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    Inspection device
    41.
    发明专利
    Inspection device 有权
    检查装置

    公开(公告)号：JP2014060002A

    公开(公告)日：2014-04-03

    申请号：JP2012203379

    申请日：2012-09-14

    Applicant: Ebara Corp ,  株式会社荏原製作所

    Inventor： YOSHIKAWA SEIJI ,  TSUKAMOTO KIWAMU ,  HATAKEYAMA MASAKI

    IPC: H01J37/20 ,  H01J37/09 ,  H01J37/285 ,  H01J37/29 ,  H01L21/66

    Abstract: PROBLEM TO BE SOLVED: To provide an inspection device capable of obtaining an image with high contrast and S/N at an edge of a mesa structure.SOLUTION: An inspection device comprises: beam generation means for generating any of a charged particle and an electromagnetic wave as a beam; a first optical system which guides a beam to an inspection object held in a working chamber and irradiates the inspection object with the beam; a second optical system which detects a secondary charged particle generated from the inspection object; and an image processing system which forms an image on the basis of the detected secondary charged particle. A central part of the inspection object is provided with a central flat part 390. A peripheral edge of the central flat part 390 is provided with a peripheral edge flat part 392 via a step 391. An electric field correction plate 400 is installed around the step 391. A surface voltage comparable to the surface voltage to be applied to the inspection object is applied to an electrode 401 on a surface of the electric field correction plate 400.

    Abstract translation: 要解决的问题：提供一种能够获得在台面结构的边缘处具有高对比度和S / N的图像的检查装置。解决方案：检查装置包括：用于产生任何带电粒子和电磁 波作为梁; 第一光学系统，其将光束引导到保持在工作室中的检查对象，并用所述光束照射所述检查对象; 第二光学系统，其检测从所述检查对象产生的二次带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。 检查对象的中心部分设置有中央平坦部分390.中心平坦部分390的周边边缘经由步骤391设置有周缘平坦部分392.电场校正板400安装在步骤 与施加到检查对象的表面电压相当的表面电压被施加到电场校正板400的表面上的电极401。

    Mesh and element analysis method
    45.
    发明专利
    Mesh and element analysis method 有权
    MESH和元素分析方法

    公开(公告)号：JP2012023041A

    公开(公告)日：2012-02-02

    申请号：JP2011167820

    申请日：2011-07-29

    Applicant: Fujitsu Ltd ,  富士通株式会社

    Inventor： GOTO YASUYUKI

    IPC: H01J37/20 ,  G01N1/28 ,  G01N23/04 ,  H01J37/285

    Abstract: PROBLEM TO BE SOLVED: To provide a mesh for holding a sample which hardly damages the distal end of the sample and is highly suitable for general purposes (unnecessary to make special the shape of a recess (concave) for a sample holder to be mounted with a mesh) and an element analysis method.SOLUTION: A mesh for holding sample 14 has a ring plate shape for use in a transmission electron microscope. The mesh comprises a first and a second mesh formed by dividing the ring plate by a groove 22 provided on the upper surface of the ring plate into a first and a second semi-ring plate shape. The second mesh can be bent from the groove in a direction toward the lower surface of the ring-shaped plate and folded under the lower surface of the first mesh in the state where a sample is mounted on the first mesh of the ring plate shape including the first and the second mesh.

    Abstract translation: 要解决的问题：提供一种用于保持几乎不损伤样品的远端的样品的网，并且非常适合于一般目的（不需要使样品保持器的凹部（凹入）的形状特别地 用网格安装）和元素分析方法。 解决方案：用于保持样品14的网格具有用于透射电子显微镜中的环板形状。 网格包括通过将设置在环形板的上表面上的凹槽22分隔成第一和第二半环形板而形成的第一和第二网格。 第二网状物可以在朝向环状板的下表面的方向上从槽弯曲，并且在样品安装在包括第一网状物的第一网状物的状态下在第一网眼的下表面下折叠，包括 第一和第二网格。 版权所有（C）2012，JPO＆INPIT

