公开(公告)号：WO2009011578A1

公开(公告)日：2009-01-22

申请号：PCT/NL2008/050479

申请日：2008-07-15

Applicant: NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO ,  MEINDERS, Erwin, Rinaldo ,  GIESEN, Peter, Theodorus, Maria

Inventor： MEINDERS, Erwin, Rinaldo ,  GIESEN, Peter, Theodorus, Maria

IPC: G11B7/00 ,  G03F7/20

CPC classification number: H01J3/14 ,  G03F7/70383 ,  G03F7/70466

Abstract: An exposure pattern is written on a substrate, by scanning a light spot along a trajectory over the substrate and switching it on and off according to a desired pattern. Respective spot sizes of the light for illuminating the substrate in respective parts of the trajectory according to a geometry of the pattern. Respective pitch values between successive ones of the parts of the trajectory are selected, in relation to the spot size selected for the respective parts. The light spot is scanned over the substrate along the trajectory, with the selected pitch values between the trajectory parts and a position dependent spot size along the trajectory. In an embodiment a helical trajectory is used.

Abstract translation: 通过沿着基板上的轨迹扫描光点并根据期望的图案将其打开和关闭来将曝光图案写入基板。 用于根据图案的几何形状在轨迹的各个部分中照射基底的光的各个斑点尺寸。 相对于为各个部分选择的光斑尺寸，选择轨迹的连续部分之间的相对间距值。 沿着轨迹将光点扫描在基板上，轨迹部分之间的所选间距值和沿着轨迹的位置相关光点尺寸。 在一个实施例中，使用螺旋轨迹。

公开(公告)号：WO2006004374A1

公开(公告)日：2006-01-12

申请号：PCT/KR2005/002145

申请日：2005-07-05

Applicant: CEBT Co. Ltd. ,  KIM, Ho Seob ,  KIM, Byeng Jin

Inventor： KIM, Ho Seob ,  KIM, Byeng Jin

IPC: H01J37/147

CPC classification number: H01J37/263 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/14 ,  H01J37/04 ,  H01J37/3007 ,  H01J37/302 ,  H01J37/3174 ,  H01J2237/1205 ,  H01J2237/248 ,  H01J2237/28 ,  H01J2237/31752

Abstract: Provided is a method for controlling electron beams in a multi-microcolumn, in which unit microcolumns having an electron emitter, a lens, and a deflector are arranged in an n x m matrix. A voltage is uniformly or differentially applied to each electron emitter or extractor. The same control voltage or different voltages are applied to a region at coordinates in a control division area of each extractor to deflect the electron beams. Lens layers not corresponding to the extractors are collectively or individually controlled so as to efficiently control the electron beams of the unit microcolumn. Further, a multi-microcolumn using the method is provided.

Abstract translation: 提供了一种用于控制多微柱中的电子束的方法，其中具有电子发射器，透镜和偏转器的单元微柱以n×m矩阵排列。 电压均匀或差分施加到每个电子发射器或提取器。 将相同的控制电压或不同的电压施加到每个提取器的控制分割区域中的坐标处的区域以偏转电子束。 不对应于提取器的透镜层被集体地或单独地控制，以便有效地控制单元微柱的电子束。 此外，提供了使用该方法的多微柱。

公开(公告)号：EP2283709B1

公开(公告)日：2018-07-11

申请号：EP09750854.3

申请日：2009-05-21

Applicant: Balakin, Vladimir Yegorovich

Inventor： Balakin, Vladimir Yegorovich

IPC: H05H13/04 ,  A61N5/01 ,  A61N5/10 ,  H05H7/10 ,  H05H7/04

CPC classification number: A61N5/10 ,  A61N2005/1087 ,  G03B42/02 ,  G21K1/087 ,  G21K1/093 ,  G21K1/14 ,  H01J3/14 ,  H01J3/34 ,  H05H7/04 ,  H05H7/08 ,  H05H7/10 ,  H05H13/04

Abstract: The invention comprises a patient positioning and/or repositioning system, such as a laying, semi-vertical, or seated patient positioning, alignment, and/or control method and apparatus used in conjunction with multi-axis charged particle radiation therapy. Patient positioning constraints optionally include one or more of: a seat support, a back support, a head support, an arm support, a knee support, and a foot support. One or more of the positioning constraints are preferably movable and/or under computer control for rapid positioning, repositioning, and/or immobilization of the patient. The system optionally uses an X-ray beam that lies in substantially the same path as a proton beam path of a particle beam cancer therapy system. The generated image is usable for: fine tuning body alignment relative to the proton beam path, to control the charged particle beam path to accurately and precisely target the tumor, and/or in system verification and validation.

