公开(公告)号：KR1020050073002A

公开(公告)日：2005-07-13

申请号：KR1020040001178

申请日：2004-01-08

Applicant: 삼성전자주식회사

Inventor： 한동균 ,  김경염

IPC: G02B6/28

CPC classification number: G02B6/12016 ,  G02B6/14 ,  G02B2006/12109 ,  G02B2006/12152

Abstract: A dual-band wavelength division multiplexer is disclosed. The multiplexer includes a first and a second slab waveguide, a plurality of channel waveguides connecting the first slab waveguide to the second slab waveguide, an input part connected to the first slab waveguide, and an output part connected to the second slab waveguide. The input part includes an input waveguide for receiving an optical signal from an exterior, and a wavelength division multiplexing filter connected to the input waveguide, for outputting an optical signal in a first band to a first connecting waveguide, and outputting an optical signal in a second band to a second connecting waveguide. The input part also includes a first mode converter connected to the wavelength division multiplexing filter through the first connecting waveguide, for mode-converting the inputted optical signal in the first band and a second mode converter connected to the wavelength division multiplexing filter through the second connecting waveguide, for mode-converting the inputted optical signal in the second band. An output mode of the first mode converter has a width different from that of an output mode of the second mode converter.

公开(公告)号：KR100469702B1

公开(公告)日：2005-02-02

申请号：KR1020020031672

申请日：2002-06-05

Applicant: 삼성전자주식회사

Inventor： 김희곤 ,  정선태 ,  송영휘 ,  조정환 ,  한동균 ,  유경희

IPC: G02B6/36

Abstract: PURPOSE: A method for fabricating an optical connecting element is provided to connect an optical block and an optical element of the different height and the different width to each other by optimizing structures of an input portion and an output portion of the optical connecting element. CONSTITUTION: A method for fabricating an optical connecting element includes a lower cladding forming process, a core layer forming process, a patterning process, and an annealing process. The lower cladding forming process is to form a lower cladding layer on a substrate. The core layer forming process is to form a core layer on the lower cladding layer. The patterning process is to pattern the core layer. The annealing process is to anneal the patterned core layer and optimize the height and the width of the optical connecting element.

Abstract translation: 目的：提供一种用于制造光学连接元件的方法，用于通过优化光学连接元件的输入部分和输出部分的结构来将光学块和具有不同高度和不同宽度的光学元件彼此连接。 构成：用于制造光学连接元件的方法包括下包层形成工艺，芯层形成工艺，图案化工艺和退火工艺。 下包层形成工艺是在衬底上形成下包层。 芯层形成工艺是在下包层上形成芯层。 构图过程是对核心层进行构图。 退火工艺是对图案化的芯层进行退火并优化光学连接元件的高度和宽度。

公开(公告)号：KR100467016B1

公开(公告)日：2005-01-24

申请号：KR1020020030416

申请日：2002-05-30

Applicant: 삼성전자주식회사

Inventor： 한동균 ,  고형호 ,  김영준 ,  박기종

IPC: H01L21/304

CPC classification number: H01L21/02065 ,  B08B7/00

Abstract: A cleaning method for a semiconductor substrate including placing the semiconductor substrate into a cleaning chamber and injecting ozone gas (O 3 ) into the cleaning chamber. This process operates to cleanse the semiconductor substrate without corrosion or etching of the semiconductor substrate; even when the substrate has metal layer made of tungsten.

Abstract translation: 一种用于半导体衬底的清洁方法，包括将半导体衬底放置到清洁室中并将臭氧气体（O SUB3 / SUB）注入到清洁室中。 该过程用于清洁半导体衬底而不腐蚀或蚀刻半导体衬底; 即使当衬底具有由钨制成的金属层时也是如此。

公开(公告)号：KR100442869B1

公开(公告)日：2004-08-02

申请号：KR1020020006045

申请日：2002-02-02

Applicant: 삼성전자주식회사

Inventor： 한동균 ,  이근택 ,  한용필 ,  고형호

IPC: H01L21/304

CPC classification number: H01L21/31138 ,  B08B7/00 ,  H01L21/67028 ,  H01L21/67763

Abstract: An apparatus for cleaning a semiconductor wafer includes a cleaning reaction chamber wherein the cleaning process is performed in a closed state, a wafer conveyor having wafer supporters for loading semiconductor onto a loading unit within the reaction chamber, at least one cleaning gas supply unit for supplying at least one cleaning solution in a vapor state into the reaction chamber, a water vaporizing unit for supplying vapor onto the semiconductor wafers, an ozone supply unit for supplying ozone gas into the reaction chamber, and a reaction gas exhaustion unit connected to the reaction chamber in order to exhaust the cleaning gas from the reaction chamber. The cleaning of the semiconductor wafers by adding cleaning gas and ozone gas into a reaction chamber easily removes any remaining photoresist that formed on the semiconductor wafers and any other contaminates from pre-processes.

