公开(公告)号：US08986563B2

公开(公告)日：2015-03-24

申请号：US13530569

申请日：2012-06-22

Applicant: Michael Thiel ,  Martin Hermatschweiler

Inventor： Michael Thiel ,  Martin Hermatschweiler

IPC: C03C15/00 ,  B81C1/00

CPC classification number: B81C1/00373 ,  B33Y10/00 ,  B33Y80/00 ,  B81B2203/0392 ,  B81B2207/07 ,  B81C2201/0187 ,  G03F7/0037

Abstract: A method for producing three-dimensional microstructures in which a source material is applied on a substrate, with a property changing by exposure with electromagnetic radiation. A three-dimensional source structure is written via spatially-resolving exposure in the source material, the source material is removed except for the source structure, and the source structure is molded with a target material, from which the microstructure to be produced is made. Here, a shell structure is provided surrounding the microstructure to be produced, with the source structure being created as the shell structure or the shell structure is produced using the source structure, and subsequently the target material is inserted into the shell structure.

Abstract translation: 一种用于产生三维微结构的方法，其中源材料施加在基底上，具有通过用电磁辐射曝光而改变的性质。 通过在源材料中的空间分辨曝光来写入三维源结构，除了源结构之外，除去源材料，并且用目标材料模制源结构，由此制造待生产的微结构。 这里，围绕要生产的微观结构提供壳结构，其中源结构被创建为壳结构，或者使用源结构产生壳结构，并且随后将靶材插入壳结构中。

公开(公告)号：US20140212641A1

公开(公告)日：2014-07-31

申请号：US14233011

申请日：2013-03-04

Applicant: Global Froniter Center for Multiscale Systems ,  SNU R& DB FOUNDATION

Inventor： Hoseop Choi ,  Man Soo Choi

IPC: B81C1/00

CPC classification number: B81C1/00373 ,  B81C1/00031 ,  B81C2201/0187 ,  Y10T428/24893

Abstract: The present invention relates to a process for producing a 3-dimensional structure assembled from nanoparticles by using a mask having a pattern of perforations, which comprises the steps of: in a grounded reactor, placing a mask having a pattern of perforations corresponding to a determined pattern at a certain distance above a substrate to be patterned, and then applying voltage to the substrate to form an electrodynamic focusing lens; and introducing charged nanoparticles into the reactor, the charged particles being guided to the substrate through the pattern of perforations so as to be selectively attached to the substrate with 3-dimensional shape. According to the process of the present invention, a 3-dimensional structure of various shapes can be produced without producing noise pattern, with high accuracy and high efficiency.

Abstract translation: 本发明涉及一种通过使用具有穿孔图案的掩模从纳米颗粒制备的三维结构的方法，其包括以下步骤：在接地的反应器中，放置具有对应于确定的孔的穿孔图案的掩模 在要图案化的基板上方一定距离的图案，然后向基板施加电压以形成电动聚焦透镜; 并将带电的纳米颗粒引入反应器中，带电粒子通过穿孔图形被引导到基底，以便以三维形状选择性地附着到基底上。 根据本发明的方法，可以以高精度和高效率产生各种形状的三维结构而不产生噪声图案。

公开(公告)号：US20120180676A1

公开(公告)日：2012-07-19

申请号：US13389113

申请日：2010-08-05

Applicant: Christine P. Tan ,  David M. Lin ,  Harold G. Craighead

Inventor： Christine P. Tan ,  David M. Lin ,  Harold G. Craighead

IPC: B05C17/06 ,  B41M1/12

CPC classification number: B41M3/006 ,  B81C1/00031 ,  B81C2201/0184 ,  B81C2201/0187

Abstract: An apparatus for forming an array of deposits on a substrate is disclosed. The apparatus may include a stencil capable of releasable attached to the substrate and having an array of openings and at least one alignment mark. The apparatus may further include a high throughput deposition printer aligned with the stencil to form an array of deposits on the substrate. The array of deposits may be aligned with the array of openings through the at least one alignment mark and an optional alignment device. Methods of manufacturing the stencil and using it to generate multiplexed or combinatorial arrays are also disclosed.