公开(公告)号：EP3200004A4

公开(公告)日：2018-05-30

申请号：EP15844562

申请日：2015-06-22

Applicant: CITIZEN WATCH CO LTD

Inventor： TANABE AYANO

IPC: G02B21/06 ,  G02B21/00 ,  G02B26/06 ,  G02B27/00 ,  G02F1/01 ,  G02F1/13

CPC classification number: H04L27/389 ,  G02B21/00 ,  G02B21/0028 ,  G02B21/0032 ,  G02B21/0036 ,  G02B21/0072 ,  G02B21/0076 ,  G02B21/0088 ,  G02B21/082 ,  G02B26/06 ,  G02B27/0068 ,  G02F1/13 ,  G02F2203/18 ,  G02F2203/50 ,  H01J3/14 ,  H04L27/361

Abstract: The phase modulation device 3 includes a first phase modulation element 11 which modulates a phase of a light flux in accordance with a voltage applied to each of a plurality of first electrodes formed to impart to the light flux an amount of phase modulation which has a polarity opposite to the polarity of a phase distribution in accordance with a first ratio of a second aberration component to a first aberration component of a wave front aberration generated by an optical system including an objective lens 4; a second phase modulation element 12 which modulates a phase of a light flux in accordance with a voltage applied to each of a plurality of second electrodes formed to impart to the light flux an amount of phase modulation which has a polarity opposite to the polarity of a phase distribution in accordance with a second ratio of the second aberration component to the first aberration component; and a control circuit 13 which controls voltages applied to the plurality of first electrodes and voltages applied to the plurality of second electrodes in accordance with a distance from the objective lens to a light focusing position of the light flux.

公开(公告)号：EP2437279B1

公开(公告)日：2018-05-30

申请号：EP11007981.1

申请日：2011-09-30

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Biberger, Josef ,  Pulwey, Ralph ,  Adolf, Andreas

IPC: H01J37/147 ,  H01J37/28

CPC classification number: H01J3/26 ,  H01J3/14 ,  H01J37/1477 ,  H01J37/28 ,  H01J37/317 ,  H01J2237/303 ,  H01J2237/31749

Abstract: An ion beam system comprises a voltage supply system (7) and at least one beam deflector (39) having at least one first deflection electrode (51a,51b,51c) and plural second deflection electrodes (52a,52b,52c), wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plural second deflection electrodes such that electric deflection fields between the plural second deflection electrodes and the opposite at least one first deflection electrode have a common orientation. The system has a high kinetic energy mode in which a distribution of the electric deflection field has a greater width, a low kinetic energy mode in which a distribution of the electric deflection field has a smaller width.

公开(公告)号：EP2437279A3

公开(公告)日：2012-12-05

申请号：EP11007981.1

申请日：2011-09-30

Applicant: Carl Zeiss NTS GmbH

Inventor： Biberger, Josef ,  Pulwey, Ralph ,  Adolf, Andreas

IPC: H01J37/147 ,  H01J37/28

CPC classification number: H01J3/26 ,  H01J3/14 ,  H01J37/1477 ,  H01J37/28 ,  H01J37/317 ,  H01J2237/303 ,  H01J2237/31749

Abstract: An ion beam system comprises a voltage supply system (7) and at least one beam deflector (39) having at least one first deflection electrode (51a,51b,51c) and plural second deflection electrodes (52a,52b,52c), wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plural second deflection electrodes such that electric deflection fields between the plural second deflection electrodes and the opposite at least one first deflection electrode have a common orientation.
The system has a high kinetic energy mode in which a distribution of the electric deflection field has a greater width, a low kinetic energy mode in which a distribution of the electric deflection field has a smaller width.

公开(公告)号：EP2437279A2

公开(公告)日：2012-04-04

申请号：EP11007981.1

申请日：2011-09-30

Applicant: Carl Zeiss NTS GmbH

Inventor： Biberger, Josef ,  Pulwey, Ralph ,  Adolf, Andreas

IPC: H01J37/147 ,  H01J37/28

CPC classification number: H01J3/26 ,  H01J3/14 ,  H01J37/1477 ,  H01J37/28 ,  H01J37/317 ,  H01J2237/303 ,  H01J2237/31749

Abstract: An ion beam system comprises a voltage supply system (7) and at least one beam deflector (39) having at least one first deflection electrode (51a,51b,51c) and plural second deflection electrodes (52a,52b,52c), wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plural second deflection electrodes such that electric deflection fields between the plural second deflection electrodes and the opposite at least one first deflection electrode have a common orientation.
The system has a high kinetic energy mode in which a distribution of the electric deflection field has a greater width, a low kinetic energy mode in which a distribution of the electric deflection field has a smaller width.