Abstract translation: 一种用于清洁半导体晶片的设备包括：清洁反应室，其中清洁过程在关闭状态下进行;晶片传送器，具有用于将半导体加载到反应室内的加载单元上的晶片支撑件;至少一个清洁气体供应单元， 至少一种处于蒸气状态的清洁溶液进入反应室，用于将蒸气供应到半导体晶片上的水蒸发单元，用于将臭氧气体供应到反应室中的臭氧供应单元以及连接到反应室的反应气体排出单元 以从反应室中排出清洁气体。 通过将清洁气体和臭氧气体添加到反应室中来清洁半导体晶片容易地去除在半导体晶片上形成的任何剩余的光致抗蚀剂以及来自预处理的任何其他污染物。

公开(公告)号：KR1020040049985A

公开(公告)日：2004-06-14

申请号：KR1020020077168

申请日：2002-12-06

Applicant: 삼성전자주식회사

Inventor： 김영훈 ,  한동균 ,  정선태

IPC: G02B6/28

CPC classification number: G02B6/12016

Abstract: PURPOSE: A wavelength division multiplexer/demultiplexer using a parabolic horn-shaped waveguide is provided to minimize a waveform change of flattened optical signals and the power loss of the optical signals by using a parabolic horn-shaped structure. CONSTITUTION: A wavelength division multiplexer/demultiplexer using a parabolic horn-shaped waveguide includes a grating for demultiplexing multiplexed optical signals to corresponding channels, an input waveguide for inputting the multiplexed optical signals into the grating, and an output waveguide for outputting the demultiplexed optical signals. The output waveguide includes a first waveguide and a second waveguide. The first waveguide has a structure of a parabolic horn in order to reduce the width of the optical signals. The second waveguide has a structure of a straight line to maintain constantly the width of the optical signals.

Abstract translation: 目的：提供使用抛物面喇叭形波导的波分复用器/解复用器，以通过使用抛物型喇叭形结构来最小化平坦化光信号的波形变化和光信号的功率损耗。 构成：使用抛物型喇叭形波导的波分多路复用器/解复用器包括用于将复用的光信号解复用到相应通道的光栅，用于将复用的光信号输入到光栅中的输入波导和用于输出解复用的光信号的输出波导 。 输出波导包括第一波导和第二波导。 第一波导具有抛物面角的结构，以便减小光信号的宽度。 第二波导具有直线的结构，以恒定地维持光信号的宽度。

公开(公告)号：KR1020040045583A

公开(公告)日：2004-06-02

申请号：KR1020020073406

申请日：2002-11-25

Applicant: 삼성전자주식회사

Inventor： 김영훈 ,  정선태 ,  한동균

IPC: G02B6/293

CPC classification number: G02B6/12016

Abstract: PURPOSE: A wavelength division multiplexer/demultiplexer is provided to prevent an interference phenomenon between neighboring channels by increasing and reducing the width of an input waveguide. CONSTITUTION: A wavelength division multiplexer/demultiplexer includes a grating for demultiplexing multiplexed optical signal to each channel, a plurality of input waveguides for inputting optical signals into the grating, and a plurality of output waveguides for outputting the demultiplexed channels. The input waveguide(413) of the wavelength division multiplexer/demultiplexer includes a first sub-waveguide and a second sub-waveguide. The width of the first sub-waveguide(413a) is increased along with the traveling direction of the optical signals. The width of the second sub-waveguide(413b) is reduced along the traveling direction of the optical signals passing the first sub-waveguide.

Abstract translation: 目的：提供波分复用器/解复用器，以通过增加和减小输入波导的宽度来防止相邻通道之间的干扰现象。 构成：波分多路复用器/解复用器包括用于将多路复用的光信号解复用到每个通道的光栅，用于将光信号输入光栅的多个输入波导和用于输出解复用的通道的多个输出波导。 波分多路复用器/解复用器的输入波导（413）包括第一子波导和第二子波导。 第一子波导（413a）的宽度随着光信号的行进方向而增加。 第二子波导（413b）的宽度沿着通过第一子波导的光信号的行进方向减小。

公开(公告)号：KR1020030096981A

公开(公告)日：2003-12-31

申请号：KR1020020034095

申请日：2002-06-18

Applicant: 삼성전자주식회사

Inventor： 김영훈 ,  한동균 ,  김희곤

IPC: G02B6/12

Abstract: PURPOSE: A polynomial curve tapered waveguide and an optical device using the same are provided to reduce the crosstalk between neighboring channels by reducing the loss and the noise of the polynomial curve tapered waveguide. CONSTITUTION: A polynomial curve tapered waveguide includes a start waveguide(31), an end waveguide(33), and a tapered waveguide(32). The tapered waveguide(32) is formed between the start waveguide(31) and the end waveguide(33). The tapered waveguide(32) is used for connecting the start waveguide(31) and the end waveguide(33) of different structures to each other. The tapered waveguide(32) has the width of a nonlinear curve structure. The nonlinear curve structure of the tapered waveguide(32) is expressed by a polynomial expression.

