公开(公告)号：JPH03228309A

公开(公告)日：1991-10-09

申请号：JP2226990

申请日：1990-02-02

Applicant: CANON KK

Inventor： SHIMODA ISAMU ,  KARIYA TAKUO ,  MIZUSAWA NOBUTOSHI ,  OZAWA KUNITAKA ,  UZAWA SHUNICHI

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To enable the specified alignment precision to be given per respective semiconductor chip when steppers in different exposure regions are used together by a method wherein, in order to expose using the second aligner, the alignment errors measured per the same exposure region as that of the first aligner are adjusted to be minimized in the whole exposure region of the second aligner and so forth. CONSTITUTION:In order to perform exposure using the second aligner in the exposure process using the first aligner (photo stepper) together with the second aligner (X ray stepper) having larger exposure region than that of the first aligner, the alignment errors per the same exposure region as that of the first aligner or per the integer times of the exposure region are measured and adjusted to be minimized in the whole exposure region of the second aligner. Furthermore, when the alignment errors can not be adjusted to be less than the specified value in the whole exposure region of the second aligner even if such an adjustment is repeated up to the previously set up times, the exposure region of the second aligner is successively limited to be narrowed so that the alignment may be made to decrease the alignment errors less than the specified value in the whole exposure region of the second aligner.

公开(公告)号：JPH03120713A

公开(公告)日：1991-05-22

申请号：JP25707789

申请日：1989-10-03

Applicant: CANON KK

Inventor： KUROSAWA HIROSHI ,  UDA KOJI ,  OZAWA KUNITAKA ,  UZAWA SHUNICHI ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKUO

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To accurately measure a spot position of a projection beam by a method wherein the projection beam passing through a mask is directly received by a sensor mounted on a stage and the beam spot position is calculated from a sensor signal and data obtained by a stage position measuring system. CONSTITUTION:A transfer pattern formed on a mask 2 by exposed light 1 is printed on a transferred pattern on a wafer with up to the previous layers transferred. A light receiving element 4 installed on a Z tilt stage 6 and a light projecting element 26 fixed on a frame are positioned facing a wafer stage 24. The light receiving element 14 detects a projection light beam 23 for detecting alignment projected from a pickup 12 and a projection beam projected from the light projecting element 26. The projection beam received by the light receiving element 14 enables a position of the center of the beam to be measured accurately with the beam center position calculated by means of gravity detection or the like with position data of the wafer stage added.

公开(公告)号：JPH03120712A

公开(公告)日：1991-05-22

申请号：JP25707689

申请日：1989-10-03

Applicant: CANON KK

Inventor： EBINUMA RYUICHI ,  WATANABE YUTAKA ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKUO ,  UZAWA SHUNICHI

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To reduce an error in registration for improving transfer accuracy by providing an exposure value controlling means for making the exposure value uniform in an exposure range and a position reference controlling means for moving a one-dimensional position reference of the exposure value controlling means with respect to an exposure device frame. CONSTITUTION:A shutter controller 64 controls a position or a moving speed of shutter apertures 36 and 37 at each time point based on a shutter driving table. Thus position references of the shutter apertures 36, 37 are shifted corresponding to a shift y of a current profile 2i with respect to a reference profile 1i due to a y fluctuation of a posture of an aligner 40, and the tip 1a of the shutter aperture is shifted by y to 2a and the rear end 1b is shifted to 2b. Therefore a time required since the tip 2a of the shutter aperture passes by until the rear end 2b passes by is shifted according to a shift amount of the profile 2i to make an exposure value over an entire exposure range uniform.

公开(公告)号：JPH0396248A

公开(公告)日：1991-04-22

申请号：JP23377289

申请日：1989-09-08

Applicant: CANON KK

Inventor： CHIBA YUJI ,  FUJIOKA HIDEHIKO ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKUO ,  SHIMODA ISAMU

IPC: H01L21/677 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To obtain a method improved more in dust prevention for a mask by reducing the pressure in a chamber smaller than that in a front field mask cassette cover in which a mask cassette body and the cover are separated when the body and the cover are separated. CONSTITUTION:In a loading method for a mask cassette for loading a mask cassette body MCM for containing a semiconductor element manufacturing mask MF to a mask cassette cover MCC for substantially sealing the periphery of the body MCM in a chamber MCH for shutting OFF the atmosphere, when the body MCM and the cover MCC are separated in order to convey the body MCM to a position for removing a mask MF from the body MCM, the pressure in the chamber MCH is reduced smaller than that in the cover MCC before the cover MCC is separated.