    Method for correcting astigmatism in electron emission microscopic spectral imaging
    46.
    发明专利
    Method for correcting astigmatism in electron emission microscopic spectral imaging 审中-公开
    电子发射微观光谱成像中校正方法

    公开(公告)号：JP2010186747A

    公开(公告)日：2010-08-26

    申请号：JP2010018777

    申请日：2010-01-29

    Applicant: Commissariat A L'energie Atomique & Aux Energies Alternatives ,  コミッサリア ア レネルジー アトミーク エ オ ゼネルジ ザルタナテイヴ

    Inventor： RENAULT OLIVIER ,  LAVAYSSIERE MAYLIS ,  MARIOLLE DENIS

    IPC: H01J37/153 ,  H01J37/285

    CPC classification number: H01J37/153 ,  H01J37/26

    Abstract: PROBLEM TO BE SOLVED: To provide a method of correcting astigmatism of an electro-optical column in an electron emission microscopic spectral device. SOLUTION: This method includes a step of forming a reference structure (100B) on a surface of a testpiece containing a structure which is to be an imaging object, a step of imaging the reference structure by a microscopic spectral device by using secondary electrons and using inner shell level photo-electrons, and a step of removing an astigmatic defect coming out while imaging the reference structure by using the secondary electrons and inner shell level photo-electrons. The material of the reference structure is selected so that a contrast C between an average strength Ia of the material of the reference structure and an average strength Ib of the material of the testpiece may become as shown in a formula (1). COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种在电子发射显微光谱装置中校正电光柱的像散的方法。 解决方案：该方法包括在包含作为成像对象的结构的试件的表面上形成参考结构（100B）的步骤，通过使用次级的，通过微观光谱装置对参考结构进行成像的步骤 电子和使用内壳级光电子，以及通过使用二次电子和内壳级光电子来去除在参考结构成像时出现的象散缺陷的步骤。 选择参考结构的材料，使得参考结构的材料的平均强度Ia与试样的材料的平均强度Ib之间的对比度C可以变为如式（1）所示。 版权所有（C）2010，JPO＆INPIT

    Element analyzer and element analysis method
    47.
    发明专利
    Element analyzer and element analysis method 有权
    元素分析和元素分析方法

    公开(公告)号：JP2009041997A

    公开(公告)日：2009-02-26

    申请号：JP2007205777

    申请日：2007-08-07

    Applicant: Fujitsu Ltd ,  富士通株式会社

    Inventor： ITO RYOJI ,  TSUKADA MINEHARU

    IPC: G01N23/04 ,  H01J37/20 ,  H01J37/26 ,  H01J37/285

    Abstract: PROBLEM TO BE SOLVED: To perform the analysis of an element with high precision, by easily and accurately adjusting a sample to the position and angle which is optimal for both of a microscopic mechanism and an element-analysis mechanism and by allowing a microscopic image and the three-dimensional data of the element-analysis mechanism to accurately correspond to each other to easily correct the scale or the deficiency of detection efficiency at three-dimensional reconstruction in a composite element analyzer constituted by loading the microscopic mechanism for observing the sample with the element analysis mechanism of the sample. SOLUTION: A function (first moving part 35) for performing the respective parallel movements in X-axis, Y-axis and Z-axis directions and the respective rotational movements around an X-axis and a Y-axis is added to a sample holder 31 on which the sample 11 is installed, and a function (second moving part 26) for performing the rotational movement around a Z-axis coinciding with the optical axis in the electron microscopic mechanism is added to a position-sensitive detector 3 for detecting the element dissociated from the sample 11. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：为了通过容易且准确地将样品调整到微观机制和元素分析机构两者的最佳位置和角度，并且通过允许 微观图像和元素分析机构的三维数据精确对应，以容易地校正复合元素分析仪中的三维重建检测效率的尺度或缺陷，该复合元件分析器由加载微观机构观察 样品与样品的元素分析机制。 解决方案：将用于执行X轴，Y轴和Z轴方向上的各个平行移动的功能（第一移动部35）以及围绕X轴和Y轴的各自的旋转运动被添加到 在电子显微镜机构上安装有样品11的样品保持器31和与光轴重合的Z轴的旋转运动的功能（第二移动部26）被添加到位置敏感检测器3 用于检测从样品11分离的元件。版权所有（C）2009，JPO＆INPIT