Abstract translation: 公开了一种用于在衬底上形成沉积物阵列的装置。 该装置可以包括能够可释放地附接到基底并具有开口阵列和至少一个对准标记的模版。 该装置还可以包括与模板对准的高通量沉积打印机，以在衬底上形成沉积物阵列。 沉积物阵列可以与通过至少一个对准标记的开口阵列和可选的对准装置对齐。 还公开了制造模板并将其用于生成多路复用或组合阵列的方法。

公开(公告)号：US6039897A

公开(公告)日：2000-03-21

申请号：US919464

申请日：1997-08-28

Applicant: Michael J. Lochhead ,  Paul Yager

Inventor： Michael J. Lochhead ,  Paul Yager

IPC: B29C33/40 ,  B29C33/42 ,  B29C39/24 ,  B81C1/00 ,  G03F7/00 ,  B29D11/00

CPC classification number: B82Y10/00 ,  B29C33/405 ,  B29C33/42 ,  B29C39/24 ,  B81C1/00373 ,  B82Y40/00 ,  G03F7/0002 ,  B81C2201/0187

Abstract: A method for patterning a material onto a substrate including the steps of: providing a micro-mold having a plurality of non-communicating independent channels and having a plurality of reservoirs for receiving a micro-molding fluid each of which reservoirs communicates with a channel, the micro-mold including an elastomeric master having a surface with a plurality of recesses therein and a substrate; introducing a micro-molding fluid into the micro-mold reservoirs filling said communicating channels; and solidifying the fluid in the micro-mold and removing the elastomeric master thereby generating a pattern of material on the substrate. The micro-mold is formed by contacting the surface of the elastomeric master with the substrate such that the recesses in the surface form the plurality of reservoirs and channels.

Abstract translation: 一种用于将材料图案化到衬底上的方法，包括以下步骤：提供具有多个不连通的独立通道的微型模具，并具有多个用于容纳每个储存器与沟道连通的微型模塑流体的储存器， 所述微型模具包括弹性体主体，所述弹性体主体具有其中具有多个凹部的表面和基板; 将微型流体引入到填充所述连通通道的微型模具储存器中; 并固化微型模具中的流体并且移除弹性体主体，从而在衬底上产生材料图案。 微型模具通过使弹性体主体的表面与基底接触而形成，使得表面中的凹部形成多个储存器和通道。

公开(公告)号：WO2016096735A1

公开(公告)日：2016-06-23

申请号：PCT/EP2015/079605

申请日：2015-12-14

Applicant: UNIVERSITÄT ULM

Inventor： STREHLE, Steffen ,  ROSSKOPF, Daniel Markus ,  PROBST, Andreas Magnus

IPC: B82B3/00 ,  B81C1/00 ,  H01L21/768 ,  H05K3/20

CPC classification number: B05D1/28 ,  B81C1/00373 ,  B81C2201/0185 ,  B81C2201/0187 ,  B82B3/0066 ,  H05K1/0306 ,  H05K1/09 ,  H05K3/102 ,  H05K3/1275 ,  H05K2201/026 ,  H05K2201/09036 ,  H05K2201/09045 ,  H05K2203/0108 ,  H05K2203/0271 ,  H05K2203/0528

Abstract: Erfindungsgemäß wird ein Verfahren zur Herstellung eines mit Nanodrähten strukturierten Substrats bereitgestellt, das dadurch gekennzeichnet ist, dass in dem Verfahren kein Gleitmittel und keine lithographische Lackmaske verwendet wird und nur durch das Bewegen eines Donorsubstrats mit Nanodrähten relativ zu einem Substrat und lokal unterschiedliche tribologische Eigenschaften auf der Oberfläche des Substrats selektiv an lokal definierten Stellen des Substrats eine bestimmte Anzahl Nanodrähte abgelegt wird. Zudem wird ein Substrat bereitgestellt, das durch das erfindungsgemäße Verfahren herstellbar ist und an einer Oberfläche selektiv an lokal definierten Stellen eine bestimmte Anzahl Nanodrähte enthält. Ferner wird die Verwendung des erfindungsgemäßen Substrats in der Mikroelektronik, Mikrosystemtechnik und/oder Mikrosensorik vorgeschlagen.

Abstract translation: 根据本发明的形成的方法的与纳米线基底图案设置，其特征在于，没有润滑剂和无光刻抗蚀剂掩模在该过程中，只有通过用相对的纳米线的供体基板移动到基材上并在局部不同的摩擦特性使用 衬底到衬底的纳米线的一定数目的将被选择性地沉积的局部定义的区域的表面上。 此外，提供了一种衬底，其可以通过本发明的方法和到本地定义的位置来生产含有一定数目选择性纳米线的表面。 此外，根据本发明在微电子使用所述基板的，微系统技术和/或微传感器提出。

公开(公告)号：WO2011017487A3

公开(公告)日：2011-05-26

申请号：PCT/US2010044493

申请日：2010-08-05

Applicant: UNIV CORNELL ,  TAN CHRISTINE P ,  LIN DAVID M ,  CRAIGHEAD HAROLD G

Inventor： TAN CHRISTINE P ,  LIN DAVID M ,  CRAIGHEAD HAROLD G

IPC: H01L21/027

CPC classification number: B41M3/006 ,  B81C1/00031 ,  B81C2201/0184 ,  B81C2201/0187

Abstract: An apparatus for forming an array of deposits on a substrate is disclosed. The apparatus may include a stencil capable of releasable attached to the substrate and having an array of openings and at least one alignment mark. The apparatus may further include a high throughput deposition printer aligned with the stencil to form an array of deposits on the substrate. The array of deposits may be aligned with the array of openings through the at least one alignment mark and an optional alignment device. Methods of manufacturing the stencil and using it to generate multiplexed or combinatorial arrays are also disclosed.

