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    41.
    发明专利
    未知

    公开(公告)号：NL7503830A

    公开(公告)日：1976-10-05

    申请号：NL7503830

    申请日：1975-04-01

    Applicant: PHILIPS NV

    IPC: H01J9/44 ,  H01J29/51 ,  H01J29/54 ,  H01J29/70 ,  H01J3/07 ,  H04N9/28

    Abstract: An in-line CRT features a static convergence means. It has at most two permanent magnets in or around the tube neck before the deflection coils.

    Masked ion implant with fast-slow scan
    42.
    发明授权
    Masked ion implant with fast-slow scan 失效
    具有快速扫描的掩蔽离子植入物

    公开(公告)号：US08461553B2

    公开(公告)日：2013-06-11

    申请号：US13188837

    申请日：2011-07-22

    Applicant: Nicholas P. T. Bateman ,  Steven M. Anella ,  Benjamin B. Riordon ,  Atul Gupta

    Inventor： Nicholas P. T. Bateman ,  Steven M. Anella ,  Benjamin B. Riordon ,  Atul Gupta

    IPC: H01J37/317 ,  H01J37/244 ,  H01J3/07 ,  G21K5/10

    CPC classification number: H01J37/3171 ,  H01J37/20 ,  H01J2237/20228 ,  H01J2237/31711 ,  H01L21/266 ,  H01L31/068 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

    Abstract: An improved method of producing solar cells utilizes a mask which is fixed relative to an ion beam in an ion implanter. The ion beam is directed through a plurality of apertures in the mask toward a substrate. The substrate is moved at different speeds such that the substrate is exposed to an ion dose rate when the substrate is moved at a first scan rate and to a second ion dose rate when the substrate is moved at a second scan rate. By modifying the scan rate, various dose rates may be implanted on the substrate at corresponding substrate locations. This allows ion implantation to be used to provide precise doping profiles advantageous for manufacturing solar cells.

    Abstract translation: 制造太阳能电池的改进方法利用在离子注入机中相对于离子束固定的掩模。 离子束被引导通过掩模中的多个孔朝向衬底。 衬底以不同的速度移动，使得当衬底以第一扫描速率移动时衬底暴露于离子剂量率，而当衬底以第二扫描速率移动时，衬底暴露于离子剂量率。 通过修改扫描速率，可以在相应的衬底位置的衬底上植入各种剂量率。 这允许离子注入用于提供有利于制造太阳能电池的精确掺杂分布。

    Multi-axis compound lens, beam system making use of the compound lens, and method using the compound lens
    43.
    发明授权
    Multi-axis compound lens, beam system making use of the compound lens, and method using the compound lens 有权
    多轴复合透镜，使用复合透镜的光束系统，以及使用复合透镜的方法

    公开(公告)号：US07253417B2

    公开(公告)日：2007-08-07

    申请号：US10539179

    申请日：2003-12-12

    Applicant: Jürgen Frosien ,  Pavel Adamec

    Inventor： Jürgen Frosien ,  Pavel Adamec

    IPC: H01J3/07 ,  H01J29/51

    CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/145 ,  H01J37/3177

    Abstract: The invention provides an optical system for a charged particle multi-beam system. The optical system comprises an electrostatic lens component and a magnetic lens component. The components are used to focus a plurality of charged particle beams in a separate opening for each of at least a plurality a charged particle beams traveling through the optical system.