    Preparation method of sample for atom probe analysis by fib, and device for executing the method
    48.
    发明专利
    Preparation method of sample for atom probe analysis by fib, and device for executing the method 有权
    FIB进行原子探针分析的样品制备方法，以及执行方法的装置

    公开(公告)号：JP2008122114A

    公开(公告)日：2008-05-29

    申请号：JP2006303500

    申请日：2006-11-09

    Applicant: Sii Nanotechnology Inc ,  エスアイアイ・ナノテクノロジー株式会社

    Inventor： MINAFUJI TAKASHI

    IPC: G01N1/32 ,  G01N1/28 ,  H01J37/285 ,  H01J37/305 ,  H01J37/317

    CPC classification number: G01Q60/38 ,  B82Y35/00 ,  G01N1/32 ,  G01Q70/10 ,  G01Q70/12 ,  H01J2237/20 ,  H01J2237/3109 ,  H01J2237/31732 ,  H01J2237/3174

    Abstract: PROBLEM TO BE SOLVED: To provide a firm sticking fixing procedure between a sample substrate and a block-shaped sample capable of enduring sufficiently a strong electrostatic attractive force at an AP analysis time, in a preparation method of the sample for atom probe analysis.
    SOLUTION: This preparation method of the sample for atom probe analysis has a step for preparing a ridged and grooved structure by performing etching machining of FIB onto both of a base needle 2 and an implantation sample piece 1, a step for bonding mutual members, and a step for sticking by deposition processing of FIB so that the ridged and grooved structure has an engaged form.
    COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：为了在样品基板和能够在AP分析时间足够承受强静电吸引力的块状样品之间提供牢固的粘附固定方法，在原子探针样品的制备方法中 分析。 解决方案：用于原子探针分析的样品的这种制备方法具有通过对基底针2和植入样品1两者进行FIB的蚀刻加工来制备脊状和凹槽结构的步骤， 构件，以及通过FIB的沉积处理粘附的步骤，使得脊状和带槽结构具有接合形式。 版权所有（C）2008，JPO＆INPIT

    Photoemission electron microscope
    50.
    发明专利
    Photoemission electron microscope 审中-公开
    摄影电子显微镜

    公开(公告)号：JP2007172886A

    公开(公告)日：2007-07-05

    申请号：JP2005365167

    申请日：2005-12-19

    Applicant: Toyota Motor Corp ,  トヨタ自動車株式会社

    Inventor： TERAI YOICHI

    IPC: H01J37/285 ,  G01N23/225 ,  G01N23/227

    Abstract: PROBLEM TO BE SOLVED: To obtain a photoemission electron microscope of which position alignment of an analysis portion and a photoelectron observation portion by an Auger electron spectral analysis on the test piece for obtaining a photoelectron observation image with high resolution is easy.
    SOLUTION: The photoemission electron microscope, in which the surface of the test piece is observed by forming a photoelectron generated by irradiation of ultraviolet rays or X-rays on the surface of the test piece (14) by electron lens systems (9, 10), comprises an electron beam source (14) for exciting Auger electrons and an electron detector (7), and the electron beams generated in the electron beam source (14) are condensed by the electron lens systems (9, 10) and irradiated on the surface of the test piece (14).
    COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题为了获得通过俄歇电子光谱分析在分析部分和光电子观察部分上的位置对准以获得具有高分辨率的光电子观察图像的测试片的光电子显微镜是容易的。 解决方案：通过形成通过电子透镜系统（9）在试片（14）的表面上照射紫外线或X射线产生的光电子来观察试片的表面的光电子显微镜 ，10）包括用于激发俄歇电子的电子束源（14）和电子检测器（7），并且在电子束源（14）中产生的电子束被电子透镜系统（9,10）和 照射在试片（14）的表面上。 版权所有（C）2007，JPO＆INPIT

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