Abstract translation: 目的：提供多项式曲线锥形波导和使用其的光学装置，以通过减少多项式曲线锥形波导的损耗和噪声来减小相邻通道之间的串扰。 构成：多项式曲线锥形波导包括起始波导（31），端波导（33）和锥形波导（32）。 锥形波导（32）形成在起始波导（31）和末端波导（33）之间。 锥形波导（32）用于将起始波导（31）和不同结构的端波导（33）彼此连接。 锥形波导（32）具有非线性曲线结构的宽度。 锥形波导（32）的非线性曲线结构由多项式表示。

公开(公告)号：KR1020030065953A

公开(公告)日：2003-08-09

申请号：KR1020020006045

申请日：2002-02-02

Applicant: 삼성전자주식회사

Inventor： 한동균 ,  이근택 ,  한용필 ,  고형호

IPC: H01L21/304

CPC classification number: H01L21/31138 ,  B08B7/00 ,  H01L21/67028 ,  H01L21/67763

Abstract: PURPOSE: A semiconductor fabrication apparatus for a semiconductor substrate cleaning process and a cleaning process using the same are provided to remove easily a hardened photoresist part by mixing a gasified cleaning solution with ozone. CONSTITUTION: A semiconductor fabrication apparatus for semiconductor substrate cleaning process includes a cleaning process chamber(110), a cleaning gas supply portion(120), an ozone supply portion(130), a steam supply portion(125), and a reaction gas exhaust portion(140). The cleaning process chamber has a substrate loading portion(111) for loading a semiconductor substrate(100) to perform a cleaning process in an airtight state. The cleaning gas supply portion supplies a cleaning solution of a gas state. The ozone supply portion supplies ozone to the cleaning process chamber. The steam supply portion supplies the steam to the cleaning process chamber. The process gas exhaust portion is connected to the process chamber in order to exhaust the cleaning gas.

Abstract translation: 目的：提供一种用于半导体衬底清洗工艺的半导体制造装置和使用该半导体衬底清洁工艺的清洁工艺，以通过将气化的清洁溶液与臭氧混合来容易地除去硬化的光致抗蚀剂部件。 构成：用于半导体衬底清洁工艺的半导体制造装置包括清洁处理室（110），清洁气体供应部分（120），臭氧供应部分（130），蒸汽供应部分（125）和反应气体排出 部分（140）。 清洁处理室具有用于加载半导体基板（100）以进行气密状态的清洁处理的基板装载部（111）。 清洁气体供给部供给气体状态的清洗液。 臭氧供应部分向清洗处理室提供臭氧。 蒸汽供应部分将蒸汽供应到清洁处理室。 过程气体排出部分连接到处理室以排出清洁气体。

公开(公告)号：KR100322133B1

公开(公告)日：2002-02-04

申请号：KR1019990003219

申请日：1999-02-01

Applicant: 삼성전자주식회사

Inventor： 한동균 ,  김현수

IPC: G02B6/293 ,  G02B6/28

CPC classification number: G02B6/12011

Abstract: 본발명은손실이균일한광파장분할기/다중화기에관한것으로, 복수의입력광도파로에서입력되는광신호들의파장을분리또는결합하여복수의출력광도파로로출력하는광파장분할기/다중화기에있어서, 입력광도파로들로부터입력된광신호들의파워를나눠주는제1성형결합기; 제1성형결합기로부터입력된광신호들이서로다른위상차를갖도록도파하는광도파로열격자; 광도파로열격자로부터출력되는광신호들의파장을분리또는결합하여출력도파로들로출력하는제2성형결합기; 및광도파로열격자로부터출력되는광신호의도파모드모양을조절하여제2성형결합기의출력측에맺히는광신호의진폭특성을평탄화하는도파모드조절부를포함함을특징으로한다. 본발명에의하면, 광도파로열격자의출력측에도파모드조절부를구비하여광도파로열격자의출력모드모양을메인피크는유지하고모드테일의위상을반전시켜서회절패턴의진폭특성을평탄하게함으로써각 채널간손실을균일하게할 수있다.

公开(公告)号：KR100296383B1

公开(公告)日：2001-07-12

申请号：KR1019990023275

申请日：1999-06-21

Applicant: 삼성전자주식회사

Inventor： 한동균 ,  김현수

IPC: G02B6/293

Abstract: 본발명은도파로열격자를이용한광파장분할기의누화비를개선하기위하여설계단계에서피치스케일링과선형분산스케일링을적용하여최소화된누화비를갖는광파장분할기제조방법에관한것으로, 이러한광파장분할기제조방법은 (a)선형분산의값을일정하게유지하는단계; (b)도파로열격자의피치를변경시키는단계; (c)피치가변화된도파로열격자로부터출력되는소정의파장분포가제2 스타커플러의초점평면상에공간적으로매핑이되도록제2 스타커플러의초점거리를변경시키는단계; (d)초점거리가변경된제2 스타커플러로부터출력되는간섭패턴의사이드로브를측정하는단계; 및 (e)사이드로브가최소화되도록 (b), (c) 및 (d)단계를반복하여도파로열격자의피치및 제2스타커플러의초점거리를구하는단계를포함함을특징으로한다. 본발명에의하면, 광도파로열격자사이의간격인피치와선형분산의값을변화시키면서제2 스타커플러내에서의간섭패턴이최적화분포를갖게되는피치와선형분산의값을산출하여출력도파로열을배열함으로써누화비를최대한억제시키는효과를얻을수 있다.