Abstract translation: 公开了一种用于在衬底上形成沉积物阵列的设备。 该设备可以包括能够可释放地附着到基板并且具有开口阵列和至少一个对准标记的模版。 该设备可以进一步包括与模版对准的高吞吐量沉积印刷机，以在衬底上形成沉积物阵列。 沉积物阵列可以与通过至少一个对准标记和任选的对准装置的开口阵列对准。 还公开了制造模板并使用它来生成多路复用或组合阵列的方法。

公开(公告)号：WO2009000969A1

公开(公告)日：2008-12-31

申请号：PCT/FI2008/050383

申请日：2008-06-23

Applicant: CANATU OY ,  BROWN, David P. ,  OLLIKAINEN, Andrei ,  KAUPPINEN, Esko I. ,  NASIBULIN, Albert G. ,  HEIKKONEN, Jussi

Inventor： BROWN, David P. ,  OLLIKAINEN, Andrei ,  KAUPPINEN, Esko I. ,  NASIBULIN, Albert G. ,  HEIKKONEN, Jussi

IPC: B82B3/00 ,  H01L51/50 ,  B32B9/00 ,  C08J5/18

CPC classification number: B81C1/00357 ,  B81C1/00373 ,  B81C1/00476 ,  B81C1/00492 ,  B81C2201/0187 ,  B81C2201/0188 ,  B81C2201/0194 ,  C01B32/15 ,  C01B32/168 ,  C01P2004/13 ,  C01P2004/16 ,  C04B14/026 ,  C04B30/02 ,  C04B2111/00844 ,  C04B2111/00853 ,  Y10T428/24802

Abstract: A method for the production of a fibrous network- substrate component. The method comprises the steps of providing a network of fibrous material (1) on a preliminary substrate (2) by filtering high aspect ratio molecular structures (HARM-structures) from gas flow, placing the network of fibrous material (1) on the preliminary substrate (2) in proximity to a secondary substrate (3), applying a force to the network of fibrous material (1) to preferably attract the network of fibrous material (1) from the preliminary substrate (2) to the secondary substrate (3) in order to transfer the network of fibrous material (1) from the preliminary substrate (2) to the secondary substrate (3), and removing the preliminary substrate (2) from the network of fibrous material (1).

Abstract translation: 一种生产纤维网状基材组分的方法。 该方法包括以下步骤：通过从气流中过滤高纵横比分子结构（HARM结构），将纤维材料网（1）放置在预备的基底（2）上，从而在预备基底（2）上提供纤维材料网（1） 在第二基底（3）附近的衬底（2），向纤维材料（1）的网络施加力以优选地将纤维材料（1）的网络从预备衬底（2）吸引到次级衬底（3） ）以将纤维材料（1）的网络从预备衬底（2）转移到第二衬底（3），并从纤维材料（1）的网络去除预备衬底（2）。

公开(公告)号：KR1020150015130A

公开(公告)日：2015-02-10

申请号：KR1020130090733

申请日：2013-07-31

Applicant: 아주대학교산학협력단

Inventor： 조성운 ,  김창구

IPC: C23C18/22 ,  C23C18/31 ,  C23F4/00 ,  H01L21/3065

CPC classification number: C23F1/12 ,  B22F1/0018 ,  B22F1/0044 ,  B22F9/02 ,  B22F2001/0037 ,  B22F2304/05 ,  B81C1/00492 ,  B81C2201/0187 ,  B81C2201/034 ,  C23C18/1605 ,  C23C18/1657 ,  C23C18/1893 ,  C23C18/405 ,  C23F4/00 ,  H01J2237/0203 ,  H01J2237/3341 ,  H01L21/288 ,  Y10T29/49982

Abstract: The present invention relates to a method of forming a three-dimensional copper nanostructure which includes steps of: manufacturing a test piece in a structure including an SiO2 mask; etching a plasma inclined in multiple directions to form a three-dimensional etching structure layer on the test piece; coating to enable metal to be filled in the portion in which the plasma inclined in multiple directions is etched; removing an overcoated portion and the SiO2 mask from the metal; and removing portions besides the metal which is the three-dimensional etching structure layer from the surface of the test piece. According to the present invention, to overcome a limitation of a focused ion beam etching (FIBE) method for manufacturing a copper nanostructure, a high-density plasma is used for etching the plasma inclined in multiple directions on a large test piece arranged on a faraday box, a copper film is formed on a gap of the etched test piece, and the overcoated copper film and the SiO2 mask are removed, thereby forming uniform arrays of a copper nanostructure, and being able to randomly control a diameter of the copper nanostructure for high applicability.

