인듐과 아연 금속을 이용한 신규 페남 유도체 및 이의 제조 방법
    58.
    发明授权
    인듐과 아연 금속을 이용한 신규 페남 유도체 및 이의 제조 방법 失效
    인듐과아연금속을이용신규페남유도체및이의제조방

    公开(公告)号:KR100387581B1

    公开(公告)日:2003-06-18

    申请号:KR1019990016354

    申请日:1999-05-07

    CPC classification number: Y02P20/55

    Abstract: PURPOSE: A new penam derivative using indium and zinc and a preparation method thereof are provided CONSTITUTION: A novel penam derivative represented by formula(I) is prepared by reacting 6-oxopenam of the formula(I') with ally halide of the formula (II) or acetylene halide of the formula (III) in the presence of indium or zinc. In the formula(I): R1 is allyl derivative and acetylene derivative; R2 is hydrogen, carboxylic acid salt(sodium salt and potassium salt as inorganic salt, alkyl amine salt, aromatic amine salt as organic salt) or carboxy protecting group(4-methoxy benzyl, diphenylmethyl, 4-nitrobenzyl, useful thing as protecting group of molecule in penicillin or cephalosporin compound field); R3 is hydrogen, halogen, hydroxy, acetoxy group.

    Abstract translation: 目的:提供一种新的使用铟和锌的青蒿衍生物及其制备方法。结构式(I)代表的新型青蒿衍生物通过使式(I')的6-氧代戊酸与式 II)或式(III)的乙炔卤化物在铟或锌存在下反应。 在式(I)中:R1是烯丙基衍生物和乙炔衍生物; R 2为氢,羧酸盐(作为无机盐的钠盐和钾盐,烷基胺盐,芳香胺盐作为有机盐)或羧基保护基(4-甲氧基苄基,二苯基甲基,4-硝基苄基,作为 分子在青霉素或头孢菌素化合物领域); R3是氢,卤素,羟基,乙酰氧基。

    새로운 세펨 화합물 및 이의 제조방법
    59.
    发明授权
    새로운 세펨 화합물 및 이의 제조방법 失效
    새로운세펨화합물및이의제조방법

    公开(公告)号:KR100380324B1

    公开(公告)日:2003-04-16

    申请号:KR1020000009065

    申请日:2000-02-24

    CPC classification number: Y02P20/55

    Abstract: PURPOSE: Provided is a cephem derivative which has broad range of antimicrobial activity. And its producing method is also provided. CONSTITUTION: The cephalosporin compounds represented by formula (1) and its pharmaceutically acceptable salts are produced. In the formula, R1 is hydrogen or an amine protecting group generally used in cephalosporin compounds; R2 is hydrogen or an oxim protecting group; R3 is hydrogen or a chloro group; R5 is hydrogen or an ester producing group, a salt producing atom or a carboxy protecting group; and R4 is ring substituent having Q group, in which Q is hydrogen, halogen, hydroxy, mercapto, cyano, carboxy, carboxylic acid ester, carbamoyloxymethyl, N,N-dimethylcarbamoyloxymethyl, carbamoyl, N,N-dimethylcarbamoyl, C1 to C4 alkyl, C1 to C4 alkyloxy, halogen substituted methyl, halogen substituted C1 to C4 alkyloxy, aryl or hetero ring substituent. The cephalosporin derivative of formula (1) is produced by reacting a compound of formula (7) with a compound of formula (8).

    Abstract translation: 目的:提供具有广泛抗微生物活性的头孢烯衍生物。 并提供其制作方法。 构成:生产式(1)代表的头孢菌素化合物及其药学上可接受的盐。 在该式中,R1是氢或通常用于头孢菌素化合物中的胺保护基; R2是氢或肟保护基; R3是氢或氯基; R5是氢或产酯基团,产盐原子或羧基保护基团; 其中Q为氢,卤素,羟基,巯基,氰基,羧基,羧酸酯,氨基甲酰氧基甲基,N,N-二甲基氨基甲酰氧基甲基,氨基甲酰基,N,N-二甲基氨基甲酰基,C1-C4烷基, C1至C4烷氧基,卤素取代的甲基,卤素取代的C1至C4烷氧基,芳基或杂环取代基。 式(1)的头孢菌素衍生物通过使式(7)的化合物与式(8)的化合物反应来制备。

    인듐과 주석 금속을 이용한 세팜 유도체 및 그의 제조 방법
    60.
    发明授权
    인듐과 주석 금속을 이용한 세팜 유도체 및 그의 제조 방법 失效
    使用印度尼西亚和锡的制备CEPHAM衍生物及其生产方法

    公开(公告)号:KR100303378B1

    公开(公告)日:2001-09-24

    申请号:KR1019990015261

    申请日:1999-04-28

    CPC classification number: Y02P20/55

    Abstract: 일반식(V)로표시되는 3-히드록시세펨유도체와일반식(III)으로표시되는알릴할라이드또는일반식(IV)로표시되는아세틸렌할라이드를용매와금속촉매존재하에반응시켜신규일반식(I)로표시되는세팜유도체및 이의제조방법. 일반식(I)의화합물은세펨항생제제조에중요한중간체로사용할수 있다. 일반식(I)에있어서, R은페닐아세틸, 2-[2-아미노(1,3-티아졸-4-일)-2-(히드록시알콕시이미노)에틴닐, 2-[2-아미노(1,3-티아졸-4-일)-2-(알콕시이미노)에틴닐또는 4-히드록시페닐글라이신유도체를표시하며, R는수소, 카르복실산염(무기염으로나트륨및 칼륨염, 유기염으로알킬아민염, 방향족아민염)으로카르복시보호기로는 4-메톡시벤질, 디페닐메틸, 4-니트로벤질, 알릴등 세팔로스포린화합물분야에서의분자보호기를표시하며, Q로표시되는알킬화합물에서, R, R및 R는각각수소, 할로겐, 메틸, 에틸기의알킬기, 히드록시기, 페닐또는알콕시카보닐기를표시한다.

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