公开(公告)号：DE3740561A1

公开(公告)日：1988-07-21

申请号：DE3740561

申请日：1987-11-30

Applicant: CANON KK

Inventor： FURUKAWA MOTOMU ,  HIGOMURA MAKOTO ,  OHTSUKA MASARU ,  YAMAMOTO HIRONORI ,  OHKAWA SHINKICHI ,  MATSUSHITA KOICHI ,  KAWAI YASUO ,  KARIYA TAKAO ,  KUSUNOKI HARUYUKI ,  YAMAURA TOSHIHIKO

IPC: G03F7/20 ,  G03F7/22 ,  G03F9/00 ,  H02K7/116

Abstract: A stage device usable, e.g., in an X-ray exposure apparatus, for moving a semiconductor wafer placed in a vacuum ambience and held by a wafer chuck, is disclosed. In the stage device, the wafer chuck holds the wafer so that the surface of the wafer onto which a circuit pattern is to be transferred is placed in a vertical plane, and the wafer chuck is moved vertically and horizontally for step-and-repeat exposure of the wafer. The device includes a guide mechanism, locking mechanism and a constant-tension spring mechanism, to thereby ensure high-accuracy movement of the wafer chuck in the vertical direction as well as high-precision positioning of the wafer. Further, in the stage device, a drive source producing a drive to move the wafer chuck is disposed in a vacuum ambience while, on the other hand, the supply of operating fluids to air bearing assemblies, for guiding the movement of the wafer chuck, is achieved by use of metal pipes coupled by rotary joints. The wafer chuck is resiliently supported by one of the air bearing assemblies, such that the wafer chuck can be moved in the vacuum ambience very accurately and without difficulties.

公开(公告)号：DE3538062A1

公开(公告)日：1986-04-30

申请号：DE3538062

申请日：1985-10-25

Applicant: CANON KK

Inventor： NISHIMOTO YOSHIFUMI ,  OKUNUKI MASAHIKO ,  KARIYA TAKAO ,  KAWAI YASUO ,  ATSUTA AKIO

IPC: G01C3/32 ,  G01S17/08 ,  G02B7/32 ,  G03F9/00 ,  G01C3/06 ,  G01B11/14 ,  G02B7/11

Abstract: A position detecting device for detecting the position of an object includes an illumination optical system for producing a light beam and for irradiating the object with the light beam, an optical system for focusing the light beam, a focus position controlling system operative to change the position at which the light beam is focused by the focusing optical system, a first detecting device for receiving the light beam reflected from the object to detect the state of incidence of the light beam on the object, and a second detecting device for detecting the position of the object on the basis of the detection of the state of incidence of the light beam on the object by the first detecting means.

公开(公告)号：DE3133659A1

公开(公告)日：1982-05-06

申请号：DE3133659

申请日：1981-08-26

Applicant: CANON KK ,  CANON DENSHI KK

Inventor： YOSHIDA SHIGERU ,  KAWAI YASUO

IPC: G11B23/033 ,  G11B17/04 ,  G11B23/04 ,  G11B5/016

Abstract: A magnetic sheet cassette device consisting of a rigid casing and a magnetic sheet housed therein, featured in having cavities between the recording faces of the magnetic sheet and the casing for preventing abrasion or damage by bending of the recording faces, featured further in having plural apertures in the casing corresponding to the index hole of the magnetic sheet in order to allow detection thereof with a single photocoupler even when the cassette device is inverted, and featured in having an aperture for prohibiting information write-in in a part of the cassette device in order to prevent erroneous erasure of the recorded information.

公开(公告)号：FR2489576A1

公开(公告)日：1982-03-05

申请号：FR8116305

申请日：1981-08-26

Applicant: CANON KK

Inventor： YOSHIDA SHIGERU ,  KAWAI YASUO

IPC: G11B23/033 ,  G11B23/04 ,  G11B5/82

Abstract: A magnetic sheet cassette device consisting of a rigid casing and a magnetic sheet housed therein, featured in having cavities between the recording faces of the magnetic sheet and the casing for preventing abrasion or damage by bending of the recording faces, featured further in having plural apertures in the casing corresponding to the index hole of the magnetic sheet in order to allow detection thereof with a single photocoupler even when the cassette device is inverted, and featured in having an aperture for prohibiting information write-in in a part of the cassette device in order to prevent erroneous erasure of the recorded information.

公开(公告)号：DE3752388T2

公开(公告)日：2006-10-19

申请号：DE3752388

申请日：1987-07-08

Applicant: CANON KK

Inventor： SUZUKI MASAYUKI ,  MOCHIZUKI NORITAKA ,  MINAMI SETSUO ,  OGURA SHIGETARO ,  FUKUDA YASUAKI ,  WATANABE YUTAKA ,  KAWAI YASUO ,  KARIYA TAKAO

IPC: G03F7/20 ,  G02B17/06

Abstract: An X-ray exposure apparatus includes a stage (1) for holding a reflection type mask (MS) having a multilayered reflection pattern for circuit manufacturing, a stage (50) for holding a wafer (WF) to be exposed to the pattern of the mask with X-rays, and a reflection reduction imaging system, disposed between the mask stage and the wafer stage, including a reflecting mirror arrangement, containing a plurality of curved reflecting mirrors (M1, M2, M3) coated with multilayer films, for receiving X-rays from a mask (MS) and directing them to a wafer (WF) to expose the wafer to the pattern of the mask with the X-rays in a reduced scale.

