simultaneously, the printing command from the controller 13 is inputted into a motor 3, whereby a sequential feed is conducted so that the nozzle 8 corresponds to the next dot position, for performing dot matrix printing. When a part of the characters or the like requires correction, a correction command is inputted into the controller 13 to control a feeding mechanism for the paper 20, the motor 3 and the like so that the jetting nozzle 14 for the correction liquid corresponds to the characters or the like to be corrected, and the correction liquid 21 is jetted from the nozzle 14 through a correction-liquid jetting means 17 to cause a chemical reaction between the ink 19 and the liquid 21, thereby decoloring the ink 19 of the character or the like in question.