Abstract:
혼합막을 채택하는 아날로그 커패시터 및 그것을 제조하는 방법이 개시된다. 상기 아날로그 커패시터는 하부전극, 상기 하부 전극 상부에 위치하는 상부전극 및 상기 하부 전극과 상기 상부전극 사이에 개재된 혼합막을 포함한다. 상기 혼합막은 서로 반대의 전압효율(VCC) 특성을 갖는 유전막들의 혼합막이다. 이에 따라, 상기 아날로그 커패시터의 VCC 특성을 최적화할 수 있다.
Abstract:
A semiconductor device having a capacitor of a multi-layer structure is provided to prevent a driving ability from being deteriorated by generation of a leakage current by maximizing the area of a capacitor while using a given design rule. A lower interconnection(150) is formed on a semiconductor substrate. The lower interconnection and the substrate are covered with a lower interlayer dielectric(200). At least one capacitor hole penetrates the lower interlayer dielectric to expose the lower interconnection. The exposed lower interconnection and the sidewall of the capacitor hole are covered with a cylindrical lower electrode. The lower interlayer dielectric in the vicinity of the lower electrode and the capacitor hole is covered with a cylindrical lower dielectric layer pattern. The lower dielectric layer pattern is covered with a cylindrical middle electrode body formed in the capacitor hole. The lower dielectric layer pattern on the lower interlayer dielectric is covered with a middle electrode extension part extended from the middle electrode body. The middle electrode body is covered with a cylindrical upper dielectric layer pattern. The upper dielectric layer pattern is covered with a cylindrical upper electrode. An upper interlayer dielectric(290) is formed on the substrate having the upper electrode. The first upper interconnection(320) is disposed on the upper interlayer dielectric, electrically connected to the lower interconnection and the upper electrode. The second upper interconnection(325) is disposed on the upper interlayer dielectric, electrically connected to the middle electrode extension part.
Abstract:
고유전율을 가지는 지르코늄 산화막 형성 방법 및 이를 이용하는 반도체 장치의 형성 방법 및 이에 의해 형성되는 반도체 장치를 이용하는 시스템 장치를 제공한다. 유전율이 높은 지르코늄 산화막과 지르코늄 산질화막 2중 구조로 형성되거나, 지르코늄 산화막과 지르코늄 산질화막 및 지르코늄 산화막 3중 구조를 이용한 반도체 디바이스는 리키지가 없는 고유전막 구조로 넓은 면적의 전극막을 형성할 필요가 없어 단위 면적당 소자의 용량을 증가시킬 수 있다.
Abstract:
A method for operating an image processing circuit includes the steps of: receiving a first original image; and generating first scaled images with different resolutions using the first original image. In the generating step, the first scaled images are generated by simultaneously scaling the first original image using each of a plurality of scaling modules.
Abstract:
A semiconductor element is provided. A first gate dielectric layer, a first bottom gate electrode, and a first top gate electrode are stacked on the first region of a substrate in order. A second gate dielectric layer, a second bottom gate electrode, and a second top gate electrode are stacked on the second region of the substrate in order. A fist spacer and a third spacer which cover the side wall of the first top gate electrode in order are provided, and a second spacer and a fourth spacer which cover the side wall of the second top gate electrode in order are provided. The side wall of the first bottom gate electrode is in contact with the third spacer.
Abstract:
A method for a zirconium carbon oxynitride insulation film, a semiconductor device using the same, and a manufacturing method thereof are provided to increase capacity of a device per unit area by excluding an electrode film of a wide dimension. A bottom electrode(180) is formed on a semiconductor substrate(100). A zirconium organic nitrogen source is absorbed on the bottom electrode. A non-reactive source is removed from the zirconium organic nitrogen. A zirconium carbon oxynitride layer is formed by supplying an oxidizer gas to the zirconium organic nitrogen absorption layer. The non-reactive oxidizer is removed. A nitriding agent is supplied to the zirconium carbon oxynitride layer. A top electrode(195) is formed on the zirconium carbon oxynitride layer.
Abstract:
A portable terminal for optimizing a cordless headset and a method therefor are provided to prevent the deterioration of the quality of sound which is changed according to the change of shape or characteristics of the cordless headset. An audio processor(130) processes an audio signal. A memory(160) stores an echo parameter value. The echo parameter values are classified according to the maker and model of each cordless headset(200). A wireless communications module(110) performs the short-distance wireless communication with the cordless headset for the audio signal and control signal. Whenever connecting with the cordless headset, a controller(180) searches the echo parameter value stored in the memory, and performs the control by using an echo parameter value for the confirmed cordless headset.