    Abstract translation: 本发明提供了一种用于带电粒子多光束系统的光学系统。 光学系统包括静电透镜部件和磁性透镜部件。 这些部件用于将多个带电粒子束聚焦在分开的开口中，用于至少多个穿过光学系统的带电粒子束中的每一个。

    Radial geometry electron beam controlled switch utilizing wire-ion-plasma electron source
    45.
    发明授权
    Radial geometry electron beam controlled switch utilizing wire-ion-plasma electron source 失效
    利用线离子等离子体电子源的径向几何电子束控制开关

    公开(公告)号：US4645978A

    公开(公告)日：1987-02-24

    申请号：US621579

    申请日：1984-06-18

    Applicant: Robin J. Harvey ,  Hayden E. Gallagher

    Inventor： Robin J. Harvey ,  Hayden E. Gallagher

    IPC: H01J3/07 ,  H01J3/02 ,  H01J3/04 ,  H01J17/38 ,  H01J17/44 ,  H01S3/09 ,  H01S3/097 ,  H01J7/24

    CPC classification number: H01J3/021 ,  H01J17/44

    Abstract: An electron beam controlled switch employing a radial geometry and a Wire-Ion Plasma-Electron gun (WIP E-gun) as an electron source is disclosed. The switch comprises an inner cylinder that serves as the WIP E-gun cathode, a cylindrical grid that serves as the WIP E-gun anode, an array of fine wire anodes disposed in the WIP E-gun ionization chamber, a foil support cylinder to support the foil windows which also serve as the switch anode, and an outer cylinder which also serves as the switch cathode. The WIP E-gun and ionization chamber is gas filled at low pressure, while the switch cavity is filled with a high pressure gas. A voltage pulse is applied to the wire anodes to ionize the gas in the ionization chamber. The ions are extracted through the chamber grid and accelerated through a high voltage to bombard the E-gun cathode. The electrons emitted from the ion bombardment are accelerated outwardly through the high voltage, penetrate through the foil windows and into the pressurized gas in the switch cavity. The high energy electrons ionize the gas between the switch anode and cathode, thereby turning "ON" the switch. In the absence of the electron beam, the switch gas deionizes and switch conduction is quickly extinguished.

    Abstract translation: 公开了采用放射状几何形状的电子束控制开关和线离子等离子体电子枪（WIP E-gun）作为电子源。 开关包括用作WIP电子枪阴极的内筒，用作WIP E枪阳极的圆柱形栅格，设置在WIP E枪电离室中的细线阳极阵列，箔支撑筒 支撑也用作开关阳极的箔窗以及也用作开关阴极的外筒。 WIP电子枪和电离室在低压下充满气体，而开关腔充满高压气体。 对电线阳极施加电压脉冲以电离电离室中的气体。 离子通过室格栅提取，并通过高压加速轰击电子枪阴极。 从离子轰击发射的电子通过高电压向外加速，穿过箔窗口并进入开关腔中的加压气体。 高能电子使开关阳极和阴极之间的气体电离，从而使开关“开”。 在没有电子束的情况下，开关气体去离子并且开关导通快速熄灭。

    Multi charged particle beam writing apparatus and multi charged particle beam writing method
    46.
    发明授权
    Multi charged particle beam writing apparatus and multi charged particle beam writing method 有权
    多带电粒子束写入装置和多带电粒子束写入方法

    公开(公告)号：US08492732B2

    公开(公告)日：2013-07-23

    申请号：US13633468

    申请日：2012-10-02

    Applicant: NuFlare Technology, Inc.

    Inventor： Munehiro Ogasawara

    IPC: H01J3/07 ,  H01J37/141 ,  G21K5/04

    CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J2237/0213 ,  H01J2237/0435 ,  H01J2237/045

    Abstract: A multi charged particle beam writing apparatus according to one aspect of the present invention includes a first aperture member to form multiple beams, a blanker array provided with a plurality of blankers which respectively perform blanking deflection of a corresponding beam in the multiple beams, a first electromagnetic lens and a second electromagnetic lens arranged between the first aperture member and the blanker array, a second aperture member arranged between the first electromagnetic lens and the second electromagnetic lens and at a position of a convergence point of the multiple beams and configured to restrict passage of charged particles deviated from the convergence point, and a third aperture member to block each beam which was deflected to be in a beam off state by the plurality of blankers.