Abstract translation: 离子束系统包括电压供应系统（7）和至少一个具有至少一个第一偏转电极（51a，51b，51c）和多个第二偏转电极（52a，52b，52c）的光束偏转器（39），其中 电压供给系统被配置为向多个第二偏转电极提供不同的可调偏转电压，使得多个第二偏转电极和相对的至少一个第一偏转电极之间的电偏转场具有共同的取向。 该系统具有高动能模式，其中电偏转场的分布具有较大的宽度，其中电偏转场的分布具有较小宽度的低动能模式。

公开(公告)号：EP1779403A1

公开(公告)日：2007-05-02

申请号：EP05765910.4

申请日：2005-07-05

Applicant: Cebt Co., Ltd.

Inventor： Kim, Ho Seob ,  Kim, Byeng Jin

IPC: H01J37/147

CPC classification number: H01J37/263 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/14 ,  H01J37/04 ,  H01J37/3007 ,  H01J37/302 ,  H01J37/3174 ,  H01J2237/1205 ,  H01J2237/248 ,  H01J2237/28 ,  H01J2237/31752

Abstract: Provided is a method for controlling electron beams in a multi-microcolumn, in which unit microcolumns having an electron emitter, a lens, and a deflector are arranged in an n x m matrix. A voltage is uniformly or differentially applied to each electron emitter or extractor. The same control voltage or different voltages are applied to a region at coordinates in a control division area of each extractor to deflect the electron beams. Lens layers not corresponding to the extractors are collectively or individually controlled so as to efficiently control the electron beams of the unit microcolumn. Further, a multi-microcolumn using the method is provided.

公开(公告)号：WO2012134601A1

公开(公告)日：2012-10-04

申请号：PCT/US2012/000179

申请日：2012-03-29

Applicant: AXCELIS TECHNOLOGIES, INC. ,  EISNER, Edward

Inventor： EISNER, Edward

IPC: H01J37/302 ,  H01J37/317

CPC classification number: H01J3/14 ,  G21K5/10 ,  H01J37/302 ,  H01J37/3171 ,  H01J2237/049 ,  H01J2237/30477 ,  H01J2237/30483

Abstract: The present invention relates to a method and apparatus for varying the cross - sectional shape (308a, 308b, 308c) of an ion beam, as the ion beam is scanned over the surface of a workpiece (304), to generate a time - averaged ion beam having an improved ion beam current profile uniformity. In one embodiment, the cross - sectional shape of an ion beam is varied as the ion beam moves across the surface of the workpiece. The different cross - sectional shapes of the ion beam respectively have different beam profiles (e.g., having peaks at different locations along the beam profile), so that rapidly changing the cross - sectional shape of the ion beam results in a smoothing of the beam current profile (e.g., reduction of peaks associated with individual beam profiles) that the workpiece is exposed to. The resulting smoothed beam current profile provides for improved uniformity of the beam current and improved workpiece dose uniformity.

Abstract translation: 本发明涉及一种用于当离子束扫描在工件（304）的表面上时改变离子束的横截面形状（308a，308b，308c）的方法和装置，以产生时间平均 具有改进的离子束电流分布均匀性的离子束。 在一个实施例中，离子束的横截面形状随着离子束移动穿过工件的表面而变化。 离子束的不同横截面形状分别具有不同的光束轮廓（例如，沿着光束轮廓在不同位置处具有峰值），使得快速改变离子束的横截面形状导致光束电流的平滑 工件暴露于的轮廓（例如，减小与各个梁轮廓相关联的峰）。 所得到的平滑光束电流分布提供了改进的束电流均匀性和改进的工件剂量均匀性。

公开(公告)号：WO2010090911A2

公开(公告)日：2010-08-12

申请号：PCT/US2010/022122

申请日：2010-01-26

Applicant: VIRGIN INSTRUMENTS CORPORATION ,  VESTAL, Marvin L.

Inventor： VESTAL, Marvin L.

IPC: H01J49/40 ,  H01J49/26

CPC classification number: H01J3/14 ,  H01J49/004 ,  H01J49/061 ,  H01J49/40

Abstract: A mass spectrometer includes a pulsed ion source that generates an ion beam comprising a plurality of ions. A first timed ion selector passes a first group of ions. A first ion mirror generates a reflected ion beam comprising the first group of ions that at least partially compensates for an initial kinetic energy distribution of the first group of ions. A second timed ion selector passes a second group of ions. A second ion mirror generates a reflected ion beam comprising the second group of ions that at least partially compensates for an initial kinetic energy distribution of the second group of ions. A timed ion deflector deflects the second group of ions to a detector assembly comprising at least two ion detectors which detects the deflected ion beam.

Abstract translation: 质谱仪包括产生包含多个离子的离子束的脉冲离子源。 第一定时离子选择器通过第一组离子。 第一离子镜产生包含至少部分地补偿第一组离子的初始动能分布的第一组离子的反射离子束。 第二个定时离子选择器通过第二组离子。 第二离子镜产生包含至少部分地补偿第二组离子的初始动能分布的第二组离子的反射离子束。 定时离子偏转器将第二组离子偏转到包括至少两个检测偏转离子束的离子检测器的检测器组件。