Abstract translation: 本发明涉及一种形成三维铜纳米结构的方法，包括以下步骤：在包括SiO 2掩模的结构中制造试片; 蚀刻沿多个方向倾斜的等离子体，在试片上形成三维蚀刻结构层; 涂覆以使金属能够被填充在其中等离子体在多个方向上倾斜的部分被蚀刻; 从金属中除去外涂部分和SiO 2掩模; 从该试片的表面除去作为三维蚀刻结构层的金属以外的部分。 根据本发明，为了克服用于制造铜纳米结构的聚焦离子束蚀刻（FIBE）方法的限制，使用高密度等离子体在布置在法拉第的大型试片上蚀刻沿多个方向倾斜的等离子体 在蚀刻试验片的间隙上形成铜膜，除去外涂铜膜和SiO 2掩模，形成均匀的铜纳米结构体阵列，能够随机控制铜纳米结构体的直径 适用性高。

公开(公告)号：KR1020140009878A

公开(公告)日：2014-01-23

申请号：KR1020120076891

申请日：2012-07-13

Applicant: 서울대학교산학협력단 ,  재단법인 멀티스케일 에너지시스템 연구단

Inventor： 최호섭 ,  최만수

IPC: H01L21/027

CPC classification number: B81C1/00373 ,  B81C1/00031 ,  B81C2201/0187 ,  Y10T428/24893 ,  H01L21/0274

Abstract: The present invention relates to a method for producing a three-dimensional structure which is made of nanoparticles using a mask with a perforated pattern. The method for producing a three-dimensional structure according to the present invention is characterized by comprising the following steps of: (1) placing a patterned mask with perforations which have a predetermined width (w) and a predetermined distance (d) above a substrate to be patterned inside a grounded reactor, and forming an electro dynamic focusing lens by applying voltage; and (2) introducing charged nanoparticles, inducing the charged particles to the substrate through the mask pattern, and attaching the charged nanoparticles onto the substrate three-dimensionally. According to the present invention, various shapes of three-dimensional structures can be produced very accurately and efficiently without forming a noise pattern. [Reference numerals] (AA) Mask; (BB) Substrate

Abstract translation: 本发明涉及一种使用具有穿孔图案的掩模的纳米颗粒制造三维结构的方法。 根据本发明的三维结构的制造方法的特征在于包括以下步骤：（1）将具有预定宽度（w）和预定距离（d）的穿孔的图案化掩模放置在基板上方 在接地的反应器内进行图案化，并通过施加电压形成电动聚焦透镜; 和（2）引入带电的纳米粒子，通过掩模图案将带电粒子诱导到基底，并将带电荷的纳米粒子三维地附着到基底上。 根据本发明，可以非常精确和有效地制造各种形状的三维结构，而不形成噪声图案。 （附图标记）（AA）掩模; （BB）基板

公开(公告)号：KR101391010B1

公开(公告)日：2014-04-30

申请号：KR1020120076891

申请日：2012-07-13

Applicant: 서울대학교산학협력단 ,  재단법인 멀티스케일 에너지시스템 연구단

Inventor： 최호섭 ,  최만수

IPC: H01L21/027

CPC classification number: B81C1/00373 ,  B81C1/00031 ,  B81C2201/0187 ,  Y10T428/24893

Abstract: 본 발명은 패턴-천공된 마스크를 이용하여 나노입자로 조립된 3차원 구조물을 제조하는 방법에 관한 것으로서, (1) 접지된 반응기 내에서, 패터닝하고자 하는 기판 위에, 소정 폭(w)으로 천공된 패턴을 갖는 마스크를 상기 기판으로부터 소정거리(d) 이격되도록 위치시키고, 전압을 인가하여 전기적 집속 렌즈를 형성하는 단계; 및 (2) 하전된 나노입자를 도입하여, 마스크의 패턴을 통해 하전입자를 기판으로 유도하여 하전된 나노입자를 3차원 형상으로 기판에 집속 부착되도록 하는 단계를 포함하는 것을 특징으로 한다. 이러한 본 발명의 방법에 의하면, 노이즈 패턴을 생성하지 않으면서 다양한 형상의 3차원 구조물을 고정밀, 고효율로 제조할 수 있다.