    Abstract translation: 根据本发明的一个方面的多带电粒子束写入装置包括形成多个光束的第一孔径构件，设置有分别对多个光束中的对应光束进行消隐偏转的多个消隐器的消隐器阵列，第一 电磁透镜和布置在所述第一孔径构件和所述遮蔽器阵列之间的第二电磁透镜，布置在所述第一电磁透镜和所述第二电磁透镜之间并且在所述多个光束的会聚点的位置处的第二孔径构件， 的带电粒子偏离会聚点，以及第三孔径构件，用于阻挡被多个阻挡器偏转成束束状态的每个束。

    Charged particle beam drawing apparatus and article manufacturing method using same
    47.
    发明授权
    Charged particle beam drawing apparatus and article manufacturing method using same 失效
    带电粒子束拉制装置及其制造方法

    公开(公告)号：US08384051B2

    公开(公告)日：2013-02-26

    申请号：US13300032

    申请日：2011-11-18

    Applicant: Kimitaka Ozawa

    Inventor： Kimitaka Ozawa

    IPC: H01J3/07 ,  H01J3/14 ,  H01J3/26 ,  G03F9/00

    CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J2237/043 ,  H01J2237/24514

    Abstract: The drawing apparatus of the present inventions includes a detector having a size for which the detector can simultaneously detect two adjacent charged particle beams among a plurality of charged particle beams, and configured to detect an intensity of a charged particle beam incident thereon. A controller is configured to perform a control of a position of the detector and a control of a blanking deflector array such that one of two adjacent charged particle beams is in a blanking state and the other is in a non-blanking state on the detector that is moved, and each of the plurality of charged particle beams becomes in a blanking state and a non-blanking state sequentially, to cause the detector to perform an output in parallel with the control, and to inspect a defect in each blanking deflector in the blanking deflector array based on the output.

    Abstract translation: 本发明的绘图装置包括检测器，该检测器具有这样的尺寸，检测器可以同时检测多个带电粒子束中的两个相邻的带电粒子束，并且被配置为检测入射在其上的带电粒子束的强度。 控制器被配置为执行检测器的位置的控制和对消隐偏转器阵列的控制，使得两个相邻的带电粒子束中的一个处于消隐状态，另一个在检测器上处于非消隐状态， 多个带电粒子束中的每一个顺序地处于消隐状态和非消隐状态，以使检测器与控制并行地执行输出，并且检查在每个消隐偏转器中的缺陷 基于输出的消隐偏转器阵列。

    Mass spectrometer and mass spectrometry
    49.
    发明授权
    Mass spectrometer and mass spectrometry 有权
    质谱仪和质谱仪

    公开(公告)号：US07375316B2

    公开(公告)日：2008-05-20

    申请号：US11712922

    申请日：2007-03-02

    Applicant: Masuyoshi Yamada ,  Masao Suga ,  Izumi Waki

    Inventor： Masuyoshi Yamada ,  Masao Suga ,  Izumi Waki

    IPC: H01J49/00 ,  H01J3/07 ,  B01D59/44

    CPC classification number: H01J49/0422 ,  H01J49/107

    Abstract: A mass spectrometer capable of measuring under switching two ion sources at different pressure levels in which a sample gas separated by GC column is branched, and separately introduced to a first ion source (for example, APCI ion source) and a second ion source (for example, EI ion source) at a pressure level lower than that of the first ion source respectively. Preferably, the flow rate of the sample gas introduced to the APCI ion source is made more than the flow rate of the sample gas introduced to the EI ion source, so that the pressure for each of the ion sources can be maintained and analysis can be conducted by each ionization at a good balance in view of the sensitivity.

    Abstract translation: 一种能够在不同压力水平下切换两个离子源的质谱仪，其中由GC柱分离的样品气体被分支，并分别引入第一离子源（例如APCI离子源）和第二离子源（用于 例如，EI离子源），其压力水平分别低于第一离子源的压力水平。 优选地，引入到APCI离子源的样品气体的流量比引入到EI离子源的样品气体的流量更多，从而可以保持每个离子源的压力并且可以分析 鉴于敏感性，通过各种电离进行良好的平衡。

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