公开(公告)号：JPH0395918A

公开(公告)日：1991-04-22

申请号：JP23137989

申请日：1989-09-08

Applicant: CANON KK

Inventor： MARUMO KOJI ,  IWAMOTO KAZUNORI ,  HARA SHINICHI ,  KARIYA TAKUO ,  UZAWA SHUNICHI

IPC: H01L21/027 ,  G03F7/20

Abstract: PURPOSE:To reduce pressure loss of temperature regulating fluid and to efficiently perform a heat exchange by providing holding means for fixedly holding a substrate at a body, temperature regulating passage for controlling the temperature of the substrate, and composing the passage of two system passages in which temperature regulating passages are arranged in parallel. CONSTITUTION:A substrate holding device has a body 2 for mounting a substrate, and has a vacuum groove 1 for sucking the substrate by a vacuum type and a vacuum inlet 40. Then, a passage for holding the temperature of the sucked substrate constant is provided. Fluid fed from an inlet 41 is branched to two flows, which are, in turn, fed to passages 11, 12. The one fluid is fed from the outside to the inside, and the other is fed from the inside to the outside to arrive at passages 13, 14. Both the flows are again gathered into one, and fed out from a temperature regulating fluid outlet 42. Two separate system passages in which the inlet, the outlet and a temperature regulating water circulating region are arranged in parallel is provided.

公开(公告)号：JPH0395913A

公开(公告)日：1991-04-22

申请号：JP23138089

申请日：1989-09-08

Applicant: CANON KK

Inventor： CHINJU HIDEYUKI ,  MIZUSAWA NOBUTOSHI ,  IWAMOTO KAZUNORI ,  KARIYA TAKUO ,  UDA KOJI ,  UZAWA SHUNICHI

IPC: F16F15/02 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To improve uniformity of an exposure beam width and to improve a total superposing accuracy by providing means for displacing an apparatus body to a predetermined attitude, means for securing the body to the predetermined attitude, and means for removing an irregular load generated at the securing means when the apparatus is moved. CONSTITUTION:An exposure apparatus is started to expose, and an apparatus body is secured by a grasping unit. A tube 36 is pressurized, an air cylinder 33 is extended, and a shaft 5 is grasped by a hand 29. An exposure stage is moved, and the inner pressures of three air suspensions 2 are varied to set values set at the respective positions for holding the body in a predetermined attitude at the moving positions of the stage. This is executed by feedback control using a pressure gauge 7 provided at the suspension 2. The tube 36 is reduced under pressure, a tube 35 is pressurized, the cylinder 33 is retracted, the hand 29 is separated from the shaft 5, and released from grasping. The same operation is repeated.

公开(公告)号：JPH0298918A

公开(公告)日：1990-04-11

申请号：JP25276188

申请日：1988-10-05

Applicant: CANON KK

Inventor： IWAMOTO KAZUNORI ,  UZAWA SHUNICHI ,  KARIYA TAKUO ,  EBINUMA RYUICHI

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To enhance a uniformity of an exposure line width and to enhance an overall overlapping accuracy by a method wherein a means which corrects a posture of an ligner with reference to an external standard in real time is installed at a vibration-removing mechanism of the exposure device. CONSTITUTION:During an exposure sequence, a distance between a displacement meter 13 and a target 14 is always measured; when the distance deviates from a preset range, it is fed back to a vibration-removing unit 7 and is servo-locked within the preset range. A feedback system sets a solenois valve 30 to a closed state and a solenoid valve 29 to an open state by using a controlling circuit 35, e.g., when a gap between the target 14 and the displacement meter 13 is widened; it instructs a drive circuit 36 about an opening area of an electropneumatic proportional valve 31; it actuates three vibration-removing units independently; it acts so as to set the distance between the displacement meter 13 and the target 14 at the preset range. A surge tank 32 prevents a hunting phenomenon of the vibration-removing units; speed controllers 33, 34 are used to set a servo gain of a delivery and evacuation system. Thereby, an overall overlapping accuracy and a uniformity of an exposure line width can be enhanced.