公开(公告)号：DE3752314T2

公开(公告)日：2000-09-14

申请号：DE3752314

申请日：1987-07-08

Applicant: CANON KK

Inventor： SUZUKI MASAYUKI ,  MOCHIZUKI NORITAKA ,  MINAMI SETSUO ,  OGURA SHIGETARO ,  FUKUDA YASUAKI ,  WATANABE YUTAKA ,  KAWAI YASUO ,  KARIYA TAKAO

IPC: G02B17/06 ,  G03F7/20 ,  G02B5/08 ,  G21K1/06

Abstract: An X-ray exposure apparatus includes a stage (1) for holding a reflection type mask (MS) having a multilayered reflection pattern for circuit manufacturing, a stage (50) for holding a wafer (WF) to be exposed to the pattern of the mask with X-rays, and a reflection reduction imaging system, disposed between the mask stage and the wafer stage, including a reflecting mirror arrangement, containing a plurality of curved reflecting mirrors (M1, M2, M3) coated with multilayer films, for receiving X-rays from a mask (MS) and directing them to a wafer (WF) to expose the wafer to the pattern of the mask with the X-rays in a reduced scale.

公开(公告)号：DE3133659C2

公开(公告)日：1994-01-13

申请号：DE3133659

申请日：1981-08-26

Applicant: CANON KK ,  CANON DENSHI KK

Inventor： YOSHIDA SHIGERU ,  KAWAI YASUO

IPC: G11B23/033 ,  G11B23/03

Abstract: A magnetic sheet cassette device consisting of a rigid casing and a magnetic sheet housed therein, featured in having cavities between the recording faces of the magnetic sheet and the casing for preventing abrasion or damage by bending of the recording faces, featured further in having plural apertures in the casing corresponding to the index hole of the magnetic sheet in order to allow detection thereof with a single photocoupler even when the cassette device is inverted, and featured in having an aperture for prohibiting information write-in in a part of the cassette device in order to prevent erroneous erasure of the recorded information.

公开(公告)号：GB2167262B

公开(公告)日：1988-11-02

申请号：GB8526374

申请日：1985-10-25

Applicant: CANON KK

Inventor： NISHIMOTO YOSHIFUMI ,  OKUNUKU MASAHIKO ,  KARIYA TAKAO ,  KAWAI YASUO ,  ATSUTA AKIO

IPC: G01C3/32 ,  G01S17/08 ,  G02B7/32 ,  G03F9/00 ,  G02B7/11

Abstract: A position detecting device for detecting the position of an object includes an illumination optical system for producing a light beam and for irradiating the object with the light beam, an optical system for focusing the light beam, a focus position controlling system operative to change the position at which the light beam is focused by the focusing optical system, a first detecting device for receiving the light beam reflected from the object to detect the state of incidence of the light beam on the object, and a second detecting device for detecting the position of the object on the basis of the detection of the state of incidence of the light beam on the object by the first detecting means.

公开(公告)号：GB2155201B

公开(公告)日：1988-07-13

申请号：GB8418145

申请日：1984-07-17

Applicant: CANON KK

Inventor： KARIYA TAKAO ,  KAWAI YASUO ,  OKUNUKI MASAHIKO ,  GOTOH SUSUMU

IPC: G03F7/20 ,  G03B42/02

Abstract: An X-ray exposure apparatus wherein a member sensitive to X-ray is exposed to a pattern formed on a mask with the X-rays, includes an X-ray source for emitting X-rays, an irradiation chamber for accommodating the mask and the sensitive member and exposing them to the X-rays emitted by the X-ray source within the chamber and a vacuum pump for evacuating the chamber to effect the exposure operation in a vacuum.

公开(公告)号：GB2155201A

公开(公告)日：1985-09-18

申请号：GB8418145

申请日：1984-07-17

Applicant: CANON KK

Inventor： KARIYA TAKAO ,  KAWAI YASUO ,  OKUNUKI MASAHIKO ,  GOTOH SUSUMU

IPC: G03F7/20 ,  G03B42/02

Abstract: X-ray exposure apparatus has an irradiation chamber, for accomodating the mask and substrate to be exposed, provided with a vacuum pump so that exposure can be made under vacuum. Preferably is in direct contact with the chamber space around the X-ray source and a pressure of less than 1 x 10 Torr is used. Prior to exposure the substrate can be housed in another chamber which is in communication with the irradiation chamber and which can also be maintained under a vacuum.