公开(公告)号：JPH0296812A

公开(公告)日：1990-04-09

申请号：JP24749388

申请日：1988-10-03

Applicant: CANON KK

Inventor： EBINUMA RYUICHI ,  KARIYA TAKUO ,  MIZUSAWA NOBUTOSHI ,  UDA KOJI ,  SAKAMOTO EIJI

IPC: G05D23/00 ,  G03F7/20 ,  G05D23/19 ,  H01L21/027

Abstract: PURPOSE:To simultaneously and precisely temperature-control plural subjects to be temperature controlled in different places by providing a temperature control means controlling the temperatures of a precision constant temperature liquid medium supply device, a distributor and the liquid medium of respective channels which the distributor has distributed. CONSTITUTION:The means supplying the prescribed constant temperature liquid medium, the distribution means 18 distributing the liquid medium from the supply means into plural channels and the means controlling the temperatures of the respective constant temperature liquid mediums which have been distributed are provided. Namely, temperature control means (the control of current values of heaters in heat converters 15-16) are respectively provided for the constant temperature liquid mediums of plural channels 9-11 which have been distributed in correspondence with plural objects which are temperature- controlled 3-5. The variance of the liquid medium temperatures due to the pressure loss energy of the liquid medium channels 9-11 of the objects to be temperature-controlled 3-5 is corrected in the temperature control means. Thus, plural objects to be temperature-controlled 3-5 in the different places can precisely be temperature-controlled with simple constitution.

公开(公告)号：JPH0296605A

公开(公告)日：1990-04-09

申请号：JP24749188

申请日：1988-10-03

Applicant: CANON KK

Inventor： KORENAGA NOBUSHIGE ,  UZAWA SHUNICHI ,  GOTO SUSUMU ,  KARIYA TAKUO

IPC: G01B15/00 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

Abstract: PURPOSE:To increase the number of electrons without enlarging the diameter of a spot and to improve the measuring accuracy of a minute size by forming the spots of the beams from a pair of electron beam mirror tubes at the different points on the surface of a specimen. CONSTITUTION:The optical axes of a pair of electron beam mirror tubes 1a and 1b are located in the same plane. Electron detectors 8a and 8b are arranged at the neighboring parts of the electron beam mirror tubes 1a and 1b. The outputs from the electron detectors 8a and 8b are added in an adder 32 which is connected to said detectors. A central processing unit 40 is connected to an electron beam detector 14 that is a knife edge electrode and beam-position correcting coils 6 and 60 which correct the positions of the electron beam detector 14 and the beams from the electron beam mirror tubes 1a and 1b. The central processing unit 40 determines signal to be applied to the beam-position correcting coils 6 and 60 for the electrode beam mirror tubes 1a and 1b from the electron beam detector 14 as follows: straight lines passing the center of the two beam spots from the electron beam tubes 1a and 1b are in parallel with the scanning direction; and the interval between said centers becomes a specified value.

公开(公告)号：JPH0277809A

公开(公告)日：1990-03-16

申请号：JP22838888

申请日：1988-09-14

Applicant: CANON KK

Inventor： KAWAKAMI EIGO ,  TANAKA YUTAKA ,  UDA KOJI ,  KARIYA TAKUO ,  SHIMODA ISAMU ,  UZAWA SHUNICHI

IPC: G05D16/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/677

Abstract: PURPOSE:To measure and control chamber pressure with high accuracy without using any expensive absolute pressure gauge by controlling a main chamber according to absolute pressure and a subordinate chamber according to the pressure difference from the main chamber. CONSTITUTION:This controller is equipped with the main gas chamber CO, at least one of subordinate gas chambers C1 and C2 linked with the main gas chamber CO through individual partition valves GV1 and GV2 and differential gauges G1 and G2, a pressure control means 10 which measures the pressure in the main gas chamber CO and controls the pressure to specific pressure, and a partition valve control means 20 which controls the opening and closing of the partition valves GV1 and GV2. Then the main chamber CO is controlled according to the absolute pressure and the subordinate chambers C1 and C2 are controlled according to the differential pressure. Consequently, the need to use many expensive absolute pressure sensors is eliminated and high-accuracy pressure control is carried out.